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1. 发明申请

US20100266966A1 Methods of forming a pattern using photoresist compositions 有权
标题翻译：使用光致抗蚀剂组合物形成图案的方法
公开(公告)号：US20100266966A1
公开(公告)日：2010-10-21
申请号：US12662455
申请日：2010-04-19
申请人： Ji-Man Park , Young-Ho Kim , Hyo-Jin Yun , Sun-Yul Ahn , Song-Se Yi , Kyung-Woo Park
发明人： Ji-Man Park , Young-Ho Kim , Hyo-Jin Yun , Sun-Yul Ahn , Song-Se Yi , Kyung-Woo Park
IPC分类号： G03F7/20
CPC分类号： G03F7/0048 , G03F7/0046 , G03F7/0392
摘要： A method of forming a pattern and a photoresist composition, the method including forming a photoresist film on a substrate by coating a photoresist composition thereon, the photoresist composition including a polymerized photoresist additive, a polymer including an acid-labile protective group at a side chain, a photoacid generator, and a solvent; exposing the photoresist film; and forming a photoresist pattern by developing the photoresist film using an aqueous alkali developer, wherein the polymerized photoresist additive includes a hydrophilic repeating unit having an aliphatic hydrocarbon backbone and a side chain containing an oxygen heteroatom in a heterocyclic ring substituted with at least three hydroxyl groups, and a hydrophobic repeating unit having an aliphatic hydrocarbon backbone and a side chain containing a fluorinated aliphatic hydrocarbon group.
摘要翻译：一种形成图案和光致抗蚀剂组合物的方法，所述方法包括通过在其上涂覆光致抗蚀剂组合物在基底上形成光致抗蚀剂膜，光致抗蚀剂组合物包括聚合的光致抗蚀剂添加剂，在侧链上包含酸不稳定保护基的聚合物，光致酸发生剂和溶剂; 曝光光刻胶膜; 以及通过使用含水碱性显影剂显影所述光致抗蚀剂膜来形成光致抗蚀剂图案，其中所述聚合的光致抗蚀剂添加剂包括具有脂族烃骨架的亲水性重复单元和在至少三个羟基取代的杂环中含有氧杂原子的侧链，以及具有脂肪族烃主链和含有氟化脂肪族烃基的侧链的疏水性重复单元。

2. 发明授权

US08247162B2 Methods of forming a pattern using photoresist compositions 有权
标题翻译：使用光致抗蚀剂组合物形成图案的方法
公开(公告)号：US08247162B2
公开(公告)日：2012-08-21
申请号：US12662455
申请日：2010-04-19
申请人： Ji-Man Park , Young-Ho Kim , Hyo-Jin Yun , Sun-Yul Ahn , Song-Se Yi , Kyung-Woo Park
发明人： Ji-Man Park , Young-Ho Kim , Hyo-Jin Yun , Sun-Yul Ahn , Song-Se Yi , Kyung-Woo Park
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0048 , G03F7/0046 , G03F7/0392
摘要： A method of forming a pattern and a photoresist composition, the method including forming a photoresist film on a substrate by coating a photoresist composition thereon, the photoresist composition including a polymerized photoresist additive, a polymer including an acid-labile protective group at a side chain, a photoacid generator, and a solvent; exposing the photoresist film; and forming a photoresist pattern by developing the photoresist film using an aqueous alkali developer, wherein the polymerized photoresist additive includes a hydrophilic repeating unit having an aliphatic hydrocarbon backbone and a side chain containing an oxygen heteroatom in a heterocyclic ring substituted with at least three hydroxyl groups, and a hydrophobic repeating unit having an aliphatic hydrocarbon backbone and a side chain containing a fluorinated aliphatic hydrocarbon group.
摘要翻译：一种形成图案和光致抗蚀剂组合物的方法，所述方法包括通过在其上涂覆光致抗蚀剂组合物在基底上形成光致抗蚀剂膜，光致抗蚀剂组合物包括聚合的光致抗蚀剂添加剂，在侧链上包含酸不稳定保护基的聚合物，光致酸发生剂和溶剂; 曝光光刻胶膜; 以及通过使用含水碱性显影剂显影所述光致抗蚀剂膜来形成光致抗蚀剂图案，其中所述聚合的光致抗蚀剂添加剂包括具有脂族烃骨架的亲水性重复单元和在至少三个羟基取代的杂环中含有氧杂原子的侧链，以及具有脂肪族烃主链和含有氟化脂肪族烃基的侧链的疏水性重复单元。

3. 发明授权

US07964332B2 Methods of forming a pattern of a semiconductor device 失效
标题翻译：形成半导体器件的图案的方法
公开(公告)号：US07964332B2
公开(公告)日：2011-06-21
申请号：US12339863
申请日：2008-12-19
申请人： Hyo-Jin Yun , Young-Ho Kim , Boo-Deuk Kim , Ji-Man Park , Jin-A Ryu , Jae-Hee Choi
发明人： Hyo-Jin Yun , Young-Ho Kim , Boo-Deuk Kim , Ji-Man Park , Jin-A Ryu , Jae-Hee Choi
IPC分类号： G03F7/00 , G03F7/004 , G03F7/11 , G03F7/26
CPC分类号： G03F7/091 , G03F7/038 , Y10S430/106 , Y10S430/114 , Y10S430/128
摘要： In polymers for an anti-reflective coating, compositions for an anti-reflective coating and methods of forming a pattern of a semiconductor device using the same, the compositions for an anti-reflective coating include a polymer that includes a first repeating unit having a basic side group, a second repeating unit having a light-absorbing group, and a third repeating unit having a cross-linkable group; a photoacid generator; a cross-linking agent; and a solvent. The polymer for the anti-reflective coating, which may have a basic side group chemically bound to a backbone of the polymer, may properly adjust diffusion of an acid in an anti-reflective coating layer to improve the profile of a pattern.
摘要翻译：在用于抗反射涂层的聚合物中，用于抗反射涂层的组合物和使用其形成半导体器件的图案的方法，用于抗反射涂层的组合物包括聚合物，其包括具有碱性具有光吸收基团的第二重复单元和具有可交联基团的第三重复单元; 光致酸发生器; 交联剂; 和溶剂。用于抗反射涂层的聚合物可以具有与聚合物的骨架化学结合的碱性侧基，可以适当地调节抗反射涂层中的酸的扩散以改善图案的轮廓。

4. 发明申请

US20090162796A1 METHODS OF FORMING A PATTERN OF A SEMICONDUCTOR DEVICE 失效
标题翻译：形成半导体器件图案的方法
公开(公告)号：US20090162796A1
公开(公告)日：2009-06-25
申请号：US12339863
申请日：2008-12-19
申请人： Hyo-Jin YUN , Young-Ho Kim , Boo-Deuk Kim , Ji-Man Park , Jin-A Ryu , Jae-Hee Choi
发明人： Hyo-Jin YUN , Young-Ho Kim , Boo-Deuk Kim , Ji-Man Park , Jin-A Ryu , Jae-Hee Choi
IPC分类号： G03F7/20
CPC分类号： G03F7/091 , G03F7/038 , Y10S430/106 , Y10S430/114 , Y10S430/128
摘要： In polymers for an anti-reflective coating, compositions for an anti-reflective coating and methods of forming a pattern of a semiconductor device using the same, the compositions for an anti-reflective coating include a polymer that includes a first repeating unit having a basic side group, a second repeating unit having a light-absorbing group, and a third repeating unit having a cross-linkable group; a photoacid generator; a cross-linking agent; and a solvent. The polymer for the anti-reflective coating, which may have a basic side group chemically bound to a backbone of the polymer, may properly adjust diffusion of an acid in an anti-reflective coating layer to improve the profile of a pattern.
摘要翻译：在用于抗反射涂层的聚合物中，用于抗反射涂层的组合物和使用其形成半导体器件的图案的方法，用于抗反射涂层的组合物包括聚合物，其包括具有碱性具有光吸收基团的第二重复单元和具有可交联基团的第三重复单元; 光致酸发生器; 交联剂; 和溶剂。用于抗反射涂层的聚合物可以具有与聚合物的骨架化学结合的碱性侧基，可以适当地调节抗反射涂层中的酸的扩散以改善图案的轮廓。

5. 发明授权

US08610565B2 RFID tag with LED and RF identification managing method using the same 有权
标题翻译：具有LED的RFID标签和使用其的RF识别管理方法
公开(公告)号：US08610565B2
公开(公告)日：2013-12-17
申请号：US12443443
申请日：2007-07-18
申请人： Ji-Man Park , Sung-Ik Jun
发明人： Ji-Man Park , Sung-Ik Jun
IPC分类号： G08B1/08
CPC分类号： G06K19/0723 , A61M2205/3569 , A61M2205/3592 , A61M2205/6054 , G06K19/0717 , G06K2017/009
摘要： A RFID tag having a LED is provided. The RFID tag includes an antenna, a RF processor, a controller, a memory, at least one of LEDs, and a LED switching unit. The RF processor receives and transmits a wireless signal through the antenna, and modulates and demodulates transmitted and received signal and data. The controller analyzes a received data outputted from the RF signal processor and generally controls the RFID tag. The memory stores the received data in response to the controller. The LED switching unit turns on/off at least one of the LEDs in response to the controller.
摘要翻译：提供具有LED的RFID标签。 RFID标签包括天线，RF处理器，控制器，存储器，LED中的至少一个以及LED开关单元。 RF处理器通过天线接收和发送无线信号，并对发送和接收的信号和数据进行调制和解调。控制器分析从RF信号处理器输出的接收数据，并通常控制RFID标签。存储器响应于控制器存储所接收的数据。 LED开关单元响应于控制器打开/关闭至少一个LED。

6. 发明申请

US20100289625A1 RFID TAG APPARATUS AND AUTHENTICATION METHOD THEREOF 审中-公开
标题翻译： RFID标签装置及其认证方法
公开(公告)号：US20100289625A1
公开(公告)日：2010-11-18
申请号：US12093642
申请日：2006-12-06
申请人： Ji-Man Park , Young-Soo Park , Young-Sae Kim , Sung-Ik Jun
发明人： Ji-Man Park , Young-Soo Park , Young-Sae Kim , Sung-Ik Jun
IPC分类号： H04Q5/22
CPC分类号： H04L63/0428 , G06K19/0723 , H04L63/08
摘要： Provided is a radio frequency identifier (RFID) tag apparatus and an authentication method thereof. The RFID tag apparatus includes a device, a device recognizing unit, an RF processor, and a controller. The device receives a first signal and outputs a second signal in response to the first signal. The device recognizing unit outputs the first signal to the device in response to control signal and receives the second signal to output n-bit data, where n is an integer greater than 1. The RF processor receives an RF signal and extracts information from the RF signal. The controller outputs the control signal to the device recognizing unit in response to the information and processes the n-bit data in response to the information.
摘要翻译：提供了一种射频识别器（RFID）标签装置及其认证方法。 RFID标签装置包括设备，设备识别单元，RF处理器和控制器。设备接收第一信号并响应于第一信号输出第二信号。设备识别单元响应于控制信号向设备输出第一信号，并接收第二信号以输出n位数据，其中n是大于1的整数。RF处理器接收RF信号并从RF提取信息信号。控制器响应于该信息将控制信号输出到设备识别单元，并根据该信息处理n位数据。

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