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1. 发明授权

US08125618B2 Reflective film interface to restore transverse magnetic wave contrast in lithographic processing 有权
标题翻译：反光膜界面，以恢复光刻处理中的横向磁波对比度
公开(公告)号：US08125618B2
公开(公告)日：2012-02-28
申请号：US12208358
申请日：2008-09-11
申请人： Kafai Lai , Dirk Pfeiffer , Alan E. Rosenbluth
发明人： Kafai Lai , Dirk Pfeiffer , Alan E. Rosenbluth
IPC分类号： G03F7/20
CPC分类号： G03F7/70216
摘要： A system for exposing a resist layer to an image that includes a layer reflective to imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer. An imaging tool projects radiation containing an aerial image onto the resist layer, with a portion of the radiation containing the aerial image passing through the resist and reflecting back to the resist to form an interference pattern of the projected aerial image through the resist layer thickness. The thickness and location of the resist layer region of photosensitivity are selected to include from within the interference pattern higher contrast portions of the interference pattern in the direction of the resist thickness, and to exclude lower contrast portions of the interference pattern in the resist thickness direction from said resist layer region of photosensitivity, to improve contrast of the aerial image in said resist layer region of photosensitivity.
摘要翻译：一种用于将抗蚀剂层暴露于包括反射成像工具辐射的层的图像和在反射层上具有光敏区域的抗蚀剂层的系统。成像工具将包含空间图像的辐射投射到抗蚀剂层上，其中包含空间图像的辐射的一部分穿过抗蚀剂并反射回抗蚀剂，以形成通过抗蚀剂层厚度的投影空间图像的干涉图案。光敏层的抗蚀剂层区域的厚度和位置被选择为在干涉图形之中包括在抗蚀剂厚度方向上的干涉图案的较高对比度部分，并且排除抗蚀剂厚度方向上的干涉图案的较低对比度部分从所述抗蚀剂层区域的光敏性，改善所述抗蚀剂层区域中的空间像的光敏性的对比度。

2. 发明授权

US07736841B2 Reflective film interface to restore transverse magnetic wave contrast in lithographic processing 有权
标题翻译：反光膜界面，以恢复光刻处理中的横向磁波对比度
公开(公告)号：US07736841B2
公开(公告)日：2010-06-15
申请号：US12233245
申请日：2008-09-18
申请人： Kafai Lai , Dirk Pfeiffer , Alan E. Rosenbluth
发明人： Kafai Lai , Dirk Pfeiffer , Alan E. Rosenbluth
IPC分类号： G03F7/26
CPC分类号： G03F7/70216
摘要： A method and system for exposing a resist layer with regions of photosensitivity to an image in a lithographic process using a high numerical aperture imaging tool. There is employed a substrate having thereover a layer reflective to the imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer, with the resist layer having a thickness. The imaging tool is adapted to project radiation containing an aerial image onto the resist layer, with a portion of the radiation containing the aerial image passing through the resist layer and reflecting back to the resist layer. The reflected radiation forms an interference pattern in the resist layer of the projected aerial image through the resist layer thickness. The thickness and location of the resist layer region of photosensitivity with respect to the reflective layer are selected to include from within the interference pattern higher contrast portions of the interference pattern in the direction of the resist thickness, and to exclude lower contrast portions of the interference pattern in the resist thickness direction from said resist layer region of photosensitivity, to improve contrast of the aerial image in said resist layer region of photosensitivity.
摘要翻译：一种用于使用高数值孔径成像工具在光刻工艺中将抗蚀剂层暴露于对图像的光敏感区域的方法和系统。采用具有反射成像工具辐射的层的基板和在反射层上具有光敏区域的抗蚀剂层，抗蚀剂层具有厚度。成像工具适于将含有空间图像的辐射投射到抗蚀剂层上，其中包含空间图像的辐射的一部分穿过抗蚀剂层并反射回抗蚀剂层。反射辐射通过抗蚀剂层厚度在投影空间图像的抗蚀剂层中形成干涉图案。选择相对于反射层的光敏层的抗蚀剂层区域的厚度和位置，以便在干涉图形内包括在抗蚀剂厚度方向上的干涉图案的较高对比度部分，并且排除干涉图形的较低对比度部分从抗蚀剂层区域的光敏剂厚度方向的图案，以提高光敏层的所述抗蚀剂层区域中的空间图像的对比度。

3. 发明授权

US07470504B2 Reflective film interface to restore transverse magnetic wave contrast in lithographic processing 失效
标题翻译：反光膜界面，以恢复光刻处理中的横向磁波对比度
公开(公告)号：US07470504B2
公开(公告)日：2008-12-30
申请号：US11265822
申请日：2005-11-03
申请人： Kafai Lai , Dirk Pfeiffer , Alan E. Rosenbluth
发明人： Kafai Lai , Dirk Pfeiffer , Alan E. Rosenbluth
IPC分类号： G03F7/26
CPC分类号： G03F7/70216
摘要： A method for exposing a resist layer with regions of photosensitivity to an image in a lithographic process using a high numerical aperture imaging tool. There is employed a substrate having thereover a layer reflective to the imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer, with the resist layer having a thickness. The imaging tool is adapted to project radiation containing an aerial image onto the resist layer, with a portion of the radiation containing the aerial image passing through the resist layer and reflecting back to the resist layer. The reflected radiation forms an interference pattern in the resist layer of the projected aerial image through the resist layer thickness. The thickness and location of the resist layer region of photosensitivity with respect to the reflective layer are selected to include from within the interference pattern higher contrast portions of the interference pattern in the direction of the resist thickness, and to exclude lower contrast portions of the interference pattern in the resist thickness direction from said resist layer region of photosensitivity, to improve contrast of the aerial image in said resist layer region of photosensitivity.
摘要翻译：一种使用高数值孔径成像工具在光刻工艺中将抗蚀剂层暴露于图像的光敏区域的方法。采用具有反射成像工具辐射的层的基板和在反射层上具有光敏区域的抗蚀剂层，抗蚀剂层具有厚度。成像工具适于将含有空间图像的辐射投射到抗蚀剂层上，其中包含空间图像的辐射的一部分穿过抗蚀剂层并反射回抗蚀剂层。反射辐射通过抗蚀剂层厚度在投影空间图像的抗蚀剂层中形成干涉图案。选择相对于反射层的光敏层的抗蚀剂层区域的厚度和位置，以便在干涉图形内包括在抗蚀剂厚度方向上的干涉图案的较高对比度部分，并且排除干涉图形的较低对比度部分从抗蚀剂层区域的光敏剂厚度方向的图案，以提高光敏层的所述抗蚀剂层区域中的空间图像的对比度。

4. 发明申请

US20120092633A1 REFLECTIVE FILM INTERFACE TO RESTORE TRANSVERSE MAGNETIC WAVE CONTRAST IN LITHOGRAPHIC PROCESSING 有权
标题翻译：反射膜界面恢复光刻处理中的横向磁波对比
公开(公告)号：US20120092633A1
公开(公告)日：2012-04-19
申请号：US13324092
申请日：2011-12-13
申请人： Kafai Lai , Dirk Pfeiffer , Alan E. Rosenbluth
发明人： Kafai Lai , Dirk Pfeiffer , Alan E. Rosenbluth
IPC分类号： G03B27/42
CPC分类号： G03F7/70216
摘要： A system for exposing a resist layer to an image that includes a layer reflective to imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer. An imaging tool projects radiation containing an aerial image onto the resist layer, with a portion of the radiation containing the aerial image passing through the resist and reflecting back to the resist to form an interference pattern of the projected aerial image through the resist layer thickness. The thickness and location of the resist layer region of photosensitivity are selected to include from within the interference pattern higher contrast portions of the interference pattern in the direction of the resist thickness, and to exclude lower contrast portions of the interference pattern in the resist thickness direction from said resist layer region of photosensitivity, to improve contrast of the aerial image in said resist layer region of photosensitivity.
摘要翻译：一种用于将抗蚀剂层暴露于包括反射成像工具辐射的层的图像和在反射层上具有光敏区域的抗蚀剂层的系统。成像工具将包含空间图像的辐射投射到抗蚀剂层上，其中包含空间图像的辐射的一部分穿过抗蚀剂并反射回抗蚀剂，以形成通过抗蚀剂层厚度的投影空间图像的干涉图案。光敏层的抗蚀剂层区域的厚度和位置被选择为在干涉图形之中包括在抗蚀剂厚度方向上的干涉图案的较高对比度部分，并且排除抗蚀剂厚度方向上的干涉图案的较低对比度部分从所述抗蚀剂层区域的光敏性，改善所述抗蚀剂层区域中的空间像的光敏性的对比度。

5. 发明申请

US20090011371A1 REFLECTIVE FILM INTERFACE TO RESTORE TRANSVERSE MAGNETIC WAVE CONTRAST IN LITHOGRAPHIC PROCESSING 有权
公开(公告)号：US20090011371A1
公开(公告)日：2009-01-08
申请号：US12233245
申请日：2008-09-18
申请人： Kafai Lai , Dirk Pfeiffer , Alan E. Rosenbluth
发明人： Kafai Lai , Dirk Pfeiffer , Alan E. Rosenbluth
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70216
摘要： A method and system for exposing a resist layer with regions of photosensitivity to an image in a lithographic process using a high numerical aperture imaging tool. There is employed a substrate having thereover a layer reflective to the imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer, with the resist layer having a thickness. The imaging tool is adapted to project radiation containing an aerial image onto the resist layer, with a portion of the radiation containing the aerial image passing through the resist layer and reflecting back to the resist layer. The reflected radiation forms an interference pattern in the resist layer of the projected aerial image through the resist layer thickness. The thickness and location of the resist layer region of photosensitivity with respect to the reflective layer are selected to include from within the interference pattern higher contrast portions of the interference pattern in the direction of the resist thickness, and to exclude lower contrast portions of the interference pattern in the resist thickness direction from said resist layer region of photosensitivity, to improve contrast of the aerial image in said resist layer region of photosensitivity.

6. 发明申请

US20090040486A1 REFLECTIVE FILM INTERFACE TO RESTORE TRANSVERSE MAGNETIC WAVE CONTRAST IN LITHOGRAPHIC PROCESSING 有权
标题翻译：反射膜界面恢复光刻处理中的横向磁波对比
公开(公告)号：US20090040486A1
公开(公告)日：2009-02-12
申请号：US12208358
申请日：2008-09-11
申请人： Kafai Lai , Dirk Pfeiffer , Alan E. Rosenbluth
发明人： Kafai Lai , Dirk Pfeiffer , Alan E. Rosenbluth
IPC分类号： G03B27/42
CPC分类号： G03F7/70216
摘要： A method and system for exposing a resist layer with regions of photosensitivity to an image in a lithographic process using a high numerical aperture imaging tool. There is employed a substrate having thereover a layer reflective to the imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer, with the resist layer having a thickness. The imaging tool is adapted to project radiation containing an aerial image onto the resist layer, with a portion of the radiation containing the aerial image passing through the resist layer and reflecting back to the resist layer. The reflected radiation forms an interference pattern in the resist layer of the projected aerial image through the resist layer thickness. The thickness and location of the resist layer region of photosensitivity with respect to the reflective layer are selected to include from within the interference pattern higher contrast portions of the interference pattern in the direction of the resist thickness, and to exclude lower contrast portions of the interference pattern in the resist thickness direction from said resist layer region of photosensitivity, to improve contrast of the aerial image in said resist layer region of photosensitivity.
摘要翻译：一种用于使用高数值孔径成像工具在光刻工艺中将抗蚀剂层暴露于对图像的光敏感区域的方法和系统。采用具有反射成像工具辐射的层的基板和在反射层上具有光敏区域的抗蚀剂层，抗蚀剂层具有厚度。成像工具适于将含有空间图像的辐射投射到抗蚀剂层上，其中包含空间图像的辐射的一部分穿过抗蚀剂层并反射回抗蚀剂层。反射辐射通过抗蚀剂层厚度在投影空间图像的抗蚀剂层中形成干涉图案。选择相对于反射层的光敏层的抗蚀剂层区域的厚度和位置，以便在干涉图形内包括在抗蚀剂厚度方向上的干涉图案的较高对比度部分，并且排除干涉图形的较低对比度部分从抗蚀剂层区域的光敏剂厚度方向的图案，以提高光敏层的所述抗蚀剂层区域中的空间图像的对比度。

7. 发明授权

US08495528B2 Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process 失效
标题翻译：用于产生用于多次曝光光刻工艺的多个优化波前的方法
公开(公告)号：US08495528B2
公开(公告)日：2013-07-23
申请号：US12890854
申请日：2010-09-27
申请人： Saeed Bagheri , Kafai Lai , David O. Melville , Alan E. Rosenbluth , Kehan Tian , Jaione Tirapu Azpiroz
发明人： Saeed Bagheri , Kafai Lai , David O. Melville , Alan E. Rosenbluth , Kehan Tian , Jaione Tirapu Azpiroz
IPC分类号： G06F17/50
CPC分类号： G03F7/70466 , G03F1/70
摘要： A simplified version of a multiexpose mask optimization problem is solved in order to find a compressed space in which to search for the solution to the full problem formulation. The simplification is to reduce the full problem to an unconstrained formulation. The full problem of minimizing dark region intensity while maintaining intensity above threshold at each bright point can be converted to the unconstrained problem of minimizing average dark region intensity per unit of average intensity in the bright regions. The extrema solutions to the simplified problem can be obtained for each source. This set of extrema solutions is then assessed to determine which features are predominantly printed by which source. A minimal set of extrema solutions serves as a space of reduced dimensionality within which to maximize the primary objective under constraints. The space typically has reduced dimensionality through selection of highest quality extrema solutions.
摘要翻译：解决了一个简化版本的多功能面罩优化问题，以便找到一个压缩空间，在该空间中搜索解决问题的全部问题。简化是将完整的问题减少到无约束的公式。将每个亮点处的强度保持在阈值以上的暗区强度最小化的问题可以转化为明亮区域每单位平均强度平均暗区强度最小化的无约束问题。可以为每个源获得简化问题的极值解。然后评估这组极值解决方案，以确定哪些特征主要由哪个来源打印。最小的一组极值解决方案作为减小维数的空间，在这个空间内可以在约束条件下最大化主要目标。该空间通常通过选择最高质量的极值解决方案降低维度。

8. 发明授权

US08351037B2 Method to match exposure tools using a programmable illuminator 失效
标题翻译：使用可编程照明器匹配曝光工具的方法
公开(公告)号：US08351037B2
公开(公告)日：2013-01-08
申请号：US12834379
申请日：2010-07-12
申请人： Jaione Tirapu Azpiroz , Saeed Bagheri , Kafai Lai , David O. Melville , Alan E. Rosenbluth , Kehan Tian
发明人： Jaione Tirapu Azpiroz , Saeed Bagheri , Kafai Lai , David O. Melville , Alan E. Rosenbluth , Kehan Tian
IPC分类号： G01B11/00
CPC分类号： G03F1/36 , G03F7/70116 , G03F7/70125 , G03F7/70525
摘要： Programmable illuminators in exposure tools are employed to increase the degree of freedom in tool matching. A tool matching methodology is provided that utilizes the fine adjustment of the individual source pixel intensity based on a linear programming (LP) problem subjected to user-specific constraints to minimize the difference of the lithographic wafer data between two tools. The lithographic data can be critical dimension differences from multiple targets and multiple process conditions. This LP problem can be modified to include a binary variable for matching sources using multi-scan exposure. The method can be applied to scenarios that the reference tool is a physical tool or a virtual ideal tool. In addition, this method can match different lithography systems, each including a tool and a mask.
摘要翻译：使用曝光工具中的可编程照明器来增加刀具匹配的自由度。提供了一种工具匹配方法，其利用基于用户特定约束的线性规划（LP）问题对各个源像素强度的精细调整，以最小化两种工具之间的平版印刷晶片数据的差异。光刻数据可以是来自多个目标和多个工艺条件的关键尺寸差异。该LP问题可以修改为包括使用多次扫描曝光来匹配源的二进制变量。该方法可以应用于参考工具是物理工具或虚拟理想工具的场景。此外，该方法可以匹配不同的光刻系统，每个包括工具和掩模。

9. 发明申请

US20080127027A1 PRINTABILITY VERIFICATION BY PROGRESSIVE MODELING ACCURACY 失效
标题翻译：可靠性验证通过逐步建模精度
公开(公告)号：US20080127027A1
公开(公告)日：2008-05-29
申请号：US11555854
申请日：2006-11-02
申请人： Gregg M. Gallatin , Kafai Lai , Maharaj Mukherjee , Alan E. Rosenbluth
发明人： Gregg M. Gallatin , Kafai Lai , Maharaj Mukherjee , Alan E. Rosenbluth
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A fast method of verifying a lithographic mask design is provided wherein catastrophic errors are identified by iteratively simulating and verifying images for the mask layout using progressively more accurate image models, including optical and resist models. Progressively accurate optical models include SOCS kernels that provide successively less influence. Corresponding resist models are constructed that may include only SOCS kernel terms corresponding to the optical model, or may include image trait terms of varying influence ranges. Errors associated with excessive light, such as bridging, side-lobe or SRAF printing errors, are preferably identified with bright field simulations, while errors associated with insufficient light, such as necking or line-end shortening overlay errors, are preferably identified with dark field simulations.
摘要翻译：提供了一种验证光刻掩模设计的快速方法，其中通过使用逐渐更精确的图像模型（包括光学和抗蚀剂模型）迭代地模拟和验证用于掩模布局的图像来识别灾难性错误。逐步准确的光学模型包括提供连续影响较小的SOCS内核。构造相应的抗蚀剂模型，其可以仅包括对应于光学模型的SOCS核项，或者可以包括不同影响范围的图像特征项。优选用亮场模拟来识别与过多光线相关的错误，例如桥接，旁瓣或SRAF打印错误，而与光线不足相关的错误，例如颈缩或线端缩短覆盖误差，优选地用暗场模拟。

10. 发明授权

US07343271B2 Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare 有权
标题翻译：将相位图并入基于快速模型的光学邻近校正模拟内核，以解决近距离和中等范围的闪光
公开(公告)号：US07343271B2
公开(公告)日：2008-03-11
申请号：US10694465
申请日：2003-10-27
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06F7/60 , G06F17/50 , G06F19/00 , G06K9/00
CPC分类号： G03F7/70441 , G03F1/36 , G03F1/70 , G03F7/705
摘要： A first method to compute a phase map within an optical proximity correction simulation kernel utilizes simulated wavefront information from randomly generated data. A second method uses measured data from optical tools. A phase map is created by analytically embedding a randomly generated two-dimensional array of complex numbers of wavefront information, and performing an inverse Fourier Transform on the resultant array. A filtering function requires the amplitude of each element of the array to be multiplied by a Gaussian function. A power law is then applied to the array. The elements of the array are shuffled, and converted from the phasor form to real/imaginary form. A two-dimensional Fast Fourier Transform is applied. The array is then unshuffled, and converted back to phasor form.
摘要翻译：计算光学邻近校正模拟核心内的相位图的第一种方法利用来自随机产生的数据的模拟波阵面信息。第二种方法使用来自光学工具的测量数据。通过分析地嵌入复数数目的波阵面信息的随机生成的二维阵列并在所得到的阵列上执行逆傅里叶变换来创建相位图。滤波函数要求阵列的每个元素的幅度乘以高斯函数。然后将幂律应用于阵列。数组的元素被洗牌，并从相量形式转换为实数/虚数形式。应用二维快速傅立叶变换。然后数组被清洗，并转换回到相量形式。

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