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    • 4. 发明授权
    • Ion beam definition of magnetoresistive field sensors
    • 磁阻场传感器的离子束定义
    • US06741429B1
    • 2004-05-25
    • US09669030
    • 2000-09-25
    • John Edward Eric BaglinLiesl FolksBruce Alvin GurneyBruce David Terris
    • John Edward Eric BaglinLiesl FolksBruce Alvin GurneyBruce David Terris
    • G11B539
    • B82Y25/00B82Y10/00G11B5/012G11B5/3163G11B5/3903G11B5/3909G11B2005/0016G11B2005/3996H01F10/3254H01F10/3259H01F10/3268H01F10/3272
    • A magnetoresistive (MR) sensor can be shaped using ion beam irradiation and/or implantation through a mask introduced between a MR structure and an ion source. The mask covers selected portions of the MR structure to define the track width of the sensor. Ion irradiation and/or implantation reduces the magnetoresistance of the unmasked portions while leaving the masked portion substantially unaltered. The mask can be a photoresist mask, an electron beam resist mask, or a stencil mask. Alternatively the mask may be part of a projection ion beam system. Track width resolution is determined at the mask production step. The edges of the sensor can be defined by a highly collimated ion beam producing an extremely straight transition edge, which reduces sensor noise and improves sensor track width control. Improved hard bias layers that directly abut the sensor may be used to achieve a suitable stability. A variety of longitudinal bias schemes are compatible with ion beam patterning.
    • 可以使用离子束照射和/或通过在MR结构和离子源之间引入的掩模注入来形成磁阻(MR)传感器。 掩模覆盖MR结构的所选部分以限定传感器的轨道宽度。 离子照射和/或注入降低未掩蔽部分的磁阻,同时使掩蔽部分基本上保持不变。 掩模可以是光致抗蚀剂掩模,电子束抗蚀剂掩模或模板掩模。 或者,掩模可以是投影离子束系统的一部分。 轨迹宽度分辨率在掩模生产步骤中确定。 传感器的边缘可以由高度准直的离子束限定,产生非常直的过渡边缘,这降低了传感器噪声并提高了传感器轨道宽度控制。 可以使用直接邻接传感器的改进的硬偏压层来实现合适的稳定性。 各种纵向偏置方案与离子束图案相容。