专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US6083663A Method for making positive working printing plates from a heat mode sensitive image element 有权
标题翻译：从加热模式敏感图像元件制作正性印刷版的方法
公开(公告)号：US6083663A
公开(公告)日：2000-07-04
申请号：US161469
申请日：1998-09-28
申请人： Joan Vermeersch , Marc Van Damme , Guido Hauquier , Eric Verschueren
发明人： Joan Vermeersch , Marc Van Damme , Guido Hauquier , Eric Verschueren
IPC分类号： B41C1/10 , B41M5/36 , G03F7/004
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： According to the present invention there is provided a method for making lithographic printing plates including the following steps:a) preparing a heat mode imaging element having on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution, a compound capable of converting light to heat and a top layer on the same side of the lithographic base as the first layer which top layer is unpenetrable for an alkaline developer containing SiO.sub.2 as silicate;b) exposing imagewise the heat mode imaging element to actinic light;c) developing the imagewise exposed heat mode imaging element with the alkaline developer so that the exposed areas of the top layer and the underlying areas of the first layer are dissolved and the unexposed areas of the first layer remain undissolved characterized in that said top layer includes an organic quaternary ammonium salt.
摘要翻译：根据本发明，提供一种制备平版印刷版的方法，包括以下步骤：a）制备具有亲水表面的平版印刷基底上的热模式成像元件，该第一层包括可溶于碱性水溶液的聚合物能够将光转换成热的化合物和在与第一层相同的一侧上的顶层，该顶层对于含有SiO 2作为硅酸盐的碱性显影剂是不可穿透的; b）将热模式成像元件成像曝光成光化光; c）用碱性显影剂显影图像曝光的热模式成像元件，使得顶层的暴露区域和第一层的下面的区域被溶解，并且第一层的未曝光区域保持不溶解，其特征在于所述顶层包括有机季铵盐。

2. 发明授权

US5462833A Lithographic base and a method for making a lithographic printing plate therewith 失效
标题翻译：平版印刷版及其制造方法
公开(公告)号：US5462833A
公开(公告)日：1995-10-31
申请号：US207709
申请日：1994-03-09
申请人： Guido Hauquier , Willem Cortens , Paul Coppens , Joan Vermeersch , Erik Mostaert , Eric Verschueren
发明人： Guido Hauquier , Willem Cortens , Paul Coppens , Joan Vermeersch , Erik Mostaert , Eric Verschueren
IPC分类号： B41N1/14 , B41N3/00 , B41N3/03 , G03F7/07 , G03C1/93 , G03F7/016
CPC分类号： B41N3/036 , G03F7/11 , B41C1/1008 , B41C1/1016 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/22 , B41C2210/24 , Y10T428/273 , Y10T428/31667 , Y10T428/31928
摘要： The present invention provides a lithographic base comprising on a hydrophobic support a subbing layer and a hydrophilic layer containing a hydrophilic (co)polymer or (co)polymer mixture and being hardened with a hydrolyzed tetraalkyl orthosilicate crosslinking agent characterized in that said subbing layer contains a hydrophilic binder and silica, the surface area of the silica being at least 300 m.sup.2 per gram.
摘要翻译：本发明提供了一种平版印刷基材，其在疏水性载体上包含底层和含有亲水（共）聚合物或（共）聚合物混合物并且与水解的原硅酸四烷基酯交联剂硬化的亲水层，其特征在于所述底层含有亲水性粘合剂和二氧化硅，二氧化硅的表面积至少为300m 2 / g。

3. 发明授权

US5445912A Lithographic base and a method for making a lithographic printing plate therewith 失效
标题翻译：平版印刷版及其制造方法
公开(公告)号：US5445912A
公开(公告)日：1995-08-29
申请号：US207712
申请日：1994-03-09
申请人： Guido Hauquier , Willem Cortens , Paul Coppens , Joan Vermeersch , Erik Mostaert , Eric Verschueren
发明人： Guido Hauquier , Willem Cortens , Paul Coppens , Joan Vermeersch , Erik Mostaert , Eric Verschueren
IPC分类号： B41C1/14 , B41N1/14 , B41N3/00 , B41N3/03 , G03F7/07 , G03C1/93 , G03F7/016
CPC分类号： B41N3/036 , G03F7/11 , B41C1/1008 , B41C1/1016 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/22 , B41C2210/24 , Y10T428/273 , Y10T428/31667 , Y10T428/31928
摘要： The present invention provides a lithographic base comprising on a hydrophobic support a subbing layer contiguous to a hydrophilic layer containing a hydrophilic (co)polymer or (co)polymer mixture and being hardened with a hydrolyzed tetraalkyl orthosilicate crosslinking agent characterized in that said subbing layer contains a hydrophilic binder and silica and is applied at a solids content of more than 200 mg per m.sup.2 but less than 750 mg per m.sup.2.
摘要翻译：本发明提供了一种平版印刷基底，其在疏水性载体上包含与亲水层邻接的底层，所述亲水层含有亲水（共）聚合物或（共）聚合物混合物，并用水解的原硅酸四烷基酯交联剂硬化，其特征在于所述底层含有亲水性粘合剂和二氧化硅，并以固体含量超过200mg / m2但小于750mg / m2施用。

4. 发明授权

US06192799B1 Heat mode sensitive imaging element for making positive working printing plates 有权
标题翻译：加热模式敏感成像元件，用于制作正性印刷版
公开(公告)号：US06192799B1
公开(公告)日：2001-02-27
申请号：US09267681
申请日：1999-03-15
申请人： Marc Van Damme , Joan Vermeersch , Guido Hauquier , Eric Verschueren
发明人： Marc Van Damme , Joan Vermeersch , Guido Hauquier , Eric Verschueren
IPC分类号： B41C110
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： According to the present invention there is provided a heat mode imaging element for making a lithographic printing plate having on a lithographic base with a hydrophilic surface a first layer including a polymer that is soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer that is IR-sensitive and unpenetrable for an alkaline developer; characterized in that at least one of the first layer and the top layer includes a surfactant.
摘要翻译：根据本发明，提供了一种热模式成像元件，用于制造在具有亲水表面的平版印刷基底上的平版印刷版，第一层包括可溶于碱性水溶液的聚合物和位于同一侧的顶层的光刻基底作为对于碱性显影剂是IR敏感且不透气的第一层; 其特征在于，所述第一层和所述顶层中的至少一个包括表面活性剂。

5. 发明授权

US6152036A Heat mode sensitive imaging element for making positive working printing plates 失效
标题翻译：加热模式敏感成像元件，用于制作正性印刷版
公开(公告)号：US6152036A
公开(公告)日：2000-11-28
申请号：US280659
申请日：1999-03-29
申请人： Eric Verschueren , Huub Van Aert , Joan Vermeersch , Marc Van Damme , Guido Hauquier
发明人： Eric Verschueren , Huub Van Aert , Joan Vermeersch , Marc Van Damme , Guido Hauquier
IPC分类号： B41C1/10 , B41M5/36 , G03F7/00
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/24 , B41C2210/26 , B41C2210/264
摘要： The present invention is directed to a heat mode imaging element for making a lithographic printing plate including on a lithographic base with a hydrophilic surface, a first layer including a polymer, soluble in an aqueous alkaline solution, and a top layer on the same side of the lithographic base as the first layer. The top layer is IR-sensitive and unpenetrable for an alkaline developer. The first layer and the top layer may be one and the same layer. The top layer is characterized in that it contains at least one compound containing epoxy units in an amount between 20 and 500 mg/m.sup.2 and a hardener.
摘要翻译：本发明涉及一种用于制造平版印刷版的热模式成像元件，该平版印刷版包括在具有亲水表面的光刻基底上，包含可溶于碱性水溶液的聚合物的第一层和位于同一侧的顶层光刻基底为第一层。顶层对于碱性显影剂是IR敏感的和不可穿透的。第一层和顶层可以是同一层。顶层的特征在于其含有至少一种含有20-500mg / m 2的环氧单元的化合物和一种硬化剂。

6. 发明授权

US5576136A Diazo based imaging element having improved storage stability 失效
标题翻译：重氮基成像元件具有改善的储存稳定性
公开(公告)号：US5576136A
公开(公告)日：1996-11-19
申请号：US267510
申请日：1994-06-29
申请人： Joan Vermeersch , Eric Verschueren , Guido Hauquier
发明人： Joan Vermeersch , Eric Verschueren , Guido Hauquier
IPC分类号： G03F7/00 , G03F7/004 , G03F7/016 , G03F7/021 , G03F7/033 , G03F7/11 , G03F7/16 , G03F7/38 , G03C1/93 , G03C1/77
CPC分类号： G03F7/168 , G03F7/021
摘要： According to the present invention the storage stability of a diazo based imaging element can be improved by controlling the amount of free water in the imaging element. Thus the present invention provides an imaging element comprising on a support a hydrophilic layer containing a hydrophilic (co)polymer or (co)polymer mixture and having been hardened with a hydrolyzed tetraalkyl orthosilicate and a light sensitive layer containing a diazo resin or a diazonium salt characterized in that the total amount of free water in said imaging element satisfies the following formula (I):FW (g/m.sup.2).ltoreq.0.0043 * WS (g/m.sup.2)+0.46 (g/m.sup.2) (I)wherein FW represents the amount of free water and WS represents the weight of the support of the imaging element.
摘要翻译：根据本发明，通过控制成像元件中的游离水的量，可以提高基于重氮的成像元件的储存稳定性。因此，本发明提供了一种成像元件，其在载体上包含含有亲水（共）聚合物或（共）聚合物混合物的亲水层，并且已经用水解的原硅酸四烷基酯和含有重氮树脂或重氮盐的光敏层硬化其特征在于，所述成像元件中的游离水的总量满足下式（I）：FW（g / m 2）

7. 发明授权

US06489079B1 Heat mode sensitive imaging element for making positive working printing plates 有权
标题翻译：加热模式敏感成像元件，用于制作正性印刷版
公开(公告)号：US06489079B1
公开(公告)日：2002-12-03
申请号：US09391421
申请日：1999-09-08
申请人： Eric Verschueren , Joan Vermeersch , Marc Van Damme , Guido Hauquier , Huub Van Aert
发明人： Eric Verschueren , Joan Vermeersch , Marc Van Damme , Guido Hauquier , Huub Van Aert
IPC分类号： G03F7004
CPC分类号： B41C1/1025 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/24 , B41N1/083 , Y10S430/165
摘要： According to the present invention there is provided a heat mode imaging element for making a lithographic printing plate comprising on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is IR-sensitive and unpenetrable for an alkaline developer wherein said first layer and said top layer may be one and the same layer; characterized in that said top layer contains at least one blockcopolymer in an amount between 0.5 and 500 mg/m2.
摘要翻译：根据本发明，提供一种用于制造平版印刷版的热模式成像元件，该平版印刷版包括在具有亲水表面的平版印刷基底上，第一层包括可溶于碱性水溶液的聚合物和位于同一侧上的顶层作为第一层的光刻基底，其顶层对于碱性显影剂是IR敏感的和不可穿透的，其中所述第一层和所述顶层可以是同一层; 其特征在于所述顶层含有至少一种0.5-500mg / m 2的嵌段共聚物。

8. 发明授权

US06472119B1 Heat mode sensitive imaging element for making positive working printing plates 有权
标题翻译：加热模式敏感成像元件，用于制作正性印刷版
公开(公告)号：US06472119B1
公开(公告)日：2002-10-29
申请号：US09476089
申请日：2000-01-03
申请人： Eric Verschueren , Joan Vermeersch , Marc Van Damme , Guido Hauquier
发明人： Eric Verschueren , Joan Vermeersch , Marc Van Damme , Guido Hauquier
IPC分类号： G03F7039
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： According to the present invention there is provided a heat ode imaging element for making a lithographic printing plate having n a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is IR-sensitive and unpenetrable or insoluble for an alkaline developer wherein said first layer and said top layer may be one and the same layer and said first layer and said top layer being the imaging layers; characterized in that said imaging layers have a glass transition temperature of at least 57° C.
摘要翻译：根据本发明，提供了一种用于制造平版印刷版的平版印刷版，其具有亲水表面的具有可溶于碱性水溶液的聚合物的第一层和具有亲水表面的第一层，作为第一层的光刻基底，其顶层对于碱性显影剂是IR敏感的且不可穿透的或不溶的，其中所述第一层和所述顶层可以是同一层，所述第一层和所述顶层是成像层; 其特征在于，所述成像层的玻璃化转变温度至少为57℃

9. 发明授权

US06455229B1 Method for making positive working printing plates 失效
标题翻译：制作正版印刷版的方法
公开(公告)号：US06455229B1
公开(公告)日：2002-09-24
申请号：US09476108
申请日：2000-01-03
申请人： Joan Vermeersch , Marc Van Damme , Guido Hauquier , Eric Verschueren
发明人： Joan Vermeersch , Marc Van Damme , Guido Hauquier , Eric Verschueren
IPC分类号： G03F7004
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41N3/08 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： According to the present invention there is provided a method for the preparation of a lithographic printing plate comprising the steps of exposing with IR light an imaging element comprising on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is IR-sensitive and unpenetratable for or insoluble in an alkaline developer wherein said first layer and said top layer may be one and the same layer, said imaging element comprising a siloxane surfactant; developing said exposed imaging element with an alkaline solution; gumming said developed imaging element with a baking gum solution; subjecting said gummed imaging element to a thermal treatment at a temperature above 50° C.; characterized in that said baking gum solution contains at least one surfactant making the contact angle between the baking gum solution and the surface of the plate less than 68° and/or at least one viscosity-regulating polymer making the viscosity of the baking gum solution between 1.7 cP and 5.0 cP.
摘要翻译：根据本发明，提供了一种制备平版印刷版的方法，包括以下步骤：用IR光照射成像元件，该成像元件在光刻基底上具有亲水表面，第一层包括可溶于碱性水溶液的聚合物以及与所述第一层在所述平版印刷基底的相同侧上的顶层，所述第一层的顶层对于碱性显影剂是IR敏感的且不可渗透的或不溶于碱性显影剂，其中所述第一层和所述顶层可以是同一层，所述成像元素，其包含硅氧烷表面活性剂;用碱性溶液显影所述暴露的成像元件;用烘焙胶溶液涂覆所述显影的成像元件;使所述胶状成像元件在高于50℃的温度下进行热处理;其特征在于，所述烘烤胶溶液含有至少一种表面活性剂，其使得烘焙胶溶液与表面之间的接触角小于68°的板和/或至少一种粘度调节聚合物，其使烘焙胶溶液的粘度在1.7cP和5.0cP之间。

10. 发明授权

US06342336B2 Heat mode sensitive imaging element for making positive working printing plates 有权
标题翻译：加热模式敏感成像元件，用于制作正性印刷版
公开(公告)号：US06342336B2
公开(公告)日：2002-01-29
申请号：US09263110
申请日：1999-03-05
申请人： Eric Verschueren , Marc Van Damme , Joan Vermeersch , Guido Hauquier , Jörg Jung , Helmuth Haberhauer
发明人： Eric Verschueren , Marc Van Damme , Joan Vermeersch , Guido Hauquier , Jörg Jung , Helmuth Haberhauer
IPC分类号： G03F7038
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41C2210/266
摘要： According to the present invention there is provided a heat mode imaging element for making a lithographic printing plate having on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution but not in water and less than 5% by weight versus the polymer, soluble in the aqueous alkaline solution of a hydrophilic polymer and a top layer on the same side of the lithographic base as the first layer which top layer is IR-sensitive and unpenetrable for or insoluble in an alkaline developer wherein said first layer and said top layer may be one and the same layer; characterized in that said top layer contains a compound selected from the group consisting of a polymer in an amount from 30 mg to 500 mg/m2, a triaryl methane dye and a phthalocyanine dye.
摘要翻译：根据本发明，提供了一种用于制造平版印刷版的平版印刷版，所述平版印刷版在具有亲水表面的平版印刷版上具有可溶于碱性水溶液而不在水中的小于5％的包含聚合物的第一层，相对于聚合物，可溶于亲水性聚合物的碱性水溶液中，并且与作为第一层的平版印刷基底的相同侧上的顶层是顶层对IR敏感且不可穿透或不溶于碱性显影剂，其中所述第一层和所述顶层可以是同一层; 其特征在于，所述顶层含有选自30mg至500mg / m 2的聚合物，三芳基甲烷染料和酞菁染料的化合物。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式