专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20060255182A1 Pattern forming apparatus and method of manufacturing pattern forming apparatus 审中-公开
标题翻译：图案形成装置和图案形成装置的制造方法
公开(公告)号：US20060255182A1
公开(公告)日：2006-11-16
申请号：US11411983
申请日：2006-04-27
申请人： Katsuya Okumura , Manabu Yabe , Yasuyuki Koyagi , Muneo Harada , Tomofumi Kiyomoto
发明人： Katsuya Okumura , Manabu Yabe , Yasuyuki Koyagi , Muneo Harada , Tomofumi Kiyomoto
IPC分类号： B05B1/26 , B05B1/34
CPC分类号： B41J2/1609 , B05C5/007 , B05C5/0212 , B05C5/027 , B41J2/1628 , B41J2/1631 , H01J9/242
摘要： Using a silicon single crystal with (100) plane orientation as a base material, a pectinate portion having a slope portion and a patterning material guiding groove is formed through photolithography process. A liquid reservoir for keeping a patterning material common to tooth portions of the pectinate portion is formed in the same step as a step for forming the guiding grooves. In forming slope portion, anisotropic wet etching allows easy and accurate formation of a slope portion with (111) plane orientation to (100) plane orientation, by taking advantage of differences in speed due to the plane orientations. In addition, by forming a groove portion using anisotropic dry etching, the patterning material guiding groove having a perpendicular sidewall reaching the slope portion may be formed at high accuracy. A pattern forming apparatus with high accuracy and low cost is provided.
摘要翻译：使用具有（100）面取向的硅单晶作为基材，通过光刻工艺形成具有倾斜部分和图案形成材料引导槽的果胶部分。在与用于形成导向槽的步骤相同的步骤中形成用于保持图形材料的共同于图形部分的牙齿部分的图案材料的液体储存器。在形成斜坡部分时，通过利用由于平面取向的速度差异，各向异性湿蚀刻允许容易且准确地形成具有（111）面取向到（100）面取向的斜面部分。此外，通过使用各向异性干蚀刻形成槽部，可以高精度地形成具有到达斜面部的垂直侧壁的图案形成材料导向槽。提供了一种高精度，低成本的图案形成装置。

2. 发明授权

US06662139B2 Drawing apparatus and method of attaching balance weights 有权
标题翻译：附着平衡重的牵引装置和方法
公开(公告)号：US06662139B2
公开(公告)日：2003-12-09
申请号：US10201700
申请日：2002-07-24
申请人： Masao Inoue , Yasuyuki Koyagi , Toru Kawada , Toshio Tamura , Junichi Nagamine
发明人： Masao Inoue , Yasuyuki Koyagi , Toru Kawada , Toshio Tamura , Junichi Nagamine
IPC分类号： G06C2300
CPC分类号： B41J29/38 , B41J29/08
摘要： Front end clamps are disposed on the cylindrical surface of a recording drum, and rear end clamps are attached in any of a plurality of positions at the cylindrical surface of the recording drum. A controller controls a front end clamp opening/closing device to open the front end clamps and controls a pair of rollers to feed a plate held on a plate carry-in path. The controller also controls the front end clamp opening/closing device to close the plate fixing portion of the front end clamps to fix the front end of the plate on the cylindrical surface, controls a driving device to rotate the recording drum for a predetermined amount, and controls a rear end clamp attaching/detaching device to attach the rear end clamps to the cylindrical surface to fix the rear end of the plate on the recording drum cylindrical surface.
摘要翻译：前端夹具设置在记录鼓的圆柱形表面上，并且后端夹具附着在记录鼓的圆柱形表面上的多个位置中的任一位置。控制器控制前端夹具打开/关闭装置以打开前端夹具并且控制一对辊以进给固定在板载入路径上的板。控制器还控制前端夹具打开/关闭装置以封闭前端夹具的板固定部分，以将板的前端固定在圆柱形表面上，控制驱动装置使记录鼓旋转预定量，并且控制后端夹具安装/拆卸装置以将后端夹具附接到圆柱形表面，以将板的后端固定在记录鼓圆柱形表面上。

3. 发明授权

US07083405B2 Photo-fabrication apparatus 有权
标题翻译：照相制作装置
公开(公告)号：US07083405B2
公开(公告)日：2006-08-01
申请号：US10759134
申请日：2004-01-20
申请人： Yasuyuki Koyagi , Hiroko Shimozuma
发明人： Yasuyuki Koyagi , Hiroko Shimozuma
IPC分类号： B28B17/00
CPC分类号： B29C64/135
摘要： A photo-fabrication apparatus comprises a stage for holding a photosensitive member which is a substrate coated with a photosensitive material, a head part for emitting a spatially-modulated light beam to said photosensitive member and a computer. The head part has a DMD having a plurality of micromirrors arranged in a two-dimensional array, and a light beam from a light source is reflected on only some of the group of micromirrors in the DMD which have a predetermined tilt angle and led onto the photosensitive member. In the photo-fabrication apparatus, the tilt angle of each micromirror in the DMD is controlled by the computer. This can control the quantity of irradiation light for an irradiation region on the photosensitive member corresponding to each micromirror, to perform an exposure in accordance with a three-dimensional shape of a desired object for a short time. The exposed photosensitive member is developed by another apparatus.
摘要翻译：光致制造装置包括用于保持作为被感光材料涂覆的基材的感光构件的台，用于向所述感光构件发射空间调制光束的头部和计算机。头部具有具有以二维阵列布置的多个微镜的DMD，并且来自光源的光束仅在具有预定倾斜角的DMD中的一组微镜上反射并被引导到感光部件。在照相制造装置中，DMD中的每个微反射镜的倾斜角度由计算机控制。这可以控制对应于每个微反射镜的感光构件上的照射区域的照射光量，以根据期望物体的三维形状短时间进行曝光。曝光的感光构件由另一装置显影。

4. 发明授权

US07568904B2 Stereolithography apparatus 失效
标题翻译：立体光刻仪
公开(公告)号：US07568904B2
公开(公告)日：2009-08-04
申请号：US11358099
申请日：2006-02-22
申请人： Yasuyuki Koyagi , Hiroko Shimozuma , Hiroshi Yaze , Ichiro Miyaki
发明人： Yasuyuki Koyagi , Hiroko Shimozuma , Hiroshi Yaze , Ichiro Miyaki
IPC分类号： B28B1/16 , B29C35/00
CPC分类号： B29C64/135 , B33Y10/00 , B33Y30/00 , B33Y40/00 , B33Y50/02
摘要： A supply part for supplying resin, a smoothing part for smoothing the resin, and an objective lens for exposing the smoothed resin to light are provided in separate positions within substantially the same horizontal plane, and a modeling part is movable by a horizontal drive mechanism under the three above-mentioned components. For processing in the three above-mentioned components, the modeling part is moved to positions immediately under the three above-mentioned components in order by the horizontal drive mechanism. Thus, the modeling part is brought as close to the three above-mentioned components as possible for processing. The exposure is performed, with the objective lens fixed to a base body. Exposure light is focused onto a resin layer on a modeling base, and the light reflected from the resin layer is received by the objective lens, directed by a beam splitter toward an image surface optical system and received as an image by a CCD camera. During the exposure, the directed exposure light serves as illumination light which enables an operator to check whether current focus is achieved on the surface of the resin layer. During a time interval between the completion of the exposure of the resin layer to light and the execution of the exposure of the next resin layer to light, the fine adjustment of the vertical position of a stage is made, whereby the fine adjustment of the focus position is made in accordance with the result of observation using a monitor. This prevents the decrease in modeling accuracy for the subsequent resin layers, thereby to hold the modeling accuracy for the entire model higher, thereby improving the yield and productivity of models. These provide a stereolithography apparatus which attains a resin layer thickness of 10 μm and an exposure resolution of 2 μm and is preferred for micromachining.
摘要翻译：用于供应树脂的供应部分，用于使树脂平滑的平滑部分和用于将平滑的树脂暴露于光的物镜设置在基本上相同的水平面内的分离位置，并且建模部分可通过水平驱动机构上述三个组件。为了在上述三个部件中进行处理，建模部件通过水平驱动机构依次移动到三个上述部件的正下方的位置。因此，建模部分尽可能靠近上述三个部件进行处理。进行曝光，物镜固定在基体上。曝光光被聚焦在建模基底上的树脂层上，并且由树脂层反射的光被物镜接收，由分束器指向图像表面光学系统，并通过CCD照相机作为图像接收。在曝光期间，定向曝光光用作照明光，使得操作者能够检查在树脂层的表面上是否实现了当前的聚焦。在树脂层与光的曝光完成与下一个树脂层的曝光的执行之间的时间间隔期间，进行阶段的垂直位置的微调，由此精细调整焦点根据观察结果使用监视器进行位置。这样可以防止后续树脂层的建模精度降低，从而保持整个模型的建模精度更高，从而提高模型的产量和生产率。这些提供了一种立体光刻设备，其获得10μm的树脂层厚度和2μm的曝光分辨率，并且对于微加工优选。

5. 发明申请

US20070069744A1 Board for probe card, inspection apparatus, photo-fabrication apparatus and photo-fabrication method 审中-公开
标题翻译：探针卡，检查仪器，光制造装置和照相制造方法的板
公开(公告)号：US20070069744A1
公开(公告)日：2007-03-29
申请号：US10557714
申请日：2004-05-10
申请人： Yasuyuki Koyagi , Hiroko Shimozuma , Takayoshi Tanabe , Takao Yashiro
发明人： Yasuyuki Koyagi , Hiroko Shimozuma , Takayoshi Tanabe , Takao Yashiro
IPC分类号： G01R31/02
CPC分类号： G01R3/00 , G01R1/06716 , G01R1/07378
摘要： A photo-fabrication apparatus (1) has a stage (2) for holding a base board (9) thereon, a feeding part (3) for feeding photosensitive material onto the base board (9), a layer forming part (4) for smoothly spreading the fed photosensitive material to form a material layer and a light emitting part (5) for emitting a spatially-modulated light beam onto the material layer. The photo-fabrication apparatus (1) forms a lot of elastic microstructures for fine probe and arranges the microstructures at microscopic intervals in a very small range with high positional accuracy on the base board (9) by repeating formation of a material layer and light emission. The microstructures become elastic probes through plating in a later process.
摘要翻译：一种光制造装置（1）具有用于在其上保持基板（9）的载物台（2），用于将感光材料馈送到基板（9）上的馈送部分（3），用于平滑地扩展馈送的感光材料以形成材料层，以及用于将空间调制的光束发射到材料层上的发光部分（5）。光致制造装置（1）形成大量用于精细探针的弹性微结构，并且通过重复形成材料层和发光，在基板（9）上以非常小的范围以非常小的范围以高位置精度布置微结构。微结构在后续工艺中通过电镀成为弹性探针。

6. 发明申请

US20060198918A1 Stereolithography apparatus 失效
公开(公告)号：US20060198918A1
公开(公告)日：2006-09-07
申请号：US11358099
申请日：2006-02-22
申请人： Yasuyuki Koyagi , Hiroko Shimozuma , Hiroshi Yaze , Ichiro Miyaki
发明人： Yasuyuki Koyagi , Hiroko Shimozuma , Hiroshi Yaze , Ichiro Miyaki
IPC分类号： B29C35/08
CPC分类号： B29C64/135 , B33Y10/00 , B33Y30/00 , B33Y40/00 , B33Y50/02
摘要： A supply part for supplying resin, a smoothing part for smoothing the resin, and an objective lens for exposing the smoothed resin to light are provided in separate positions within substantially the same horizontal plane, and a modeling part is movable by a horizontal drive mechanism under the three above-mentioned components. For processing in the three above-mentioned components, the modeling part is moved to positions immediately under the three above-mentioned components in order by the horizontal drive mechanism. Thus, the modeling part is brought as close to the three above-mentioned components as possible for processing. The exposure is performed, with the objective lens fixed to a base body. Exposure light is focused onto a resin layer on a modeling base, and the light reflected from the resin layer is received by the objective lens, directed by a beam splitter toward an image surface optical system and received as an image by a CCD camera. During the exposure, the directed exposure light serves as illumination light which enables an operator to check whether current focus is achieved on the surface of the resin layer. During a time interval between the completion of the exposure of the resin layer to light and the execution of the exposure of the next resin layer to light, the fine adjustment of the vertical position of a stage is made, whereby the fine adjustment of the focus position is made in accordance with the result of observation using a monitor. This prevents the decrease in modeling accuracy for the subsequent resin layers, thereby to hold the modeling accuracy for the entire model higher, thereby improving the yield and productivity of models. These provide a stereolithography apparatus which attains a resin layer thickness of 10 μm and an exposure resolution of 2 μm and is preferred for micromachining.

7. 发明授权

US06505142B1 Drawing apparatus and method of attaching balance weights 有权
标题翻译：附着平衡重的牵引装置和方法
公开(公告)号：US06505142B1
公开(公告)日：2003-01-07
申请号：US09249088
申请日：1999-02-12
申请人： Masao Inoue , Yasuyuki Koyagi , Toru Kawada , Toshio Tamura , Junichi Nagamine
发明人： Masao Inoue , Yasuyuki Koyagi , Toru Kawada , Toshio Tamura , Junichi Nagamine
IPC分类号： G06C2300
CPC分类号： B41J29/38 , B41J29/08
摘要： Annular grooves are formed on both end surfaces of a recording drum to be rotated, and two balance weights are disposed inside each of the annular grooves. The balance weight is composed of a magnet, and is attracted to the end surface of the recording drum by its magnetic force. The two balance weights are arranged at a predetermined attaching angle such that an unbalance force caused by centrifugal forces developed by a plate and a movable clamp, for example, is canceled. Every time the size and the mass of the plate are changed, the positions of the two balance weights are adjusted, so that forced vibration in the recording drum is restrained.
摘要翻译：环形槽形成在要转动的记录鼓的两个端面上，并且在每个环形槽内设置两个平衡重。平衡重由磁体构成，并通过其磁力被吸引到记录鼓的端面。这两个平衡配重被布置成预定的附着角度，使得例如由板和可动夹具产生的离心力引起的不平衡力被消除。每当板的尺寸和质量改变时，调整两个平衡重的位置，从而抑制记录鼓中的强制振动。

8. 发明授权

US4971443A Optical position detecting method and apparatus therefor 失效
标题翻译：光学位置检测方法及其装置
公开(公告)号：US4971443A
公开(公告)日：1990-11-20
申请号：US289542
申请日：1988-12-23
申请人： Yasuyuki Koyagi
发明人： Yasuyuki Koyagi
IPC分类号： G03F9/00
CPC分类号： G03F9/7023
摘要： A method of and an apparatus for optically detecting the position of an object having a surface including first and second reflecting regions each having a different reflectance coefficient. First a ratio of reflectance of the first reflecting region to that of the second reflecting region is obtained. Incident optical beams are projected onto the measured surface of the object, and first and second reflected optical beams reflected by the first and second reflecting regions of the measured surface are received at a photoelectric conversion element to obtain first and second light receiving signals, respectively. Thereafter, the second light receiving signal is multiplied by the reflectance ratio to produce a correction light receiving signal. Further, the central position of the reflected optical beams is obtained on the basis of the first light receiving signal and the correction light receiving signal. Thus, the central position of the reflected optical beams can be obtained with very high accuracy.
摘要翻译：一种用于光学检测具有包括具有不同反射系数的第一和第二反射区域的表面的物体的位置的方法和装置。首先获得第一反射区域与第二反射区域的反射率的比率。入射光束被投影到物体的测量表面上，并且被测量表面的第一和第二反射区域反射的第一和第二反射光束在光电转换元件处被接收以分别获得第一和第二光接收信号。此后，将第二光接收信号乘以反射率，以产生校正光接收信号。此外，基于第一光接收信号和校正光接收信号获得反射光束的中心位置。因此，可以以非常高的精度获得反射光束的中心位置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式