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1. 发明授权

US10126238B2 Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology 有权
$Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology$
公开(公告)号：US10126238B2
公开(公告)日：2018-11-13
申请号：US15841219
申请日：2017-12-13
申请人： KLA-Tencor Corporation
发明人： Amnon Manassen , Andrew Hill , Daniel Kandel , Ilan Sela , Ohad Bachar , Barak Bringoltz
IPC分类号： G01N21/55 , G01B11/00 , G01N21/956 , G01N21/95
摘要： Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

2. 发明授权

US09719920B2 Scatterometry system and method for generating non-overlapping and non-truncated diffraction images 有权
$Scatterometry system and method for generating non-overlapping and non-truncated diffraction images$
公开(公告)号：US09719920B2
公开(公告)日：2017-08-01
申请号：US14497439
申请日：2014-09-26
申请人： KLA-Tencor Corporation
发明人： Tzahi Grunzweig , Andrew Hill , Barry Loevsky
IPC分类号： G01B11/24 , G01N21/47 , G03F7/20
CPC分类号： G01N21/4788 , G01B2210/48 , G01N2201/06113 , G03F7/701 , G03F7/70633
摘要： Scatterometry measurement systems, illumination configurations and respective methods are provided, which comprise illumination beams that have vertical projections on a target plane comprising both a parallel component and a perpendicular component, with respect to a target measurement direction. The illumination beams propagate at an angle to the plane defined by the measurement direction and a normal to the targets surface and generate diffraction images which are off-center at the imaging pupil plane. The eccentric diffraction images are spatially arranged to avoid overlaps and to correspond to measurement requirements such as spot sizes, number of required diffraction orders and so forth. The illumination beams may be implemented using illumination pupil masks, which provide a simple way to increase scatterometry measurements throughput.

3. 发明授权

US09080971B2 Metrology systems and methods 有权
标题翻译：计量系统和方法
公开(公告)号：US09080971B2
公开(公告)日：2015-07-14
申请号：US14516540
申请日：2014-10-16
申请人： KLA-Tencor Corporation
发明人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC分类号： G01N21/47 , G01B11/02 , G03F7/20 , G01N21/956 , G01N21/95 , G01B11/06 , G01N21/21
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
摘要翻译：提供了各种计量系统和方法。一个计量系统包括被配置为产生衍射受限光束的光源，被配置为使照明光学器件的入射光瞳中的光束成形的变迹器，以及被配置为将来自变迹器的衍射受限光束引导到在晶片上的光栅目标上的照明点并且收集来自光栅目标的散射光。测量系统还包括场停止器和检测器，其被配置为检测通过场停止器的散射光。此外，计量系统包括被配置为使用检测器的输出来确定光栅目标的特性的计算机系统。

4. 发明申请

US20150022822A1 ILLUMINATION CONFIGURATIONS FOR SCATTEROMETRY MEASUREMENTS 有权
标题翻译：用于散射测量的照明配置
公开(公告)号：US20150022822A1
公开(公告)日：2015-01-22
申请号：US14497439
申请日：2014-09-26
申请人： KLA-Tencor Corporation
发明人： Tzahi Grunzweig , Andrew Hill , Barry Loevsky
IPC分类号： G01B11/24 , G01N21/47
CPC分类号： G01N21/4788 , G01B2210/48 , G01N2201/06113 , G03F7/701 , G03F7/70633
摘要： Scatterometry measurement systems, illumination configurations and respective methods are provided, which comprise illumination beams that have vertical projections on a target plane comprising both a parallel component and a perpendicular component, with respect to a target measurement direction. The illumination beams propagate at an angle to the plane defined by the measurement direction and a normal to the targets surface and generate diffraction images which are off-center at the imaging pupil plane. The eccentric diffraction images are spatially arranged to avoid overlaps and to correspond to measurement requirements such as spot sizes, number of required diffraction orders and so forth. The illumination beams may be implemented using illumination pupil masks, which provide a simple way to increase scatterometry measurements throughput.
摘要翻译：提供散射测量系统，照明配置和各自的方法，其包括相对于目标测量方向在包括平行分量和垂直分量的目标平面上具有垂直投影的照明光束。照明光束以与测量方向限定的平面成一角度传播，并且与目标表面垂直的方向传播，并产生在成像光瞳平面处偏心的衍射图像。偏心衍射图像在空间上排列以避免重叠并且对应于测量要求，例如光斑尺寸，所需衍射级数等。照明光束可以使用照明光瞳屏蔽来实现，其提供了增加散射测量吞吐量的简单方法。

5. 发明授权

US10663281B2 Systems and methods for optimizing focus for imaging-based overlay metrology 有权
公开(公告)号：US10663281B2
公开(公告)日：2020-05-26
申请号：US15574294
申请日：2017-09-14
申请人： KLA-Tencor Corporation
发明人： Amnon Manassen , Andrew Hill
IPC分类号： G01B11/02 , G01B9/02 , G03F7/20 , G01B11/27
摘要： Methods and systems for focusing and measuring by mean of an interferometer device, having an optical coherence tomography (OCT) focusing system, by separately directing an overlapped measurement and reference wavefront towards a focus sensor and towards an imaging sensor; where a predefined focusing illumination spectrum of the overlapped wavefront is directed towards the focus sensor, and where a predefined measurement illumination spectrum of the overlapped wavefront is directed towards the imaging sensor. Methods and systems for maintaining focus of an interferometer device, having an OCT focusing system, during sample's stage moves.

6. 发明授权

US09958385B2 Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology 有权
$Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology$
公开(公告)号：US09958385B2
公开(公告)日：2018-05-01
申请号：US14581719
申请日：2014-12-23
申请人： Kla-Tencor Corporation
发明人： Amnon Manassen , Andrew Hill , Daniel Kandel , Ilan Sela , Ohad Bachar , Barak Bringoltz
IPC分类号： G01N21/55 , G01B11/00 , G01N21/95 , G01N21/956
CPC分类号： G01N21/55 , G01B11/00 , G01N21/9501 , G01N21/956 , G01N2201/06113 , G01N2201/104
摘要： Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

7. 发明授权

US09886764B2 Image acquisition system, image acquisition method, and inspection system 有权
公开(公告)号：US09886764B2
公开(公告)日：2018-02-06
申请号：US14926984
申请日：2015-10-29
申请人： KLA-TENCOR CORPORATION
发明人： Guoheng Zhao , Stanley E. Stokowski , Andrew Hill , Johan De Greeve , Maarten Van Der Burgt , Karel Van Gils
IPC分类号： G06T7/00 , H04N5/372 , G01B11/06 , G01B11/25 , G06T7/586
CPC分类号： G06T7/586 , G01B11/0608 , G01B11/2513 , G01B11/2522 , G06T2207/10052 , G06T2207/20208 , H04N5/37206
摘要： The invention relates to an image acquisition system and an image acquisition method, as well as to an inspection system having at least one such image acquisition system. A projector projects a pattern on a surface of a sample, a camera records light intensity information from within at least two detection fields defined by the camera on the surface of the sample. A relative motion between the sample on the one hand and the camera and projector on the other hand is generated. From the acquired at least one image a height profile of the surface of the sample may be inferred. The pattern may comprise a number of sub-patterns related to each other by a phase shift. Alternatively, the pattern may be a fringe pattern.

8. 发明申请

US20150036142A1 Metrology Systems and Methods 有权
标题翻译：计量系统与方法
公开(公告)号：US20150036142A1
公开(公告)日：2015-02-05
申请号：US14516540
申请日：2014-10-16
申请人： KLA-Tencor Corporation
发明人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC分类号： G01N21/47 , G01N21/956 , G01N21/95 , G01B11/02
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
摘要翻译：提供了各种计量系统和方法。一个计量系统包括被配置为产生衍射受限光束的光源，被配置为使照明光学器件的入射光瞳中的光束成形的变迹器，以及被配置为将来自变迹器的衍射受限光束引导到在晶片上的光栅目标上的照明点并且收集来自光栅目标的散射光。测量系统还包括场停止器和检测器，其被配置为检测通过场停止器的散射光。此外，计量系统包括被配置为使用检测器的输出来确定光栅目标的特性的计算机系统。

9. 发明申请

US20200240765A1 Systems and Methods for Optimizing Focus for Imaging-Based Overlay Metrology 审中-公开
公开(公告)号：US20200240765A1
公开(公告)日：2020-07-30
申请号：US16848056
申请日：2020-04-14
申请人： KLA-Tencor Corporation
发明人： Amnon Manassen , Andrew Hill
IPC分类号： G01B9/02 , G01B11/27 , G03F7/20
摘要： Methods and systems for focusing and measuring by mean of an interferometer device, having an optical coherence tomography (OCT) focusing system, by separately directing an overlapped measurement and reference wavefront towards a focus sensor and towards an imaging sensor; where a predefined focusing illumination spectrum of the overlapped wavefront is directed towards the focus sensor, and where a predefined measurement illumination spectrum of the overlapped wavefront is directed towards the imaging sensor. Methods and systems for maintaining focus of an interferometer device, having an OCT focusing system, during sample's stage moves.

10. 发明授权

US10684563B2 On the fly target acquisition 有权
公开(公告)号：US10684563B2
公开(公告)日：2020-06-16
申请号：US15761830
申请日：2018-02-19
申请人： KLA-TENCOR CORPORATION
发明人： Amnon Manassen , Andrew Hill , Nadav Gutman , Yossi Simon , Alexander Novikov , Eugene Maslovsky
IPC分类号： G06T7/00 , H04N5/372 , G06T7/246 , G03F7/20 , G06T7/73 , G03F9/00 , G01B11/00
摘要： Metrology systems and methods are provided, which derive metrology target position on the wafer and possibly the target focus position during the movement of the wafer on the system's stage. The positioning data is derived before the target arrives its position (on-the-fly), sparing the time required in the prior art for the acquisition stage and increasing the throughput of the systems and methods. The collection channel may be split to provide for an additional moving-imaging channel comprising at least one TDI (time delay and integration) sensor with an associated analysis unit configured to derive wafer surface information, positioning and/or focusing information of the metrology targets with respect to the objective lens, during wafer positioning movements towards the metrology targets. Additional focusing-during-movement module and possibly feedbacking derived position and/or focus information to the stage may enhance the accuracy of the stopping of the stage.

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