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1. 发明授权

US09507251B2 Method for manufacturing reflective mask and apparatus for manufacturing reflective mask 有权
标题翻译：制造反光罩的方法和用于制造反光罩的装置
公开(公告)号：US09507251B2
公开(公告)日：2016-11-29
申请号：US14197549
申请日：2014-03-05
申请人： Shibaura Mechatronics Corporation , Kabushiki Kaisha Toshiba
发明人： Tomoaki Yoshimori , Makoto Karyu , Takeharu Motokawa , Kosuke Takai , Yoshihisa Kase
IPC分类号： G03F1/24 , G03B27/42 , G03F1/54 , G03F1/80
CPC分类号： G03F1/24 , G03B27/42 , G03F1/54 , G03F1/80
摘要： According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the absorption layer. In addition, the method can include forming a light blocking region surrounding the pattern region in the absorption layer and the reflection layer. The forming the light blocking region includes etching-processing the reflection layer using a gas containing chlorine and oxygen.
摘要翻译：根据一个实施例，公开了一种用于制造反射掩模的方法。该方法可以包括在基底的主表面上形成反射层。该方法可以包括在反射层上形成吸收层。该方法可以包括在吸收层中形成图案区域。此外，该方法可以包括在吸收层和反射层中形成围绕图案区域的遮光区域。形成遮光区域包括使用含有氯和氧的气体对反射层进行蚀刻处理。

2. 发明申请

US20140186754A1 METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACTURING REFLECTIVE MASK 有权
标题翻译：用于制造反射掩模的方法和制造反射掩模的装置
公开(公告)号：US20140186754A1
公开(公告)日：2014-07-03
申请号：US14197549
申请日：2014-03-05
申请人： Kabushiki Kaisha Toshiba , Shibaura Mechatronics Corporation
发明人： Tomoaki Yoshimori , Makoto Karyu , Takeharu Motokawa , Kosuke Takai , Yoshihisa Kase
IPC分类号： G03F1/24
CPC分类号： G03F1/24 , G03B27/42 , G03F1/54 , G03F1/80
摘要： According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the absorption layer. In addition, the method can include forming a light blocking region surrounding the pattern region in the absorption layer and the reflection layer. The forming the light blocking region includes etching-processing the reflection layer using a gas containing chlorine and oxygen.
摘要翻译：根据一个实施例，公开了一种用于制造反射掩模的方法。该方法可以包括在基底的主表面上形成反射层。该方法可以包括在反射层上形成吸收层。该方法可以包括在吸收层中形成图案区域。此外，该方法可以包括在吸收层和反射层中形成围绕图案区域的遮光区域。形成遮光区域包括使用含有氯和氧的气体对反射层进行蚀刻处理。

3. 发明授权

US10111313B2 Plasma processing apparatus and plasma processing method 有权
公开(公告)号：US10111313B2
公开(公告)日：2018-10-23
申请号：US13847130
申请日：2013-03-19
申请人： SHIBAURA MECHATRONICS CORPORATION
发明人： Takeharu Motokawa , Tokuhisa Ooiwa , Kensuke Demura , Tomoaki Yoshimori , Makoto Karyu , Yoshihisa Kase , Hidehito Azumano
IPC分类号： H01L21/00 , C23C16/00 , H05H1/46 , H01J37/32
摘要： According to one embodiment, a plasma processing apparatus includes: a processing chamber; a decompression section configured to decompress inside of the processing chamber; a member including a control section to be inserted into a depression provided on mounting side of a workpiece, the control section being configured to thereby control at least one of in-plane distribution of capacitance of a region including the workpiece and in-plane distribution of temperature of the workpiece; a mounting section provided inside the processing chamber; a plasma generating section configured to supply electromagnetic energy to a region for generating a plasma for performing plasma processing on the workpiece; and a gas supply section configured to supply a process gas to the region for generating a plasma. The control section performs control so that at least one of the in-plane distribution of capacitance and the in-plane distribution of temperature is made uniform.

4. 发明申请

US20160068430A1 PATTERNING METHOD 审中-公开
标题翻译：绘图方法
公开(公告)号：US20160068430A1
公开(公告)日：2016-03-10
申请号：US14645017
申请日：2015-03-11
申请人： KABUSHIKI KAISHA TOSHIBA
发明人： Machiko SUENAGA , Hideaki Sakurai , Takeharu Motokawa , Masatoshi Terayama
IPC分类号： C03C15/00
CPC分类号： C03C15/00 , C03C2218/34
摘要： A patterning method according to one embodiment includes forming on a glass substrate a guide pattern including a first region at which the glass substrate is exposed, and a second region on which a pattern is formed. A self-assembly material including a first segment pinned to the first region, and a second segment is applied onto the guide pattern. The self-assembly material is phase-separated into a first domain including the first: segment and a second domain including the second segment. One of the first domain and the second domain is selectively removed. The width of the first region is not less than 0.8 times and not more than 1.15 times as large as the width of the first domain.
摘要翻译：根据一个实施例的图案化方法包括在玻璃基板上形成包括玻璃基板被暴露的第一区域的引导图案和形成有图案的第二区域。将包括固定在第一区域上的第一段和第二段的自组装材料施加到引导图案上。自组装材料被相分离成包括第一部分的第一部分和包括第二部分的第二结构域。有选择地删除第一个域和第二个域之一。第一区域的宽度不小于第一区域的宽度的0.8倍且不大于1.15倍。

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