专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20110216275A1 DISPLAY APPARATUS 有权
标题翻译：显示设备
公开(公告)号：US20110216275A1
公开(公告)日：2011-09-08
申请号：US13034173
申请日：2011-02-24
申请人： Jeongho LEE , Junho Song , Kyehun Lee , Swae-Hyun Kim
发明人： Jeongho LEE , Junho Song , Kyehun Lee , Swae-Hyun Kim
IPC分类号： G02F1/1335
CPC分类号： G02F1/1335
摘要： A display apparatus includes a display-controlling substrate and an opposite substrate facing the display-controlling substrate. The display-controlling substrate includes a base substrate portion and has a display area and a peripheral area surrounding the display area with pixel units being formed in the display area of the display-controlling substrate. Each pixel unit includes a gate line segment extending in a first direction and having a respective first width (W1), a data line segment, a color filter, a pixel electrode, and a storage electrode segment having a second width and extending in a direction different from that of the gate line segment. Spaces between adjacent pixel electrodes, where uncontrolled light might leak out are overlapped by one or the other of the first and second width segments where the widths of the opaque segments are wider than the overlapped space.
摘要翻译：显示装置包括显示控制基板和面对显示控制基板的相对基板。显示控制基板包括基底部分，并且具有显示区域和围绕显示区域的周边区域，其中像素单元形成在显示控制基板的显示区域中。每个像素单元包括在第一方向上延伸并且具有相应的第一宽度（W1），数据线段，滤色器，像素电极和具有第二宽度并沿着方向延伸的存储电极段的栅极线段不同于栅极线段。不受控制的光可能泄漏的相邻像素电极之间的空间被第一和第二宽度段中的一个或另一个重叠，其中不透明段的宽度比重叠的空间宽。

2. 发明授权

US08373828B2 Display apparatus 有权
标题翻译：显示装置
公开(公告)号：US08373828B2
公开(公告)日：2013-02-12
申请号：US13034173
申请日：2011-02-24
申请人： Jeongho Lee , Junho Song , Kyehun Lee , Swae-Hyun Kim
发明人： Jeongho Lee , Junho Song , Kyehun Lee , Swae-Hyun Kim
IPC分类号： G02F1/1335
CPC分类号： G02F1/1335
摘要： A display apparatus includes a display-controlling substrate and an opposite substrate facing the display-controlling substrate. The display-controlling substrate includes a base substrate portion and has a display area and a peripheral area surrounding the display area with pixel units being formed in the display area of the display-controlling substrate. Each pixel unit includes a gate line segment extending in a first direction and having a respective first width (W1), a data line segment, a color filter, a pixel electrode, and a storage electrode segment having a second width and extending in a direction different from that of the gate line segment. Spaces between adjacent pixel electrodes, where uncontrolled light might leak out are overlapped by one or the other of the first and second width segments where the widths of the opaque segments are wider than the overlapped space.
摘要翻译：显示装置包括显示控制基板和面对显示控制基板的相对基板。显示控制基板包括基底部分，并且具有显示区域和围绕显示区域的周边区域，其中像素单元形成在显示控制基板的显示区域中。每个像素单元包括在第一方向上延伸并且具有相应的第一宽度（W1），数据线段，滤色器，像素电极和具有第二宽度并沿着方向延伸的存储电极段的栅极线段不同于栅极线段。不受控制的光可能泄漏的相邻像素电极之间的空间被第一和第二宽度段中的一个或另一个重叠，其中不透明段的宽度比重叠的空间宽。

3. 发明申请

US20110086474A1 METHOD OF MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE 有权
标题翻译：制造薄膜晶体管基板的方法
公开(公告)号：US20110086474A1
公开(公告)日：2011-04-14
申请号：US12729172
申请日：2010-03-22
申请人： Hong-Kee CHIN , Yunjong Yeo , Sanggab Kim , Junho Song , Kyehun Lee , Ho-Jun Lee
发明人： Hong-Kee CHIN , Yunjong Yeo , Sanggab Kim , Junho Song , Kyehun Lee , Ho-Jun Lee
IPC分类号： H01L21/336
CPC分类号： H01L27/1288 , H01L27/1214
摘要： A method of manufacturing a thin film transistor substrate includes a first process in which a gate line pattern including a gate line and a gate electrode is formed with a first conductive material on a substrate using a first mask, a second process in which a first insulating layer is formed on the substrate and a data line pattern including a data line, a source electrode, and a drain electrode is formed with a second conductive material using a second mask, and a third process in which a second insulating layer is formed on the substrate and a pixel electrode connected to the drain electrode is formed on the second insulating layer with a third conductive material.
摘要翻译：制造薄膜晶体管基板的方法包括第一工艺，其中包括栅极线和栅电极的栅极线图案使用第一掩模在基板上形成第一导电材料;第二工艺，其中第一绝缘在衬底上形成层，并且使用第二掩模，用第二导电材料形成包括数据线，源电极和漏电极的数据线图案，以及在第二掩模上形成第二绝缘层的第三工艺连接到漏极的衬底和像素电极用第三导电材料形成在第二绝缘层上。

4. 发明授权

US08153463B2 Method of manufacturing thin film transistor substrate 有权
标题翻译：制造薄膜晶体管基板的方法
公开(公告)号：US08153463B2
公开(公告)日：2012-04-10
申请号：US12729172
申请日：2010-03-22
申请人： Hong-Kee Chin , Yunjong Yeo , Sanggab Kim , Junho Song , Kyehun Lee , Ho-Jun Lee
发明人： Hong-Kee Chin , Yunjong Yeo , Sanggab Kim , Junho Song , Kyehun Lee , Ho-Jun Lee
IPC分类号： H01L21/00
CPC分类号： H01L27/1288 , H01L27/1214
摘要： A method of manufacturing a thin film transistor substrate includes a first process in which a gate line pattern including a gate line and a gate electrode is formed with a first conductive material on a substrate using a first mask, a second process in which a first insulating layer is formed on the substrate and a data line pattern including a data line, a source electrode, and a drain electrode is formed with a second conductive material using a second mask, and a third process in which a second insulating layer is formed on the substrate and a pixel electrode connected to the drain electrode is formed on the second insulating layer with a third conductive material.
摘要翻译：制造薄膜晶体管基板的方法包括第一工艺，其中包括栅极线和栅电极的栅极线图案使用第一掩模在基板上形成第一导电材料;第二工艺，其中第一绝缘在衬底上形成层，并且使用第二掩模，用第二导电材料形成包括数据线，源电极和漏电极的数据线图案，以及在第二掩模上形成第二绝缘层的第三工艺连接到漏极的衬底和像素电极用第三导电材料形成在第二绝缘层上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式