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1. 发明授权

US07964521B2 Getter paste composition 失效
标题翻译：吸气膏组成
公开(公告)号：US07964521B2
公开(公告)日：2011-06-21
申请号：US12204105
申请日：2008-09-04
申请人： Jung-Hyun Son , Sang-Kyu Lee , Han-Bok Joo , Jong-Dai Park
发明人： Jung-Hyun Son , Sang-Kyu Lee , Han-Bok Joo , Jong-Dai Park
IPC分类号： C03C8/08 , C03C8/14 , C03C8/16 , C03C8/24 , C03C3/21 , C03B23/00 , B29C65/16 , H01J9/26
CPC分类号： H01J7/183 , H01L51/5246 , H01L51/5259
摘要： The present invention relates to a getter paste composition, and more particularly, to a getter paste composition which is quickly densified at low densification temperatures to be applied to a device that is weak to heat, provides good adhesiveness, controls moisture and gas effectively and is screen-printable to thereby improve productivity.
摘要翻译：本发明涉及一种吸气剂糊剂组合物，更具体地说，涉及一种在低致密化温度下快速致密化以应用于弱热装置的吸气剂糊组合物，提供良好的粘合性，有效地控制水分和气体，并且是可屏幕打印，从而提高生产率。

2. 发明申请

US20090065049A1 Getter Paste Composition 失效
标题翻译：吸气膏组成
公开(公告)号：US20090065049A1
公开(公告)日：2009-03-12
申请号：US12204105
申请日：2008-09-04
申请人： Jung-Hyun Son , Sang-Kyu Lee , Han-Bok Joo , Jong-Dai Park
发明人： Jung-Hyun Son , Sang-Kyu Lee , Han-Bok Joo , Jong-Dai Park
IPC分类号： H01L31/0216 , H01K1/56 , H01J1/62 , H01J9/26
CPC分类号： H01J7/183 , H01L51/5246 , H01L51/5259
摘要： The present invention relates to a getter paste composition, and more particularly, to a getter paste composition which is quickly densified at low densification temperatures to be applied to a device that is weak to heat, provides good adhesiveness, controls moisture and gas effectively and is screen-printable to thereby improve productivity.
摘要翻译：本发明涉及一种吸气剂糊剂组合物，更具体地说，涉及一种在低致密化温度下快速致密化以应用于弱热装置的吸气剂糊组合物，提供良好的粘合性，有效地控制水分和气体，并且是可屏幕打印，从而提高生产率。

3. 发明申请

US20090029623A1 Sealing Method for Display Element 有权
标题翻译：显示元件密封方法
公开(公告)号：US20090029623A1
公开(公告)日：2009-01-29
申请号：US12177494
申请日：2008-07-22
申请人： Jung-Hyun Son , Han-Bok Joo , Sang-Kyu Lee , Jong-Dai Park
发明人： Jung-Hyun Son , Han-Bok Joo , Sang-Kyu Lee , Jong-Dai Park
IPC分类号： H01L51/50 , H01J9/20
CPC分类号： H01L51/525 , H01L51/5246
摘要： The present invention relates to a sealing method for a display element, and more particularly, to a sealing method for a display element which fundamentally prevents an error due to contact between light emitting bodies of upper and lower sealing members by protecting a surface of a light emitting layer and an electrode with a curing body of a photocurable transparent composition, enhances workability of a display element sealing, provides good moisture resistance and adhesiveness and improves an aperture ratio of a display element by making a top emission available to thereby make a thinner, larger display element.
摘要翻译：显示元件的密封方法技术领域本发明涉及一种显示元件的密封方法，更具体地，涉及一种用于显示元件的密封方法，其基本上防止由于上部和下部密封构件的发光体之间的接触而产生的误差，通过保护光的表面发光层和具有可光固化透明组合物的固化体的电极，提高显示元件密封的加工性，提供良好的耐湿性和粘合性，并且通过使顶部发射可用来提高显示元件的开口率，从而使薄，较大的显示元素。

4. 发明授权

US08362690B2 Sealing method for display element 有权
标题翻译：显示元件密封方法
公开(公告)号：US08362690B2
公开(公告)日：2013-01-29
申请号：US12177494
申请日：2008-07-22
申请人： Jung-Hyun Son , Han-Bok Joo , Sang-Kyu Lee , Jong-Dai Park
发明人： Jung-Hyun Son , Han-Bok Joo , Sang-Kyu Lee , Jong-Dai Park
IPC分类号： H01L27/32 , H01L27/28
CPC分类号： H01L51/525 , H01L51/5246
摘要： The present invention relates to a sealing method for a display element, and more particularly, to a sealing method for a display element which fundamentally prevents an error due to contact between light emitting bodies of upper and lower sealing members by protecting a surface of a light emitting layer and an electrode with a curing body of a photocurable transparent composition, enhances workability of a display element sealing, provides good moisture resistance and adhesiveness and improves an aperture ratio of a display element by making a top emission available to thereby make a thinner, larger display element.
摘要翻译：显示元件的密封方法技术领域本发明涉及一种显示元件的密封方法，更具体地，涉及一种用于显示元件的密封方法，其基本上防止由于上部和下部密封构件的发光体之间的接触而产生的误差，通过保护光的表面发光层和具有可光固化透明组合物的固化体的电极，提高显示元件密封的加工性，提供良好的耐湿性和粘合性，并且通过使顶部发射可用来提高显示元件的开口率，从而使薄，较大的显示元素。

5. 发明授权

US07863207B2 Glass frit and sealing method for element using the same 失效
标题翻译：玻璃料和密封方法使用相同的元素
公开(公告)号：US07863207B2
公开(公告)日：2011-01-04
申请号：US12202455
申请日：2008-09-02
申请人： Jung-Hyun Son , Sang-Kyu Lee , Han-Bok Joo , Jong-Dai Park
发明人： Jung-Hyun Son , Sang-Kyu Lee , Han-Bok Joo , Jong-Dai Park
IPC分类号： C03C8/08 , C03C8/14 , C03C8/16 , C03C8/24 , C03C3/21 , C03B23/00 , B29C65/16 , H01J9/26
CPC分类号： C03C8/08 , C03C8/04 , C03C8/24 , H01L51/5246 , H01L51/5259
摘要： The present invention relates to a glass frit and a sealing method for an electric element using the same, and more particularly, to a glass frit which provides a good sealing effect to moisture and gas and is processable at low temperatures, and a sealing method for an electric element using the same.
摘要翻译：本发明涉及一种玻璃料和使用其的电气元件的密封方法，更具体地说，涉及一种对湿气和气体具有良好的密封效果并且可在低温下加工的玻璃料，以及用于使用其的电气元件。

6. 发明申请

US20090120012A1 Method for preparing additive for chemical mechanical polishing slurry composition 审中-公开
标题翻译：化学机械抛光浆料组合物添加剂的制备方法
公开(公告)号：US20090120012A1
公开(公告)日：2009-05-14
申请号：US12314714
申请日：2008-12-16
申请人： Jong-Dai Park , Dong-Wan Kim
发明人： Jong-Dai Park , Dong-Wan Kim
IPC分类号： C09K3/14
CPC分类号： B24D3/02 , C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/3212
摘要： Disclosed is a method for preparing an additive solution which can be contained in a chemical mechanical polishing slurry composition used for a semiconductor manufacturing process. The method for preparing an additive solution for a chemical mechanical polishing slurry composition comprises the steps of: preparing an aqueous iron salt solution by admixing an iron salt and cooled water of 5° C. or less; and preparing an oxide containing silicon and iron by admixing and stirring a silicon salt and the aqueous iron salt solution for carrying out a reaction of the silicon salt and the aqueous iron salt solution.
摘要翻译：公开了一种制备添加剂溶液的方法，其可以包含在用于半导体制造过程的化学机械抛光浆料组合物中。制备化学机械抛光浆料组合物添加剂溶液的方法包括以下步骤：通过混合铁盐和5℃或更低的冷却水来制备铁盐水溶液; 并通过混合和搅拌硅盐和铁盐水溶液来制备含硅和铁的氧化物，以进行硅盐和铁盐水溶液的反应。

7. 发明申请

US20050282471A1 Chemical mechanical polishing slurry useful for tunsten/titanium substrate 审中-公开
标题翻译：化学机械抛光浆可用于钍/钛基体
公开(公告)号：US20050282471A1
公开(公告)日：2005-12-22
申请号：US11153624
申请日：2005-06-16
申请人： Jong-Dai Park , Dong-Wan Kim
发明人： Jong-Dai Park , Dong-Wan Kim
IPC分类号： B24B1/00 , B24D3/02 , C08H1/00 , C09G1/02 , C09K3/14 , H01L21/321
CPC分类号： C09K3/1463 , C09G1/02 , C09K3/1409 , H01L21/3212
摘要： Disclosed is a chemical mechanical polishing (CMP) slurry having a superior polishing efficiency as well as being capable of effectively converting a metal layer to be polished into a metal oxide layer. The CMP slurry composition includes an abrasive, an oxidizing agent, an iron-doped colloidal silica, and water. Preferably, the amount of the iron-doped colloidal silica is 0.0001 to 0.5 weight % with respect to the total CMP slurry composition, and the iron-doped colloidal silica is produced by reacting a silica salt with an iron salt in an aqueous solution state. The preferable amount of Si contained in the silica salt is 2 to 10 times of the amount of Fe contained in the iron salt by mole ratio.
摘要翻译：公开了具有优异的抛光效率以及能够有效地将要抛光的金属层转化为金属氧化物层的化学机械抛光（CMP）浆料。 CMP浆料组合物包括研磨剂，氧化剂，掺铁胶体二氧化硅和水。铁掺杂胶体二氧化硅的量优选相对于总CMP浆料组合物为0.0001〜0.5重量％，并且通过使二氧化硅盐与铁盐在水溶液状态下反应来制备掺铁胶体二氧化硅。二氧化硅盐中所含的Si的优选量为铁盐中所含的Fe的摩尔比的2〜10倍。

8. 发明授权

US08241375B1 Method for preparing chemical mechanical polishing slurry composition 有权
标题翻译：化学机械抛光浆料组合物的制备方法
公开(公告)号：US08241375B1
公开(公告)日：2012-08-14
申请号：US13433041
申请日：2012-03-28
申请人： Jong-Dai Park , Dong-Wan Kim
发明人： Jong-Dai Park , Dong-Wan Kim
IPC分类号： B24D3/02 , C09C1/68 , C09K3/14
CPC分类号： B24D3/02 , C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/3212
摘要： A method for preparing a chemical mechanical polishing slurry composition comprises the steps of preparing an aqueous iron salt solution by admixing an iron salt and cooled water of 5° C. or less; preparing an oxide containing silicon and iron as an additive by admixing and stirring a silicon salt and the aqueous iron salt solution for carrying out a reaction of the silicon salt and the aqueous iron salt solution to form an additive solution; and mixing the additive solution with at least one abrasive, at least one oxidizing agent and optionally at least one additional component to form the chemical mechanical polishing slurry composition.
摘要翻译：制备化学机械抛光浆料组合物的方法包括以下步骤：通过混合铁盐和5℃或更低的冷却水来制备铁盐水溶液; 通过混合和搅拌硅盐和铁盐水溶液来制备含有硅和铁的氧化物作为添加剂，以进行硅盐和铁盐水溶液的反应以形成添加剂溶液; 以及将添加剂溶液与至少一种研磨剂，至少一种氧化剂和任选的至少一种另外的组分混合以形成化学机械抛光浆料组合物。

9. 发明授权

US07393474B2 Conductive coating composition for protective film and method for producing coating layer using the same 失效
标题翻译：保护膜用导电性涂料组合物及其制造方法
公开(公告)号：US07393474B2
公开(公告)日：2008-07-01
申请号：US11715349
申请日：2007-03-08
申请人： Jong-Dai Park , Jong-Chul Shin , Ho-Kyu Lee
发明人： Jong-Dai Park , Jong-Chul Shin , Ho-Kyu Lee
IPC分类号： H01B1/00
CPC分类号： H01B1/124
摘要： A conductive coating composition and a method for producing coating layer using the same are disclosed. The conductive coating composition is capable of forming an antistatic coating layer on the protective film surface of display device. The conductive coating composition includes: 1 to 30 wt % of polyethylene dioxythiophene aqueous-dispersed solution; 5 to 15 wt % of water-soluble binder resin; 0.2 to 10 wt % of melamine resin; 6 to 40 wt % of alcohol solvent; 5 to 30 wt % of organic solvent selected from the group consisting of dimethyl sulfoxide, propyleneglycol methylether, N-methylpyrrolidone, ethyl-3-ethoxypropionate, propyleneglycol monomethyletheracetate, butylcarbitol and the mixtures thereof; and 10 to 50 wt % of water. The method for producing the conductive coating layer includes the steps of coating the conductive coating composition on a substrate; and drying the coating composition.
摘要翻译：公开了一种导电涂料组合物及其制备方法。导电性涂料组合物能够在显示装置的保护膜表面上形成抗静电涂层。导电性涂料组合物包括：1〜30重量％的聚乙烯二氧噻吩水分散溶液; 5〜15重量％的水溶性粘合剂树脂; 0.2〜10重量％的三聚氰胺树脂; 6〜40重量％的醇溶剂; 5〜30重量％的选自二甲基亚砜，丙二醇甲基醚，N-甲基吡咯烷酮，3-乙氧基丙酸乙酯，丙二醇单甲醚基乙酸酯，丁基卡必醇及其混合物的有机溶剂; 和10〜50重量％的水。导电性涂层的制造方法包括将导电性涂料组合物涂布在基材上的工序; 并干燥涂料组合物。

10. 发明申请

US20070257235A1 Conductive coating composition for protective film and method for producing coating layer using the same 失效
标题翻译：保护膜用导电性涂料组合物及其制造方法
公开(公告)号：US20070257235A1
公开(公告)日：2007-11-08
申请号：US11715349
申请日：2007-03-08
申请人： Jong-Dai Park , Jong-Chul Shin , Ho-Kyu Lee
发明人： Jong-Dai Park , Jong-Chul Shin , Ho-Kyu Lee
IPC分类号： H01B1/12
CPC分类号： H01B1/124
摘要： A conductive coating composition and a method for producing coating layer using the same are disclosed. The conductive coating composition is capable of forming an antistatic coating layer on the protective film surface of display device. The conductive coating composition includes: 1 to 30 wt % of polyethylene dioxythiophene aqueous-dispersed solution; 5 to 15 wt % of water-soluble binder resin; 0.2 to 10 wt % of melamine resin; 6 to 40 wt % of alcohol solvent; 5 to 30 wt % of organic solvent selected from the group consisting of dimethyl sulfoxide, propyleneglycol methylether, N-methylpyrrolidone, ethyl-3-ethoxypropionate, propyleneglycol monomethyletheracetate, butylcarbitol and the mixtures thereof; and 10 to 50 wt % of water. The method for producing the conductive coating layer includes the steps of coating the conductive coating composition on a substrate; and drying the coating composition.
摘要翻译：公开了一种导电涂料组合物及其制备方法。导电性涂料组合物能够在显示装置的保护膜表面上形成抗静电涂层。导电性涂料组合物包括：1〜30重量％的聚乙烯二氧噻吩水分散溶液; 5〜15重量％的水溶性粘合剂树脂; 0.2〜10重量％的三聚氰胺树脂; 6〜40重量％的醇溶剂; 5〜30重量％的选自二甲基亚砜，丙二醇甲基醚，N-甲基吡咯烷酮，3-乙氧基丙酸乙酯，丙二醇单甲醚基乙酸酯，丁基卡必醇及其混合物的有机溶剂; 和10〜50重量％的水。导电性涂层的制造方法包括将导电性涂料组合物涂布在基材上的工序; 并干燥涂料组合物。

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