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1. 发明申请

US20070049039A1 Method for fabricating a semiconductor device 有权
标题翻译：半导体器件的制造方法
公开(公告)号：US20070049039A1
公开(公告)日：2007-03-01
申请号：US11320977
申请日：2005-12-30
申请人： Jeong Jang , Kang Lee
发明人： Jeong Jang , Kang Lee
IPC分类号： H01L21/461
CPC分类号： H01L21/32139 , H01L21/31116 , H01L21/31138
摘要： Method for fabricating a semiconductor device in which a by-product of etching is deposited on a photoresist film for using as a mask. The method for fabricating a semiconductor device includes the steps of depositing a polysilicon, and a bottom anti-refection coating on an entire surface of a substrate in succession, forming a photoresist film pattern on a predetermined portion of the bottom anti-refection coating, etching the bottom anti-refection coating by using the photoresist film pattern to deposit by-product of the etching on sidewalls of the photoresist pattern to form spacers, and etching the polysilicon by using the photoresist film pattern and the spacers, to form a line.
摘要翻译：制造半导体器件的方法，其中蚀刻副产物沉积在用作掩模的光致抗蚀剂膜上。制造半导体器件的方法包括以下步骤：在基片的整个表面上依次沉积多晶硅和底部抗反射涂层，在底部抗反射涂层的预定部分上形成光致抗蚀剂膜图案，蚀刻通过使用光致抗蚀剂膜图案沉积蚀刻的副产物的底部抗反射涂层以形成间隔物，并且通过使用光致抗蚀剂膜图案和间隔物蚀刻多晶硅以形成线。

2. 发明申请

US20070028184A1 Automatically generating a search result in a separate window for a displayed symbol that is selected with a drag and drop control 有权
标题翻译：在使用拖放控制选择的显示符号的单独窗口中自动生成搜索结果
公开(公告)号：US20070028184A1
公开(公告)日：2007-02-01
申请号：US11190685
申请日：2005-07-27
申请人： Jeong Jang
发明人： Jeong Jang
IPC分类号： G06F9/00
CPC分类号： G06F17/30882 , G06F3/04842 , G06F3/0486
摘要： A system and method are directed towards using an icon, animation, or other indicator to search for content associated with one or more words, language characters, or other symbols on a display. A pointing device, such as a mouse, is used to drag and drop the indicator onto a displayed symbol. Display data near the drop location of the indicator are evaluated to determine one or more words or other symbols. A determined symbol is submitted to a search system to access a definition, a translation, an encyclopedia entry, an audio clip, an image, and/or other content associated with the determined symbol. The indicator may be controlled on a client device which initiates the search by submitting a search request over a network to a server. Resulting content is displayed in a separate result window, which may also include tabs, buttons, and/or other elements for selecting other content.
摘要翻译：系统和方法针对使用图标，动画或其他指示符来搜索与一个或多个单词，语言字符或显示器上的其他符号相关联的内容。诸如鼠标的指示设备用于将指示器拖放到显示的符号上。评估指示符的放置位置附近的显示数据以确定一个或多个单词或其它符号。将确定的符号提交给搜索系统以访问与确定的符号相关联的定义，翻译，百科全书条目，音频剪辑，图像和/或其他内容。可以通过在网络上向服务器提交搜索请求来发起搜索的客户端设备上控制指示符。结果内容显示在单独的结果窗口中，该结果窗口还可以包括用于选择其他内容的选项卡，按钮和/或其他元素。

3. 发明申请

US20050142680A1 Method for fabrication liquid crystal display device and diffraction mask therefor 有权
$Method for fabrication liquid crystal display device and diffraction mask therefor$
标题翻译：制造液晶显示装置的方法及其衍射掩模
公开(公告)号：US20050142680A1
公开(公告)日：2005-06-30
申请号：US11010528
申请日：2004-12-13
申请人： Yong Ha , Hun Jeoung , Jeong Jang
发明人： Yong Ha , Hun Jeoung , Jeong Jang
IPC分类号： G02F1/136 , G02F1/1362 , H01L21/336 , H01L21/77 , H01L21/84 , H01L27/12 , H01L29/786 , H01L21/00 , H01L29/76 , H01L29/94 , H01L31/062 , H01L31/113 , H01L31/119
CPC分类号： H01L27/1288 , G02F1/136213 , G02F1/136227 , G02F2001/136231 , G02F2001/136236 , H01L27/1214 , H01L27/1274 , H01L29/66757 , H01L29/78645
摘要： An LCD is fabricated using a diffraction mask with transmissive, semi-transmissive, and opaque regions. The semi-transmissive region permits formation of a transmission, reflection, or pixel electrode, depending on the type of LCD being fabricated, using the same masking process as that to produce contact holes in an insulating film and a conductive layer. Photoresist exposed through the semi-transmissive region is partially removed during developing that completely removes photoresist in the transmissive or opaque region. The contact holes are formed in the region in which the photoresist is completely removed, the photoresist and underlying conductive layer in the semi-transmissive region are then removed, and the remaining photoresist is stripped.
摘要翻译：使用具有透射，半透射和不透明区域的衍射掩模制造LCD。使用与在绝缘膜和导电层中产生接触孔相同的掩模工艺，根据所制造的LCD的类型，半透射区域允许形成透射，反射或像素电极。通过半透射区域曝光的光致抗蚀剂在显影期间被部分去除，从而完全去除透射或不透明区域中的光致抗蚀剂。接触孔形成在其中光致抗蚀剂被完全去除的区域中，然后去除半透射区域中的光致抗蚀剂和下面的导电层，并且剩余的光致抗蚀剂被剥离。

4. 发明申请

US20080017938A1 Semiconductor device and manufacturing method thereof 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US20080017938A1
公开(公告)日：2008-01-24
申请号：US11880473
申请日：2007-07-20
申请人： Jeong Jang
发明人： Jeong Jang
IPC分类号： H01L29/94 , H01L31/062
CPC分类号： H01L29/7833 , H01L29/6656 , H01L29/6659
摘要： A method for manufacturing a semiconductor device includes: forming a device isolation layer in a semiconductor substrate; forming a gate insulating layer and a gate electrode on the semiconductor substrate; depositing a triple layer over the resulting structure, the triple layer including a bottom oxide layer, a nitride oxide layer and a top oxide layer; and etching the triple layer to form spacers.
摘要翻译：一种制造半导体器件的方法包括：在半导体衬底中形成器件隔离层; 在半导体衬底上形成栅极绝缘层和栅电极; 在所得结构上沉积三层，所述三层包括底部氧化物层，氮化物氧化物层和顶部氧化物层; 并蚀刻三层以形成间隔物。

5. 发明申请

US20050243267A1 LCD substrate structure and fabrication method 有权
标题翻译： LCD基板结构及制作方法
公开(公告)号：US20050243267A1
公开(公告)日：2005-11-03
申请号：US11002019
申请日：2004-12-02
申请人： Hun Jeoung , Jeong Jang
发明人： Hun Jeoung , Jeong Jang
IPC分类号： G02F1/13 , G02F1/133 , G02F1/1333
CPC分类号： G02F1/133351 , G02F1/1309
摘要： An LCD substrate including multiple LCD panels may be cut along a scribing boundary. All or part of one or more test pads or test signal lines may extend in whole or in part across the scribing boundary. When the LCD substrate is cut along the scribing boundary, the test pads or test signal lines are cut or removed.
摘要翻译：可以沿着划线边界切割包括多个LCD面板的LCD基板。一个或多个测试垫或测试信号线的全部或部分可以全部或部分地跨越划线边界延伸。当沿着划刻边界切割LCD基板时，切割或去除测试焊盘或测试信号线。

6. 发明申请

US20080023737A1 Image sensor and method for manufacturing the same 审中-公开
标题翻译：图像传感器及其制造方法
公开(公告)号：US20080023737A1
公开(公告)日：2008-01-31
申请号：US11878384
申请日：2007-07-24
申请人： Sang Hwang , Jeong Jang
发明人： Sang Hwang , Jeong Jang
IPC分类号： H01L31/113 , H01L21/00
CPC分类号： H01L27/14689 , H01L27/14609 , H01L27/14627
摘要： An image sensor and a method for manufacturing the same are provided. In the method, a photoresist is formed on a substrate including a photodiode region and a gate electrode opposite to the photodiode region on the basis of the gate electrode. An oxide layer is formed to a specific thickness on both the photodiode region and a part of the gate electrode. The photoresist is removed from the substrate and cleaned. A first oxide film is formed on the substrate, the gate electrode, and the oxide layer remaining on the photodiode region. A nitride film is formed on the first oxide film. And a second oxide film is formed on the nitride film. Blank etching is performed on the first oxide film, the nitride film, and the second oxide film to form a spacer at the side of the gate electrode.
摘要翻译：提供了图像传感器及其制造方法。在该方法中，基于栅电极，在包括光电二极管区域和与光电二极管区域相对的栅电极的基板上形成光致抗蚀剂。在光电二极管区域和栅电极的一部分上形成特定厚度的氧化物层。将光致抗蚀剂从基材上除去并进行清洁。第一氧化物膜形成在基板上，栅极电极和保留在光电二极管区域上的氧化物层。在第一氧化物膜上形成氮化物膜。并且在氮化膜上形成第二氧化膜。在第一氧化膜，氮化物膜和第二氧化物膜上进行空白蚀刻，以在栅极侧形成间隔物。

7. 发明申请

US20070122753A1 Method for manufacturing semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US20070122753A1
公开(公告)日：2007-05-31
申请号：US11605552
申请日：2006-11-28
申请人： Jeong Jang
发明人： Jeong Jang
IPC分类号： G03F7/26
CPC分类号： G03F7/40 , G03F7/091 , H01L21/0337 , H01L21/0338 , H01L21/31116 , H01L21/31138 , H01L21/32137 , H01L21/32139
摘要： A method for manufacturing a semiconductor device is provided. The method includes forming a polysilicon layer on a semiconductor substrate, forming an anti-reflection coating on the polysilicon layer, forming a photoresist (PR) layer pattern on the anti-reflection coating, etching the anti-reflection coating using the PR layer pattern as a mask in capacitive coupled plasma (CCP) equipment using CF4, Ar, and O2, so as to cause a reaction by-product generated by etching the anti-reflect coating to be deposited on sidewalls of the PR layer pattern, thereby forming spacers, and etching the polysilicon layer using the PR layer pattern and the spacers as a mask.
摘要翻译：提供一种制造半导体器件的方法。该方法包括在半导体衬底上形成多晶硅层，在多晶硅层上形成抗反射涂层，在抗反射涂层上形成光致抗蚀剂（PR）层图案，使用PR层图案蚀刻抗反射涂层在使用CF 4，Ar和O 2的电容耦合等离子体（CCP）设备中的掩模，以产生通过蚀刻抗反射产生的反应副产物涂层沉积在PR层图案的侧壁上，从而形成间隔物，并使用PR层图案和间隔物作为掩模蚀刻多晶硅层。

8. 发明申请

US20050227395A1 Array substrate of liquid crystal display and fabrication method thereof 有权
标题翻译：液晶显示阵列基板及其制造方法
公开(公告)号：US20050227395A1
公开(公告)日：2005-10-13
申请号：US10946128
申请日：2004-09-21
申请人： Hun Jeoung , Jeong Jang
发明人： Hun Jeoung , Jeong Jang
IPC分类号： G02F1/1368 , G02F1/133 , G02F1/1343 , G02F1/136 , G02F1/1362 , G03F7/20 , G09F9/00 , G09F9/30 , H01L21/00 , H01L21/336 , H01L29/786
CPC分类号： G02F1/136227 , G02F1/1368
摘要： Provided is an array substrate of an LCD that includes a substrate, an active layer, a first insulating layer, and a gate electrode sequentially formed on the substrate. A source region and a drain region reside in predetermined regions of the active layer and each is doped with impurity ions. A second insulating layer overlies an entire surface of the substrate including the gate electrode. A pixel electrode resides on the second insulating layer. First and second contact holes reside in the first and second insulating layer and expose portions of the source region and the drain region, respectively. A portion of a source electrode contacts the source region through the first contact hole and a first portion of a drain electrode contacts the drain region and a second portion contacts the pixel electrode.
摘要翻译：提供了一种LCD的阵列基板，其包括顺序形成在基板上的基板，有源层，第一绝缘层和栅极电极。源极区域和漏极区域位于有源层的预定区域中，并且各自掺杂有杂质离子。第二绝缘层覆盖包括栅电极的基板的整个表面。像素电极位于第二绝缘层上。第一和第二接触孔位于第一绝缘层和第二绝缘层中，分别暴露出源极区和漏极区的部分。源电极的一部分通过第一接触孔接触源极区域，漏电极的第一部分接触漏极区域，第二部分接触像素电极。

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