专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20080170818A1 Humidity Tolerant Electro-Optic Device 有权
标题翻译：湿度电容器
公开(公告)号：US20080170818A1
公开(公告)日：2008-07-17
申请号：US11971726
申请日：2008-01-09
申请人： Karl Kissa , William J. Minford , Jason Jiazhan Xu , Glen Drake
发明人： Karl Kissa , William J. Minford , Jason Jiazhan Xu , Glen Drake
IPC分类号： G02F1/035
CPC分类号： G02F1/0316 , G02F1/0356
摘要： The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by electro-migration and other effects that can be present in non-hermetic packages. The bias electrodes include an upper split portion and an optically transparent lower portion. The optically transparent lower layer improves modulation frequency and reduces optical loss.
摘要翻译：本发明涉及一种电光调制器结构，其包含埋在该装置内的附加一组偏置电极，用于施加偏压以设定工作点。因此，用于调制输入光信号的RF电极可以以零直流偏压运行，通过电迁移减少电极腐蚀和可能存在于非密封封装中的其他效应。偏置电极包括上分割部分和光学透明下部分。光透明下层提高调制频率，减少光损耗。

2. 发明授权

US07529433B2 Humidity tolerant electro-optic device 有权
标题翻译：耐湿电光装置
公开(公告)号：US07529433B2
公开(公告)日：2009-05-05
申请号：US11971726
申请日：2008-01-09
申请人： Karl Kissa , William J. Minford , Jason Jiazhan Xu , Glen Drake
发明人： Karl Kissa , William J. Minford , Jason Jiazhan Xu , Glen Drake
IPC分类号： G02F1/295 , G02B6/12
CPC分类号： G02F1/0316 , G02F1/0356
摘要： The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by electro-migration and other effects that can be present in non-hermetic packages. The bias electrodes include an upper split portion and an optically transparent lower portion. The optically transparent lower layer improves modulation frequency and reduces optical loss.
摘要翻译：本发明涉及一种电光调制器结构，其包含埋在该装置内的附加一组偏置电极，用于施加偏压以设定工作点。因此，用于调制输入光信号的RF电极可以以零直流偏压运行，通过电迁移减少电极腐蚀和可能存在于非密封封装中的其他效应。偏置电极包括上分割部分和光学透明下部分。光透明下层提高调制频率，减少光损耗。

3. 发明授权

US07512303B2 Wafer scale method of manufacturing optical waveguide devices and the waveguide devices made thereby 有权
标题翻译：制造光波导器件的晶片刻度方法和由此制成的波导器件
公开(公告)号：US07512303B2
公开(公告)日：2009-03-31
申请号：US11769070
申请日：2007-06-27
申请人： Benjamin F. Catching , Donald M. Friedrich , Charles A. Hulse , Marc K. Von Gunten , Jason Reed , Karl Kissa , Glen Drake , Julia Duncan , William J. Minford , Hiren V. Shah , Jerry Zieba , Jason Jiazhan Xu
发明人： Benjamin F. Catching , Donald M. Friedrich , Charles A. Hulse , Marc K. Von Gunten , Jason Reed , Karl Kissa , Glen Drake , Julia Duncan , William J. Minford , Hiren V. Shah , Jerry Zieba , Jason Jiazhan Xu
IPC分类号： G02B6/10
CPC分类号： G02F1/377 , G02B6/13 , G02B6/1342 , G02B2006/1204 , G02B2006/12097 , G02F2201/06 , G02F2201/07
摘要： The invention relates to a wafer scale process for the manufacture of optical waveguide devices, and particularly for the manufacture of ridge waveguide devices, and the improved waveguides made thereby. The present invention has found a process for achieving sub-micron control of an optical waveguiding layer thickness by providing a dimensionally stable wafer assembly into which adhesive can be introduced without altering the planar relationship between a carrier wafer and an optically transmissive wafer in wafer scale manufacture. This process permits wafer scale manufacture of optical waveguide devices including thin optically transmissive layers. A pattern of spacer pedestals is created by a deposition and etch back, or by a surface etch process to precisely reference surface information from a master surface to a carrier wafer to a thin optically transmissive wafer. The tolerance achievable in accordance with this process provides consistent yield across the wafer.
摘要翻译：本发明涉及一种用于制造光波导器件的晶片刻度工艺，特别涉及脊波导器件的制造以及由此制成的改进的波导。本发明已经发现了一种通过提供尺寸稳定的晶片组件来实现光学波导层厚度的亚微米控制的方法，其中可以引入粘合剂而不改变晶片规模制造中的载体晶片和光学透射晶片之间的平面关系。该方法允许晶圆级制造包括薄光学透射层的光波导器件。通过沉积和回蚀，或通过表面蚀刻工艺来产生间隔基座的图案，以将表面信息从主表面精确地参考到载体晶片到薄的光学透射晶片。根据该方法可实现的公差提供了跨晶片的一致产率。

4. 发明授权

US07844149B2 Humidity tolerant electro-optic device 有权
标题翻译：耐湿电光装置
公开(公告)号：US07844149B2
公开(公告)日：2010-11-30
申请号：US11971683
申请日：2008-01-09
申请人： Karl Kissa , William J. Minford , Glen Drake
发明人： Karl Kissa , William J. Minford , Glen Drake
IPC分类号： G02B6/42
CPC分类号： G02F1/0316 , G02F1/0356
摘要： The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by galvanic and other effects that can be present in non-hermetic packages. The bias electrodes are at least partially separated from the substrate with a buffer layer, which in one embodiment has a small amount of conductivity. This conductive buffer layer reduces optical loss from the bias electrodes and also reduces DC drift.
摘要翻译：本发明涉及一种电光调制器结构，其包含埋在该装置内的附加一组偏置电极，用于施加偏压以设定工作点。因此，用于调制输入光信号的RF电极可以以零直流偏压工作，减少电极腐蚀以及可能存在于非密封封装中的电流和其他影响。偏置电极与衬底至少部分地与缓冲层分开，在一个实施例中，缓冲层具有少量的导电性。该导电缓冲层减少了偏置电极的光学损耗并且还减少了DC漂移。

5. 发明申请

US20080170821A1 Humidity Tolerant Electro-Optic Device 有权
标题翻译：湿度电容器
公开(公告)号：US20080170821A1
公开(公告)日：2008-07-17
申请号：US11971683
申请日：2008-01-09
申请人： Karl Kissa , William J. Minford , Glen Drake
发明人： Karl Kissa , William J. Minford , Glen Drake
IPC分类号： G02B6/12 , B05D5/12
CPC分类号： G02F1/0316 , G02F1/0356
摘要： The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by galvanic and other effects that can be present in non-hermetic packages. The bias electrodes are at least partially separated from the substrate with a buffer layer, which in one embodiment has a small amount of conductivity. This conductive buffer layer reduces optical loss from the bias electrodes and also reduces DC drift.
摘要翻译：本发明涉及一种电光调制器结构，其包含埋在该装置内的附加一组偏置电极，用于施加偏压以设定工作点。因此，用于调制输入光信号的RF电极可以以零直流偏压工作，减少电极腐蚀以及可能存在于非密封封装中的电流和其他影响。偏置电极与衬底至少部分地与缓冲层分开，在一个实施例中，缓冲层具有少量的导电性。该导电缓冲层减少了偏置电极的光学损耗并且还减少了DC漂移。

6. 发明授权

US07408693B2 Electro-optic device 有权
标题翻译：电光装置
公开(公告)号：US07408693B2
公开(公告)日：2008-08-05
申请号：US11932356
申请日：2007-10-31
申请人： Karl Kissa , Gregory J. McBrien , Glen Drake , William J. Minford
发明人： Karl Kissa , Gregory J. McBrien , Glen Drake , William J. Minford
IPC分类号： G02F1/035 , G02F1/03
CPC分类号： G02F1/0123 , G02F1/0316 , G02F1/0356 , G02F1/2255 , G02F2203/20
摘要： The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by electro-migration, galvanic, and other effects that can be present in non-hermetic packages. The RF electrodes are supported by a first surface of the electro-optic substrate, while the bias electrodes are supported by a second opposite surface.
摘要翻译：本发明涉及一种电光调制器结构，其包含埋在该装置内的附加一组偏置电极，用于施加偏压以设定工作点。因此，用于调制输入光信号的RF电极可以用零直流偏压来操作，通过电迁移，电流以及可以存在于非密封封装中的其它效应来减少电极腐蚀。 RF电极由电光基板的第一表面支撑，而偏置电极由第二相对表面支撑。

7. 发明申请

US20080069491A1 Electro-Optic Device 有权
标题翻译：电光装置
公开(公告)号：US20080069491A1
公开(公告)日：2008-03-20
申请号：US11932356
申请日：2007-10-31
申请人： Karl Kissa , Gregory McBrien , Glen Drake , William Minford
发明人： Karl Kissa , Gregory McBrien , Glen Drake , William Minford
IPC分类号： G02F1/035
CPC分类号： G02F1/0123 , G02F1/0316 , G02F1/0356 , G02F1/2255 , G02F2203/20
摘要： The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by electro-migration, galvanic, and other effects that can be present in non-hermetic packages. The RF electrodes are supported by a first surface of the electro-optic substrate, while the bias electrodes are supported by a second opposite surface.
摘要翻译：本发明涉及一种电光调制器结构，其包含埋在该装置内的附加一组偏置电极，用于施加偏压以设定工作点。因此，用于调制输入光信号的RF电极可以用零直流偏压来操作，通过电迁移，电流以及可以存在于非密封封装中的其它效应来减少电极腐蚀。 RF电极由电光基板的第一表面支撑，而偏置电极由第二相对表面支撑。

8. 发明申请

US20070116475A1 Low Bias Drift Modulator With Buffer Layer 有权
标题翻译：具有缓冲层的低偏移调制器
公开(公告)号：US20070116475A1
公开(公告)日：2007-05-24
申请号：US11625535
申请日：2007-01-22
申请人： Gregory McBrien , Karl Kissa , Glen Drake , Kate Versprille
发明人： Gregory McBrien , Karl Kissa , Glen Drake , Kate Versprille
IPC分类号： H04B10/00
CPC分类号： G02F1/0356 , G02F1/2255 , G02F2201/07 , G02F2203/21
摘要： The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by galvanic and other effects that can be present in non-hermetic packages. The buried bias electrodes are also advantageous in controlling charge build-up with consequent improvement in drift characteristics. The bias electrode material is useful for routing bias signals inside the device, in particular to external terminals, as well as forming encapsulating layers to permit operation in non-hermetic environments, thereby lowering manufacturing costs. Embodiments using both X-cut and Z-cut lithium niobate (LiNbO3) are presented. For the latter, the bias electrodes can be split along their axis to avoid optical losses
摘要翻译：本发明涉及一种电光调制器结构，其包含埋在该装置内的附加一组偏置电极，用于施加偏压以设定工作点。因此，用于调制输入光信号的RF电极可以以零直流偏压工作，减少电极腐蚀以及可能存在于非密封封装中的电流和其他影响。掩埋偏置电极在控制电荷积聚方面也是有利的，随之而来的是漂移特性的改善。偏置电极材料可用于布置装置内的偏置信号，特别是外部端子，以及形成封装层，以允许在非密封环境中操作，从而降低制造成本。提出了使用X切割和Z切割的铌酸锂（LiNbO 3 3）的实施例。对于后者，偏置电极可以沿其轴线分开以避免光损耗

9. 发明授权

US07343055B2 Low bias drift modulator with buffer layer 有权
标题翻译：具有缓冲层的低偏置漂移调制器
公开(公告)号：US07343055B2
公开(公告)日：2008-03-11
申请号：US11625535
申请日：2007-01-22
申请人： Gregory J. McBrien , Karl Kissa , Glen Drake , Kate Versprille
发明人： Gregory J. McBrien , Karl Kissa , Glen Drake , Kate Versprille
IPC分类号： G02F1/035 , G02F1/03
CPC分类号： G02F1/0356 , G02F1/2255 , G02F2201/07 , G02F2203/21
摘要： The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by galvanic and other effects that can be present in non-hermetic packages. The buried bias electrodes are also advantageous in controlling charge build-up with consequent improvement in drift characteristics. The bias electrode material is useful for routing bias signals inside the device, in particular to external terminals, as well as forming encapsulating layers to permit operation in non-hermetic environments, thereby lowering manufacturing costs. Embodiments using both X-cut and Z-cut lithium niobate (LiNbO3) are presented. For the latter, the bias electrodes can be split along their axis to avoid optical losses.
摘要翻译：本发明涉及一种电光调制器结构，其包含埋在该装置内的附加一组偏置电极，用于施加偏压以设定工作点。因此，用于调制输入光信号的RF电极可以以零直流偏压工作，减少电极腐蚀以及可能存在于非密封封装中的电流和其他影响。掩埋偏置电极在控制电荷积聚方面也是有利的，随之而来的是漂移特性的改善。偏置电极材料可用于布置装置内的偏置信号，特别是外部端子，以及形成封装层，以允许在非密封环境中操作，从而降低制造成本。提出了使用X切割和Z切割的铌酸锂（LiNbO 3 3）的实施例。对于后者，偏置电极可以沿其轴线分开以避免光损耗。

10. 发明申请

US20080085089A1 Wafer Scale Method Of Manufacturing Optical Waveguide Devices And The Waveguide Devices Made Thereby 有权
标题翻译：制造光波导器件的晶片刻度方法和由此制造的波导器件
公开(公告)号：US20080085089A1
公开(公告)日：2008-04-10
申请号：US11769070
申请日：2007-06-27
申请人： Benjamin Catching , Donald Friedrich , Charles Hulse , Marc Von Gunten , Jason Reed , Karl Kissa , Glen Drake , Julia Duncan , William Minford , Hiren Shah , Jerry Zieba , Jason Xu
发明人： Benjamin Catching , Donald Friedrich , Charles Hulse , Marc Von Gunten , Jason Reed , Karl Kissa , Glen Drake , Julia Duncan , William Minford , Hiren Shah , Jerry Zieba , Jason Xu
IPC分类号： G02B6/10 , B29D11/00
CPC分类号： G02F1/377 , G02B6/13 , G02B6/1342 , G02B2006/1204 , G02B2006/12097 , G02F2201/06 , G02F2201/07
摘要： The invention relates to a wafer scale process for the manufacture of optical waveguide devices, and particularly for the manufacture of ridge waveguide devices, and the improved waveguides made thereby. The present invention has found a process for achieving sub-micron control of an optical waveguiding layer thickness by providing a dimensionally stable wafer assembly into which adhesive can be introduced without altering the planar relationship between a carrier wafer and an optically transmissive wafer in wafer scale manufacture. This process permits wafer scale manufacture of optical waveguide devices including thin optically transmissive layers. A pattern of spacer pedestals is created by a deposition and etch back, or by a surface etch process to precisely reference surface information from a master surface to a carrier wafer to a thin optically transmissive wafer. The tolerance achievable in accordance with this process provides consistent yield across the wafer.
摘要翻译：本发明涉及一种用于制造光波导器件的晶片刻度工艺，特别涉及脊波导器件的制造以及由此制成的改进的波导。本发明已经发现了一种通过提供尺寸稳定的晶片组件来实现光学波导层厚度的亚微米控制的方法，其中可以引入粘合剂而不改变晶片规模制造中的载体晶片和光学透射晶片之间的平面关系。该方法允许晶圆级制造包括薄光学透射层的光波导器件。通过沉积和回蚀，或通过表面蚀刻工艺来产生间隔基座的图案，以将表面信息从主表面精确地参考到载体晶片到薄的光学透射晶片。根据该方法可实现的公差提供了跨晶片的一致产率。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式