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    • 8. 发明授权
    • Non-destructive read ferroelectric based memory circuit
    • 无损读取基于铁电的存储电路
    • US5434811A
    • 1995-07-18
    • US356661
    • 1989-05-24
    • Joseph T. Evans, Jr.Richard H. Womack
    • Joseph T. Evans, Jr.Richard H. Womack
    • G11C14/00G11C11/22
    • G11C14/0072G11C14/00
    • A non-volatile memory circuit comprises cross-coupled transistors which drive first and second nodes to differential voltage states. First and second ferroelectric capacitors are connected respectively between the first and second nodes and a common node. The ferroelectric capacitors are set to opposite polarization states as a function of the voltage states at the first and second differential nodes. When power is lost from the circuit, the last data state in the circuit is stored in the ferroelectric capacitors. When power is restored to the memory circuit, the ferroelectric capacitors unbalance the differential nodes to such an extent to cause the circuit to become reestablished to the last data state stored in the circuit. An input signal can be received at one of the nodes through an input transistor to set the state of the memory circuit and the state of the circuit can be read from one of the nodes through an output transistor. The input and output transistors can be the same device.
    • 非易失性存储器电路包括将第一和第二节点驱动到差分电压状态的交叉耦合晶体管。 第一和第二铁电电容器分别连接在第一和第二节点和公共节点之间。 铁电电容器被设置为与第一和第二差分节点处的电压状态的函数相反的极化状态。 当电路断电时,电路中的最后一个数据状态被存储在铁电电容器中。 当电源恢复到存储器电路时,铁电电容器将差分节点的平衡不平衡到使得电路重新建立到存储在电路中的最后数据状态的程度。 可以通过输入晶体管在一个节点处接收输入信号以设置存储器电路的状态,并且可以通过输出晶体管从节点之一读取电路的状态。 输入和输出晶体管可以是相同的器件。
    • 9. 发明授权
    • Static ferrolectric memory transistor having improved data retention
    • 静态铁电存储晶体管具有改进的数据保留
    • US06225654B1
    • 2001-05-01
    • US08640572
    • 1996-05-01
    • Joseph T. Evans, Jr.William L. WarrenBruce A. Tuttle
    • Joseph T. Evans, Jr.William L. WarrenBruce A. Tuttle
    • B05D512
    • H01L29/516G11C11/223
    • An improved ferroelectric FET structure in which the ferroelectric layer is doped to reduce retention loss. A ferroelectric FET according to the present invention includes a semiconductor layer having first and second contacts thereon, the first and second contacts being separated from one another. The ferroelectric FET also includes a bottom electrode and a ferroelectric layer which is sandwiched between the semiconductor layer and the bottom electrode. The ferroelectric layer is constructed from a perovskite structure of the chemical composition ABO3 wherein the B site comprises first and second elements and a dopant element that has an oxidation state greater than +4 in sufficient concentration to impede shifts in the resistance measured between the first and second contacts with time. The ferroelectric FET structure preferably comprises Pb in the A-site. The first and second elements are preferably Zr and Ti, respectively. The preferred B-site dopants are Niobium, Tantalum, and Tungsten at concentrations between 1% and 8%.
    • 改进的铁电FET结构,其中掺杂铁电层以减少保留损耗。 根据本发明的铁电FET包括其上具有第一和第二触点的半导体层,第一和第二触点彼此分离。 铁电FET还包括夹在半导体层和底部电极之间的底部电极和铁电体层。 铁电层由化学组成ABO 3的钙钛矿结构构成,其中B位置包含第一和第二元素以及具有足够浓度的大于+4的氧化态的掺杂剂元素,以阻止在第一和第二元素之间测量的电阻的偏移 第二次接触时间。 铁电FET结构优选在A位置包含Pb。 第一和第二元素分别优选为Zr和Ti。 优选的B位掺杂剂是浓度在1%和8%之间的铌,钽和钨。
    • 10. 发明授权
    • Ferroelectric based memory devices utilizing low Curie point ferroelectrics and encapsulation
    • 采用低居里点铁电体和封装的铁电存储器件
    • US06194751B1
    • 2001-02-27
    • US09015373
    • 1998-01-29
    • Joseph T. Evans, Jr.
    • Joseph T. Evans, Jr.
    • H01L2976
    • H01L27/11502H01L27/11507H01L28/55H01L28/75H01L29/516
    • A ferroelectric memory cell for storing information. The information is stored in the remnant polarization of a ferroelectric dielectric layer by setting the direction of the remnant polarization. The ferroelectric memory cell is designed to store the information at a temperature less than a first temperature. The memory cell includes top and bottom contacts that sandwich the dielectric layer which includes a ferroelectric material having a Curie point greater than the first temperature and less than 400° C. The dielectric layer is encapsulated in an oxygen impermeable material such that the encapsulating layer prevents oxygen from entering or leaving the dielectric layer. One of the contacts typically includes a platinum electrode. The other contact may include a similar electrode or a semiconductor layer having electrodes spaced apart thereon.
    • 用于存储信息的铁电存储单元。 通过设定残留极化的方向,将信息存储在铁电介质层的剩余极化中。 铁电存储器单元被设计成在小于第一温度的温度下存储信息。 存储单元包括夹住电介质层的顶部和底部触点,该电介质层包括具有大于第一温度且小于400℃的居里点的铁电材料。介电层被封装在不透氧材料中,使得封装层防止 氧气进入或离开电介质层。 触点之一通常包括铂电极。 另一个接触可以包括具有间隔开的电极的类似电极或半导体层。