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1. 发明申请

US20050218382A1 Uphill screen printing in the manufacturing of microelectronic components 审中-公开
公开(公告)号：US20050218382A1
公开(公告)日：2005-10-06
申请号：US11140783
申请日：2005-05-31
申请人： John Michiels , Darryl Stansbury
发明人： John Michiels , Darryl Stansbury
IPC分类号： B41M1/12 , B41M1/34 , B41M3/00 , H01C1/00 , H01J9/02 , H05K1/09 , H05K1/18 , H05K3/12 , H05K3/24 , H05K3/46
CPC分类号： B41M1/12 , B41M1/34 , B41M3/006 , H01J29/92 , H01L51/0004 , H05K1/092 , H05K1/181 , H05K3/1233 , H05K3/248 , H05K3/4664 , H05K2201/035 , H05K2201/09045 , H05K2201/09981 , H05K2203/0264
摘要： Method for screen printing a continuous structure on a substrate wherein the screen printed structure extends from at least a first level to at least a second level. The disclosed method is particularly suitable for the fabrication of microelectronic devices and components thereof including the fabrication of field emission display devices. Preferably, a print screen of a preferred thickness having a preconfigured print pattern formed therethrough, in combination with a squeegee having a hardness within a preferred range, are used to force a screen printable substance onto a substrate while maintaining a portion of the print screen within a preferred reference angle. The resulting screen printed structure extends from at least one lower level to at least one upper level in a continuous “uphill” manner.

2. 发明授权

US06458515B2 Structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters 失效
标题翻译：结构，光刻掩模形成方法，掩模形成方法，场发射显示发射体掩模形成方法和形成多个场发射显示发射体的方法
公开(公告)号：US06458515B2
公开(公告)日：2002-10-01
申请号：US09947648
申请日：2001-09-05
申请人： John Michiels , David Wells , Eric J. Knappenberger , James J. Alwan
发明人： John Michiels , David Wells , Eric J. Knappenberger , James J. Alwan
IPC分类号： G03C500
CPC分类号： G03F7/00 , G03F7/0015 , H01J9/025 , H01J2329/00 , H01L21/0271 , H01L21/3081 , H01L21/31144 , Y10S430/15
摘要： The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.
摘要翻译：本发明包括结构，光刻掩模形成溶液，掩模形成方法，场致发射显示发射体掩模形成方法以及形成多场发射显示发射体的方法。本发明的一个方面提供一种掩模形成方法，包括在衬底的表面上形成掩模层; 在掩模层的表面上方式印刷多个掩蔽粒子; 以及使用所述掩模颗粒作为掩模去除所述掩蔽层的至少一部分。本发明的另一方面提供了一种形成多个场发射显示发射器的方法。该方法包括在发射极基板上形成掩模层; 在掩模层上方丝网印刷多个掩模颗粒; 去除屏幕印刷掩模颗粒之间的掩模层的部分以形成多个掩模元件; 从掩蔽元件去除掩蔽粒子; 以及去除所述发射极基板的部分以形成多个发射极。

3. 发明授权

US06586144B2 Mask forming methods and a field emission display emitter mask forming method 失效
标题翻译：掩模形成方法和场发射显示发射体掩模形成方法
公开(公告)号：US06586144B2
公开(公告)日：2003-07-01
申请号：US09819165
申请日：2001-03-27
申请人： John Michiels , David Wells , Eric J. Knappenberger , James J. Alwan
发明人： John Michiels , David Wells , Eric J. Knappenberger , James J. Alwan
IPC分类号： G03F900
CPC分类号： G03F7/00 , G03F7/0015 , H01J9/025 , H01J2329/00 , H01L21/0271 , H01L21/3081 , H01L21/31144 , Y10S430/15
摘要： The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.
摘要翻译：本发明包括结构，光刻掩模形成溶液，掩模形成方法，场致发射显示发射体掩模形成方法以及形成多场发射显示发射体的方法。本发明的一个方面提供一种掩模形成方法，包括在衬底的表面上形成掩模层; 在掩模层的表面上方式印刷多个掩蔽粒子; 以及使用所述掩模颗粒作为掩模去除所述掩蔽层的至少一部分。本发明的另一方面提供了一种形成多个场发射显示发射器的方法。该方法包括在发射极基板上形成掩模层; 在掩模层上方丝网印刷多个掩模颗粒; 去除屏幕印刷掩模颗粒之间的掩模层的部分以形成多个掩模元件; 从掩蔽元件去除掩蔽粒子; 以及去除所述发射极基板的部分以形成多个发射极。

4. 发明授权

US06573023B2 Structures and structure forming methods 失效
标题翻译：结构和结构形成方法
公开(公告)号：US06573023B2
公开(公告)日：2003-06-03
申请号：US09458758
申请日：1999-12-10
申请人： John Michiels , David Wells , Eric J. Knappenberger , James J. Alwan
发明人： John Michiels , David Wells , Eric J. Knappenberger , James J. Alwan
IPC分类号： G03C500
CPC分类号： G03F7/00 , G03F7/0015 , H01J9/025 , H01J2329/00 , H01L21/0271 , H01L21/3081 , H01L21/31144 , Y10S430/15
摘要： The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.
摘要翻译：本发明包括结构，光刻掩模形成溶液，掩模形成方法，场致发射显示发射体掩模形成方法以及形成多场发射显示发射体的方法。本发明的一个方面提供一种掩模形成方法，包括在衬底的表面上形成掩模层; 在掩模层的表面上方式印刷多个掩蔽粒子; 以及使用所述掩模颗粒作为掩模去除所述掩蔽层的至少一部分。本发明的另一方面提供了一种形成多个场发射显示发射器的方法。该方法包括在发射极基板上形成掩模层; 在掩模层上方丝网印刷多个掩模颗粒; 去除屏幕印刷掩模颗粒之间的掩模层的部分以形成多个掩模元件; 从掩蔽元件去除掩蔽粒子; 以及去除所述发射极基板的部分以形成多个发射极。

5. 发明授权

US06682873B2 Semiconductive substrate processing methods and methods of processing a semiconductive substrate 失效
标题翻译：半导体基板的加工方法和半导体基板的加工方法
公开(公告)号：US06682873B2
公开(公告)日：2004-01-27
申请号：US10253550
申请日：2002-09-23
申请人： John Michiels , David Wells , Eric J. Knappenberger , James J. Alwan
发明人： John Michiels , David Wells , Eric J. Knappenberger , James J. Alwan
IPC分类号： G03C500
CPC分类号： G03F7/00 , G03F7/0015 , H01J9/025 , H01J2329/00 , H01L21/0271 , H01L21/3081 , H01L21/31144 , Y10S430/15
摘要： The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.
摘要翻译：本发明包括结构，光刻掩模形成溶液，掩模形成方法，场致发射显示发射体掩模形成方法以及形成多场发射显示发射体的方法。本发明的一个方面提供一种掩模形成方法，包括在衬底的表面上形成掩模层; 在掩模层的表面上方式印刷多个掩蔽粒子; 以及使用所述掩模颗粒作为掩模去除所述掩蔽层的至少一部分。本发明的另一方面提供了一种形成多个场发射显示发射器的方法。该方法包括在发射极基板上形成掩模层; 在掩模层上方丝网印刷多个掩模颗粒; 去除屏幕印刷掩模颗粒之间的掩模层的部分以形成多个掩模元件; 从掩蔽元件去除掩蔽粒子; 以及去除所述发射极基板的部分以形成多个发射极。

6. 发明授权

US06537728B2 Structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters 失效
公开(公告)号：US06537728B2
公开(公告)日：2003-03-25
申请号：US09947647
申请日：2001-09-05
申请人： John Michiels , David Wells , Eric J. Knappenberger , James J. Alwan
发明人： John Michiels , David Wells , Eric J. Knappenberger , James J. Alwan
IPC分类号： G03C176
CPC分类号： G03F7/00 , G03F7/0015 , H01J9/025 , H01J2329/00 , H01L21/0271 , H01L21/3081 , H01L21/31144 , Y10S430/15
摘要： The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.

7. 发明授权

US06228538B1 Mask forming methods and field emission display emitter mask forming methods 失效
标题翻译：掩模形成方法和场发射显示发射体掩模形成方法
公开(公告)号：US06228538B1
公开(公告)日：2001-05-08
申请号：US09141809
申请日：1998-08-28
申请人： John Michiels , David Wells , Eric J. Knappenberger , James J. Alwan
发明人： John Michiels , David Wells , Eric J. Knappenberger , James J. Alwan
IPC分类号： G03F900
CPC分类号： G03F7/00 , G03F7/0015 , H01J9/025 , H01J2329/00 , H01L21/0271 , H01L21/3081 , H01L21/31144 , Y10S430/15
摘要： The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.
摘要翻译：本发明包括结构，光刻掩模形成溶液，掩模形成方法，场致发射显示发射体掩模形成方法以及形成多场发射显示发射体的方法。本发明的一个方面提供一种掩模形成方法，包括在衬底的表面上形成掩模层; 在掩模层的表面上方式印刷多个掩蔽粒子; 以及使用所述掩模颗粒作为掩模去除所述掩蔽层的至少一部分。本发明的另一方面提供了一种形成多个场发射显示发射器的方法。该方法包括在发射极基板上形成掩模层; 在掩模层上方丝网印刷多个掩模颗粒; 去除屏幕印刷掩模颗粒之间的掩模层的部分以形成多个掩模元件; 从掩蔽元件去除掩蔽粒子; 以及去除所述发射极基板的部分以形成多个发射极。

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