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    • 4. 发明申请
    • Microfabrication using replicated patterned topography and self-assembled monolayers
    • 使用复制图案形貌和自组装单层的微加工
    • US20070036951A1
    • 2007-02-15
    • US11200551
    • 2005-08-10
    • Khanh NguyenMatthew FreyHaiyan ZhangJun-Ying Zhang
    • Khanh NguyenMatthew FreyHaiyan ZhangJun-Ying Zhang
    • B05D3/04B05D5/12B32B3/00
    • C23C18/208B82Y30/00C23C18/1608C23C18/31C25D1/10Y10T428/24917
    • A method of selectively and electrolessly depositing a metal onto a substrate having a metallic patterned-nanostructure surface is disclosed. The method includes providing a tool having a patterned-nanostructure surface, the patterned-nanostructure surface having surface regions having a nanostructured surface, replicating the tool patterned-nanostructure surface onto a substrate to form a substrate patterned-nanostructure surface, disposing a metal layer on the substrate patterned-nanostructure surface to form a metallic patterned-nanostructure surface region, forming a self-assembled monolayer on the metallic patterned-nanostructure surface region, exposing the self-assembled monolayer to an electroless plating solution comprising a deposit metal, and depositing electrolessly the deposit metal selectively on the surface regions having a metallic nanostructured surface. Articles formed from this method are also disclosed.
    • 公开了一种选择性地和无电沉积金属到具有金属图案化纳米结构表面的基底上的方法。 该方法包括提供具有图案化纳米结构表面的工具,所述图案化纳米结构表面具有具有纳米结构化表面的表面区域,将工具图案化纳米结构表面复制到衬底上以形成衬底图案化纳米结构表面,将金属层设置在 衬底图案化纳米结构表面以形成金属图案化纳米结构表面区域,在金属图案化纳米结构表面区域上形成自组装单层,将自组装单层暴露于包含沉积金属的化学镀溶液中,并将无电沉积 选择性地在具有金属纳米结构表面的表面区域上沉积金属。 还公开了由该方法形成的制品。