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2. 发明授权

US06414328B1 Method and apparatus for the conveying and positioning of ion implantation targets 失效
标题翻译：用于输送和定位离子注入靶的方法和装置
公开(公告)号：US06414328B1
公开(公告)日：2002-07-02
申请号：US09434373
申请日：1999-11-05
申请人： Kair Nussupov
发明人： Kair Nussupov
IPC分类号： H01J37317
CPC分类号： H01L21/67213 , H01J2237/204 , H01J2237/31701 , H01L21/67069 , H01L21/67775
摘要： An economical, high capacity, multi-chamber target presentation unit is used in the ion beam processing of semiconductor wafers in the fabrication of integrated circuits. The multi-chamber target presentation unit comprises a central vacuum chamber where the semiconductor wafers are processed and two symmetrically disposed lateral vacuum chambers wherein one of the lateral vacuum chambers is the loading chamber into which the semiconductor wafers which are mounted on cassettes are loaded, while the other lateral vacuum chamber is the discharge chamber into which the semiconductor wafers are transferred after processing. The cassettes with mounted wafers are conveyed from one vacuum chamber to another by means of several screw conveyors and a looped chain conveyor. The present invention continuously processes large semiconductor wafers both efficiently and economically. The present invention has a large capacity and a high throughput being able to continuously process a large number of semiconductor wafers in a relatively short period of time.
摘要翻译：在集成电路的制造中，在半导体晶片的离子束处理中使用经济，高容量的多室目标呈现单元。多室目标呈现单元包括中央真空室，其中半导体晶片被处理和两个对称设置的侧面真空室，其中侧面真空室之一是加载室，安装在盒上的半导体晶片被加载到其中，同时另一个侧面真空室是在处理之后半导体晶片被转移到其中的放电室。具有安装的晶片的盒通过几个螺旋输送机和环形链式输送机从一个真空室输送到另一个真空室。本发明能够有效和经济地连续地处理大的半导体晶片。本发明具有能够在较短时间内连续处理大量半导体晶片的大容量和高产量。

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