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1. 发明申请

US20090023254A1 METHOD OF FORMING INORGANIC INSULATING LAYER AND METHOD OF FABRICATING ARRAY SUBSTRATE FOR DISPLAY DEVICE USING THE SAME 有权
标题翻译：形成无机绝缘层的方法以及使用其制造用于显示装置的阵列基板的方法
公开(公告)号：US20090023254A1
公开(公告)日：2009-01-22
申请号：US11967660
申请日：2007-12-31
申请人： Joo-Soo Lim , Hong-Sik Kim , Hee-Young Kwack , Hyun-Seok Hong , Byung-Chul Ahn , Byoung-Ho Lim
发明人： Joo-Soo Lim , Hong-Sik Kim , Hee-Young Kwack , Hyun-Seok Hong , Byung-Chul Ahn , Byoung-Ho Lim
IPC分类号： H01L21/336 , H01L21/469
CPC分类号： C23C14/0652
摘要： A method of forming an inorganic insulating layer on a substrate comprises supplying a mixed gas between the substrate and a target, and generating a plasma between the substrate and the target. The target comprises a silicon-based material. The method further comprises depositing a plurality of ions from the plasma on the substrate.
摘要翻译：在衬底上形成无机绝缘层的方法包括在衬底和靶之间提供混合气体，以及在衬底和靶之间产生等离子体。目标包括硅基材料。所述方法还包括在所述衬底上沉积来自所述等离子体的多个离子。

2. 发明授权

US08377265B2 Method of forming inorganic insulating layer and method of fabricating array substrate for display device using the same 有权
标题翻译：无机绝缘层的形成方法及使用其的显示装置的阵列基板的制造方法
公开(公告)号：US08377265B2
公开(公告)日：2013-02-19
申请号：US11967660
申请日：2007-12-31
申请人： Joo-Soo Lim , Hong-Sik Kim , Hee-Young Kwack , Hyun-Seok Hong , Byung-Chul Ahn , Byoung-Ho Lim
发明人： Joo-Soo Lim , Hong-Sik Kim , Hee-Young Kwack , Hyun-Seok Hong , Byung-Chul Ahn , Byoung-Ho Lim
IPC分类号： C23C14/35
CPC分类号： C23C14/0652
摘要： A method of forming an inorganic insulating layer on a substrate comprises supplying a mixed gas between the substrate and a target, and generating a plasma between the substrate and the target. The target comprises a silicon-based material. The method further comprises depositing a plurality of ions from the plasma on the substrate.
摘要翻译：在衬底上形成无机绝缘层的方法包括在衬底和靶之间提供混合气体，以及在衬底和靶之间产生等离子体。目标包括硅基材料。所述方法还包括在所述衬底上沉积来自所述等离子体的多个离子。

3. 发明授权

US08456601B2 Array substrate for liquid crystal display device and method of manufacturing the same 有权
标题翻译：液晶显示装置用阵列基板及其制造方法
公开(公告)号：US08456601B2
公开(公告)日：2013-06-04
申请号：US13193384
申请日：2011-07-28
申请人： Joo-Soo Lim , Hyo-Uk Kim , Hee-Young Kwack , Hyun-Seok Hong , Byung-Chul Ahn , Byoung-Ho Lim
发明人： Joo-Soo Lim , Hyo-Uk Kim , Hee-Young Kwack , Hyun-Seok Hong , Byung-Chul Ahn , Byoung-Ho Lim
IPC分类号： G02F1/134363
CPC分类号： H01L27/1288 , G02F1/134363 , G02F2001/136231 , H01L27/1214
摘要： An array substrate for a liquid crystal display device includes a substrate, a gate line on the substrate, a thin film transistor including a gate electrode of the gate line, a gate insulating layer over the gate electrode, an active layer on the gate insulating layer and ohmic contact layers on the active layer, and source and drain electrodes over the ohmic contact layers, a pixel electrode electrically connected to the drain electrode, a data line electrically connected to the source electrode and crossing the gate line, a common electrode spaced apart from the pixel electrode, and a passivation layer directly between the pixel electrode and the common electrode and directly between the source and drain electrodes.
摘要翻译：液晶显示装置用阵列基板包括基板，基板上的栅极线，包括栅极线的栅电极的薄膜晶体管，栅极上的栅极绝缘层，栅极绝缘层上的有源层和有源层上的欧姆接触层，欧姆接触层上的源电极和漏电极，电连接到漏电极的像素电极，与源电极电连接并与栅极线交叉的数据线，间隔开的公共电极从像素电极和直接在像素电极和公共电极之间直接在源电极和漏电极之间的钝化层。

4. 发明申请

US20110281386A1 Array Substrate for Liquid Crystal Display Device and Method of Manufacturing the Same 有权
标题翻译：液晶显示装置用阵列基板及其制造方法
公开(公告)号：US20110281386A1
公开(公告)日：2011-11-17
申请号：US13193384
申请日：2011-07-28
申请人： Joo-Soo Lim , Hyo-Uk Kim , Hee-Young Kwack , Hyun-Seok Hong , Byung-Chul Ahn , Byoung-Ho Lim
发明人： Joo-Soo Lim , Hyo-Uk Kim , Hee-Young Kwack , Hyun-Seok Hong , Byung-Chul Ahn , Byoung-Ho Lim
IPC分类号： H01L33/08
CPC分类号： H01L27/1288 , G02F1/134363 , G02F2001/136231 , H01L27/1214
摘要： An array substrate for a liquid crystal display device includes a substrate, a gate line on the substrate, a thin film transistor including a gate electrode of the gate line, a gate insulating layer over the gate electrode, an active layer on the gate insulating layer and ohmic contact layers on the active layer, and source and drain electrodes over the ohmic contact layers, a pixel electrode electrically connected to the drain electrode, a data line electrically connected to the source electrode and crossing the gate line, a common electrode spaced apart from the pixel electrode, and a passivation layer directly between the pixel electrode and the common electrode and directly between the source and drain electrodes.
摘要翻译：液晶显示装置用阵列基板包括基板，基板上的栅极线，包括栅极线的栅电极的薄膜晶体管，栅极上的栅极绝缘层，栅极绝缘层上的有源层和有源层上的欧姆接触层，欧姆接触层上的源电极和漏电极，电连接到漏电极的像素电极，与源电极电连接并与栅极线交叉的数据线，间隔开的公共电极从像素电极和直接在像素电极和公共电极之间直接在源电极和漏电极之间的钝化层。

5. 发明授权

US08031312B2 Array substrate for liquid crystal display device and method of manufacturing the same 有权
标题翻译：液晶显示装置用阵列基板及其制造方法
公开(公告)号：US08031312B2
公开(公告)日：2011-10-04
申请号：US11806214
申请日：2007-05-30
申请人： Joo-Soo Lim , Hyo-Uk Kim , Hee-Young Kwack , Hyun-Seok Hong , Byung-Chul Ahn , Byoung-Ho Lim
发明人： Joo-Soo Lim , Hyo-Uk Kim , Hee-Young Kwack , Hyun-Seok Hong , Byung-Chul Ahn , Byoung-Ho Lim
IPC分类号： G02F1/1333
CPC分类号： H01L27/1288 , G02F1/134363 , G02F2001/136231 , H01L27/1214
摘要： An array substrate for a liquid crystal display device includes a substrate, a gate line on the substrate, a thin film transistor including a gate electrode of the gate line, a gate insulating layer over the gate electrode, an active layer on the gate insulating layer and ohmic contact layers on the active layer, and source and drain electrodes over the ohmic contact layers, a pixel electrode electrically connected to the drain electrode, a data line electrically connected to the source electrode and crossing the gate line, a common electrode spaced apart from the pixel electrode, and a passivation layer directly between the pixel electrode and the common electrode and directly between the source and drain electrodes.
摘要翻译：液晶显示装置用阵列基板包括基板，基板上的栅极线，包括栅极线的栅电极的薄膜晶体管，栅极上的栅极绝缘层，栅极绝缘层上的有源层和有源层上的欧姆接触层，欧姆接触层上的源电极和漏电极，电连接到漏电极的像素电极，与源电极电连接并与栅极线交叉的数据线，间隔开的公共电极从像素电极和直接在像素电极和公共电极之间直接在源电极和漏电极之间的钝化层。

6. 发明申请

US20080122767A1 Array substrate for liquid crystal display device and method of manufacturing the same 有权
公开(公告)号：US20080122767A1
公开(公告)日：2008-05-29
申请号：US11806214
申请日：2007-05-30
申请人： Joo-Soo Lim , Hyo-Uk Kim , Hee-Young Kwack , Hyun-Seok Hong , Byung-Chul Ahn , Byoung-Ho Lim
发明人： Joo-Soo Lim , Hyo-Uk Kim , Hee-Young Kwack , Hyun-Seok Hong , Byung-Chul Ahn , Byoung-Ho Lim
IPC分类号： G09G3/30
CPC分类号： H01L27/1288 , G02F1/134363 , G02F2001/136231 , H01L27/1214
摘要： An array substrate for a liquid crystal display device includes a substrate, a gate line on the substrate, a thin film transistor including a gate electrode of the gate line, a gate insulating layer over the gate electrode, an active layer on the gate insulating layer and ohmic contact layers on the active layer, and source and drain electrodes over the ohmic contact layers, a pixel electrode electrically connected to the drain electrode, a data line electrically connected to the source electrode and crossing the gate line, a common electrode spaced apart from the pixel electrode, and a passivation layer directly between the pixel electrode and the common electrode and directly between the source and drain electrodes.

7. 发明授权

US08454847B2 Method of lifting off and fabricating array substrate for liquid crystal display device using the same 有权
公开(公告)号：US08454847B2
公开(公告)日：2013-06-04
申请号：US13165466
申请日：2011-06-21
申请人： Hee-Young Kwack , Hyun-Seok Hong , Joo-Soo Lim , Hong-Sik Kim
发明人： Hee-Young Kwack , Hyun-Seok Hong , Joo-Soo Lim , Hong-Sik Kim
IPC分类号： C03B33/00
CPC分类号： H01L27/1288 , G02F1/1368 , G02F2001/13625 , H01L27/1214 , H01L27/124
摘要： A method of lifting off includes forming a first material layer on a substrate; forming a photoresist pattern including first and second holes and on the first material layer; patterning the first material layer using the photoresist pattern as a patterning mask to form a material pattern having first and second grooves within the material pattern, the first and second grooves corresponding to the first and second holes, respectively; forming a second material layer on an entire surface of the substrate including the photoresist pattern and the first and second grooves; and removing the photoresist pattern and the second material layer on the photoresist pattern at the same time, wherein a portion of the material pattern between the first and second grooves and portions of the material pattern at sides of the first and second grooves constitute a line as a whole.

8. 发明申请

US20090021687A1 Method of lifting off and fabricating array substrate for liquid crystal display device using the same 有权
标题翻译：提出并制造使用其的液晶显示装置的阵列基板的方法
公开(公告)号：US20090021687A1
公开(公告)日：2009-01-22
申请号：US12219306
申请日：2008-07-18
申请人： Hee-Young Kwack , Hyun-Seok Hong , Joo-Soo Lim , Hong-Sik Kim
发明人： Hee-Young Kwack , Hyun-Seok Hong , Joo-Soo Lim , Hong-Sik Kim
IPC分类号： H01L21/28 , H01L33/00 , G02F1/1333
CPC分类号： H01L27/1288 , G02F1/1368 , G02F2001/13625 , H01L27/1214 , H01L27/124
摘要： A method of lifting off includes forming a first material layer on a substrate; forming a photoresist pattern including first and second holes and on the first material layer; patterning the first material layer using the photoresist pattern as a patterning mask to form a material pattern having first and second grooves within the material pattern, the first and second grooves corresponding to the first and second holes, respectively; forming a second material layer on an entire surface of the substrate including the photoresist pattern and the first and second grooves; and removing the photoresist pattern and the second material layer on the photoresist pattern at the same time, wherein a portion of the material pattern between the first and second grooves and portions of the material pattern at sides of the first and second grooves constitute a line as a whole.
摘要翻译：剥离方法包括在基材上形成第一材料层; 形成包括第一和第二孔的光致抗蚀剂图案，并在第一材料层上形成; 使用光致抗蚀剂图案作为图案掩模来图案化第一材料层，以形成在材料图案内具有第一和第二凹槽的材料图案，第一和第二凹槽分别对应于第一和第二孔; 在包括光致抗蚀剂图案和第一和第二凹槽的基板的整个表面上形成第二材料层; 并且同时去除光致抗蚀剂图案上的光致抗蚀剂图案和第二材料层，其中在第一和第二槽之间的材料图案的一部分和材料图案的部分在第一和第二槽的侧面构成一条直线，整个。

9. 发明申请

US20110250532A1 METHOD OF LIFTING OFF AND FABRICATING ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME 有权
标题翻译：使用该液晶显示装置提升关闭和制造阵列基板的方法
公开(公告)号：US20110250532A1
公开(公告)日：2011-10-13
申请号：US13165466
申请日：2011-06-21
申请人： Hee-Young Kwack , Hyun-Seok Hong , Joo-Soo Lim , Hong-Sik Kim
发明人： Hee-Young Kwack , Hyun-Seok Hong , Joo-Soo Lim , Hong-Sik Kim
IPC分类号： G03F7/20
CPC分类号： H01L27/1288 , G02F1/1368 , G02F2001/13625 , H01L27/1214 , H01L27/124
摘要： A method of lifting off includes forming a first material layer on a substrate; forming a photoresist pattern including first and second holes and on the first material layer; patterning the first material layer using the photoresist pattern as a patterning mask to form a material pattern having first and second grooves within the material pattern, the first and second grooves corresponding to the first and second holes, respectively; forming a second material layer on an entire surface of the substrate including the photoresist pattern and the first and second grooves; and removing the photoresist pattern and the second material layer on the photoresist pattern at the same time, wherein a portion of the material pattern between the first and second grooves and portions of the material pattern at sides of the first and second grooves constitute a line as a whole.
摘要翻译：剥离方法包括在基材上形成第一材料层; 形成包括第一和第二孔的光致抗蚀剂图案，并在第一材料层上形成; 使用光致抗蚀剂图案作为图案掩模来图案化第一材料层，以形成在材料图案内具有第一和第二凹槽的材料图案，第一和第二凹槽分别对应于第一和第二孔; 在包括光致抗蚀剂图案和第一和第二凹槽的基板的整个表面上形成第二材料层; 并且同时去除光致抗蚀剂图案上的光致抗蚀剂图案和第二材料层，其中在第一和第二槽之间的材料图案的一部分和材料图案的部分在第一和第二槽的侧面构成一条直线，整个。

10. 发明授权

US07988871B2 Method of lifting off and fabricating array substrate for liquid crystal display device using the same 有权
标题翻译：提出并制造使用其的液晶显示装置的阵列基板的方法
公开(公告)号：US07988871B2
公开(公告)日：2011-08-02
申请号：US12219306
申请日：2008-07-18
申请人： Hee-Young Kwack , Hyun-Seok Hong , Joo-Soo Lim , Hong-Sik Kim
发明人： Hee-Young Kwack , Hyun-Seok Hong , Joo-Soo Lim , Hong-Sik Kim
IPC分类号： C23F1/00
CPC分类号： H01L27/1288 , G02F1/1368 , G02F2001/13625 , H01L27/1214 , H01L27/124
摘要： A method of lifting off includes forming a first material layer on a substrate; forming a photoresist pattern including first and second holes and on the first material layer; patterning the first material layer using the photoresist pattern as a patterning mask to form a material pattern having first and second grooves within the material pattern, the first and second grooves corresponding to the first and second holes, respectively; forming a second material layer on an entire surface of the substrate including the photoresist pattern and the first and second grooves; and removing the photoresist pattern and the second material layer on the photoresist pattern at the same time, wherein a portion of the material pattern between the first and second grooves and portions of the material pattern at sides of the first and second grooves constitute a line as a whole.
摘要翻译：剥离方法包括在基材上形成第一材料层; 形成包括第一和第二孔的光致抗蚀剂图案，并在第一材料层上形成; 使用光致抗蚀剂图案作为图案掩模来图案化第一材料层，以形成在材料图案内具有第一和第二凹槽的材料图案，第一和第二凹槽分别对应于第一和第二孔; 在包括光致抗蚀剂图案和第一和第二凹槽的基板的整个表面上形成第二材料层; 并且同时去除光致抗蚀剂图案上的光致抗蚀剂图案和第二材料层，其中在第一和第二槽之间的材料图案的一部分和材料图案的部分在第一和第二槽的侧面构成一条直线，整个。

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