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    • 5. 发明授权
    • Diode-based ESD concept for DEMOS protection
    • 基于二极管的ESD概念,用于DEMOS保护
    • US09048096B2
    • 2015-06-02
    • US11844965
    • 2007-08-24
    • Jens SchneiderKlaus RoeschlauHarald Gossner
    • Jens SchneiderKlaus RoeschlauHarald Gossner
    • H01L23/62H01L27/02
    • H01L27/0259H01L27/0255H01L29/0684H01L29/0804H01L29/0821H01L29/1004H01L29/732H01L29/7833H02H9/041
    • The invention relates to an ESD protection circuit for an integrated circuit including a drain-extended MOS device and an output pad that requires protection. The ESD protection circuit includes a first diode coupled to the output pad and to a bias voltage rail, a second diode coupled to the output pad and to another bias voltage rail, and an ESD power clamp coupled between the two bias voltage rails. The ESD power clamp is formed as a vertical npn transistor with its base and emitter coupled together. The collector of the npn transistor is formed using an n-well implantation and a DEMOS n-drain extension to produce a snapback-based voltage limiting characteristic. The diodes are formed with a lightly p-doped substrate region over a buried n-type layer, and a p-well implant and an n-well implant separated by intervening substrate. A third diode may be coupled between the two bias voltage rails.
    • 本发明涉及一种用于集成电路的ESD保护电路,其包括需要保护的漏极扩展MOS器件和输出焊盘。 ESD保护电路包括耦合到输出焊盘和偏置电压轨道的第一二极管,耦合到输出焊盘和另一个偏置电压轨道的第二二极管,以及耦合在两个偏置电压轨道之间的ESD功率钳位。 ESD功率钳位形成为垂直的npn晶体管,其基极和发射极耦合在一起。 npn晶体管的集电极使用n阱注入和DEMOS n漏极扩展形成,以产生基于快速恢复的电压限制特性。 二极管由掩埋的n型层上的轻掺杂p型衬底区域和由插入衬底分离的p阱注入和n阱注入形成。 第三二极管可以耦合在两个偏置电压轨道之间。
    • 8. 发明申请
    • Diode-Based ESD Concept for DEMOS Protection
    • 用于DEMOS保护的基于二极管的ESD概念
    • US20090050970A1
    • 2009-02-26
    • US11844965
    • 2007-08-24
    • Jens SchneiderKlaus RoeschlauHarald Gossner
    • Jens SchneiderKlaus RoeschlauHarald Gossner
    • H01L23/62H01L21/8249
    • H01L27/0259H01L27/0255H01L29/0684H01L29/0804H01L29/0821H01L29/1004H01L29/732H01L29/7833H02H9/041
    • The invention relates to an ESD protection circuit for an integrated circuit including a drain-extended MOS device and an output pad that requires protection. The ESD protection circuit includes a first diode coupled to the output pad and to a bias voltage rail, a second diode coupled to the output pad and to another bias voltage rail, and an ESD power clamp coupled between the two bias voltage rails. The ESD power clamp is formed as a vertical npn transistor with its base and emitter coupled together. The collector of the npn transistor is formed using an n-well implantation and a DEMOS n-drain extension to produce a snapback-based voltage limiting characteristic. The diodes are formed with a lightly p-doped substrate region over a buried n-type layer, and a p-well implant and an n-well implant separated by intervening substrate. A third diode may be coupled between the two bias voltage rails.
    • 本发明涉及一种用于集成电路的ESD保护电路,其包括需要保护的漏极扩展MOS器件和输出焊盘。 ESD保护电路包括耦合到输出焊盘和偏置电压轨道的第一二极管,耦合到输出焊盘和另一个偏置电压轨道的第二二极管,以及耦合在两个偏置电压轨道之间的ESD功率钳位。 ESD功率钳位形成为垂直的npn晶体管,其基极和发射极耦合在一起。 npn晶体管的集电极使用n阱注入和DEMOS n漏极扩展形成,以产生基于快速恢复的电压限制特性。 二极管由掩埋的n型层上的轻掺杂p型衬底区域和由插入衬底分离的p阱注入和n阱注入形成。 第三二极管可以耦合在两个偏置电压轨道之间。