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1. 发明授权

US06843882B2 Gas flow control in a wafer processing system having multiple chambers for performing same process 失效
标题翻译：在具有用于执行相同处理的多个室的晶片处理系统中的气体流量控制
公开(公告)号：US06843882B2
公开(公告)日：2005-01-18
申请号：US10263556
申请日：2002-10-02
申请人： Karthik Janakiraman , Victor Wang , Vikash Banthia , Teresa Winson , Nitin Ingle
发明人： Karthik Janakiraman , Victor Wang , Vikash Banthia , Teresa Winson , Nitin Ingle
IPC分类号： C23C16/44 , C23C16/455 , C23C16/52 , H01L21/00 , H01L21/677 , C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01L21/67754 , C23C16/4412 , C23C16/455 , C23C16/52 , H01L21/67017 , H01L21/67178 , H01L21/6719
摘要： A system for processing substrates comprises a plurality of process chambers. Each process chamber includes an inlet gas distribution member connected to an inlet gas line to distribute gas from the inlet gas line into the process chamber, and a gas outlet. The inlet gas distribution member has an inlet gas distribution member impedance to a gas flow through the inlet gas distribution member into the process chamber. The plurality of process chambers are substantially identical. A source gas delivery line is connected to the inlet gas lines of the plurality of process chambers to supply a gas flow to be divided into the inlet gas lines. A plurality of tunable upstream gas restrictors are each disposed in one of the inlet gas lines connected to the inlet gas distribution members of the process chambers and are configured to adjust a flow rate into the corresponding process chamber.
摘要翻译：用于处理衬底的系统包括多个处理室。每个处理室包括连接到入口气体管线以将气体从入口气体管线分配到处理室中的入口气体分配构件和气体出口。入口气体分配构件具有入口气体分配构件对通过入口气体分配构件的气体流入处理室的阻抗。多个处理室基本相同。源气体输送管线连接到多个处理室的入口气体管线，以供应待分成入口气体管线的气流。多个可调节的上游气体限制器分别设置在连接到处理室的入口气体分配构件的入口气体管线中的一个中，并且被配置为调节进入相应处理室的流量。

2. 发明授权

US10110834B2 Hadamard enhanced sensors 有权
公开(公告)号：US10110834B2
公开(公告)日：2018-10-23
申请号：US13290409
申请日：2011-11-07
申请人： Chet L. Richards , Victor Wang
发明人： Chet L. Richards , Victor Wang
IPC分类号： H04N5/349 , H04N5/225 , H04N5/232 , G02B27/46
摘要： A method for increasing the pixel count delivered from a plurality of light detectors when scanning an object that includes positioning a mask, having a plurality of two dimensional Walsh-Hadamard filter patterns, in front of a plurality of light detectors to control the passage of light through the mask filter patterns to the light detectors. The method also includes positioning a lens assembly in front of the mask to project an image through the mask filter patterns on to the plurality of light detectors. The method also includes moving the mask, plurality of light detectors, or the image in a plane defined by a planar surface of the plurality of light detectors. The method also includes measuring the filtered image projected through the mask with the plurality of light detectors.

3. 发明授权

US08449786B2 Film adhesive for semiconductor vacuum processing apparatus 有权
标题翻译：半导体真空处理设备的胶粘剂
公开(公告)号：US08449786B2
公开(公告)日：2013-05-28
申请号：US12746810
申请日：2008-12-18
申请人： Dean J. Larson , Tom Stevenson , Victor Wang
发明人： Dean J. Larson , Tom Stevenson , Victor Wang
IPC分类号： B44C1/22 , C23F1/00
CPC分类号： H01L21/67069 , B32B37/12 , H01L21/67103 , H01L21/68757 , Y10T156/10 , Y10T156/1062 , Y10T428/31504
摘要： A bonded assembly to reduce particle contamination in a semiconductor vacuum chamber such as a plasma processing apparatus is provided, including an elastomeric sheet adhesive bond between mating surfaces of a component and a support member to accommodate thermal stresses. The elastomeric sheet comprises a silicone adhesive to withstand a high shear strain of ≧800% at a temperature range between room temperature and 300° C. such as heat curable high molecular weight dimethyl silicone with optional fillers. The sheet form has bond thickness control for parallelism of bonded surfaces. The sheet adhesive may be cut into pre-form shapes to conform to regularly or irregularly shaped features, maximize surface contact area with mating parts, and can be installed into cavities. Installation can be manually, manually with installation tooling, or with automated machinery. Composite layers of sheet adhesive having different physical properties can be laminated or coplanar.
摘要翻译：提供了一种用于减少诸如等离子体处理装置的半导体真空室中的颗粒污染的粘合组件，包括在部件的配合表面和支撑构件之间的弹性片粘合剂粘合以适应热应力。弹性体片材包含硅氧烷粘合剂，以在室温至300℃的温度范围内承受≥800％的高剪切应变，例如具有任选填料的可热固化的高分子量二甲基硅氧烷。片材形式具有用于粘结表面平行度的粘结厚度控制。片状粘合剂可以被切割成预成型形状以符合规则或不规则形状的特征，使与配合部件的表面接触面积最大化，并且可以安装到空腔中。安装可以手动，手动安装工具或自动化机械。具有不同物理性质的片状粘合剂的复合层可以层压或共面。

4. 发明申请

US20130113921A1 HADAMARD ENHANCED SENSORS 审中-公开
标题翻译： HADAMARD增强传感器
公开(公告)号：US20130113921A1
公开(公告)日：2013-05-09
申请号：US13290409
申请日：2011-11-07
申请人： Chet L. Richards , Victor Wang
发明人： Chet L. Richards , Victor Wang
IPC分类号： H04N7/18
CPC分类号： H04N5/349 , G02B27/46 , G02B2207/129 , H04N5/2254 , H04N5/23232
摘要： A method for increasing the pixel count delivered from a plurality of light detectors when scanning an object that includes positioning a mask, having a plurality of two dimensional Walsh-Hadamard filter patterns, in front of a plurality of light detectors to control the passage of light through the mask filter patterns to the light detectors. The method also includes positioning a lens assembly in front of the mask to project an image through the mask filter patterns on to the plurality of light detectors. The method also includes moving the mask, plurality of light detectors, or the image in a plane defined by a planar surface of the plurality of light detectors. The method also includes measuring the filtered image projected through the mask with the plurality of light detectors.
摘要翻译：一种在多个光检测器前面扫描包括定位具有多个二维沃尔什 - 哈达玛滤波器图案的掩模的对象以增加从多个光检测器传送的像素数的方法，以控制光的通过通过掩模过滤器图案到光检测器。该方法还包括将透镜组件定位在掩模前面，以将图像通过掩模过滤器图案投影到多个光检测器上。该方法还包括在由多个光检测器的平面表面限定的平面中移动掩模，多个光检测器或图像。该方法还包括用多个光检测器测量通过掩模投影的滤波图像。

5. 发明授权

US08418649B2 Composite showerhead electrode assembly for a plasma processing apparatus 有权
标题翻译：用于等离子体处理装置的复合喷头电极组件
公开(公告)号：US08418649B2
公开(公告)日：2013-04-16
申请号：US12337323
申请日：2008-12-17
申请人： Dean Jay Larson , Tom Stevenson , Victor Wang
发明人： Dean Jay Larson , Tom Stevenson , Victor Wang
IPC分类号： C23C16/455 , C23C16/50 , C23C16/505 , C23C16/509 , H01L21/306 , C23F1/00 , C23C16/06 , C23C16/22
CPC分类号： H01L21/3065 , B29C65/483 , B29C65/4835 , B29C65/4855 , B29C65/4865 , B29C65/4875 , B29C65/4885 , B29C65/5028 , B29C65/5057 , B29C65/5071 , B29C66/73111 , B29C66/73112 , B29C66/742 , B29K2305/00 , B32B37/025 , B32B37/1292 , B32B38/145 , B32B38/164 , B32B2307/202 , B32B2309/02 , B32B2309/10 , B32B2309/105 , B32B2457/00 , C23C16/45565 , H01J37/32009 , H01J37/3244 , H01J37/32541 , H01J37/3255 , H05K13/00 , Y10T29/49 , Y10T29/49002 , Y10T29/5313 , Y10T29/532 , Y10T29/53204 , Y10T156/10 , Y10T156/1062
摘要： A showerhead electrode for a plasma processing apparatus includes an elastomeric sheet adhesive bond between mating surfaces of an electrode and a backing member to accommodate stresses generated during temperature cycling due to mismatch in coefficients of thermal expansion. The elastomeric sheet comprises a thermally conductive silicone adhesive able to withstand a high shear strain of ≧300% in a temperature range of room temperature to 300° C. such as heat curable high molecular weight dimethyl silicone with fillers. The sheet form adhesive has bond thickness control for parallelism of bonded surfaces over large areas. The sheet adhesive may be cast or die cut into pre-form shapes that can conform to irregularly shaped features, maximize surface contact area with mating electrode surfaces, and installed into cavities of the mating assembly. Installation can be manually, manually with installation tooling, or with automated machinery. Composite layers of sheet adhesive having different physical properties can be laminated or coplanar.
摘要翻译：用于等离子体处理装置的喷头电极包括在电极的配合表面和背衬构件之间的弹性片粘合剂粘合，以适应由于热膨胀系数的失配而在温度循环期间产生的应力。弹性体片材包括能够在室温至300℃的温度范围内承受≥300％的高剪切应变的导热硅胶粘合剂，例如具有填料的热固化高分子量二甲基硅酮。片状粘合剂具有用于在大面积上的接合表面的平行度的结合厚度控制。片状粘合剂可以被铸造或模切成预成形的形状，其可以符合不规则形状的特征，使与配合的电极表面的表面接触面积最大化并且安装到配合组件的空腔中。安装可以手动，手动安装工具或自动化机械。具有不同物理性质的片状粘合剂的复合层可以层压或共面。

6. 外观设计

USD438873S1 Icon for a computer display 失效
公开(公告)号：USD438873S1
公开(公告)日：2001-03-13
申请号：US29120465
申请日：2000-03-17
申请人： Victor Wang , Kristofer Chun , Andrew Schmeling , Steve Gustafson , Sonja Aliesch
设计人： Victor Wang , Kristofer Chun , Andrew Schmeling , Steve Gustafson , Sonja Aliesch

7. 发明授权

US5972804A Process for forming a semiconductor device 失效
标题翻译：用于形成半导体器件的工艺
公开(公告)号：US5972804A
公开(公告)日：1999-10-26
申请号：US963436
申请日：1997-11-03
申请人： Philip J. Tobin , Rama I. Hegde , Hsing-Huang Tseng , David O'Meara , Victor Wang
发明人： Philip J. Tobin , Rama I. Hegde , Hsing-Huang Tseng , David O'Meara , Victor Wang
IPC分类号： H01L29/78 , H01L21/28 , H01L21/318 , H01L21/336 , H01L21/76 , H01L29/51 , H01L21/285
CPC分类号： H01L21/28202 , H01L21/28247 , H01L29/518 , H01L29/66575 , Y10S438/906
摘要： A method for forming an oxynitride gate dielectric layer (202, 204) begins by providing a semiconductor substrate (200). This semiconductor substrate is cleaned via process steps (10-28). Optional nitridation and oxidation are performed via steps (50 and 60) to form a thin interface layer (202). Bulk oxynitride gate deposition occurs via a step (70) to form a bulk gate dielectric material (204) having custom tailored oxygen and nitrogen profile and concentration. A step (10) is then utilized to in situ cap this bulk dielectric layer (204) with a polysilicon or amorphous silicon layer (208). The layer (208) ensures that the custom tailors oxygen and nitrogen profile and concentration of the underlying gate dielectric (204) is preserved even in the presence of subsequent wafer exposure to oxygen ambients.
摘要翻译：形成氧氮化物栅极电介质层（202,204）的方法由提供半导体衬底（200）开始。通过工艺步骤（10-28）清洁该半导体衬底。通过步骤（50和60）进行可选的氮化和氧化以形成薄界面层（202）。大量氮氧化物栅极沉积通过步骤（70）发生，以形成具有定制的氧和氮分布和浓度的体栅电介质材料（204）。然后使用步骤（10）以多晶硅或非晶硅层（208）原位覆盖该体电介质层（204）。即使在随后的晶片暴露于氧气氛的情况下，层（208）确保定制定制氧气和氮气分布和下层栅极电介质（204）的浓度。

8. 发明申请

US20130098974A1 Apparatus And Method For Providing An Inerting Gas During Soldering 有权
标题翻译：在焊接过程中提供惰性气体的设备和方法
公开(公告)号：US20130098974A1
公开(公告)日：2013-04-25
申请号：US13449470
申请日：2012-04-18
申请人： Chun Christine Dong , Victor Wang , Jerry Wu , Ranajit Ghosh , Gregory Khosrov Arslanian
发明人： Chun Christine Dong , Victor Wang , Jerry Wu , Ranajit Ghosh , Gregory Khosrov Arslanian
IPC分类号： B23K3/08 , B23K1/20 , B23K3/06
CPC分类号： B23K3/082 , B23K1/0016 , B23K1/085 , B23K1/203 , B23K3/0653 , B23K3/08 , B23K2101/42 , H05K3/3468 , H05K2203/044
摘要： Described herein is an apparatus and method for providing an inerting gas during the application of soldering to a work piece. In one aspect, there is provided an enclosure for providing an inerting gas into an atmosphere above a solder reservoir during soldering of a work piece comprising: a tube in fluid communication with an inerting gas source wherein the tube comprises one or more openings for the flow of the inerting gas therethrough, a base wherein the tube resides in therein and comprises an interior volume, a neck comprising an opening and an interior volume in fluid communication with the interior volume of the base, and a cap proximal to the opening wherein the inerting gas source travels through the tube into the interior volume and into the atmosphere through the opening defined by the neck and cap.
摘要翻译：这里描述了一种用于在对工件进行焊接的过程中提供惰性气体的装置和方法。在一个方面，提供了一种用于在工件焊接期间将惰性气体提供到焊料储存器上方的气氛中的外壳，包括：与惰性气体源流体连通的管，其中管包括用于流动的一个或多个开口的惰性气体通过其中的基部，其中管位于其中并包括内部容积的基部，颈部包括开口和与基部的内部空间流体连通的内部容积，以及靠近开口的盖，其中惰性气体源通过颈部和盖子限定的开口穿过管进入内部空间并进入大气。

9. 发明授权

US08084705B2 Quartz guard ring centering features 有权
公开(公告)号：US08084705B2
公开(公告)日：2011-12-27
申请号：US12967717
申请日：2010-12-14
申请人： Dean J. Larson , Daniel Brown , Keith Comendant , Victor Wang
发明人： Dean J. Larson , Daniel Brown , Keith Comendant , Victor Wang
IPC分类号： B23K10/00
CPC分类号： H01J37/3255 , H01J37/32009 , H01J37/32568 , Y10T29/49002
摘要： An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the outer ring around an outer surface of a backing member of the electrode assembly, and inserting at least one centering element between the outer ring and the backing member. The centering element can be a plurality of spring-loaded centering elements received in a cavity on the outer surface of the backing member, the centering elements having a first end adapted to contact the outer ring and a second end adapted to receive a spring. The outer ring surrounds an outer surface of the backing member, such that the plurality of spring-loaded centering elements are positioned between the outer surface of the backing member and an inner surface of the outer ring.

10. 发明申请

US20060195637A1 Television with integrated signal switch for console and peripheral devices 失效
标题翻译：带有控制台和外围设备的集成信号开关的电视
公开(公告)号：US20060195637A1
公开(公告)日：2006-08-31
申请号：US11414638
申请日：2006-04-27
申请人： Joseph Zhang , Victor Wang , Sampson Shih Yang
发明人： Joseph Zhang , Victor Wang , Sampson Shih Yang
IPC分类号： G06F13/38 , G06F13/12
CPC分类号： G09G5/006 , G06F3/14 , G09G5/003 , G09G2370/24 , H04N21/4104 , H04N21/4113 , H04N21/4122
摘要： A television with integrated signal switch (100) for sharing a television screen (14), a plurality of console devices compliant with an industry standard (16, 18) and at least one peripheral devices (20) with any computer system in a plurality of computer systems (12), is provided comprising a CPU (30); a hub switch module (32) connected to the CPU (30) and configured to communicate with any of the plurality of computer systems (12), and the at least one peripheral devices (20); a device control module (38) for emulating, according to the industry standard, the plurality of console devices, connected to the CPU (30) and the hub switch module (32); a host control module (44) connected to the CPU (30) and configured to communicate with the plurality of console devices (16, 18); and a video control module (50) connected to the CPU (30) and configured to communicate with the television screen (14).
摘要翻译：具有用于共享电视屏幕（14）的集成信号开关（100）的电视机，符合工业标准（16,18）的多个控制台设备和至少一个外围设备（20），其中多个计算机系统（12），包括CPU（30）; 连接到CPU（30）并被配置为与所述多个计算机系统（12）中的任一个通信的所述集线器交换模块（32）和所述至少一个外围设备（20）; 用于根据工业标准仿真连接到CPU（30）和集线器交换模块（32）的多个控制台设备的设备控制模块（38）。主机控制模块（44），其连接到所述CPU（30）并且被配置为与所述多个控制台设备（16,18）通信; 以及连接到CPU（30）并被配置为与电视屏幕（14）进行通信的视频控制模块（50）。

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