会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明申请
    • High-throughput printing of semiconductor precursor layer by use of chalcogen-containing vapor
    • 通过使用含硫属元素的蒸气对半导体前体层进行高通量打印
    • US20070169810A1
    • 2007-07-26
    • US11361464
    • 2006-02-23
    • Jeroen Van DurenMatthew RobinsonCraig Leidholm
    • Jeroen Van DurenMatthew RobinsonCraig Leidholm
    • H01L31/00
    • H01L31/0322C23C18/1204C23C18/127C23C18/1275Y02E10/541
    • A high-throughput method of forming a semiconductor precursor layer by use of a chalcogen-containing vapor is disclosed. In one embodiment, the method comprises forming a precursor material comprising group IB and/or group IIIA particles of any shape. The method may include forming a precursor layer of the precursor material over a surface of a substrate. The method may further include heating the particle precursor material in a substantially oxygen-free chalcogen atmosphere to a processing temperature sufficient to react the particles and to release chalcogen from the chalcogenide particles, wherein the chalcogen assumes a liquid form and acts as a flux to improve intermixing of elements to form a group IB-IIIA-chalcogenide film at a desired stoichiometric ratio. The chalcogen atmosphere may provide a partial pressure greater than or equal to the vapor pressure of liquid chalcogen in the precursor layer at the processing temperature.
    • 公开了一种通过使用含硫属原子的蒸气形成半导体前体层的高通量方法。 在一个实施方案中,该方法包括形成包含任何形状的IB族和/或IIIA族颗粒的前体材料。 该方法可以包括在衬底的表面上形成前体材料的前体层。 该方法还可以包括将基本上无氧的硫属元素气氛中的颗粒前体材料加热到足以使颗粒反应并从硫族化物颗粒中释放硫属元素的处理温度,其中硫族元素呈现液体形式并用作助熔剂以改善 元素的混合以期望的化学计量比形成IB-IIIA族硫族化合物膜。 硫属化合物气氛可以在处理温度下提供大于或等于前体层中液态硫属元素的蒸气压的分压。
    • 8. 发明申请
    • High-throughput printing of chalcogen layer
    • 高通量打印硫属元素层
    • US20070166453A1
    • 2007-07-19
    • US11361522
    • 2006-02-23
    • Jeroen Van DurenMatthew RobinsonCraig Leidholm
    • Jeroen Van DurenMatthew RobinsonCraig Leidholm
    • B05D3/00
    • C23C18/1283C23C18/1204C23C18/1225C23C18/1241C23C18/127H01L31/0322H01L31/06H01L31/0749H01L31/18Y02E10/541Y02P70/521
    • Methods and devices for high-throughput printing of a precursor material for forming a film of a group IB-IIIA-chalcogenide compound are disclosed. In one embodiment, the method comprises forming a precursor layer on a substrate, wherein the precursor layer comprises one or more discrete layers. The layers may include at least a first layer containing one or more group IB elements and two or more different group IIIA elements and at least a second layer containing elemental chalcogen particles. The precursor layer may be heated to a temperature sufficient to melt the chalcogen particles and to react the chalcogen particles with the one or more group IB elements and group IIIA elements in the precursor layer to form a film of a group IB-IIIA-chalcogenide compound. The method may also include making a film of group IB-IIIA-chalcogenide compound that includes mixing the nanoparticles and/or nanoglobules and/or nanodroplets to form an ink, depositing the ink on a substrate, heating to melt the extra chalcogen and to react the chalcogen with the group IB and group IIIA elements and/or chalcogenides to form a dense film.
    • 公开了用于形成IB-IIIA族硫族化合物化合物的膜的前体材料的高通量印刷的方法和装置。 在一个实施例中,该方法包括在衬底上形成前体层,其中前体层包含一个或多个离散层。 这些层可以包括至少包含一个或多个IB族元素和两个或更多个不同IIIA族元素的第一层和至少包含元素硫族元素颗粒的第二层。 可以将前体层加热到足以熔化硫族元素颗粒的温度,并使硫族元素颗粒与前体层中的一种或多种IB族元素和IIIA族元素反应,以形成IB-IIIA族硫族化合物组合物 。 该方法还可以包括制备IB-IIIA族硫族化合物化合物的膜,其包括混合纳米颗粒和/或纳米金属和/或纳米质子以形成油墨,将油墨沉积在基材上,加热熔化额外的硫属元素并反应 具有IB族和IIIA族元素和/或硫族化物的硫族化合物以形成致密膜。