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1. 发明授权

US09311834B2 Display module including transparent display panel and display system including the display module 有权
标题翻译：显示模块包括透明显示面板和显示系统，包括显示模块
公开(公告)号：US09311834B2
公开(公告)日：2016-04-12
申请号：US13278504
申请日：2011-10-21
申请人： Joo-yeon Lee , Sang Chul Lee , Jong Seo Lee , Se Yong Kim
发明人： Joo-yeon Lee , Sang Chul Lee , Jong Seo Lee , Se Yong Kim
IPC分类号： G09F9/35 , A47F3/00 , G07F9/02 , G06F1/16 , G07F11/00 , G07F9/10 , A47F3/04 , G09F23/00 , G09F13/04 , G09F13/12 , G02F1/1333 , G09F27/00
CPC分类号： G06F3/041 , A47F3/001 , A47F3/0404 , A47F3/043 , A47F3/0434 , A47F11/06 , G02F2001/133388 , G06F1/1626 , G06F1/1637 , G06F1/1647 , G07F9/023 , G07F9/105 , G07F11/00 , G09F9/35 , G09F13/0413 , G09F13/12 , G09F23/0058 , G09F23/04 , G09F23/065 , G09F27/00 , G09F2023/0033 , G09F2027/001 , G09G2380/06 , G09G2380/16
摘要： Disclosed is a display module including a transparent display panel and a frame to fix a side of the transparent display panel, wherein the frame has a communication unit to receive data from the outside, a controller to process the received data and to output a drive command corresponding to the processed data and a display drive unit to drive the transparent display panel in response to the drive command from the controller. A display system includes a system body and a display module detachably mounted in the system body.
摘要翻译：公开了一种显示模块，包括透明显示面板和用于固定透明显示面板侧面的框架，其中框架具有用于从外部接收数据的通信单元，控制器，用于处理接收到的数据并输出驱动命令对应于所处理的数据;以及显示驱动单元，用于响应于来自控制器的驱动命令来驱动透明显示面板。显示系统包括系统主体和可拆卸地安装在系统主体中的显示模块。

2. 发明申请

US20090217871A1 THIN FILM DEPOSITION APPARATUS AND METHOD OF MAINTAINING THE SAME 有权
标题翻译：薄膜沉积装置及其保持方法
公开(公告)号：US20090217871A1
公开(公告)日：2009-09-03
申请号：US12393377
申请日：2009-02-26
申请人： Se Yong Kim , Woo Chan Kim , Dong Rak Jung
发明人： Se Yong Kim , Woo Chan Kim , Dong Rak Jung
IPC分类号： B05C11/00 , C23C16/54 , G01B11/26
CPC分类号： C23C14/22 , C23C16/44
摘要： A thin film deposition apparatus and a method of maintaining the same are disclosed. In one embodiment, a thin film deposition apparatus includes: a chamber including a removable chamber cover; one or more reactors housed in the chamber; a chamber cover lifting device connected to the chamber cover. The chamber cover lifting device is configured to move the chamber cover vertically between a lower position and an upper position. The apparatus further includes a level sensing device configured to detect whether the chamber cover is level, and a level maintaining device configured to adjust the chamber cover if the chamber cover is not level. This configuration maintains the chamber cover to be level as a condition for further vertical movement of the chamber cover.
摘要翻译：公开了一种薄膜沉积装置及其保持方法。在一个实施例中，薄膜沉积设备包括：包括可拆卸室盖的室; 容纳在室中的一个或多个反应器; 连接到室盖的室盖提升装置。室盖提升装置构造成在下位置和上位置之间垂直移动室盖。该装置还包括液位感测装置，其被配置为检测腔室盖是否水平;以及水平维持装置，其被配置为如果腔室盖不平坦则调节腔室盖。这种构造保持室盖被平坦化，作为室盖的进一步垂直移动的条件。

3. 发明授权

US08273178B2 Thin film deposition apparatus and method of maintaining the same 有权
标题翻译：薄膜沉积装置及其保持方法
公开(公告)号：US08273178B2
公开(公告)日：2012-09-25
申请号：US12393377
申请日：2009-02-26
申请人： Se Yong Kim , Woo Chan Kim , Dong Rak Jung
发明人： Se Yong Kim , Woo Chan Kim , Dong Rak Jung
IPC分类号： C23C16/44 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： C23C14/22 , C23C16/44
摘要： A thin film deposition apparatus and a method of maintaining the same are disclosed. In one embodiment, a thin film deposition apparatus includes: a chamber including a removable chamber cover; one or more reactors housed in the chamber; a chamber cover lifting device connected to the chamber cover. The chamber cover lifting device is configured to move the chamber cover vertically between a lower position and an upper position. The apparatus further includes a level sensing device configured to detect whether the chamber cover is level, and a level maintaining device configured to adjust the chamber cover if the chamber cover is not level. This configuration maintains the chamber cover to be level as a condition for further vertical movement of the chamber cover.
摘要翻译：公开了一种薄膜沉积装置及其保持方法。在一个实施例中，薄膜沉积设备包括：包括可移除室盖的室; 容纳在室中的一个或多个反应器; 连接到室盖的室盖提升装置。室盖提升装置构造成在下位置和上位置之间垂直移动室盖。所述装置还包括液位感测装置，其被配置为检测所述腔室盖是否水平;以及水平维持装置，其被配置为如果所述腔室盖不是水平面则调节所述腔室盖。这种构造保持室盖被平坦化，作为室盖的进一步垂直移动的条件。

4. 发明申请

US20100089320A1 PLASMA PROCESSING MEMBER, DEPOSITION APPARATUS INCLUDING THE SAME, AND DEPOSITING METHOD USING THE SAME 有权
标题翻译：等离子体处理构件，包括其的沉积装置和使用其的沉积方法
公开(公告)号：US20100089320A1
公开(公告)日：2010-04-15
申请号：US12577885
申请日：2009-10-13
申请人： Ki Jong KIM , Hyun Kyu Cho , Jin Su Lee , Se Yong Kim
发明人： Ki Jong KIM , Hyun Kyu Cho , Jin Su Lee , Se Yong Kim
IPC分类号： C23C16/513
CPC分类号： C23C16/45542 , C23C16/45551 , C23C16/5096 , H01J37/32009 , H01J37/32091 , H01J37/32146 , H01J37/3244 , H01J37/32568 , H01J37/32733 , H01J2237/332
摘要： A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reaction spaces, a plurality of plasma electrodes respectively disposed in the reaction spaces, a first plasma processor connected to at least two plasma electrodes, and a first plasma power source connected to the first plasma processor. The first plasma processor may include a plasma distributor or a plasma splitter.
摘要翻译：根据本发明的示例性实施例的沉积设备包括多个反应空间，分别设置在反应空间中的多个等离子体电极，连接到至少两个等离子体电极的第一等离子体处理器和连接到第一等离子体电源的第一等离子体电源到第一等离子体处理器。第一等离子体处理器可以包括等离子体分配器或等离子体分离器。

5. 发明授权

US09371583B2 Plasma processing member, deposition apparatus including the same, and depositing method using the same 有权
标题翻译：等离子体处理构件，包括该等离子体处理构件的沉积装置以及使用其的沉积方法
公开(公告)号：US09371583B2
公开(公告)日：2016-06-21
申请号：US12577885
申请日：2009-10-13
申请人： Ki Jong Kim , Hyun Kyu Cho , Jin Su Lee , Se Yong Kim
发明人： Ki Jong Kim , Hyun Kyu Cho , Jin Su Lee , Se Yong Kim
IPC分类号： C23C16/00 , C23C16/455 , C23C16/509 , H01J37/32
CPC分类号： C23C16/45542 , C23C16/45551 , C23C16/5096 , H01J37/32009 , H01J37/32091 , H01J37/32146 , H01J37/3244 , H01J37/32568 , H01J37/32733 , H01J2237/332
摘要： A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reaction spaces, a plurality of plasma electrodes respectively disposed in the reaction spaces, a first plasma processor connected to at least two plasma electrodes, and a first plasma power source connected to the first plasma processor. The first plasma processor may include a plasma distributor or a plasma splitter.
摘要翻译：根据本发明的示例性实施例的沉积设备包括多个反应空间，分别设置在反应空间中的多个等离子体电极，连接到至少两个等离子体电极的第一等离子体处理器和连接到第一等离子体电源的第一等离子体电源到第一等离子体处理器。第一等离子体处理器可以包括等离子体分配器或等离子体分离器。

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