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    • 10. 发明授权
    • Illumination optical system, exposure apparatus, and device manufacturing method
    • 照明光学系统,曝光装置和装置制造方法
    • US08947635B2
    • 2015-02-03
    • US13168068
    • 2011-06-24
    • Hirohisa TanakaYasushi Mizuno
    • Hirohisa TanakaYasushi Mizuno
    • G03B27/72G02B27/09G03F7/20
    • G02B27/0966G03F7/70091G03F7/70191
    • According to one embodiment, an illumination optical system is provided with an optical integrator which forms a predetermined light intensity distribution on an illumination pupil plane in an illumination optical path of the illumination optical system with incidence of exposure light from a light source device thereinto; a transmission filter arranged on the reticle side with respect to the optical integrator and in a first adjustment region set including the illumination pupil plane in an optical-axis direction of the illumination optical system, and having a transmittance characteristic varying according to positions of the exposure light incident thereinto; and a movement mechanism which moves the transmission filter along the optical-axis direction in the first adjustment region.
    • 根据一个实施例,照明光学系统设置有光学积分器,其在照明光学系统的照明光路中在照明光瞳平面上形成预定的光强度分布,其中光源装置的曝光光入射到照明光学系统中; 相对于光积分器布置在光罩侧的透射滤光器和在照明光学系统的光轴方向上包括照明光瞳面的第一调整区域,并且具有根据曝光位置而变化的透射率特性 光线事件 以及在第一调整区域中沿着光轴方向移动发送滤波器的移动机构。