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1. 发明授权

US06785547B1 Method and apparatus for implementing network planning 失效
标题翻译：实施网络规划的方法和装置
公开(公告)号：US06785547B1
公开(公告)日：2004-08-31
申请号：US09604793
申请日：2000-06-28
申请人： Kari Heiska , Olli Pekonen , Hannu Kauppinen
发明人： Kari Heiska , Olli Pekonen , Hannu Kauppinen
IPC分类号： H04B1702
CPC分类号： H04W16/18
摘要： A method and apparatus implement network planning in a radio system in a desired area. To determine transmitter coverage, a vector map describing the surroundings of the transmitter and containing a description of buildings and surfaces reflecting radio waves in the area is used. The transmitter signal strength is measured at points of a desired area. A subset is selected among the points, path attenuation is determined between all subset points using a ray tracing method, and the calculated values are stored in a memory. When performing network planning, a transmitter and a receiver are located at the points in the areas; a given number of the most significant signal paths among the possible signal propagation paths between the transmitter and the receiver is searched for using the values stored in the memory, and the transmitter signal strength is determined at the receipt location point using the ray tracing method.
摘要翻译：一种方法和装置在期望的区域中的无线电系统中实现网络规划。为了确定发射机覆盖范围，使用描述发射机周围的矢量图，并且包含反映该区域中的无线电波的建筑物和表面的描述。在所需区域的点处测量发射机信号强度。在这些点中选择一个子集，使用光线跟踪方法在所有子集点之间确定路径衰减，并将计算的值存储在存储器中。执行网络规划时，发射机和接收机位于该区域的各点; 使用存储在存储器中的值来搜索发射机和接收机之间的可能的信号传播路径中给定数量的最重要的信号路径，并且使用光线跟踪方法在接收位置点确定发射机信号强度。

2. 发明申请

US20130071551A1 COATING METHOD AND APPARATUS 审中-公开
标题翻译：涂料方法和装置
公开(公告)号：US20130071551A1
公开(公告)日：2013-03-21
申请号：US13639054
申请日：2011-03-02
申请人： Markku Rajala , Olli Pekonen
发明人： Markku Rajala , Olli Pekonen
IPC分类号： C23C16/448
CPC分类号： C23C16/4486 , C03C17/002 , C03C17/245 , C03C17/25 , C23C16/52 , C23C18/1216 , C23C18/1245 , C23C18/1258 , C23C18/1291
摘要： A coating process and apparatus; the apparatus including a unit for forming a mixture that includes at least one precursor of a surface reaction, a unit for atomizing the mixture into droplets, a unit for transporting the droplets of mixture towards a surface of a substrate to be coated with the surface reaction. The unit for forming a mixture are adjusted to mix to the mixture a liquid carrier substance, which is not a precursor of the surface reaction, and the boiling point of which in the defined process space is lower than the boiling point of the precursor of the surface reaction. The proposed arrangement improves both speed and quality of the coating process.
摘要翻译：涂装工艺及装置; 所述设备包括用于形成包括表面反应的至少一种前体的混合物的单元，用于将混合物雾化成液滴的单元，用于将混合物液滴输送到待涂覆表面反应的基底的表面的单元。调节混合物的形成单位，使其与液体载体物质混合，而液体载体物质不是表面反应的前体，其定义的工艺空间的沸点低于其前体的沸点表面反应。所提出的布置改善了涂布过程的速度和质量。

3. 发明申请

US20130149446A1 NOZZLE HEAD AND APPARATUS 有权
标题翻译：喷嘴头和装置
公开(公告)号：US20130149446A1
公开(公告)日：2013-06-13
申请号：US13817977
申请日：2011-08-29
申请人： Pekka Soininen , Olli Pekonen
发明人： Pekka Soininen , Olli Pekonen
IPC分类号： C23C16/455
CPC分类号： C23C16/45563 , C23C16/45551 , C23C16/545
摘要： Described herein is an apparatus and nozzle head for coating a surface of a substrate. The apparatus comprising a process chamber having inside a gas atmosphere, a nozzle head arranged inside the process chamber, precursor supply and discharge means. The nozzle head including one or more first precursor nozzles for subjecting the surface of the substrate to the first precursor, one or more second precursor nozzles for subjecting the surface of the substrate to the second precursor and one or more purge gas channels between the first and second precursor zones. In certain aspects, the purge gas channel is at least partly open to the gas atmosphere comprising purge gas for subjecting the surface of the substrate to purge gas.
摘要翻译：这里描述了一种用于涂覆基底表面的装置和喷嘴头。该装置包括在气体气氛内部的处理室，布置在处理室内的喷嘴头，前体供给和排出装置。所述喷嘴头包括一个或多个第一前体喷嘴，所述第一前体喷嘴用于使所述基板的表面经受所述第一前体;一个或多个第二前体喷嘴，用于使所述基板的表面经受所述第二前体;以及一个或多个吹扫气体通道，第二前体区。在某些方面，吹扫气体通道至少部分地对包含吹扫气体的气体气体开放，以使基板表面吹扫气体。

4. 发明授权

US09803281B2 Nozzle head and apparatus 有权
公开(公告)号：US09803281B2
公开(公告)日：2017-10-31
申请号：US13817977
申请日：2011-08-29
申请人： Pekka Soininen , Olli Pekonen
发明人： Pekka Soininen , Olli Pekonen
IPC分类号： C23C16/455 , C23C16/54
CPC分类号： C23C16/45563 , C23C16/45551 , C23C16/545
摘要： Described herein is an apparatus and nozzle head for coating a surface of a substrate. The apparatus comprising a process chamber having inside a gas atmosphere, a nozzle head arranged inside the process chamber, precursor supply and discharge means. The nozzle head including one or more first precursor nozzles for subjecting the surface of the substrate to the first precursor, one or more second precursor nozzles for subjecting the surface of the substrate to the second precursor and one or more purge gas channels between the first and second precursor zones. In certain aspects, the purge gas channel is at least partly open to the gas atmosphere comprising purge gas for subjecting the surface of the substrate to purge gas.

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