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    • 9. 发明授权
    • Nanoporous silicone resins having low dielectric constants and method for preparation
    • 具有低介电常数的纳米多孔硅树脂及其制备方法
    • US06313045B1
    • 2001-11-06
    • US09459331
    • 1999-12-13
    • Bianxiao ZhongRussell Keith KingKyuha ChungShizhong Zhang
    • Bianxiao ZhongRussell Keith KingKyuha ChungShizhong Zhang
    • H01L2131
    • C08G77/02C08G77/12C09D183/04Y10S977/70Y10S977/831Y10S977/891
    • Nanoporous silicone resins and silicone resin films having low dielectric constants and a method for preparing such nanoporous silicone resins. The silicone resin comprises the reaction product of a mixture comprising (A) 15-70 mol % of a tetraalkoxysilane described by formula Si(OR1)4,  where each R1 is an independently selected alkyl group comprising 1 to about 6 carbon atoms, (B) 12 to 60 mol % of an organosilane described by formula R4SiX3,  where R4 is selected from the group consisting of alkyl groups comprising 1 to about 6 carbon atoms and phenyl and each X is an independently selected hydrolyzable substituent, (C) 15 to 70 mol % of an organotrialkoxysilane described by formula R2Si(OR3)3,  where R2 is a hydrocarbon group comprising about 8 to 24 carbon atoms or a substituted hydrocarbon group comprising a hydrocarbon chain having about 8 to 24 carbon atoms and each R3 is an independently selected alkyl group comprising 1 to about 6 carbon atoms; in the presence of (D) water, (E) hydrolysis catalyst, and (F) organic solvent for the reaction product. The silicone resin is cured and heated in preferably an inert atmosphere at a temperature sufficient to effect thermolysis of carbon-carbon bonds of the R2 groups thereby forming a nanoporous silicone resin.
    • 具有低介电常数的纳米多孔有机硅树脂和有机硅树脂薄膜以及这种纳米多孔硅树脂的制备方法。 硅氧烷树脂包括含有(A)15-70mol%四烷氧基硅烷的混合物的反应产物,其中R1是独立选择的含有1至约6个碳原子的烷基,(B)12至60mol% 的式中R 4选自包含1至约6个碳原子的烷基和苯基,并且每个X是独立选择的可水解取代基的有机硅烷,(C)15至70mol%由式(I)表示的有机基三烷氧基硅烷 其中R 2是包含约8至24个碳原子的烃基或包含具有约8至24个碳原子的烃链的取代烃基,并且每个R 3是独立选择的包含1至约6个碳原子的烷基; 在(D)水,(E)水解催化剂和(F)反应产物的(F)有机溶剂的存在下)。有机硅树脂在优选惰性气氛中在足以实现碳 - 碳键热解的温度下固化和加热 的R2基团,从而形成纳米多孔硅树脂。