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    • 7. 发明申请
    • METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM
    • 制造磁记录介质的方法
    • US20110014496A1
    • 2011-01-20
    • US12838349
    • 2010-07-16
    • Kaori KIMURAYousuke ISOWAKIYoshiyuki KAMATAMasatoshi SAKURAI
    • Kaori KIMURAYousuke ISOWAKIYoshiyuki KAMATAMasatoshi SAKURAI
    • G11B5/64C23F1/00
    • G11B5/855C23F4/00G03F7/427
    • According to one embodiment, there is provided a method of manufacturing a magnetic recording medium, including forming a first hard mask including carbon as a main component, a second hard mask including a main component other than carbon and a resist on a magnetic recording layer, contacting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues in the recesses of the patterned resist, etching the second hard mask, etching the first hard mask, patterning the magnetic recording layer, and removing the first hard mask, the method further including, between etching the first hard mask and removing the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and removing a contaminating layer on a surface of the first hard mask by a mixed gas of oxygen-based gas and a fluorine compound.
    • 根据一个实施例,提供了一种制造磁记录介质的方法,包括形成包括碳作为主要成分的第一硬掩模,包括除碳以外的主要成分的第二硬掩模和在磁记录层上的抗蚀剂, 将压模接触抗蚀剂以将突起和凹陷的图案转移到抗蚀剂,去除图案化抗蚀剂的凹部中的残留物,蚀刻第二硬掩模,蚀刻第一硬掩模,图案化磁记录层,以及去除第一硬 掩模,所述方法还包括在蚀刻所述第一硬掩模和去除所述第一硬掩模之间,去除残留在所述第一硬掩模的突起上的所述第二硬掩模,以及通过所述第一硬掩模的表面去除所述第一硬掩模的表面上的污染层 氧基气体和氟化合物的混合气体。
    • 9. 发明申请
    • METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM
    • 制造磁记录介质的方法
    • US20100215989A1
    • 2010-08-26
    • US12705456
    • 2010-02-12
    • Yousuke ISOWAKIKaori KIMURAYoshiyuki KAMATAMasatoshi SAKURAI
    • Yousuke ISOWAKIKaori KIMURAYoshiyuki KAMATAMasatoshi SAKURAI
    • G11B5/33B44C1/22
    • G11B5/865B82Y10/00G11B5/743G11B5/746G11B5/855
    • According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, subjecting the magnetic recording layer exposed in the recesses to modifying treatment to change an etching rate, and deactivating the magnetic recording layer exposed in the recesses.
    • 根据一个实施例,一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模,第二硬掩模和抗蚀剂,将压模压印到抗蚀剂上,以将凹凸图案转印到抗蚀剂上, 去除残留在图案化抗蚀剂的凹部中的残留物,通过使用图案化抗蚀剂作为掩模蚀刻第二硬掩模以将突起和凹陷的图案转移到第二硬掩模,通过使用第二硬掩模蚀刻第一硬掩模 用于将突起和凹陷的图案转移到第一硬掩模的掩模,对暴露于凹部中的磁记录层进行修改处理以改变蚀刻速率,以及使在凹部中暴露的磁记录层失活。