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1. 发明授权

US5468590A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5468590A
公开(公告)日：1995-11-21
申请号：US348994
申请日：1994-11-29
申请人： Kazuhiko Hashimoto , Haruyoshi Osaki , Chinehito Ebina , Kyoko Nagase , Hiroshi Moriuma , Yasunori Uetani
发明人： Kazuhiko Hashimoto , Haruyoshi Osaki , Chinehito Ebina , Kyoko Nagase , Hiroshi Moriuma , Yasunori Uetani
IPC分类号： C08G8/24 , G03F7/023 , H01L21/027 , G03F7/30
CPC分类号： G03F7/0236 , C08G8/24
摘要： A positive resist composition containing a quinone diazide compound and an alkali-soluble resin which contains a resin (A) obtained by a condensation reaction of an aldehyde compound, at least one phenol compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are independently a hydrogen atom, or a C.sub.1 -C.sub.4 alkyl or alkoxy group, and j is 1 or 2, and at least one compound of the formula: ##STR2## wherein R'.sub.1, R'.sub.2, R'.sub.3, R'.sub.4, R'.sub.5 and R'.sub.6 are independently a hydrogen atom, or a C.sub.1 -C.sub.4 alkyl or alkoxy group, R'.sub.7 is a hydrogen, a C.sub.1 -C.sub.4 alkyl group or an aryl group, and k, m and n are independently 0, 1 or 2 provided that a sum of k, m and n is larger than 2, which composition is excellent in balance among various properties such as a profile, a sensitivity, heat resistance and a depth of focus.
摘要翻译：含有醌二叠氮化合物和碱溶性树脂的正性抗蚀剂组合物，其含有通过醛化合物，至少一种下式的酚化合物缩合反应获得的树脂（A）：其中R1， R2和R3独立地为氢原子或C1-C4烷基或烷氧基，j为1或2，以及至少一种下式化合物：其中R'1，R'2， R'3，R'4，R'5和R'6独立地是氢原子或C1-C4烷基或烷氧基，R'7是氢，C1-C4烷基或芳基，以及 k，m和n独立地为0,1或2，条件是k，m和n的和大于2，该组成在各种性质如轮廓，灵敏度，耐热性和深度之间的平衡优异焦点。

2. 发明授权

US5429904A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5429904A
公开(公告)日：1995-07-04
申请号：US67935
申请日：1993-05-27
申请人： Kyoko Nagase , Haruyoshi Osaki , Kazuhiko Hashimoto , Hiroshi Moriuma
发明人： Kyoko Nagase , Haruyoshi Osaki , Kazuhiko Hashimoto , Hiroshi Moriuma
IPC分类号： G03F7/022 , C08G8/04 , G03F7/023 , H01L21/027
CPC分类号： C08G8/04 , G03F7/0236
摘要： A positive resist composition comprising a quinonediazide compound and an alkali-soluble resin containing resin (A) obtainable through a condensation reaction of at least one compound represented by the general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one polyphenol compound represented by the general formula ( II ): ##STR2## wherein R.sub.4 ' to R.sub.6 ' each represent a hydrogen atom or an alkyl or alkoxy group and n represents 1 or 2, with an aldehyde compound. This positive resist composition is excellent in properties such as profile, resolution, heat resistance, etc. and nearly completely free from scum
摘要翻译：一种正型抗蚀剂组合物，其包含醌二叠氮化合物和通过至少一种由通式（I）表示的化合物缩合反应获得的含有树脂（A）的碱溶性树脂：其中R1，R2和R3 彼此独立地表示氢原子或具有1-4个碳原子的烷基或烷氧基，k表示1或2个，至少一种由通式（II）表示的多酚化合物：其中R 4 '至R6'各自表示氢原子或烷基或烷氧基，n表示1或2，表示醛化合物。该正型抗蚀剂组合物的特性如型材，分辨率，耐热性等，几乎完全不含浮渣

3. 发明授权

US5451484A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5451484A
公开(公告)日：1995-09-19
申请号：US067933
申请日：1993-05-27
申请人： Kyoko Nagase , Haruyoshi Osaki , Hiroshi Moriuma
发明人： Kyoko Nagase , Haruyoshi Osaki , Hiroshi Moriuma
IPC分类号： G03F7/022 , G03F7/023 , H01L21/027
CPC分类号： G03F7/0236
摘要： A positive resist composition comprising a quinonediazide compound and an alkali-soluble resin containing resin (A) obtainable through a condensation reaction of at least one compound represented by the general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one polyphenol compound represented by the general formula (II): ##STR2## wherein R.sub.4 ' to R.sub.6 ' each represent a hydrogen atom or an alkyl or alkoxy group and n represents 1 or 2, with an aldehyde compound. This positive resist composition is excellent in properties such as profile, resolution, heat resistance, etc.
摘要翻译：一种正型抗蚀剂组合物，其包含醌二叠氮化合物和通过至少一种由通式（I）表示的化合物缩合反应获得的含有树脂（A）的碱溶性树脂：其中R1，R2和R3 彼此独立地表示氢原子或具有1-4个碳原子的烷基或烷氧基，k表示1或2个，至少一种由通式（II）表示的多酚化合物：其中R 4 '至R6'各自表示氢原子或烷基或烷氧基，n表示1或2，表示醛化合物。该正型抗蚀剂组合物的特性如型材，分辨率，耐热性等优异。

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