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1. 发明授权

US07972569B2 Catalyst and systems incorporating the catalyst 有权
标题翻译：催化剂和掺入催化剂的体系
公开(公告)号：US07972569B2
公开(公告)日：2011-07-05
申请号：US12361377
申请日：2009-01-28
申请人： Jeffrey W. Elam , Michael J. Pellin , Joseph A. Libera , Peter C. Stair , Gerry Zajac , Steven A. Cohen
发明人： Jeffrey W. Elam , Michael J. Pellin , Joseph A. Libera , Peter C. Stair , Gerry Zajac , Steven A. Cohen
IPC分类号： B01J8/02 , B01J8/18 , B01J23/00
CPC分类号： B01J8/1836 , B01J23/002 , B01J23/30 , B01J35/023 , B01J35/065 , B01J35/1014 , B01J35/1019 , B01J35/1061 , B01J37/0238 , B01J37/0244 , B01J2523/00 , C23C16/405 , C23C16/45525 , B01J2523/55 , B01J2523/56 , B01J2523/69
摘要： A catalyst includes a carrier body and a catalytic portion carried by the carrier body. The catalytic portion includes a plurality of distinct layers of catalytic material, which layers may be deposited through atomic layer deposition techniques. The catalyst may have a selectivity for the conversion of alkanes to alkenes of over 50%. The catalyst may be incorporated in a reactor such as a fluidized bed reactor or a single pass reactor.
摘要翻译：催化剂包括载体和由载体承载的催化部分。催化部分包括多个不同层的催化材料，这些层可以通过原子层沉积技术沉积。催化剂可以具有选择性，使烷烃转化为烯烃超过50％。催化剂可以并入反应器如流化床反应器或单程反应器中。

2. 发明申请

US20090191101A1 CATALYST AND SYSTEMS INCORPORATING THE CATALYST 有权
标题翻译：催化剂和催化剂体系
公开(公告)号：US20090191101A1
公开(公告)日：2009-07-30
申请号：US12361377
申请日：2009-01-28
申请人： Jeffrey W. ELAM , Michael J. Pellin , Joseph A. Libera , Peter C. Stair , Gerry Zajac , Steven A. Cohen
发明人： Jeffrey W. ELAM , Michael J. Pellin , Joseph A. Libera , Peter C. Stair , Gerry Zajac , Steven A. Cohen
IPC分类号： B01J8/18 , B01J23/22 , B01J23/20 , B01J23/30 , B01J19/24
CPC分类号： B01J8/1836 , B01J23/002 , B01J23/30 , B01J35/023 , B01J35/065 , B01J35/1014 , B01J35/1019 , B01J35/1061 , B01J37/0238 , B01J37/0244 , B01J2523/00 , C23C16/405 , C23C16/45525 , B01J2523/55 , B01J2523/56 , B01J2523/69
摘要： A catalyst includes a carrier body and a catalytic portion carried by the carrier body. The catalytic portion includes a plurality of distinct layers of catalytic material, which layers may be deposited through atomic layer deposition techniques. The catalyst may have a selectivity for the conversion of alkanes to alkenes of over 50%. The catalyst may be incorporated in a reactor such as a fluidized bed reactor or a single pass reactor.
摘要翻译：催化剂包括载体和由载体承载的催化部分。催化部分包括多个不同层的催化材料，这些层可以通过原子层沉积技术沉积。催化剂可以具有选择性，使烷烃转化为烯烃超过50％。催化剂可以并入反应器如流化床反应器或单程反应器中。

3. 发明授权

US08318248B2 Spatially controlled atomic layer deposition in porous materials 有权
标题翻译：多孔材料中的空间控制原子层沉积
公开(公告)号：US08318248B2
公开(公告)日：2012-11-27
申请号：US12478578
申请日：2009-06-04
申请人： Jeffrey W. Elam , Joseph A. Libera , Michael J. Pellin , Peter C. Stair
发明人： Jeffrey W. Elam , Joseph A. Libera , Michael J. Pellin , Peter C. Stair
IPC分类号： C23C16/00
CPC分类号： B01J37/0226 , B01J35/065 , C23C16/042 , C23C16/045 , C23C16/403 , C23C16/405 , C23C16/407 , C23C16/45525 , C23C16/45555
摘要： Methods for the selective deposition of materials within a porous substrate. The methods use the passivating effects of masking precursors applied to the porous substrate. A portion of a pore surface within the substrate is masked by exposing the substrate to one or more masking precursors. The depth of the pore surface that is masked is controllable by regulating the exposure of the substrate to the masking precursor. Application of the masking precursor prevents adsorption of one or more subsequently applied metal precursors about a portion of the pore surface coated by the masking precursor. Less than an entirety of the unmasked pore surface is coated by the metal precursor, forming a metal stripe on a portion of the pore surface. The depth of the metal stripe is controllable by regulating exposure of the porous substrate to the metal precursor. Subsequent exposure of the substrate to a saturating water application oxidizes the deposited precursors.
摘要翻译：在多孔基材内选择性沉积材料的方法。该方法使用掩蔽前体施加到多孔基材上的钝化作用。通过将衬底暴露于一个或多个掩模前体来掩蔽衬底内的孔表面的一部分。被掩蔽的孔表面的深度可通过调节衬底对掩蔽前体的曝光来控制。掩蔽前体的应用防止一个或多个随后施加的金属前体在被掩蔽前体涂覆的孔表面的一部分附近吸附。小于整个未掩模的孔表面被金属前体涂覆，在孔表面的一部分上形成金属条纹。通过调节多孔基材对金属前体的曝光来控制金属条纹的深度。随后将底物暴露于饱和水中，使沉积的前体氧化。

4. 发明申请

US20090304920A1 SPATIALLY CONTROLLED ATOMIC LAYER DEPOSITION IN POROUS MATERIALS 有权
标题翻译：空间控制原子层沉积在多孔材料中
公开(公告)号：US20090304920A1
公开(公告)日：2009-12-10
申请号：US12478578
申请日：2009-06-04
申请人： Jeffrey W. ELAM , Joseph A. Libera , Michael J. Pellin , Peter C. Stair
发明人： Jeffrey W. ELAM , Joseph A. Libera , Michael J. Pellin , Peter C. Stair
IPC分类号： B05D3/00 , B05D7/00 , B01J8/02 , B05D7/22
CPC分类号： B01J37/0226 , B01J35/065 , C23C16/042 , C23C16/045 , C23C16/403 , C23C16/405 , C23C16/407 , C23C16/45525 , C23C16/45555
摘要： Methods for the selective deposition of materials within a porous substrate. The methods use the passivating effects of masking precursors applied to the porous substrate. A portion of a pore surface within the substrate is masked by exposing the substrate to one or more masking precursors. The depth of the pore surface that is masked is controllable by regulating the exposure of the substrate to the masking precursor. Application of the masking precursor prevents adsorption of one or more subsequently applied metal precursors about a portion of the pore surface coated by the masking precursor. Less than an entirety of the unmasked pore surface is coated by the metal precursor, forming a metal stripe on a portion of the pore surface. The depth of the metal stripe is controllable by regulating exposure of the porous substrate to the metal precursor. Subsequent exposure of the substrate to a saturating water application oxidizes the deposited precursors.
摘要翻译：在多孔基材内选择性沉积材料的方法。该方法使用掩蔽前体施加到多孔基材上的钝化作用。通过将衬底暴露于一个或多个掩模前体来掩蔽衬底内的孔表面的一部分。被掩蔽的孔表面的深度可通过调节衬底对掩蔽前体的曝光来控制。掩蔽前体的应用防止一个或多个随后施加的金属前体在被掩蔽前体涂覆的孔表面的一部分附近吸附。小于整个未掩模的孔表面被金属前体涂覆，在孔表面的一部分上形成金属条纹。通过调节多孔基材对金属前体的曝光来控制金属条纹的深度。随后将底物暴露于饱和水中，使沉积的前体氧化。

5. 发明授权

US08741800B2 Hydrothermal performance of catalyst supports 有权
标题翻译：催化剂载体的水热性能
公开(公告)号：US08741800B2
公开(公告)日：2014-06-03
申请号：US12841805
申请日：2010-07-22
申请人： Jeffrey W. Elam , Christopher L. Marshall , Joseph A. Libera , James A. Dumesic , Yomaira J. Pagan-Torres
发明人： Jeffrey W. Elam , Christopher L. Marshall , Joseph A. Libera , James A. Dumesic , Yomaira J. Pagan-Torres
IPC分类号： B01J23/00 , B01J27/02 , B01J27/24 , C23C16/00 , C23C16/06 , C23C16/22 , C23C16/40
CPC分类号： B01J29/78 , B01J21/063 , B01J21/066 , B01J23/20 , B01J29/041 , B01J29/06 , B01J29/061 , B01J35/002 , B01J35/1019 , B01J35/1023 , B01J35/1042 , B01J35/1047 , B01J35/1061 , B01J37/0215 , B01J37/14 , B01J37/348 , B01J2229/186
摘要： A high surface area catalyst with a mesoporous support structure and a thin conformal coating over the surface of the support structure. The high surface area catalyst support is adapted for carrying out a reaction in a reaction environment where the thin conformal coating protects the support structure within the reaction environment. In various embodiments, the support structure is a mesoporous silica catalytic support and the thin conformal coating comprises a layer of metal oxide resistant to the reaction environment which may be a hydrothermal environment.
摘要翻译：具有介孔载体结构的高表面积催化剂和在支撑结构表面上的薄的共形涂层。高表面积催化剂载体适于在反应环境中进行反应，其中薄的共形涂层保护反应环境内的载体结构。在各种实施方案中，支撑结构是介孔二氧化硅催化载体，并且薄的共形涂层包含对可能是水热环境的反应环境有抗性的金属氧化物层。

6. 发明申请

US20140053779A1 MICRO-BALANCE SENSOR INTEGRATED WITH ATOMIC LAYER DEPOSITION CHAMBER 有权
标题翻译：微平衡传感器与原子层沉积室集成
公开(公告)号：US20140053779A1
公开(公告)日：2014-02-27
申请号：US13591498
申请日：2012-08-22
申请人： Alex B. F. Martinson , Joseph A. Libera , Jeffrey W. Elam , Shannon C. Riha
发明人： Alex B. F. Martinson , Joseph A. Libera , Jeffrey W. Elam , Shannon C. Riha
IPC分类号： C23C16/44 , C23C16/50
CPC分类号： C23C16/45525 , C23C16/52
摘要： The invention is directed to QCM measurements in monitoring ALD processes. Previously, significant barriers remain in the ALD processes and accurate execution. To turn this exclusively dedicated in situ technique into a routine characterization method, an integral QCM fixture was developed. This new design is easily implemented on a variety of ALD tools, allows rapid sample exchange, prevents backside deposition, and minimizes both the footprint and flow disturbance. Unlike previous QCM designs, the fast thermal equilibration enables tasks such as temperature-dependent studies and ex situ sample exchange, further highlighting the feasibility of this QCM design for day-to-day use. Finally, the in situ mapping of thin film growth rates across the ALD reactor was demonstrated in a popular commercial tool operating in both continuous and quasi-static ALD modes.
摘要翻译：本发明涉及在监测ALD过程中的QCM测量。此前，ALD流程仍然存在重大障碍，准确执行。将这种专门的原位技术转化为常规表征方法，开发了一个完整的QCM夹具。这种新设计可以在各种ALD工具上轻松实现，允许快速进行样品交换，防止背面沉积，并最大限度地减少占地面积和流量扰动。与以前的QCM设计不同，快速热平衡使得诸如温度依赖性研究和非原位样品交换等任务进一步凸显了该QCM设计的日常使用的可行性。最后，在连续和准静态ALD模式下工作的流行商业工具中，证明了ALD反应器中薄膜生长速率的原位测绘。

7. 发明授权

US09856563B2 Micro-balance sensor integrated with atomic layer deposition chamber 有权
公开(公告)号：US09856563B2
公开(公告)日：2018-01-02
申请号：US13591498
申请日：2012-08-22
申请人： Alex B. F. Martinson , Joseph A. Libera , Jeffrey W. Elam , Shannon C. Riha
发明人： Alex B. F. Martinson , Joseph A. Libera , Jeffrey W. Elam , Shannon C. Riha
IPC分类号： C23C16/00 , C23C16/455 , C23C16/52
CPC分类号： C23C16/45525 , C23C16/52
摘要： The invention is directed to QCM measurements in monitoring ALD processes. Previously, significant barriers remain in the ALD processes and accurate execution. To turn this exclusively dedicated in situ technique into a routine characterization method, an integral QCM fixture was developed. This new design is easily implemented on a variety of ALD tools, allows rapid sample exchange, prevents backside deposition, and minimizes both the footprint and flow disturbance. Unlike previous QCM designs, the fast thermal equilibration enables tasks such as temperature-dependent studies and ex situ sample exchange, further highlighting the feasibility of this QCM design for day-to-day use. Finally, the in situ mapping of thin film growth rates across the ALD reactor was demonstrated in a popular commercial tool operating in both continuous and quasi-static ALD modes.

8. 发明申请

US20110206846A1 METHOD FOR DEPOSITING TRANSPARENT CONDUCTING OXIDES 审中-公开
标题翻译：沉积透明导电氧化物的方法
公开(公告)号：US20110206846A1
公开(公告)日：2011-08-25
申请号：US12895305
申请日：2010-09-30
申请人： Jeffrey W. ELAM , Joseph A. Libera
发明人： Jeffrey W. ELAM , Joseph A. Libera
IPC分类号： C23C16/40
CPC分类号： C23C16/45527 , C23C16/407 , C23C16/45553
摘要： A method of preparing light transmitting conducting metal oxide (TCO) films using atomic layer deposition (ALD) of a metal precursor multiple oxidizing reactants. The multiple metal oxidizing reactants may be selected to enhance growth of the TCO film. In a particular embodiment, an indium oxide TCO film is prepared using a cyclopentadienyl indium precursor and a combination of water and oxygen.
摘要翻译：一种使用金属前体多重氧化反应物的原子层沉积（ALD）制备透光导电金属氧化物（TCO）膜的方法。可以选择多种金属氧化反应物以增强TCO膜的生长。在一个具体实施方案中，使用环戊二烯基铟前体以及水和氧的组合制备氧化铟TCO膜。

9. 发明授权

US10131991B2 Method for depositing transparent conducting oxides 有权
公开(公告)号：US10131991B2
公开(公告)日：2018-11-20
申请号：US12895305
申请日：2010-09-30
申请人： Jeffrey W. Elam , Joseph A. Libera
发明人： Jeffrey W. Elam , Joseph A. Libera
IPC分类号： C23C16/455 , C23C16/40
摘要： A method of preparing light transmitting conducting metal oxide (TCO) films using atomic layer deposition (ALD) of a metal precursor multiple oxidizing reactants. The multiple metal oxidizing reactants may be selected to enhance growth of the TCO film. In a particular embodiment, an indium oxide TCO film is prepared using a cyclopentadienyl indium precursor and a combination of water and oxygen.

10. 发明申请

US20120021898A1 HYDROTHERMAL PERFORMANCE OF CATALYST SUPPORTS 有权
标题翻译：催化剂支持的水热性能
公开(公告)号：US20120021898A1
公开(公告)日：2012-01-26
申请号：US12841805
申请日：2010-07-22
申请人： Jeffrey W. Elam , Christopher L. Marshall , Joseph A. Libera , James A. Dumesic , Yomaira J. Pagan-Torres
发明人： Jeffrey W. Elam , Christopher L. Marshall , Joseph A. Libera , James A. Dumesic , Yomaira J. Pagan-Torres
IPC分类号： B01J23/20 , B01J21/06
CPC分类号： B01J29/78 , B01J21/063 , B01J21/066 , B01J23/20 , B01J29/041 , B01J29/06 , B01J29/061 , B01J35/002 , B01J35/1019 , B01J35/1023 , B01J35/1042 , B01J35/1047 , B01J35/1061 , B01J37/0215 , B01J37/14 , B01J37/348 , B01J2229/186
摘要： A high surface area catalyst with a mesoporous support structure and a thin conformal coating over the surface of the support structure. The high surface area catalyst support is adapted for carrying out a reaction in a reaction environment where the thin conformal coating protects the support structure within the reaction environment. In various embodiments, the support structure is a mesoporous silica catalytic support and the thin conformal coating comprises a layer of metal oxide resistant to the reaction environment which may be a hydrothermal environment.
摘要翻译：具有介孔载体结构的高表面积催化剂和在支撑结构表面上的薄的共形涂层。高表面积催化剂载体适于在反应环境中进行反应，其中薄的共形涂层保护反应环境内的载体结构。在各种实施方案中，支撑结构是介孔二氧化硅催化载体，并且薄的共形涂层包含对可能是水热环境的反应环境有抗性的金属氧化物层。

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