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    • 4. 发明授权
    • Aryl sulfonylurea carbamates and thiolcarbamates and salts thereof:
herbicidal antidotes
    • 芳基磺酰脲氨基甲酸酯和硫代氨基甲酸酯及其盐:除草剂
    • US4931580A
    • 1990-06-05
    • US564981
    • 1983-12-23
    • Ferenc M. PallosKang-Chi LinLaddie L. Green
    • Ferenc M. PallosKang-Chi LinLaddie L. Green
    • A01N25/32C07D213/71
    • C07D213/71A01N25/32C07C311/62
    • Aryl sulfonylureas as new compositions and included in a two-part herbicide system comprising at least one or more thiolcarbamate, thiolcarbamate sulfoxide or haloacetanilide herbicide, and as the second part a non-phytotoxic antidotally effective amount of aryl sulfonylurea as an antidote therefor of the formula ##STR1## in which X is oxygen or sulfur; n is an integer; R is lower alkyl, lower alkoxy, lower alkylthio, halogen, trifluoromethyl, cyano, nitro, lower alkyl sulfonyl;R.sup.4 is hydrogen, lower alkyl, lower alkoxyalkyl, phenyl and chlorophenyl;R.sup.2 is hydrogen, lower alkyl, alkoxyalkyl and phenyl;R.sup.1 is lower alkyl, alkenyl, alkynyl, haloalkyl, alkoxyalkyl, 1-phenylpropenyl, benzyl, chlorobenzyl, haloalkenyl, phenyl and alkyl substituted phenyl; andAR is phenyl, benzyl, naphthyl, pyridyl or styryl; and the inorganic base salts sodium, potassium, ammonium and other inorganic salts; and organic base salts thereof.
    • 作为新组合物并包含在包含至少一种或多种硫代氨基甲酸酯,硫代氨基甲酸酯亚砜或卤代乙酰替苯胺除草剂的两部分除草剂系统中的作为新组合物的芳基磺酰脲类,并且作为第二部分是非植物毒性的解毒有效量的芳基磺酰脲作为式 其中X为氧或硫; n是整数; R为低级烷基,低级烷氧基,低级烷硫基,卤素,三氟甲基,氰基,硝基,低级烷基磺酰基; R4是氢,低级烷基,低级烷氧基烷基,苯基和氯苯基; R2是氢,低级烷基,烷氧基烷基和苯基; R1是低级烷基,烯基,炔基,卤代烷基,烷氧基烷基,1-苯基丙烯基,苄基,氯苄基,卤代烯基,苯基和烷基取代的苯基; AR为苯基,苄基,萘基,吡啶基或苯乙烯基; 和无机碱盐,钠,钾,铵等无机盐; 及其有机碱盐。