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1. 发明申请

US20050004223A1 Novel 3,3-diphenylpropylamines useful in therapy 审中-公开
标题翻译：用于治疗的新型3,3-二苯基丙胺
公开(公告)号：US20050004223A1
公开(公告)日：2005-01-06
申请号：US10832555
申请日：2004-04-26
申请人： John Slatter , Raymond Charles Grabiak , Robert Kaufman
发明人： John Slatter , Raymond Charles Grabiak , Robert Kaufman
IPC分类号： A61P13/06 , C07C217/62 , A61K31/195 , A61K31/137
CPC分类号： C07C215/52 , C07C217/62
摘要： Novel 3,3-diphenylpropylamines of the formula and any stereoisomers thereof; wherein R1 represents —H or —CH3; R2 represents —CX3, —CR2-1X2, —CR2-1R2-2X, or —CR2-1R2-2H, wherein X represents halogen, and R2-1 and R2-2 independently represent —H or —(C1-C4 alkyl), optionally substituted with halogen; R3 and R4 independently represent —H, —OCH3, —OH, —CONH2, —SO2NH2, —F, —Cl, —Br, —I, —CF3, or —(C1-C4 alkyl), optionally substituted with one or two —OH, —(C1-C4 alkoxy), —COOH, or —CO—O—(C1-C3 alkyl); and R5 and R6 independently represent C1-C6 alkyl, optionally substituted with hydroxyl, wherein R5 and R6 together contain at least three carbon atoms, and wherein R5 and R6 may form a ring together with the amine nitrogen; provided that R2 comprises at least one halogen; or a physiologically acceptable acid addition salt thereof; the 3,3-diphenylpropylamines for use as medicaments, use of the 3,3-diphenylpropylamines for the manufacture of specific medicaments, and pharmaceutical compositions comprising the 3,3-diphenylpropylamines. The present invention also includes a method of treatment involving administration of the 3,3-diphenylpropylamines.
摘要翻译：下式的新型3,3-二苯基丙胺及其任何立体异构体; 其中R1表示-H或-CH3; R2表示-CX3，-CR2-1X2，-CR2-1R2-2X或-CR2-1R2-2H，其中X表示卤素，R2-1和R2-2独立地表示-H或 - （C1-C4烷基），任选被卤素取代; R 3和R 4独立地表示-H，-OCH 3，-OH，-CONH 2，-SO 2 NH 2，-F，-Cl，-Br，-I，-CF 3或 - （C 1 -C 4烷基） -OH， - （C1-C4烷氧基），-COOH或-CO-O-（C1-C3烷基）; 并且R 5和R 6独立地表示任选被羟基取代的C 1 -C 6烷基，其中R 5和R 6一起含有至少三个碳原子，并且其中R 5和R 6可与胺氮一起形成环; 条件是R 2包含至少一个卤素; 或其生理上可接受的酸加成盐; 用作药物的3,3-二苯基丙胺，用于制备特定药物的3,3-二苯基丙胺，以及包含3,3-二苯基丙胺的药物组合物。本发明还包括涉及3,3-二苯基丙胺的给药的方法。

2. 发明申请

US20060281812A1 NOVEL 3,3-diphenylpropylamines USEFUL IN THERAPY 失效
标题翻译：新的3,3-二苯基丙胺有用的治疗
公开(公告)号：US20060281812A1
公开(公告)日：2006-12-14
申请号：US11466814
申请日：2006-08-24
申请人： John Slatter , Raymond Grabiak , Robert Kaufman
发明人： John Slatter , Raymond Grabiak , Robert Kaufman
IPC分类号： A61K31/205 , C07C215/34
CPC分类号： C07C215/52 , C07C217/62
摘要： Novel 3,3-diphenylpropylamines of the formula and stereoisomers and physiologically acceptable acid addition salt thereof; wherein R1, R2, R3, R4, R5, and R6 are as defined herein; methods of use thereof; and pharmaceutical compositions thereof.
摘要翻译：新的式3,3-二苯基丙胺和立体异构体及其生理上可接受的酸加成盐; 其中R 1，R 2，R 3，R 4，R 5， R 6和R 6如本文所定义; 使用方法; 及其药物组合物。

3. 发明申请

US20060004106A1 Novel 3,3-diphenylpropylamines useful in therapy 失效
标题翻译：用于治疗的新型3,3-二苯基丙胺
公开(公告)号：US20060004106A1
公开(公告)日：2006-01-05
申请号：US11212330
申请日：2005-08-25
申请人： John Slatter , Raymond Grabiak , Robert Kaufman
发明人： John Slatter , Raymond Grabiak , Robert Kaufman
IPC分类号： A61K31/195 , A61K31/137 , C07C311/13 , C07C211/14
CPC分类号： C07C215/52 , C07C217/62
摘要： Novel 3,3-diphenylpropylamines of the formula and stereoisomers and physiologically acceptable acid addition salt thereof; wherein R1, R2, R3, R4, R5, and R6 are as defined herein; methods of use thereof; and pharmaceutical compositions thereof.
摘要翻译：新的式3,3-二苯基丙胺和立体异构体及其生理上可接受的酸加成盐; 其中R 1，R 2，R 3，R 4，R 5， R 6和R 6如本文所定义; 使用方法; 及其药物组合物。

4. 发明申请

US20090137773A1 Production Processes and Systems, Compositions, Surfactants, Monomer Units, Metal Complexes, Phosphate Esters, Glycols, Aqueous Film Forming Foams, and Foam Stabilizers 审中-公开
标题翻译：生产工艺和系统，组合物，表面活性剂，单体单元，金属络合物，磷酸酯，二醇，水成膜泡沫和泡沫稳定剂
公开(公告)号：US20090137773A1
公开(公告)日：2009-05-28
申请号：US11922980
申请日：2006-07-28
申请人： Andrew Jackson , Vimal Sharma , Bradley E. Edwards , Janet Boggs , Victoria Hedrick , Stephan Brandstadter , John Chien , Edward Norman , Robert Kaufman , Bruno Ameduri , George K. Kostov
发明人： Andrew Jackson , Vimal Sharma , Bradley E. Edwards , Janet Boggs , Victoria Hedrick , Stephan Brandstadter , John Chien , Edward Norman , Robert Kaufman , Bruno Ameduri , George K. Kostov
IPC分类号： C08G75/20 , C07C317/04 , C07C311/01 , C07F9/09 , C07C31/38 , C07C19/08
CPC分类号： C07C21/18 , A62D1/0085 , C07C19/075 , C07C19/10 , C07C19/16 , C07C22/02 , C07C43/137 , C07C69/653 , C07C311/09 , C07C317/18 , C07F9/091 , C07F9/14 , C11D1/004 , C11D3/0026 , C11D3/0031
摘要： Compositions and methods for making compositions such as RF(Rτ)nQ are provided. The RF group can include at least two —CF3 groups, the Rτ group can be a group having at least two carbons, n can be at least 1, and the Q group can include one or more atoms of the periodic table of elements. RF-intermediates (RF(RT)nQg); Surfactants (RF(RT)nQs); Foam stabilizers (RF(RT)IIQFS); Metal complexes (RF(RT)IIQMC); Phosphate ester (RF(RT)HQPE); Polymers (RF(RT)IIQMU); Monomers (RF(RT)IIQM); Urethanes (RF(Rτ)nQu); and/or Glycols (RF(RT)IIQH) and methods for making the same are provided.
摘要翻译：提供了组合物如RF（Rtau）nQ的组合物和方法。 RF基团可以包括至少两个-CF 3基团，Rtau基团可以是具有至少两个碳原子的基团，n可以至少为1，并且Q基团可以包括元素周期表的一个或多个原子。 RF-中间体（RF（RT）nQg）; 表面活性剂（RF（RT）nQs）; 泡沫稳定剂（RF（RT）IIQFS）; 金属络合物（RF（RT）IIQMC）; 磷酸酯（RF（RT）HQPE）; 聚合物（RF（RT）IIQMU）; 单体（RF（RT）IIQM）; 聚氨酯（RF（Rtau）nQu）; 和/或二醇（RF（RT）IIQH）及其制备方法。

5. 发明申请

US20050107348A1 Histone deacetylase inhibitors 有权
公开(公告)号：US20050107348A1
公开(公告)日：2005-05-19
申请号：US11019303
申请日：2004-12-23
申请人： Hsuan-Yin Lan-Hargest , Robert Kaufman , Norbert Wiech
发明人： Hsuan-Yin Lan-Hargest , Robert Kaufman , Norbert Wiech
IPC分类号： A61K31/16 , C07C57/42 , C07C57/60 , C07C259/06 , C07D307/54 , A61K31/655 , A61K31/19 , A61K31/195 , A61K31/24 , A61K31/277 , A61K31/40 , A61K31/44
CPC分类号： A61K31/16 , C07C57/42 , C07C57/60 , C07C259/06 , C07D307/54
摘要： Histone deacetylase is a metallo-enzyme with zinc at the active site. Compounds having a zinc-binding moiety, such as, for example, a hydroxamic acid group or a carboxylic acid group, can inhibit histone deacetylase. Histone deacetylase can repress gene expression, including expression of genes related to tumor suppression. Accordingly, inhibition of histone deacetylase can provide an alternate route for treating cancer, hematological disorders, e.g., hemoglobinopathies, and genetic related metabolic disorders, e.g., cystic fibrosis and adrenoleukodystrophy.

6. 发明授权

US06277260B1 Apparatus and method for plating wafers, substrates and other articles 失效
公开(公告)号：US06277260B1
公开(公告)日：2001-08-21
申请号：US09639019
申请日：2000-08-15
申请人： Robert Kaufman , Gary C. Downes
发明人： Robert Kaufman , Gary C. Downes
IPC分类号： C25D500
CPC分类号： H01L21/2885 , C25D7/123 , C25D17/001 , C25D17/008 , Y10S204/07
摘要： A plating apparatus and methodology is disclosed that is particularly useful in improving the plating rate, improving the plating of via holes, improving the uniformity of the plating deposition across the surface of the wafer, and minimizing damage to the wafer. With regard to improving the plating rate and the plating of via holes, the plating apparatus and method immerses a wafer in a plating fluid bath and continuously directs plating fluid towards the surface of the wafer. Immersing the wafer in a plating fluid bath reduces the occurrence of trapped gas pockets within via holes which makes it easier to plate them. The continuous directing of plating fluid towards the surface of the wafer increases the ion concentration gradient which is, in turn, increases the plating rate. With regard to improving the uniformity of the plating deposition, the plating apparatus and method effectuate random horizontal fluid flow within the bath to reduce the occurrence of relatively long horizontal fluid flow that causes non-uniform plating deposition across the surface of the wafer.

7. 发明申请

US20120071689A1 PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS, MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM FORMING FOAMS, AND FOAM STABILIZERS 失效
标题翻译：生产过程和系统，组合物，表面活性剂，单体单元，金属络合物，磷酸酯，甘油，形成泡沫的水性膜和泡沫稳定剂
公开(公告)号：US20120071689A1
公开(公告)日：2012-03-22
申请号：US13024836
申请日：2011-02-10
申请人： Janet Boggs , Stephan Brandstadter , John Chien , Vimal Sharma , E. Bradley Edwards , Vicki Hedrick , Andrew Jackson , Gregory Leman , Edward Norman , Robert Kaufman
发明人： Janet Boggs , Stephan Brandstadter , John Chien , Vimal Sharma , E. Bradley Edwards , Vicki Hedrick , Andrew Jackson , Gregory Leman , Edward Norman , Robert Kaufman
IPC分类号： C07C311/05
CPC分类号： C07C311/09 , C07C69/653 , C07C311/13 , C07C311/24 , C07C311/48 , C07C323/12 , C11D1/004
摘要： Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups, RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and or RF-foam stabilizers. The RF portion can include at least two groups —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2 groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include RF-surfactants and/or RF-foam stabilizers are provided.
摘要翻译：提供了生产方法和系统，其包括使卤代化合物，脱卤化合物，醇反应，烯烃和饱和化合物反应，使具有至少两个-CF 3基团的反应物与具有环状基团的反应物反应，RF组合物如RF-中间体，RF 表面活性剂，RF单体，RF单体单元，RF-金属配合物，RF-磷酸酯，RF-二醇，RF-聚氨酯和/或RF-泡沫稳定剂。 RF部分可以包括至少两个基团-CF 3基团，至少三个-CF 3基团和/或至少两个-CF 3基团和至少两个-CH 2基团。提供了洗涤剂，乳化剂，油漆，粘合剂，油墨，润湿剂，起泡剂和消泡剂，包括RF-表面活性剂组合物。提供了包括RF单体单元的丙烯酸树脂，树脂和聚合物。提供了包括其上具有RF组成的基底的组合物。提供了可以包括RF-表面活性剂和/或RF泡沫稳定剂的水性成膜泡沫（“AFFF”）配方。

8. 发明申请

US20070105955A1 Compounds for the treatment of metabolic disorders 有权
标题翻译：用于治疗代谢紊乱的化合物
公开(公告)号：US20070105955A1
公开(公告)日：2007-05-10
申请号：US10553936
申请日：2004-04-20
申请人： Kirvin Hodge , Shalini Sharma , Robert Kaufman , Albert Lee , Reid von Borstel
发明人： Kirvin Hodge , Shalini Sharma , Robert Kaufman , Albert Lee , Reid von Borstel
IPC分类号： A61K31/235 , C07C69/76
CPC分类号： C07C69/734 , A61K31/235
摘要： Agents useful for the treatment of various metabolic disorders, such as insulin resistance syndrome, diabetes, hyper-lipidemia, fatty liver disease, cachexia, obesity, atherosclerosis and arteriosclerosis are disclosed. Formula (I) wherein n is 1 or 2; m is 2 or 3; q is 0 or 1; t is 0 or 1; R2 is alkyl having from 1 to 3 carbon atoms; R3 is hydrogen, halo, alkyl having from 1 to 3 carbon atoms, or alkoxy having from 1 to 3 carbon atoms; A is phenyl, unsubstituted or substituted by 1 or 2 groups selected from: halo, alkyl having 1 or 2 carbon atoms, perfluoromethyl, alkoxy having 1 or 2 carbon atoms, and perfluoromethoxy; or cycloalkyl having from 3 to 6 ring carbon atoms wherein the cycloalkyl is unsubstituted or one or two ring carbons are independently mono-substituted by methyl or ethyl; or a 5 or 6 membered heteroaromatic ring having 1 or 2 ring heteroatoms selected from N, S and O and the heteroaromatic ring is covalently bound to the remainder of the compound of formula I by a ring carbon; and R1 is hydrogen or alkyl having 1 or 2 carbon atoms. Alternatively, when R1 is hydrogen, the biologically active agent can be a pharmaceutically acceptable salt of the compound of Formula (I).
摘要翻译：公开了可用于治疗诸如胰岛素抵抗综合征，糖尿病，高脂血症，脂肪肝疾病，恶病质，肥胖症，动脉粥样硬化和动脉硬化的各种代谢疾病的药剂。式（I）其中n为1或2; m为2或3; q为0或1; t为0或1; R 2是具有1至3个碳原子的烷基; R 3是氢，卤素，具有1至3个碳原子的烷基或具有1至3个碳原子的烷氧基; A是未取代的或被1或2个选自：卤素，具有1或2个碳原子的烷基，全氟甲基，具有1或2个碳原子的烷氧基和全氟甲氧基取代的苯基; 或具有3至6个环碳原子的环烷基，其中环烷基是未取代的或一个或两个环碳独立地被甲基或乙基单取代; 或具有1或2个选自N，S和O的环杂原子的5或6元杂芳环，杂芳环通过环碳与式I化合物的其余部分共价结合; R 1是氢或具有1或2个碳原子的烷基。或者，当R 1是氢时，生物活性剂可以是式（I）化合物的药学上可接受的盐。

9. 发明申请

US20070037869A1 Histone deacetylase inhibitors 失效
标题翻译：组蛋白脱乙酰酶抑制剂
公开(公告)号：US20070037869A1
公开(公告)日：2007-02-15
申请号：US11489519
申请日：2006-07-20
申请人： Hsuan-Yin Lan-Hargest , Robert Kaufman , Norbert Wiech
发明人： Hsuan-Yin Lan-Hargest , Robert Kaufman , Norbert Wiech
IPC分类号： A61K31/381 , A61K31/34 , A61K31/202 , A61K31/336 , A61K31/19
CPC分类号： A61K31/19 , A61K31/202 , A61K31/336 , A61K31/34 , A61K31/381
摘要： Histone deacetylase is a metallo-enzyme with zinc at the active site. Compounds having a zinc-binding moiety, such as, for example, a hydroxamic acid group or a carboxylic acid group, can inhibit histone deacetylase. Histone deacetylase inhibition can repress gene expression, including expression of genes related to tumor suppression. Accordingly, inhibition of histone deacetylase can provide an alternate route for treating cancer, hematological disorders, e.g., hemoglobinopathies, genetic disorders, e.g. Huntington's disease and spinal muscular atrophy and genetic related metabolic disorders, e.g., cystic fibrosis and adrenoleukodystrophy.
摘要翻译：组蛋白脱乙酰酶是在活性位点具有锌的金属酶。具有锌结合部分的化合物，例如异羟肟酸基或羧酸基可以抑制组蛋白脱乙酰酶。组蛋白脱乙酰酶抑制可抑制基因表达，包括与肿瘤抑制相关的基因的表达。因此，组蛋白脱乙酰酶的抑制可以提供治疗癌症的替代途径，血液病症，例如血红蛋白病，遗传疾病，亨廷顿氏病和脊髓性肌肉萎缩以及遗传相关的代谢紊乱，例如囊性纤维化和肾上腺脑白质营养不良。

10. 发明授权

US06361669B1 Apparatus and method for plating wafers, substrates and other articles 失效
标题翻译：用于电镀晶片，基板和其他物品的装置和方法
公开(公告)号：US06361669B1
公开(公告)日：2002-03-26
申请号：US09638961
申请日：2000-08-15
申请人： Robert Kaufman , Gary C. Downes
发明人： Robert Kaufman , Gary C. Downes
IPC分类号： C23C1400
CPC分类号： H01L21/2885 , C25D7/123 , C25D17/001 , C25D17/008 , Y10S204/07
摘要： A plating apparatus and methodology is disclosed that is particularly useful in improving the plating rate, improving the plating of via holes, improving the uniformity of the plating deposition across the surface of the wafer, and minimizing damage to the wafer. With regard to improving the plating rate and the plating of via holes, the plating apparatus and method immerses a wafer in a plating fluid bath and continuously directs plating fluid towards the surface of the wafer. Immersing the wafer in a plating fluid bath reduces the occurrence of trapped gas pockets within via holes which makes it easier to plate them. The continuous directing of plating fluid towards the surface of the wafer increases the ion concentration gradient which is, in turn, increases the plating rate. With regard to improving the uniformity of the plating deposition, the plating apparatus and method effectuate random horizontal fluid flow within the bath to reduce the occurrence of relatively long horizontal fluid flow that causes non-uniform plating deposition across the surface of the wafer. In addition, the plating apparatus and method configure the electrostatic field between the anode and cathode in a manner that improves the uniformity of the current distribution across the surface of the wafer to provide a more uniform plating of the wafer. Also, a secondary cathode is provide between the anode and cathode to alter the electrostatic field in order to improve the uniformity of the plating deposition across the surface of the wafer. With regard to minimizing damage to the wafer, the plating apparatus and method provides a conductive liquid to effectuate the cathode contact to the surface of the wafer.
摘要翻译：公开了一种电镀装置和方法，其特别可用于改善电镀速率，改善通孔的电镀，改善跨晶片表面的电镀沉积的均匀性，并最小化对晶片的损伤。关于提高电镀速度和通孔的电镀，电镀装置和方法将晶片浸入电镀液浴中，并且将电镀液持续地引向晶片表面。将晶片浸入电镀液浴中可以减少通孔内捕获的气穴的发生，从而使其更容易固定。电镀流体朝向晶片表面的连续引导增加了离子浓度梯度，这又提高了电镀速率。关于提高电镀沉积的均匀性，电镀装置和方法实现了浴内的随机水平流体流动，以减少在晶片表面上引起不均匀电镀沉积的相对长的水平流体流动的发生。此外，电镀装置和方法以提高晶片表面的电流分布的均匀性的方式配置阳极和阴极之间的静电场，以提供更均匀的晶片电镀。此外，在阳极和阴极之间提供二次阴极以改变静电场，以便提高穿过晶片表面的电镀沉积的均匀性。关于最小化对晶片的损害，电镀装置和方法提供导电液体以实现与晶片表面的阴极接触。

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