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1. 发明申请

US20050206888A1 Method and apparatus for inspecting a pattern formed on a substrate 失效
标题翻译：用于检查在基板上形成的图案的方法和装置
公开(公告)号：US20050206888A1
公开(公告)日：2005-09-22
申请号：US11131379
申请日：2005-05-18
申请人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
IPC分类号： G01N21/956 , G03F7/20 , G03F9/00
CPC分类号： G03F7/7065 , G01N21/95684
摘要： A pattern inspection apparatus includes a light source which emits ultraviolet light, an irradiator which reduces coherency of the ultraviolet light and irradiates the coherency reduced ultraviolet light onto a specimen on which a pattern is formed through an objective lens, and a focus control means which projects light on the specimen from outside the objective lens, detects light reflected from the specimen by the projection and adjusts a height of the specimen relative to the objective lens. The apparatus further includes an image which forms an image of the specimen irradiated with the ultraviolet light and detects the formed image with a sensor, an image processor which processes a signal outputted from the sensor to detect a defect of the specimen, and a display which displays information of the defect detected by the image processor.
摘要翻译：图案检查装置包括发出紫外线的光源，减少紫外线的相干性并将相干性降低的紫外光照射到通过物镜形成图案的样本的照射器，以及投影从物镜外部对样品进行光照射，通过投影检测从样品反射的光，并调整样本相对于物镜的高度。该装置还包括形成用紫外线照射的样本的图像并用传感器检测形成的图像的图像，处理从传感器输出的信号以检测样本的缺陷的图像处理器，以及显示器显示由图像处理器检测到的缺陷的信息。

2. 发明申请

US20100104173A1 Method And Apparatus For Inspecting A Pattern Formed On A Substrate 有权
标题翻译：检查基板上形成的图案的方法和装置
公开(公告)号：US20100104173A1
公开(公告)日：2010-04-29
申请号：US12649898
申请日：2009-12-30
申请人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
IPC分类号： G06K9/62
CPC分类号： G03F7/7065 , G01N21/95684
摘要： A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.
摘要翻译：将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像，形成使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。处理从图像传感器输出的信号，以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷，并且显示器显示检测到的缺陷的信息。

3. 发明授权

US07330248B2 Method and apparatus for inspecting defects 失效
标题翻译：检查缺陷的方法和装置
公开(公告)号：US07330248B2
公开(公告)日：2008-02-12
申请号：US11089881
申请日：2005-03-25
申请人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe , Masahiro Watanabe
发明人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe , Masahiro Watanabe
IPC分类号： G01N21/88
CPC分类号： G01N23/227 , G01N21/94 , G01N21/9501
摘要： In a defect inspecting apparatus, having contrast, brightness and appearance of a target for inspection and detection sensitivity of a defect changed depending on optical system conditions, and adapted to perform inspection by selecting an optimal test condition, even an unskilled user can easily select an optimal optical condition by quantitatively displaying evaluation values side by side when optical system conditions are changed. Moreover, by selecting an evaluation item having highest satisfaction based on a result of a series of test inspection, an optimal test condition can be automatically selected.
摘要翻译：在缺陷检查装置中，根据光学系统条件具有对象的检查目标的检查和检测灵敏度的对比度，亮度和外观变化，并且适于通过选择最佳测试条件进行检查，即使是非熟练的用户也可以容易地选择当光学系统条件改变时，通过定量地显示评估值来获得最佳光学条件。此外，通过基于一系列检查结果的结果选择具有最高满意度的评价项目，可以自动选择最佳检测条件。

4. 发明授权

US07646477B2 Method and apparatus for inspecting a pattern formed on a substrate 失效
标题翻译：用于检查在基板上形成的图案的方法和装置
公开(公告)号：US07646477B2
公开(公告)日：2010-01-12
申请号：US11131379
申请日：2005-05-18
申请人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G03F7/7065 , G01N21/95684
摘要： A pattern inspection apparatus includes a light source which emits ultraviolet light, an irradiator which reduces coherency of the ultraviolet light and irradiates the coherency reduced ultraviolet light onto a specimen on which a pattern is formed through an objective lens, and a focus control means which projects light on the specimen from outside the objective lens, detects light reflected from the specimen by the projection and adjusts a height of the specimen relative to the objective lens. The apparatus further includes an image which forms an image of the specimen irradiated with the ultraviolet light and detects the formed image with a sensor, an image processor which processes a signal outputted from the sensor to detect a defect of the specimen, and a display which displays information of the defect detected by the image processor.
摘要翻译：图案检查装置包括发出紫外线的光源，减少紫外线的相干性并将相干性降低的紫外光照射到通过物镜形成图案的样本的照射器，以及投影从物镜外部对样品进行光照射，通过投影检测从样品反射的光，并调整样本相对于物镜的高度。该装置还包括形成用紫外线照射的样本的图像并用传感器检测形成的图像的图像，处理从传感器输出的信号以检测样本的缺陷的图像处理器，以及显示器显示由图像处理器检测到的缺陷的信息。

5. 发明申请

US20050168730A1 Method and apparatus for inspecting defects 失效
公开(公告)号：US20050168730A1
公开(公告)日：2005-08-04
申请号：US11089881
申请日：2005-03-25
申请人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe , Masahiro Watanabe
发明人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe , Masahiro Watanabe
IPC分类号： G01B11/30 , G01B21/30 , G01N21/94 , G01N21/95 , G01N21/956 , G01N23/04 , G01N23/06 , G01N23/225 , G01N23/227 , G06T1/00 , H01L21/66 , G01N21/00
CPC分类号： G01N23/227 , G01N21/94 , G01N21/9501
摘要： In a defect inspecting apparatus, having contrast, brightness and appearance of a target for inspection and detection sensitivity of a defect changed depending on optical system conditions, and adapted to perform inspection by selecting an optimal test condition, even an unskilled user can easily select an optimal optical condition by quantitatively displaying evaluation values side by side when optical system conditions are changed. Moreover, by selecting an evaluation item having highest satisfaction based on a result of a series of test inspection, an optimal test condition can be automatically selected.

6. 发明授权

US06900888B2 Method and apparatus for inspecting a pattern formed on a substrate 失效
标题翻译：用于检查在基板上形成的图案的方法和装置
公开(公告)号：US06900888B2
公开(公告)日：2005-05-31
申请号：US10650756
申请日：2003-08-29
申请人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
IPC分类号： G01N21/956 , G03F7/20 , G03F9/00 , G01N21/88
CPC分类号： G03F7/7065 , G01N21/95684
摘要： The inventive method and apparatus for detecting defects of a microscopic circuit pattern by imaging the pattern at high resolution comprises an objective lens for imaging the subject pattern, a laser illumination means for illuminating the pupil of the objective lens, means of diminishing the coherency of the laser illumination, an accumulative detector, and means of processing the signal detected by the detector. The method and apparatus are capable of imaging the subject pattern at high sensitivity and high speed based on the illumination by a short wavelength, which is indispensable for the enhancement of resolution, particularly based on a laser light source which is advantageous for practicing, with a resulting image being the same or better in quality as compared with an image resulting from the ordinary discharge tube illumination, whereby it is possible to detect microscopic defects at high sensitivity.
摘要翻译：用于通过以高分辨率对图案进行成像来检测微观电路图案的缺陷的本发明的方法和装置包括用于对被摄体图案进行成像的物镜，用于照射物镜的瞳孔的激光照明装置，降低该物镜的相干性的手段激光照明，累积检测器，以及处理由检测器检测到的信号的装置。该方法和装置能够以高灵敏度和高速度基于短波长的照明来对被摄体图案进行成像，这对于提高分辨率是不可或缺的，特别是基于有利于实践的激光光源与普通放电管照明产生的图像相比，所得到的图像的质量相同或更好，从而可以以高灵敏度检测微观缺陷。

7. 发明授权

US06879392B2 Method and apparatus for inspecting defects 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US06879392B2
公开(公告)日：2005-04-12
申请号：US10115880
申请日：2002-04-02
申请人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe , Masahiro Watanabe
发明人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe , Masahiro Watanabe
IPC分类号： G01B11/30 , G01B21/30 , G01N21/94 , G01N21/95 , G01N21/956 , G01N23/04 , G01N23/06 , G01N23/225 , G01N23/227 , G06T1/00 , H01L21/66 , G01N21/88
CPC分类号： G01N23/227 , G01N21/94 , G01N21/9501
摘要： In a defect inspecting apparatus, having contrast, brightness and appearance of a target for inspection and detection sensitivity of a defect changed depending on optical system conditions, and adapted to perform inspection by selecting an optimal test condition, even an unskilled user can easily select an optimal optical condition by quantitatively displaying evaluation values side by side when optical system conditions are changed. Moreover, by selecting an evaluation item having highest satisfaction based on a result of a series of test inspection, an optimal test condition can be automatically selected.
摘要翻译：在缺陷检查装置中，根据光学系统条件具有对象的检查目标的检查和检测灵敏度的对比度，亮度和外观变化，并且适于通过选择最佳测试条件进行检查，即使是非熟练的用户也可以容易地选择当光学系统条件改变时，通过定量地显示评估值来获得最佳光学条件。此外，通过基于一系列检查结果的结果选择具有最高满意度的评价项目，可以自动选择最佳检测条件。

8. 发明授权

US08253934B2 Method and apparatus for inspecting a pattern formed on a substrate 有权
标题翻译：用于检查在基板上形成的图案的方法和装置
公开(公告)号：US08253934B2
公开(公告)日：2012-08-28
申请号：US12649898
申请日：2009-12-30
申请人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G03F7/7065 , G01N21/95684
摘要： A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.
摘要翻译：将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像，形成使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。处理从图像传感器输出的信号，以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷，并且显示器显示检测到的缺陷的信息。

9. 发明授权

US08275190B2 Method and apparatus for inspecting pattern defects 有权
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US08275190B2
公开(公告)日：2012-09-25
申请号：US13214420
申请日：2011-08-22
申请人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe
发明人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T2207/30148
摘要： An apparatus for inspecting pattern defects, the apparatus including: an image acquisition unit which acquires an image of a specimen and stores the acquired image in an image memory; a defect candidate extraction unit which performs a defect candidate extraction process by using the acquired image, which is read from the image memory; and a defect detection unit which performs a defect detection process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit, wherein the defect detection process performed by the defect detection unit is performed asynchronously with an image acquisition process that is performed by the image acquisition unit.
摘要翻译：一种用于检查图案缺陷的装置，所述装置包括：图像获取单元，其获取样本的图像并将所获取的图像存储在图像存储器中; 缺陷候选提取单元，其通过使用从图像存储器读取的所获取的图像来执行缺陷候选提取处理; 以及缺陷检测单元，其执行基于包含由缺陷候选提取单元提取的缺陷候选的部分图像的缺陷检测处理，其中由缺陷检测单元执行的缺陷检测处理与图像获取处理异步地执行，由图像获取单元执行。

10. 发明授权

US08005292B2 Method and apparatus for inspecting pattern defects 有权
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US08005292B2
公开(公告)日：2011-08-23
申请号：US12876699
申请日：2010-09-07
申请人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe
发明人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T2207/30148
摘要： An apparatus for inspecting pattern defects, the apparatus including: an image acquisition unit which acquires an image of a specimen and stores the acquired image in an image memory; a defect candidate extraction unit which performs a defect candidate extraction process by using the acquired image, which is read from the image memory; and a defect detection unit which performs a defect detection process and a defect classification process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit, wherein the processes performed by the defect detection unit is performed off-line asynchronously with an image acquisition process that is performed by the image acquisition unit.
摘要翻译：一种用于检查图案缺陷的装置，所述装置包括：图像获取单元，其获取样本的图像并将所获取的图像存储在图像存储器中; 缺陷候选提取单元，其通过使用从图像存储器读取的所获取的图像来执行缺陷候选提取处理; 以及缺陷检测单元，其执行基于包含由缺陷候选提取单元提取的缺陷候选的部分图像的缺陷检测处理和缺陷分类处理，其中由缺陷检测单元执行的处理异步执行具有由图像获取单元执行的图像获取处理。

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