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    • 4. 发明授权
    • Health care server and method of operating the same
    • 医疗服务器和操作方法相同
    • US08847767B2
    • 2014-09-30
    • US13550811
    • 2012-07-17
    • Joon-Ho LimChan Yong ParkSoo Jun Park
    • Joon-Ho LimChan Yong ParkSoo Jun Park
    • G08B23/00
    • G06F19/3418A61B5/0002A61B5/746G06F19/00G08B21/04G16H50/20
    • The inventive concept relates to a health care system, and more particularly, to a health care server of the health care system and a method of operating the same. The health care server includes a symptom collection module collecting clinical information of patient from a hospital server and health information of patient from an individual health record server; an alarm and reaction rule management module generating an alarm rule on the basis of the clinical information and the health information; and an alarm generation module monitoring the health information or the clinical information and generating an alarm when the monitored health information or the clinical information corresponding to the alarm rule. The health care server can provide a different alarm service to a patient having a different health state with reference to clinical information and health information of each patient.
    • 本发明的概念涉及医疗保健系统,更具体地,涉及医疗保健系统的保健服务器及其操作方法。 保健服务器包括从医院服务器收集患者的临床信息的症状收集模块和来自个人健康记录服务器的患者的健康信息; 警报和反应规则管理模块,根据临床信息和健康信息生成警报规则; 监视健康信息或临床信息的报警发生模块,并在监视到的健康信息或与该告警规则对应的临床信息时产生报警。 参考每个患者的临床信息和健康信息,医疗保健服务器可以向具有不同健康状态的患者提供不同的警报服务。
    • 7. 发明授权
    • Substrate-processing apparatus and substrate-processing method for selectively inserting diffusion plates
    • 用于选择性地插入扩散板的基板处理装置和基板处理方法
    • US08771418B2
    • 2014-07-08
    • US13382812
    • 2010-07-02
    • Sung Tae JeChan Yong ParkKyoung Hun Kim
    • Sung Tae JeChan Yong ParkKyoung Hun Kim
    • C23C16/455C23F1/00H01L21/306C23C16/06C23C16/22
    • C23C16/45565
    • According to one embodiment of the present invention, a substrate-processing apparatus comprises: a lower chamber with an open top; an upper chamber which covers the top of the lower chamber, and which cooperates with the lower chamber to form an internal space for substrate-processing; a shower head arranged in a lower portion of the upper chamber to supply reaction gas to the internal space, and forming a buffer space between the shower head and the upper chamber; a gas supply port formed in the upper chamber to supply reaction gas to the buffer space; and a diffusion unit arranged in the buffer space to diffuse the reaction gas supplied through the gas supply port. The diffusion unit includes: a plurality of diffusion areas which are blocked from each other, in order to enable the reaction gas to be diffused therein; a plurality of diffusion holes for placing the gas supply port and the diffusion areas in communication; and one or more diffusion plates, the shapes of which correspond to the shapes of the diffusion areas, and which are selectively inserted into the respective diffusion areas.
    • 根据本发明的一个实施例,一种基板处理装置包括:具有开口顶部的下室; 上室,其覆盖下室的顶部,并与下腔室配合以形成用于衬底处理的内部空间; 淋浴头,其布置在所述上​​部腔室的下部,以将反应气体供应到所述内部空间;以及在所述淋浴喷头和所述上部腔室之间形成缓冲空间; 形成在上部室中的气体供给口,用于向缓冲空间供给反应气体; 以及布置在所述缓冲空间中的扩散单元,用于扩散通过所述气体供给口供给的反应气体。 扩散单元包括:多个彼此被阻挡的扩散区域,以使反应气体能够在其中扩散; 多个用于将气体供给口和扩散区域连通的扩散孔; 以及一个或多个扩散板,其形状对应于扩散区域的形状,并且被选择性地插入到相应的扩散区域中。
    • 8. 发明申请
    • SUBSTRATE-PROCESSING APPARATUS AND SUBSTRATE-PROCESSING METHOD FOR SELECTIVELY INSERTING DIFFUSION PLATES
    • 用于选择性插入扩散板的基板处理装置和基板处理方法
    • US20120135145A1
    • 2012-05-31
    • US13382812
    • 2010-07-02
    • Sung Tae JeChan Yong ParkKyoung Hun Kim
    • Sung Tae JeChan Yong ParkKyoung Hun Kim
    • C23C16/455
    • C23C16/45565
    • According to one embodiment of the present invention, a substrate-processing apparatus comprises: a lower chamber with an open top; an upper chamber which covers the top of the lower chamber, and which cooperates with the lower chamber to form an internal space for substrate-processing; a shower head arranged in a lower portion of the upper chamber to supply reaction gas to the internal space, and forming a buffer space between the shower head and the upper chamber; a gas supply port formed in the upper chamber to supply reaction gas to the buffer space; and a diffusion unit arranged in the buffer space to diffuse the reaction gas supplied through the gas supply port. The diffusion unit includes: a plurality of diffusion areas which are blocked from each other, in order to enable the reaction gas to be diffused therein; a plurality of diffusion holes for placing the gas supply port and the diffusion areas in communication; and one or more diffusion plates, the shapes of which correspond to the shapes of the diffusion areas, and which are selectively inserted into the respective diffusion areas.
    • 根据本发明的一个实施例,一种基板处理装置包括:具有开口顶部的下室; 上室,其覆盖下室的顶部,并与下腔室配合以形成用于衬底处理的内部空间; 淋浴头,其布置在所述上​​部腔室的下部,以将反应气体供应到所述内部空间;以及在所述淋浴喷头和所述上部腔室之间形成缓冲空间; 形成在上部室中的气体供给口,用于向缓冲空间供给反应气体; 以及布置在所述缓冲空间中的扩散单元,用于扩散通过所述气体供给口供给的反应气体。 扩散单元包括:多个彼此被阻挡的扩散区域,以使反应气体能够在其中扩散; 多个用于将气体供给口和扩散区域连通的扩散孔; 以及一个或多个扩散板,其形状对应于扩散区域的形状,并且被选择性地插入到相应的扩散区域中。