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1. 发明申请

US20120108063A1 BEAM DOSE COMPUTING METHOD AND WRITING METHOD AND RECORD CARRIER BODY AND WRITING APPARATUS 有权
标题翻译：光束剂量计算方法和书写方法和记录载体体系和书写装置
公开(公告)号：US20120108063A1
公开(公告)日：2012-05-03
申请号：US13323986
申请日：2011-12-13
申请人： Keiko EMI , Junichi SUZUKI , Takayuki ABE , Tomohiro IIJIMA , Jun YASHIMA
发明人： Keiko EMI , Junichi SUZUKI , Takayuki ABE , Tomohiro IIJIMA , Jun YASHIMA
IPC分类号： H01L21/306
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31764 , H01J2237/31769
摘要： A beam dose computing method includes dividing a surface area of a target object into include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions to create a map of base doses of the beam in respective of said second regions and to prepare a map of proximity effect correction coefficients in respective of said second regions, using the maps to determine second corrected doses of the beam for proximity effect correction in the third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.
摘要翻译：射束剂量计算方法包括将目标物体的表面积分成包括不同尺寸的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域，确定带电粒子束的第一校正剂量，以便校正第一区域中的雾化效果，确定用于校正由于第二区域中的负载效应而发生的图案线宽度偏差的校正大小值，以在所述第二区域的各自中创建所述光束的基本剂量图，并且准备接近的图在所述第二区域的各个区域中的效应校正系数，使用该图确定在第三区域中用于邻近效应校正的光束的第二校正剂量，并且使用第一和第二校正剂量来确定表面上每个位置处的实际光束剂量的所述物体。

2. 发明申请

US20080184190A1 METHOD FOR RESIZING PATTERN TO BE WRITTEN BY LITHOGRAPHY TECHNIQUE, AND CHARGED PARTICLE BEAM WRITING METHOD 有权
标题翻译：用于通过算术技术来记录图案的方法和充电的粒子束写法
公开(公告)号：US20080184190A1
公开(公告)日：2008-07-31
申请号：US11851176
申请日：2007-09-06
申请人： Jun YASHIMA , Junichi Suzuki , Takayuki Abe
发明人： Jun YASHIMA , Junichi Suzuki , Takayuki Abe
IPC分类号： G06F17/50
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026
摘要： A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.
摘要翻译：通过使用光刻技术来调整要写入的图案的尺寸的方法包括：对通过将目标工件的写入区域进行实际分割而形成的每个小区域，计算用于校正由加载效应引起的尺寸误差的图案的第一维度校正量基于每个小区域的面积密度预定尺寸的网格，根据要写入每个小区域的图案的线宽度尺寸来计算第二维度校正量，通过使用来校正第一维度校正量第二维度校正量，并且通过使用校正的第一维度校正量来调整图案的线宽度尺寸，并输出调整大小的结果。

3. 发明申请

US20090200488A1 CHARGED PARTICLE BEAM WRITING APPARATUS, AND APPARATUS AND METHOD FOR CORRECTING DIMENSION ERROR OF PATTERN 有权
标题翻译：充电颗粒光束写字装置，以及校正图形尺寸误差的装置和方法
公开(公告)号：US20090200488A1
公开(公告)日：2009-08-13
申请号：US12369252
申请日：2009-02-11
申请人： Jun YASHIMA , Takayuki Abe
发明人： Jun YASHIMA , Takayuki Abe
IPC分类号： A61N5/00 , G06F19/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： A charged particle beam writing apparatus includes a first area density calculation unit configured to calculate a first area density occupied by a pattern of a first dimension in a predetermined region, a first dimension error calculation unit configured to calculate a first dimension error caused by a loading effect, using the first area density, a first dimension calculation unit configured to calculate a second dimension of a pattern obtained by correcting the first dimension error of the first dimension, a second area density calculation unit configured to calculate a second area density occupied by the pattern of the second dimension in the predetermined region, a second dimension error calculation unit configured to calculate a second dimension error caused by the loading effect, using the second area density, a second dimension calculation unit configured to calculate a third dimension by adding the second dimension error to the second dimension, a judgment unit configured to judge whether a difference between the first dimension and the third dimension is within a predetermined range or not, and a writing unit configured to write the pattern of the second dimension in which the difference is within the predetermined range, onto a target workpiece by using a charged particle beam.
摘要翻译：带电粒子束写入装置包括：第一区域密度计算单元，被配置为计算由预定区域中的第一维度的图案占据的第一区域密度;第一维度误差计算单元，被配置为计算由加载引起的第一维度误差效果，使用第一区域密度，第一维度计算单元，被配置为计算通过校正第一维度的第一维度误差而获得的图案的第二维度;第二区域密度计算单元，被配置为计算由第一区域密度占据的第二区域密度第二维度误差计算单元，被配置为使用第二区域密度计算由加载效应引起的第二维度误差;第二维度计算单元，被配置为通过将第二维度的第二维度加到第二维度中，尺寸误差到第二维度，判断单元被配置为j 第一尺寸和第三尺寸之间的差是否在预定范围内;以及写入单元，其被配置为将差异在预定范围内的第二尺寸的图案写入到目标工件上，使用带电粒子束。

4. 发明申请

US20120104286A1 METHOD FOR RESIZING PATTERN TO BE WRITTEN BY LITHOGRAPHY TECHNIQUE, AND CHARGED PARTICLE BEAM WRITING METHOD 有权
公开(公告)号：US20120104286A1
公开(公告)日：2012-05-03
申请号：US13349002
申请日：2012-01-12
申请人： Jun YASHIMA , Junichi SUZUKI , Takayuki ABE
发明人： Jun YASHIMA , Junichi SUZUKI , Takayuki ABE
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026
摘要： A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.

5. 发明申请

US20120292536A1 CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD 有权
标题翻译：充电颗粒光束写字装置和充电颗粒光束写字方法
公开(公告)号：US20120292536A1
公开(公告)日：2012-11-22
申请号：US13465221
申请日：2012-05-07
申请人： Jun YASHIMA , Akihito Anpo
发明人： Jun YASHIMA , Akihito Anpo
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/304 , H01J2237/31762 , H01J2237/31764 , H01J2237/31776
摘要： A charged particle beam writing apparatus includes a unit to divide a chip region into first data processing blocks, a unit to, in each block, extract a cell whose reference position is located in the block concerned from cells each including at least one figure pattern, a unit to, for each block, generate a first frame that surrounds the block concerned and the cell extracted, a unit to, for each first frame, divide the inside of the first frame concerned into mesh regions and calculate an area density of a figure pattern in each mesh, a unit to combine area densities of mesh regions which are overlapped with each other and between different first frames, a unit to calculate a dose of beam by using the area density, and a unit to write a pattern on a target workpiece by irradiating the beam of the dose calculated.
摘要翻译：带电粒子束写入装置包括：将芯片区域划分为第一数据处理块的单元，在每个块中单元提取其参考位置位于相关块中的小区，每个小区包括至少一个图形模式，对于每个块，单元产生围绕所涉及的块并且提取的单元的第一帧，对于每个第一帧的单元，将有关的第一帧的内部划分成网格区域，并且计算图形的面积密度每个网格中的图案，用于组合彼此重叠并且在不同第一帧之间的网格区域的区域密度的单位，通过使用面积密度来计算光束的剂量的单元以及在目标上写入图案的单元工件通过照射光束的剂量计算。

6. 发明申请

US20100237253A1 CHARGED PARTICLE BEAM DRAWING METHOD AND APPARATUS 有权
标题翻译：充电颗粒光束绘图方法和装置
公开(公告)号：US20100237253A1
公开(公告)日：2010-09-23
申请号：US12725676
申请日：2010-03-17
申请人： Jun YASHIMA
发明人： Jun YASHIMA
IPC分类号： H01J37/302 , H01J37/20 , H01J37/147
CPC分类号： H01J37/3023 , B82Y10/00 , B82Y40/00 , G03F1/20 , H01J37/3026 , H01J37/3174
摘要： A charged particle beam drawing apparatus includes a charged particle beam gun, a first forming aperture member having an opening, wherein a charged particle beam emitted from the charged particle beam gun is passed through the opening of the first forming aperture member, a second forming aperture member having an opening, wherein the charged particle beam passed through the first forming aperture member is passed through the opening of the second forming aperture member, a movable stage for supporting a workpiece, wherein patterns corresponding to figures in a drawing data are drawn on the workpiece by the charged particle beam passed through the second forming aperture member, and a drawing data correcting process portion for moving the figures in the drawing data on the basis of positions in the opening of the second forming aperture, where the charged particle beam for drawing the patterns is passed through.
摘要翻译：带电粒子束描绘装置包括带电粒子束枪，具有开口的第一形成孔径构件，其中从带电粒子束枪发射的带电粒子束穿过第一成形孔构件的开口，第二形成孔具有开口的构件，其中穿过第一成形孔构件的带电粒子束穿过第二成形孔构件的开口，用于支撑工件的可移动台，其中对应于图形数据中的图形的图案被绘制在通过穿过第二成形孔径构件的带电粒子束的工件以及用于基于第二成形孔的开口中的位置移动图形数据中的图形的绘图数据校正处理部分，其中用于绘制的带电粒子束图案通过。

7. 发明申请

US20110291029A1 CHARGED PARTICLE BEAM DRAWING APPARATUS AND CONTROL METHOD THEREOF 有权
标题翻译：充电颗粒光束绘图装置及其控制方法
公开(公告)号：US20110291029A1
公开(公告)日：2011-12-01
申请号：US13111311
申请日：2011-05-19
申请人： Jun YASHIMA
发明人： Jun YASHIMA
IPC分类号： B01J19/08
CPC分类号： G03F1/78 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： In a charged particle beam drawing apparatus, if at least one of calculating portions is free and at least one memory includes a free portion, a report that a next process can be additionally started by using at least one free calculating portion and the free portion of the memory, is transferred from a daemon to a writing control unit, and the next process is additionally started by the daemon on the basis of a start request transferred from the writing control unit to the daemon. If there is a possibility of a shortage of the calculating portions and the memory, and if a start request for starting a next process is transferred from the writing control unit to the daemon, the start request for starting the next process is refused by the daemon.
摘要翻译：在带电粒子束绘制装置中，如果计算部分中的至少一个是空闲的，并且至少一个存储器包括空闲部分，则可以通过使用至少一个自由计算部分和自由部分存储器从守护进程传送到写入控制单元，并且由后台程序根据从写入控制单元传送到守护进程的启动请求另外启动下一个进程。如果存在计算部分和存储器不足的可能性，并且如果开始下一个处理的开始请求从写入控制单元传送到守护程序，则启动下一个进程的开始请求被守护进程拒绝。

8. 发明申请

US20110046762A1 CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS OF PROCESSING DATA FOR CHARGED PARTICLE BEAM WRITING 有权
标题翻译：充电颗粒光束装置，充电颗粒光束写入方法和装载数据的装置数据的装置
公开(公告)号：US20110046762A1
公开(公告)日：2011-02-24
申请号：US12850928
申请日：2010-08-05
申请人： Jun YASHIMA
发明人： Jun YASHIMA
IPC分类号： G06F19/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026
摘要： There is provided a charged particle beam writing apparatus in which data processing is optimized by automatically dividing process regions on which parallel distributed processing is performed. A charged particle beam writing apparatus includes: a data storage unit to which layout data defining a plurality of figure patterns in a chip region is input and which stores the layout data; a dividing unit configured to divide the chip region into a plurality of process regions; a shot data generating unit configured to perform distributed processing on pattern data in the process regions using a plurality of computing processors so as to convert the pattern data to shot data for shooting a charged particle beam onto a target object; a determining and instructing unit configured to compare an amount of output data from each of the computing processors with a predetermined threshold, and when the amount of the output data is larger than the threshold, instruct corresponding one of the computing processors to divide corresponding one of the process regions and continue the data processing; and a writing unit configured to write on the target object using the shot data.
摘要翻译：提供了一种带电粒子束写入装置，其中通过自动划分执行并行分布式处理的处理区域来优化数据处理。带电粒子束写入装置包括：数据存储单元，其输入定义芯片区域中的多个图形图案的布局数据，并存储布局数据; 分割单元，被配置为将所述芯片区域划分为多个处理区域; 镜头数据生成单元，被配置为使用多个计算处理器对所述处理区域中的图案数据进行分散处理，以将所述图案数据转换为用于将带电粒子束拍摄到目标对象的拍摄数据; 确定和指示单元，被配置为将来自每个计算处理器的输出数据的量与预定阈值进行比较，并且当输出数据的量大于阈值时，指示对应的一个计算处理器将进程区域并继续进行数据处理; 以及写入单元，其被配置为使用所述拍摄数据对所述目标对象进行写入。

9. 发明申请

US20120126145A1 CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD 有权
标题翻译：充电颗粒光束写字装置和充电颗粒光束写字方法
公开(公告)号：US20120126145A1
公开(公告)日：2012-05-24
申请号：US13288530
申请日：2011-11-03
申请人： Jun YASHIMA
发明人： Jun YASHIMA
IPC分类号： B01J19/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31762
摘要： A charged particle beam writing apparatus includes a storage unit configured to store writing data in which there are defined a plurality of figures and resizing information indicating, with respect to each of the plurality of figures, a resizing status whether or not to perform resizing and a resizing direction used when performing resizing, a judgment determination unit configured to input the writing data and judge, with respect to each of the plurality of figures, the resizing status whether or not to perform resizing and the resizing direction used when performing resizing, a resize processing unit configured to resize, with respect to each of the plurality of figures, a dimension of a figure concerned in a judged resizing direction when it is judged to perform resizing, and a writing unit configured to write a pattern onto a target workpiece with using a resized figure and a charged particle beam.
摘要翻译：带电粒子束写入装置包括存储单元，其被配置为存储其中定义了多个图形的写入数据，并且调整大小信息，其中，对于多个图中的每一个，调整大小信息是否进行调整大小的调整大小状态，以及判断确定单元，被配置为输入写入数据，并且针对多个图中的每一个判断调整大小状态是否进行调整大小和调整大小时使用的调整大小方向;调整大小处理单元，被配置为当判断为进行调整大小时，相对于所述多个图中的每一个调整所判定的大小调整方向上的图形的尺寸;以及写入单元，被配置为使用图案将图案写入到目标工件上调整大小的图和带电粒子束。

10. 发明申请

US20120001097A1 CHARGED PARTICLE BEAM DRAWING APPARATUS AND CONTROL METHOD THEREOF 有权
标题翻译：充电颗粒光束绘图装置及其控制方法
公开(公告)号：US20120001097A1
公开(公告)日：2012-01-05
申请号：US13163111
申请日：2011-06-17
申请人： Jun YASHIMA , Yasuo Kato , Akihito Anpo
发明人： Jun YASHIMA , Yasuo Kato , Akihito Anpo
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31771 , H01J2237/31776
摘要： A charged particle beam drawing apparatus applies a predetermined dose of a charged particle beam for drawing patterns corresponding to figures included in a drawing data, in a whole of a drawing area of a workpiece, before a result of calculation of a fogging effect correction dose is obtained, wherein a proximity effect correction dose is incorporated in the predetermined dose, and the fogging effect correction dose is not incorporated in the predetermined dose, then, the charged particle beam drawing apparatus applies a predetermined dose of the charged particle beam for drawing the patterns which overlap the patterns drawn before the result of calculation of the fogging effect correction dose is obtained, in the whole of the drawing area of the workpiece, after the calculation of the fogging effect correction dose, wherein the proximity effect correction dose and the fogging effect correction dose are incorporated in the predetermined dose.
摘要翻译：带电粒子束描绘装置在雾化效应校正剂量的计算结果是在工件的整个绘图区域中之前，将预定剂量的带电粒子束用于绘制对应于包括在绘图数据中的图形的图案得到的，其中以预定剂量并入接近效应校正剂量，并且雾化效应校正剂量不包含在预定剂量中，然后，带电粒子束描绘装置施加预定剂量的带电粒子束以绘制图案在计算雾化效果校正剂量之前，在整个绘图区域中获得在雾化效果校正剂量的计算结果之前绘制的图案重叠，其中邻近效应校正剂量和起雾效果校正剂量以预定剂量掺入。

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