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1. 发明授权

US07893466B2 Semiconductor FET sensor and method of fabricating the same 有权
标题翻译：半导体FET传感器及其制造方法
公开(公告)号：US07893466B2
公开(公告)日：2011-02-22
申请号：US12195302
申请日：2008-08-20
申请人： Jong Heon Yang , In Bok Baek , Chang Geun Ahn , Chan Woo Park , An Soon Kim , Han Young Yu , Chil Seong Ah , Tae Youb Kim , Myung Sim Jun , Moon Gyu Jang
发明人： Jong Heon Yang , In Bok Baek , Chang Geun Ahn , Chan Woo Park , An Soon Kim , Han Young Yu , Chil Seong Ah , Tae Youb Kim , Myung Sim Jun , Moon Gyu Jang
IPC分类号： G01N27/403
CPC分类号： G01N27/4145 , H01L29/66818 , H01L29/7853
摘要： Provided are a semiconductor Field-Effect Transistor (FET) sensor and a method of fabricating the same. The method includes providing a semiconductor substrate, forming a sensor structure having a fin-shaped structure on the semiconductor substrate, injecting ions for electrical ohmic contact into the sensor structure, and depositing a metal electrode on the sensor structure, immobilizing a sensing material to be specifically combined with a target material onto both sidewall surfaces of the fin-shaped structure, and forming a passage on the sensor structure such that the target material passes through the fin-shaped structure.
摘要翻译：提供了一种半导体场效应晶体管（FET）传感器及其制造方法。该方法包括提供半导体衬底，在半导体衬底上形成具有鳍状结构的传感器结构，将用于电欧姆接触的离子注入到传感器结构中，以及在传感器结构上沉积金属电极，将感测材料固定为特别地将目标材料组合到鳍状结构的两个侧壁表面上，并且在传感器结构上形成通道，使得目标材料通过鳍状结构。

2. 发明申请

US20090152598A1 BIOSENSOR USING SILICON NANOWIRE AND METHOD OF MANUFACTURING THE SAME 审中-公开
标题翻译：使用硅纳米管的生物传感器及其制造方法
公开(公告)号：US20090152598A1
公开(公告)日：2009-06-18
申请号：US12240114
申请日：2008-09-29
申请人： In Bok BAEK , Jong Heon Yang , Chang Geun Ahn , Han Young Yu , Chil Seong Ah , Chan Woo Park , An Soon Kim , Tae Youb Kim , Moon Gyu Jang , Myung Sim Jun
发明人： In Bok BAEK , Jong Heon Yang , Chang Geun Ahn , Han Young Yu , Chil Seong Ah , Chan Woo Park , An Soon Kim , Tae Youb Kim , Moon Gyu Jang , Myung Sim Jun
IPC分类号： H01L29/00 , H01L21/00
CPC分类号： G01N27/4145 , G01N27/4146
摘要： Provided are a biosensor using a silicon nanowire and a method of manufacturing the same. The silicon nanowire can be formed to have a shape, in which identical patterns are continuously repeated, to enlarge an area in which probe molecules are fixed to the silicon nanowire, thereby increasing detection sensitivity. In addition, the detection sensitivity can be easily adjusted by adjusting a gap between the identical patterns of the silicon nanowire depending on characteristics of target molecules, without adjusting a line width of the silicon nanowire in the conventional art. Further, the gap between the identical patterns of the silicon nanowire can be adjusted depending on characteristics of the target molecule to differentiate detection sensitivities, thereby simultaneously detecting various detection sensitivities.
摘要翻译：提供了使用硅纳米线的生物传感器及其制造方法。可以将硅纳米线形成为具有连续重复相同图案的形状，以扩大探针分子固定在硅纳米线上的面积，从而提高检测灵敏度。此外，通过根据目标分子的特性调整硅纳米线的相同图案之间的间隙，而不调整现有技术中的硅纳米线的线宽，可以容易地调整检测灵敏度。此外，可以根据目标分子的特性来调整硅纳米线的相同图案之间的间隙，以区分检测灵敏度，从而同时检测各种检测灵敏度。

3. 发明申请

US20090152596A1 SEMICONDUCTOR FET SENSOR AND METHOD OF FABRICATING THE SAME 有权
标题翻译：半导体FET传感器及其制造方法
公开(公告)号：US20090152596A1
公开(公告)日：2009-06-18
申请号：US12195302
申请日：2008-08-20
申请人： Jong Heon YANG , In Bok Baek , Chang Geun Ahn , Chan Woo Park , An Soon Kim , Han Young Yu , Chil Seong Ah , Tae Youb Kim , Myung Sim Jun , Moon Gyu Jang
发明人： Jong Heon YANG , In Bok Baek , Chang Geun Ahn , Chan Woo Park , An Soon Kim , Han Young Yu , Chil Seong Ah , Tae Youb Kim , Myung Sim Jun , Moon Gyu Jang
IPC分类号： H01L29/78 , H01L21/336
CPC分类号： G01N27/4145 , H01L29/66818 , H01L29/7853
摘要： Provided are a semiconductor Field-Effect Transistor (FET) sensor and a method of fabricating the same. The method includes providing a semiconductor substrate, forming a sensor structure having a fin-shaped structure on the semiconductor substrate, injecting ions for electrical ohmic contact into the sensor structure, and depositing a metal electrode on the sensor structure, immobilizing a sensing material to be specifically combined with a target material onto both sidewall surfaces of the fin-shaped structure, and forming a passage on the sensor structure such that the target material passes through the fin-shaped structure.
摘要翻译：提供了一种半导体场效应晶体管（FET）传感器及其制造方法。该方法包括提供半导体衬底，在半导体衬底上形成具有鳍状结构的传感器结构，将用于电欧姆接触的离子注入到传感器结构中，以及在传感器结构上沉积金属电极，将感测材料固定为特别地将目标材料组合到鳍状结构的两个侧壁表面上，并且在传感器结构上形成通道，使得目标材料通过鳍状结构。

4. 发明授权

US08241939B2 Semiconductor nanowire sensor device and method for manufacturing the same 有权
标题翻译：半导体纳米线传感器装置及其制造方法
公开(公告)号：US08241939B2
公开(公告)日：2012-08-14
申请号：US12682571
申请日：2008-07-24
申请人： Chan Woo Park , Chang Geun Ahn , Jong Heon Yang , In Bok Baek , Chil Seong Ah , Han Young Yu , An Soon Kim , Tae Youb Kim , Moon Gyu Jang , Myung Sim Jun
发明人： Chan Woo Park , Chang Geun Ahn , Jong Heon Yang , In Bok Baek , Chil Seong Ah , Han Young Yu , An Soon Kim , Tae Youb Kim , Moon Gyu Jang , Myung Sim Jun
IPC分类号： H01L21/00 , H01L29/06
CPC分类号： H01L29/0665 , B82Y10/00 , B82Y15/00 , H01L29/0673 , H01L29/78696
摘要： A method for manufacturing a biosensor includes forming a silicon nanowire channel, etching a first conductivity-type single crystalline silicon layer which is a top layer of a Silicon-On-Insulator (SOI) substrate to form a first conductivity-type single crystalline silicon line pattern, doping both sidewalls of the first conductivity-type single crystalline silicon line pattern with impurities of a second conductivity-type opposite to the first conductivity-type to form a second conductivity-type channel, forming second conductivity-type pads for forming electrodes at both ends of the first conductivity-type single crystalline silicon line pattern, forming, in an undoped region of the first conductivity-type single crystalline silicon line pattern, a first electrode for applying a reverse-bias voltage to insulate the first conductivity-type single crystalline silicon line pattern and the second conductivity-type channel from each other, and forming second electrodes for applying a bias voltage across the second conductivity-type channel on the second conductivity-type pad.
摘要翻译：制造生物传感器的方法包括形成硅纳米线通道，蚀刻作为绝缘体上硅（SOI）衬底的顶层的第一导电型单晶硅层，以形成第一导电型单晶硅线以与第一导电类型相反的第二导电类型的杂质掺杂第一导电型单晶硅线图案的两个侧壁以形成第二导电型沟道，形成第二导电型垫，用于在第一导电型单晶硅线图案的两端，在第一导电型单晶硅线图案的未掺杂区域中形成用于施加反向偏置电压以使第一导电型单晶硅线型图案绝缘的第一电极晶体硅线图案和第二导电型沟道，并且形成用于施加双面的第二电极在第二导电型垫上的第二导电类型沟道上的电压。

5. 发明授权

US08163240B2 Detection device and system 有权
标题翻译：检测装置和系统
公开(公告)号：US08163240B2
公开(公告)日：2012-04-24
申请号：US12682545
申请日：2008-06-13
申请人： Chang Geun Ahn , Chan Woo Park , Jong Heon Yang , In Bok Baek , Chil Seong Ah , Han Young Yu , An Soon Kim , Tae Youb Kim , Moon Gyu Jang , Seon Hee Park
发明人： Chang Geun Ahn , Chan Woo Park , Jong Heon Yang , In Bok Baek , Chil Seong Ah , Han Young Yu , An Soon Kim , Tae Youb Kim , Moon Gyu Jang , Seon Hee Park
IPC分类号： G01N15/06 , G01N33/00 , G01N33/48 , G01N27/00
CPC分类号： G01N27/4145 , Y10T436/11
摘要： A detection device and system are provided. The detection device includes a detection capacitor and a Field Effect Transistor (FET). The detection capacitor has a reactive material layer reacting to a specific functional group in a fluid, and first and second electrodes disposed on the both surfaces of an insulating layer, and the FET has a source electrode connected with the second electrode, a gate electrode connected with the first electrode, and a drain electrode. Here, the insulating layer of the detection capacitor is thicker than a gate insulating layer of the FET.
摘要翻译：提供检测装置和系统。检测装置包括检测电容器和场效应晶体管（FET）。检测电容器具有与流体中的特定官能团反应的反应性物质层，以及设置在绝缘层两面的第一和第二电极，并且所述FET具有与所述第二电极连接的源电极，连接有栅电极与第一电极和漏电极。这里，检测电容器的绝缘层比FET的栅极绝缘层厚。

6. 发明申请

US20110194976A1 DETECTION DEVICE AND SYSTEM 有权
标题翻译：检测装置和系统
公开(公告)号：US20110194976A1
公开(公告)日：2011-08-11
申请号：US12682545
申请日：2008-06-13
申请人： Chang Geun Ahn , Chan Woo Park , Jong Heon Yang , In Bok Baek , Chil Seong Ah , Han Young Yu , An Soon Kim , Tae Youb Kim , Moon Gyu Jang , Seon Hee Park
发明人： Chang Geun Ahn , Chan Woo Park , Jong Heon Yang , In Bok Baek , Chil Seong Ah , Han Young Yu , An Soon Kim , Tae Youb Kim , Moon Gyu Jang , Seon Hee Park
IPC分类号： G01N33/48 , H01L27/06
CPC分类号： G01N27/4145 , Y10T436/11
摘要： A detection device and system are provided. The detection device includes a detection capacitor and a Field Effect Transistor (FET). The detection capacitor has a reactive material layer reacting to a specific functional group in a fluid, and first and second electrodes disposed on the both surfaces of an insulating layer, and the FET has a source electrode connected with the second electrode, a gate electrode connected with the first electrode, and a drain electrode. Here, the insulating layer of the detection capacitor is thicker than a gate insulating layer of the FET.
摘要翻译：提供检测装置和系统。检测装置包括检测电容器和场效应晶体管（FET）。检测电容器具有与流体中的特定官能团反应的反应性物质层，以及设置在绝缘层两面的第一和第二电极，并且所述FET具有与所述第二电极连接的源电极，连接有栅电极与第一电极和漏电极。这里，检测电容器的绝缘层比FET的栅极绝缘层厚。

7. 发明申请

US20100270530A1 SEMICONDUCTOR NANOWIRE SENSOR DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：半导体纳米传感器器件及其制造方法
公开(公告)号：US20100270530A1
公开(公告)日：2010-10-28
申请号：US12682571
申请日：2008-07-24
申请人： Chan Woo Park , Chang Geun Ahn , Jong Heon Yang , In Book Baek , Chil Seong Ah , Han Young Yu , An Soon Kim , Tae Youb Kim , Moon Gyu Jang , Myung Sim Jun
发明人： Chan Woo Park , Chang Geun Ahn , Jong Heon Yang , In Book Baek , Chil Seong Ah , Han Young Yu , An Soon Kim , Tae Youb Kim , Moon Gyu Jang , Myung Sim Jun
IPC分类号： H01L29/775 , H01L21/336
CPC分类号： H01L29/0665 , B82Y10/00 , B82Y15/00 , H01L29/0673 , H01L29/78696
摘要： A method for manufacturing a biosensor device is provided. The method involves forming a silicon nanowire channel with a line width of several nanometers to several tens of nanometers using a typical photolithography process, and using the channel to manufacture a semiconductor nanowire sensor device. The method includes etching a first conductivity-type single crystalline silicon layer which is a top layer of a Silicon-On-Insulator (SOI) substrate to form a first conductivity-type single crystalline silicon line pattern, doping both sidewalls of the first conductivity-type single crystalline silicon line pattern with impurities of a second conductivity-type opposite to the first conductivity-type to form a second conductivity-type channel, forming second conductivity-type pads for forming electrodes at both ends of the first conductivity-type single crystalline silicon line pattern, forming, in an undoped region of the first conductivity-type single crystalline silicon line pattern, a first electrode for applying a reverse-bias voltage to insulate the first conductivity-type single crystalline silicon line pattern and the second conductivity-type channel from each other, and forming second electrodes for applying a bias voltage across the second conductivity-type channel on the second conductivity-type pad.
摘要翻译：提供一种制造生物传感器装置的方法。该方法包括使用典型的光刻工艺形成线宽为几纳米至几十纳米的硅纳米线通道，并使用该通道制造半导体纳米线传感器装置。该方法包括蚀刻作为绝缘体上硅（SOI）衬底的顶层的第一导电型单晶硅层，以形成第一导电型单晶硅线图案，掺杂第一导电型单晶硅线阵列的两个侧壁，形成具有与第一导电类型相反的第二导电类型的杂质的单晶硅线图案，以形成第二导电型沟道，形成用于在第一导电型单晶的两端形成电极的第二导电型焊盘硅线图案，在第一导电型单晶硅线图案的未掺杂区域中形成第一电极，用于施加反向偏置电压以使第一导电型单晶硅线图案和第二导电型并且形成用于在第二导通型通道上施加偏置电压的第二电极导电型垫。

8. 发明授权

US08426900B2 Sensing device 有权
标题翻译：感应装置
公开(公告)号：US08426900B2
公开(公告)日：2013-04-23
申请号：US13122273
申请日：2009-05-27
申请人： Chang Geun Ahn , Chan Woo Park , Jong Heon Yang , In Bok Baek , Chil Seong Ah , An Soon Kim , Tae Youb Kim , Gun Yong Sung
发明人： Chang Geun Ahn , Chan Woo Park , Jong Heon Yang , In Bok Baek , Chil Seong Ah , An Soon Kim , Tae Youb Kim , Gun Yong Sung
IPC分类号： G01N27/403
CPC分类号： G01N27/4145 , G01N27/4146
摘要： Provided is a sensing device, which includes a reactive material layer (260) responding to a specific functional group in a fluid, a sensing capacitor (B) including first and second electrodes disposed on and under an insulating layer (230), the first electrode being disposed under the reactive material layer (260), and a field effect transistor including a gate electrode connected with the first electrode of the sensing capacitor. Here, the reactive material layer (260) is formed in a conductive three-dimensional structure to widen a surface area. Thus, the sensing device may have high sensitivity by maximizing a capacitor sharing effect and a change in voltage amount applied to a gate, which may be caused by widening a surface area of the conductive three-dimensional structure with respect to the fluid flow.
摘要翻译：提供了一种感测装置，其包括响应于流体中的特定官能团的反应性材料层（260），包括设置在绝缘层（230）上和下方的第一和第二电极的感测电容器（B），第一电极设置在反应性材料层（260）下方的场效应晶体管，以及包括与感测电容器的第一电极连接的栅电极的场效应晶体管。这里，反应性材料层（260）形成为导电三维结构以扩大表面积。因此，感测装置可以通过最大化电容器共享效应和施加到栅极的电压量的变化而具有高灵敏度，这可能是通过相对于流体流动扩大导电三维结构的表面积而引起的。

9. 发明申请

US20110180856A1 SENSING DEVICE 有权
标题翻译：感应装置
公开(公告)号：US20110180856A1
公开(公告)日：2011-07-28
申请号：US13122273
申请日：2009-05-27
申请人： Chang Geun Ahn , Chan Woo Park , Jong Heon Yang , In Bok Baek , Chil Seong Ah , An Soon Kim , Tae Youb Kim , Gun Yong Sung
发明人： Chang Geun Ahn , Chan Woo Park , Jong Heon Yang , In Bok Baek , Chil Seong Ah , An Soon Kim , Tae Youb Kim , Gun Yong Sung
IPC分类号： G01N27/403 , H01L29/772 , B82Y15/00
CPC分类号： G01N27/4145 , G01N27/4146
摘要： Provided is a sensing device, which includes a reactive material layer (260) responding to a specific functional group in a fluid, a sensing capacitor (B) including first and second electrodes disposed on and under an insulating layer (230), the first electrode being disposed under the reactive material layer (260), and a field effect transistor including a gate electrode connected with the first electrode of the sensing capacitor. Here, the reactive material layer (260) is formed in a conductive three-dimensional structure to widen a surface area. Thus, the sensing device may have high sensitivity by maximizing a capacitor sharing effect and a change in voltage amount applied to a gate, which may be caused by widening a surface area of the conductive three-dimensional structure with respect to the fluid flow.
摘要翻译：提供了一种感测装置，其包括响应于流体中的特定官能团的反应性材料层（260），包括设置在绝缘层（230）上和下方的第一和第二电极的感测电容器（B），第一电极设置在反应性材料层（260）下方的场效应晶体管，以及包括与感测电容器的第一电极连接的栅电极的场效应晶体管。这里，反应性材料层（260）形成为导电三维结构以扩大表面积。因此，感测装置可以通过最大化电容器共享效应和施加到栅极的电压量的变化而具有高灵敏度，这可能是通过相对于流体流动扩大导电三维结构的表面积而引起的。

10. 发明授权

US08263964B2 Three-dimensional nanodevices including nanostructures 有权
标题翻译：包括纳米结构在内的三维纳米器件
公开(公告)号：US08263964B2
公开(公告)日：2012-09-11
申请号：US12672995
申请日：2008-05-19
申请人： Han Young Yu , Byung Hoon Kim , An Soon Kim , In Bok Baek , Chil Seong Ah , Jong Heon Yang , Chan Woo Park , Chang Geun Ahn
发明人： Han Young Yu , Byung Hoon Kim , An Soon Kim , In Bok Baek , Chil Seong Ah , Jong Heon Yang , Chan Woo Park , Chang Geun Ahn
IPC分类号： H01L29/06
CPC分类号： H01J49/4205 , B81B7/0025 , B81B2201/0214 , B81B2201/0271 , B82Y10/00 , B82Y40/00 , G01N2291/0257 , H01J49/0018 , H01L29/0673 , H01L29/7613 , H01L29/775 , H03H2009/02314
摘要： Provided are three-dimensional (3D) nanodevices including 3D nanostructures. The 3D nanodevice includes at least one nanostructure, each nanostructure including an oscillation portion floating over a substrate and support portions for supporting both lengthwise end portions of the oscillation portion, supports disposed on the substrate to support the support portions of each of the nanostructures, at least one controller disposed at an upper portion of the substrate, a lower portion of the substrate, or both the upper and lower portions of the substrate to control each of the nanostructures, and a sensing unit disposed on each of the oscillation portions to sense an externally supplied adsorption material. Thus, unlike in a typical planar device, generation of impurities between a nanodevice and a substrate can be reduced, and mechanical vibration can be caused. In particular, since 3D nanostructures have mechanical and electrical characteristics, 3D nanodevices including new 3D nanostructures can be provided using nano-electro-mechanical systems (NEMS). Also, a single electron device, a spin device, or a single electron transistor (SET)-field effect transistor (FET) hybrid device can be formed using a simple process unlike in planar devices.
摘要翻译：提供了三维（3D）纳米器件，包括3D纳米结构。 3D纳米装置包括至少一个纳米结构，每个纳米结构包括漂浮在基板上的振荡部分和支撑部分，用于支撑振荡部分的两个纵向端部，支撑件设置在基板上以支撑每个纳米结构的支撑部分，设置在基板的上部，基板的下部或基板的上部和下部的至少一个控制器，以控制每个纳米结构;以及感测单元，设置在每个振荡部分上以感测外部供应的吸附材料。因此，与典型的平面器件不同，可以减少纳米器件与衬底之间的杂质的产生，并且可能引起机械振动。特别地，由于3D纳米结构具有机械和电学特性，可以使用纳米机电系统（NEMS）提供包括新的3D纳米结构的3D纳米器件。此外，可以使用与平面器件不同的简单工艺来形成单电子器件，自旋器件或单电子晶体管（SET）场效应晶体管（FET）混合器件。

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