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1. 发明申请

US20080297745A1 PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：投影平面图投影目标
公开(公告)号：US20080297745A1
公开(公告)日：2008-12-04
申请号：US12187152
申请日：2008-08-06
申请人： Karl-Stefan WEISSENRIEDER , Alexander HIRNET , Alexander PAZIDIS , Karl-Heinz SCHUSTER , Christoph ZACZEK , Michael LILL , Patrick SCHEIBLE , Guenter SCHEIBLE , Sigrid SCHEIBLE , Harald SCHINK , Markus BROTSACK , Ulrich LOERING , Toralf GRUNER
发明人： Karl-Stefan WEISSENRIEDER , Alexander HIRNET , Alexander PAZIDIS , Karl-Heinz SCHUSTER , Christoph ZACZEK , Michael LILL , Patrick SCHEIBLE , Guenter SCHEIBLE , Sigrid SCHEIBLE , Harald SCHINK , Markus BROTSACK , Ulrich LOERING , Toralf GRUNER
IPC分类号： G03B27/52 , G02B13/14 , B05D5/06
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
摘要翻译：在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

2. 发明申请

US20110069296A1 MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE SYSTEM FOR CARRYING OUT THE METHOD 有权
标题翻译：作为实施方法的投影曝光系统的微观曝光方法
公开(公告)号：US20110069296A1
公开(公告)日：2011-03-24
申请号：US12946380
申请日：2010-11-15
申请人： Toralf GRUNER , Daniel KRAEHMER , Michael TOTZECK , Johannes WANGLER , Markus BROTSACK , Nils DIECKMANN , Aksel GOEHNERMEIER , Markus SCHWAB , Damian FIOLKA , Markus ZENZINGER
发明人： Toralf GRUNER , Daniel KRAEHMER , Michael TOTZECK , Johannes WANGLER , Markus BROTSACK , Nils DIECKMANN , Aksel GOEHNERMEIER , Markus SCHWAB , Damian FIOLKA , Markus ZENZINGER
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

3. 发明申请

US20090040496A1 MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE SYSTEM FOR CARRYING OUT THE METHOD 有权
标题翻译：作为实施方法的投影曝光系统的微观曝光方法
公开(公告)号：US20090040496A1
公开(公告)日：2009-02-12
申请号：US12177715
申请日：2008-07-22
申请人： Toralf GRUNER , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf GRUNER , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

4. 发明申请

US20090237636A1 PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE SYSTEM THEREFOR 有权
标题翻译：投影曝光方法和投影曝光系统
公开(公告)号：US20090237636A1
公开(公告)日：2009-09-24
申请号：US12410640
申请日：2009-03-25
申请人： Julian KALLER , Toralf GRUNER
发明人： Julian KALLER , Toralf GRUNER
IPC分类号： G03B27/54
CPC分类号： G03F7/70933 , G03F7/70191 , G03F7/70575 , G03F7/70941
摘要： In a projection exposure method, primary radiation having a center wavelength λ is generated and guided through an illumination system along an illumination path and through a projection system along a projection path. The center wavelength is varied within a wavelength variation range Δλ having a lower limit λMIN≦λ and an upper limit λMAX≧λ. A specific absorption coefficient k(λ) of at least one gaseous absorbent species selected from the group consisting of oxygen (O2), ozone (O3) and water vapor (H2O) present in at least one gas-filled space along at least one of the illumination path and the projection path varies between a minimum absorption coefficient kMIN and a maximum absorption coefficient kMAX within the wavelength variation range such that an absorption ratio (kMAX/kMIN) exceeds 10. A concentration of the absorbent species within the gas-filled space is controlled such that an overall absorption variation effected by the absorbent species for all rays running along differing ray paths towards the image field is maintained below a predetermined absorption variation threshold value.
摘要翻译：在投影曝光方法中，产生具有中心波长λ的初级辐射并沿着照明路径通过照明系统并沿着投影路径通过投影系统。中心波长在具有下限λMIN<=λ和上限λMAX> =λ的波长变化范围Deltalambda内变化。至少一种选自氧（O 2），臭氧（O 3）和水蒸汽（H 2 O）的气体吸收剂物质的吸收系数k（λ）至少存在于至少一个气体填充空间中，照射路径和投影路径在波长变化范围内的最小吸收系数kMIN和最大吸收系数kMAX之间变化，使得吸收比（kMAX / kMIN）超过10。气体填充空间内的吸收物质的浓度被控制为使得沿着沿着不同光线路朝着图像场行进的所有射线的吸收物质的整体吸收变化保持在预定吸收变化阈值以下。

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