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1. 发明公开

US20230191554A1 POLISHING SYSTEM 审中-公开
公开(公告)号：US20230191554A1
公开(公告)日：2023-06-22
申请号：US17921391
申请日：2021-04-12
申请人： Konica Minolta, Inc.
发明人： Atsushi TAKAHASHI , Akihiro MAEZAWA , Fumiko TSUKIGATA , Keisuke MIZOGUCHI
IPC分类号： B24B37/013
CPC分类号： B24B37/013
摘要： A polishing system performs chemical-mechanical polishing of an object to be polished using an abrasive slurry. The polishing system includes a polishing amount calculator that measures an amount of free metal ions of a metallic element derived from the object to be polished in a processed slurry and calculates a polishing amount of the object to be polished from the amount of the free metal ions. The object to be polished is a glass containing the metallic element of Group 1 or Group 2 of a periodic table.

2. 发明申请

US20160194538A1 Polishing Material Particles, Method For Producing Polishing Material, And Polishing Processing Method 有权
标题翻译：抛光材料颗粒，抛光材料的制造方法和抛光加工方法
公开(公告)号：US20160194538A1
公开(公告)日：2016-07-07
申请号：US14910986
申请日：2014-07-28
申请人： KONICA MINOLTA, INC.
发明人： Keisuke MIZOGUCHI , Akihiro MAEZAWA , Natsuki ITO , Atsushi TAKAHASHI , Hideaki WAKAMATSU , Yuuki NAGAI , Chie INUI
IPC分类号： C09K3/14 , B24C11/00 , C09G1/02
CPC分类号： C09K3/1409 , B24C11/00 , C01F17/0043 , C01P2004/03 , C01P2004/32 , C01P2004/52 , C01P2004/54 , C01P2004/61 , C01P2004/62 , C01P2004/64 , C09G1/02 , C09K3/1463
摘要： Disclosed are polishing material particles which have polishing performance suitable for precision polishing and also have a high polishing speed and high monodispersibility; a polishing material containing the polishing material particles; and a polishing processing method using the polishing material. The polishing material particles are spherical particles having an average aspect ratio of 1.00 to 1.15, wherein the particle diameter (D50 (nm)) of the polishing material particles as determined from a particle diameter cumulative distribution curve falls within the range from 50 to 1500 nm. The average content of cerium or the total content of cerium and at least one element selected from lanthanum (La), praseodymium (Pr), neodymium (Nd), samarium (Sm) and europium (Eu) in the polishing material particles is 81 mol % or more relative to the total content of all of rare earth elements that constitute the polishing material particles.
摘要翻译：公开了具有适合于精密抛光的抛光性能并且还具有高抛光速度和高单分散性的抛光材料颗粒; 包含抛光材料颗粒的抛光材料; 以及使用研磨材料的研磨处理方法。抛光材料颗粒是平均纵横比为1.00至1.15的球形颗粒，其中由粒径累积分布曲线确定的抛光材料颗粒的粒径（D50（nm））落在50至1500nm的范围内。在研磨材料颗粒中，铈的平均含量或铈和至少一种选自镧（La），镨（Pr），钕（Nd），钐（Sm）和铕（Eu）的元素的含量为81mol 相对于构成抛光材料颗粒的所有稀土元素的总含量为％以上。

3. 发明申请

US20220111489A1 POLISHING AGENT REGENERATING METHOD AND POLISHING AGENT RECYCLE PROCESSING SYSTEM 有权
公开(公告)号：US20220111489A1
公开(公告)日：2022-04-14
申请号：US17420621
申请日：2019-12-24
申请人： Konica Minolta, Inc.
发明人： Keisuke MIZOGUCHI , Jing XUE , Fumiko TSUKIGATA , Akihiro MAEZAWA
IPC分类号： B24B57/02 , C09G1/04 , B01D21/24
摘要： A polishing agent regenerating method in which a component of a polished material is removed from polishing agent slurry and a polishing agent is collected and regenerated is shown. The method includes at least, polishing, polishing agent slurry supplying, polishing agent slurry collecting, and sedimenting/separating/concentrating, performed in the above order. In the polishing agent slurry collecting or the sedimenting/separating/concentrating, a K2O density in the polishing agent slurry after dilution by water is performed is to be within a range of 0.002-0.2 mass %.

4. 发明申请

US20180044198A1 SPHERICAL ZINC OXIDE PARTICLES, PROCESS FOR PRODUCING SAME, AND PLASMON SENSOR CHIP OBTAINED USING SAME 审中-公开
公开(公告)号：US20180044198A1
公开(公告)日：2018-02-15
申请号：US15555837
申请日：2016-03-02
申请人： Konica Minolta, Inc.
发明人： Natsuki ITO , Akihiro MAEZAWA , Keisuke MIZOGUCHI
IPC分类号： C01G9/02
CPC分类号： C01G9/02 , C01G15/00 , C01P2002/02 , C01P2002/52 , C01P2004/03 , C01P2004/32 , C01P2004/54 , C01P2004/61 , C01P2004/62 , C01P2004/64 , C01P2006/60 , G01N21/41 , G01N21/554
摘要： The present invention addresses the problem of providing spherical zinc oxide particles which have an average particle diameter within a specific range, have excellent monodispersity, and have a high plasmon resonance intensity. Also provided are a process for producing the spherical zinc oxide particles and a plasmon sensor chip obtained using the spherical zinc oxide particles, the chip having high sensitivity and being reduced in angle dependence during measurement. The spherical zinc oxide particles have been doped with one or more metallic elements selected from the group consisting of gallium (Ga), europium (Eu), cerium (Ce), praseodymium (Pr), samarium (Sm), gadolinium (Gd), terbium (Tb), neodymium (Nd), and ytterbium (Yb), have an average particle diameter within the range of 50 to 5,000 nm, and have a variation coefficient in particle diameter distribution within the range of 1.0 to 10%.

5. 发明申请

US20220356372A1 PREPARATION METHOD OF RECYCLED POLISHING AGENT SLURRY AND POLISHING AGENT SLURRY 有权
公开(公告)号：US20220356372A1
公开(公告)日：2022-11-10
申请号：US17658574
申请日：2022-04-08
申请人： Konica Minolta, Inc.
发明人： Atsushi TAKAHASHI , Akihiro MAEZAWA , Fumiko TSUKIGATA , Keisuke MIZOGUCHI
IPC分类号： C09G1/02
摘要： A recycled polishing agent slurry is prepared from a used polishing agent slurry after polishing a silicon material using a reference polishing agent slurry including a cerium oxide polishing agent and a dispersing agent. The preparation method includes: slurry collecting in which the used slurry discharged from a polishing machine is collected; separation and concentration in which the cerium oxide polishing agent in the collected slurry is separated from a component derived from the material to be polished and then concentrated, and polishing agent recycling in which a pH adjusting agent and the dispersing agent are added to the separated and concentrated cerium oxide polishing agent, and a recycled polishing agent slurry is adjusted to have a pH value at 25° C. of in a range of 6.0 to 10.5 and an electrical conductivity value in a range of 0.10 to 10.00 times that of the reference slurry.

6. 发明申请

US20210109038A1 Quality Inspection Method 有权
公开(公告)号：US20210109038A1
公开(公告)日：2021-04-15
申请号：US16500120
申请日：2018-03-30
申请人： Konica Minolta, Inc.
发明人： Keisuke MIZOGUCHI , Mitsuharu KITAMURA , Kenji GOTO
IPC分类号： G01N23/041 , G01N23/083
摘要： Provided is a quality inspection method in which an inner state of a three-dimensional laminated molding can be quickly and easily inspected without destroying the three-dimensional laminated molding. To this end, the quality inspection method uses an X-ray Talbot imaging system 1 which creates a reconstructed image of an inspection object on the basis of a moire image obtained by using an X-ray detector to read X-rays which, after being radiated from an X-ray source 11a, have passed through: a plurality of grids in which a plurality of slits S are arranged in a direction perpendicular to the radiation axis direction of the X-ray; and an inspection object H placed on a subject table 13. The inspection object H is a three-dimensional laminated molding formed into a three-dimensional shape by laminating multiple layers of constituent materials. The reconstructed image is created while the inspection object H is placed on the subject table 13 in such a way that at least the lamination direction of layers constituting the inspection object H and the arrangement direction of the plurality of slits S in the plurality of grids are parallel. The inner state of the inspection object H is inspected on the basis of the reconstructed image.

7. 发明申请

US20210087375A1 RESIN COMPOSITION FOR THREE-DIMENSIONAL MODELING, THREE-DIMENSIONAL MODELED ARTICLE, AND METHOD FOR MANUFACTURING THREE-DIMENSIONAL MODELED ARTICLE 有权
公开(公告)号：US20210087375A1
公开(公告)日：2021-03-25
申请号：US16963418
申请日：2019-01-17
申请人： Konica Minolta, Inc.
发明人： Keisuke MIZOGUCHI
IPC分类号： C08L23/12 , B29C64/268 , B33Y70/00 , B29C64/153 , B33Y10/00 , C08L25/06 , B33Y40/10
摘要： The present invention addresses the problem of providing a three-dimensional modeled article having high dimensional precision, high strength, and high ductility, and a resin composition for a three-dimensional modeled article, the resin composition being used to fabricate the three-dimensional modeled article, and of providing a method for manufacturing a three-dimensional modeled article. To address this problem, a resin composition for a three-dimensional modeled article according to the present invention contains resin particles having a continuous phase including a thermoplastic resin, and a dispersed phase including a thermoplastic elastomer, dispersed in the continuous phase, the amount of the thermoplastic elastomer therein being 1-12 parts by mass with respect to a total of 100 parts by mass of the thermoplastic resin and the thermoplastic elastomer.

8. 发明申请

US20200032006A1 POWDER MATERIAL AND METHOD FOR MANUFACTURING COATED PARTICLES USED IN SAME, METHOD FOR MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT USING POWDER MATERIAL, AND THREE-DIMENSIONAL SHAPING DEVICE 审中-公开
公开(公告)号：US20200032006A1
公开(公告)日：2020-01-30
申请号：US16484354
申请日：2017-12-08
申请人： Konica Minolta, Inc.
发明人： Keisuke MIZOGUCHI
IPC分类号： C08J3/12 , B33Y10/00 , B33Y30/00 , B33Y50/02 , B33Y70/00 , B29C64/153 , B29C64/268 , B29C64/393
摘要： A powder material is used in a method for manufacturing a three-dimensional shaped object, the method including: repeatedly performing preheating of a powder material containing coated particles and selective laser light irradiation of a thin layer of the powder material; and laminating together a plurality of shaped object layers of which at least some of the coated particles are fused and coupled to each other. The coated particles include a core resin and a shell material which coats the core resin and which is made of an inorganic material. An average linear expansion coefficient of the core resin at 20 to 100° C. is 5 to 240 with respect to an average linear expansion coefficient of the shell material at 20° C. to 100° C. The shell material breaks in a range between the softening temperature of the core resin and the softening temperature+50° C.

9. 发明申请

US20150353795A1 Core/Shell-Type Inorganic Particles 审中-公开
标题翻译：核/壳型无机颗粒
公开(公告)号：US20150353795A1
公开(公告)日：2015-12-10
申请号：US14763070
申请日：2014-01-22
申请人： KONICA MINOLTA, INC.
发明人： Natsuki ITO , Akihiro MAEZAWA , Atsushi TAKAHASHI , Keisuke MIZOGUCHI , Chie INUI
IPC分类号： C09K3/14
CPC分类号： C09K3/1445 , C01F17/0043 , C01P2002/60 , C01P2004/32 , C01P2004/62 , C01P2004/64 , C01P2004/80 , C01P2004/84 , C23C18/1216 , C23C18/1229
摘要： An object of the present invention is to provide an inorganic core/shell particle to be contained in an abrasive material that contains a reduced amount of cerium, can polish harder workpieces at a high polishing rate, and can decrease the surface roughness of the workpieces. The inorganic core/shell particle P of the present invention is to be contained in an abrasive material and includes a core (1) containing a salt of at least one element selected from yttrium (Y), titanium (Ti), strontium (Sr), barium (Ba), samarium (Sm), europium (Eu), gadolinium (Gd), and terbium (Tb) and a shell (2) containing a salt of at least one element selected from these eight elements and a salt of cerium (Ce), wherein the crystallites in the shell (2) have an average diameter within a range of 4 to 30 nm.
摘要翻译：本发明的目的在于提供一种含有少量铈的研磨材料的无机核/壳粒子，能够以高抛光速度对较硬的工件进行抛光，能够降低工件的表面粗糙度。本发明的无机核/壳粒子P包含在研磨材料中，并且包括含有选自钇（Y），钛（Ti），锶（Sr），钡（Ba），钐（Sm），铕（Eu），钆（Gd）和铽（Tb）和含有选自这八元素中的至少一种元素的盐的壳（2）（Ce），其中壳（2）中的微晶的平均直径在4〜30nm的范围内。

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