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1. 发明授权

US4653326A Directional accelerometer and its microlithographic fabrication process 失效
标题翻译：定向加速度计及其微光刻制造工艺
公开(公告)号：US4653326A
公开(公告)日：1987-03-31
申请号：US686902
申请日：1984-12-27
申请人： Jean-Sebastien Danel , Gilles Delapierre , France Michel
发明人： Jean-Sebastien Danel , Gilles Delapierre , France Michel
IPC分类号： B81B3/00 , G01P15/08 , G01P15/125
CPC分类号： G01P15/125 , G01P15/0802 , G01P2015/0817 , G01P2015/0828
摘要： A directional accelerometer and a process for the microlithographic fabrication of such an accelerometer. The accelerometer includes a substrate having at least one recess to define at least one beam in the substrate. One of the ends of the beam is integrally formed with the remainder of the substrate. The beam, which is oriented in the first direction, is deformable into the recess in a second direction only, parallel to the substrate surface and perpendicular to the first direction. The second direction corresponds to the acceleration component to be measured. Electrical connections and contacts are formed in the substrate for the device measuring the deformations of the beam. These measurements make it possible to determine the acceleration components.
摘要翻译：方向加速度计和用于这种加速度计的微光刻制造的方法。加速度计包括具有至少一个凹部以在基底中限定至少一个光束的基底。梁的一端与衬底的其余部分整体形成。沿第一方向定向的光束仅在平行于衬底表面并垂直于第一方向的第二方向上变形为凹陷。第二方向对应于要测量的加速度分量。在用于测量梁的变形的装置的基板中形成电连接和触点。这些测量可以确定加速度分量。

2. 发明授权

US06365056B1 Method for producing a suspended element in a micro-machined structure 失效
标题翻译：用于在微加工结构中制造悬浮元件的方法
公开(公告)号：US06365056B1
公开(公告)日：2002-04-02
申请号：US09331255
申请日：1999-07-27
申请人： Philippe Robert , France Michel , Hubert Grange
发明人： Philippe Robert , France Michel , Hubert Grange
IPC分类号： H01L21302
CPC分类号： G01L9/0042
摘要： A process for making at least one suspended element uses an etching technique for micro-machining a structure comprising a substrate covered in sequence by a first layer called a stop layer made of a first material, and a second layer made of a second material in which the suspended element is formed. The process uses a dry etching technique using a gas with sufficient selectivity to enable etching of the second layer without etching the stop layer, under conditions defined to enable anisotropic etching of the second material, the etching being carried out according to a first phase to delimit the suspended element as far as the level of the stop layer and being continued in a second phase during which the suspended element is released by etching of the surface layer of the suspended element delimited in the first phase and which is adjacent to the stop layer.
摘要翻译：用于制造至少一个悬浮元件的方法使用蚀刻技术来微观加工包括由被称为第一材料制成的阻挡层的第一层依次覆盖的衬底的结构，以及由第二材料制成的第二层，其中形成悬挂元件。该方法使用干蚀刻技术，使用具有足够选择性的气体，以便能够在限定为能够进行第二材料的各向异性蚀刻的条件下蚀刻第二层而不蚀刻停止层，根据第一阶段进行蚀刻该悬浮元件至止动层的水平并且在第二阶段中继续，在第二阶段期间，通过蚀刻在第一相中界定并且与停止层相邻的悬挂元件的表面层来释放悬浮元件。

3. 发明授权

US5495761A Integrated accelerometer with a sensitive axis parallel to the substrate 失效
标题翻译：集成的加速度计，其敏感轴平行于基板
公开(公告)号：US5495761A
公开(公告)日：1996-03-05
申请号：US171642
申请日：1993-12-22
申请人： Bernard Diem , France Michel
发明人： Bernard Diem , France Michel
IPC分类号： B81B3/00 , G01P15/125
CPC分类号： G01P15/125 , G01R33/0286 , G01P2015/0814
摘要： An accelerometer with a mobile mass mechanically connected, via an insulator, to a conductive substrate by flexible beams. Mobile conductive teeth are integrally formed with the mobile mass. Fixed conductive teeth are joined to an insulator from the substrate and arranged in an alternating manner with the mobile conductive teeth. Fixed electrodes serving as an electrostatic screen are placed between the fixed teeth and the mobile teeth in such a way that each mobile tooth is intercalated between a fixed electrode and a fixed tooth so as to constitute a series of variable capacitance capacitors.
摘要翻译：具有移动质量的加速度计通过绝缘体通过柔性梁机械连接到导电基底。移动导电齿与移动块一体形成。固定导电齿从衬底连接到绝缘体并且与移动导电齿交替地布置。作为静电屏幕的固定电极以固定电极和固定齿之间插入的方式配置在固定齿与移动齿之间，构成一系列可变容量的电容器。

4. 发明申请

US20060138076A1 Method for making a planar suspended microstructure, using a sacrificial layer of polymer material and resulting component 审中-公开
标题翻译：使用聚合物材料的牺牲层和所得成分制造平面悬浮微结构的方法
公开(公告)号：US20060138076A1
公开(公告)日：2006-06-29
申请号：US10536890
申请日：2003-12-18
申请人： Philippe Robert , France Michel , Catherine Maeder-Pachurka , Nicolas Sillon
发明人： Philippe Robert , France Michel , Catherine Maeder-Pachurka , Nicolas Sillon
IPC分类号： B44C1/22
CPC分类号： G01R3/00 , B33Y80/00 , B81B2203/0118 , B81C1/00611 , B81C2201/0108 , B81C2201/0125 , G01R1/0483 , G01R1/06711 , G01R1/06716 , G01R1/06727 , G01R1/06733 , G01R1/07342 , H01L23/4822 , H01L24/72 , H01L2924/01005 , H01L2924/01006 , H01L2924/01011 , H01L2924/01013 , H01L2924/01015 , H01L2924/01023 , H01L2924/01024 , H01L2924/01027 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01042 , H01L2924/01046 , H01L2924/01057 , H01L2924/01072 , H01L2924/01074 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/12042 , H01L2924/14 , H01L2924/181 , H01L2924/3025 , H01R12/52 , H01R13/24 , H01R13/2407 , H05K3/4092 , H05K7/1069 , H01L2924/00
摘要： Production process of a flat suspended micro-structure using a sacrificial layer of polymer material and component obtained thereby The process successively comprises deposition of a sacrificial layer (2) of polymer material, deposition, on at least a part of the substrate (1) and of the front face of the sacrificial layer (2), of an embedding layer (6), the thickness whereof is larger than that of the sacrificial layer (2), and planarization so that the front faces of the sacrificial layer (2) and of the embedding layer (6) form a common flat surface. A formation layer (3) of a suspended structure (5) is deposited on the front face of the common flat surface. Planarization can comprise chemical mechanical polishing and etching of the embedding layer (6). Etching of the sacrificial layer (2) can be performed by means of a mask formed on the front face of a layer of polymer material eliminated during the planarization step.
摘要翻译：使用聚合物材料的牺牲层和由此获得的部件的扁平悬浮微结构的制造方法该方法依次包括在基底（1）的至少一部分上沉积聚合物材料的牺牲层（2），沉积（2）的牺牲层（2）的前表面，其厚度大于牺牲层（2）的厚度，并且平坦化，使得牺牲层（2）的前表面和的嵌入层（6）形成共同的平坦表面。悬挂结构（5）的形成层（3）沉积在公共平坦表面的前表面上。平面化可以包括化学机械抛光和蚀刻嵌入层（6）。牺牲层（2）的蚀刻可以通过形成在平坦化步骤期间消除的聚合物材料层的正面上的掩模进行。

5. 发明授权

US5750420A Method for manufacturing a structure with a useful layer held at a distance from a substrate by abutments, and for detaching such a layer 失效
标题翻译：用于制造具有通过邻接保持在离开基板一定距离的有用层并且用于分离这种层的结构的方法
公开(公告)号：US5750420A
公开(公告)日：1998-05-12
申请号：US676629
申请日：1996-07-10
申请人： Hubert Bono , France Michel , Patrice Rey
发明人： Hubert Bono , France Michel , Patrice Rey
IPC分类号： H01L21/302 , B81B3/00 , G01P15/08 , H01L21/3065 , H01L49/00 , H01L21/00
CPC分类号： B81C1/00944 , G01P15/0802 , G01P2015/0814
摘要： A method of manufacturing a structure with a useful layer (120) held at a distance from a substrate (100) by abutments (150, 151) and of detaching such a layer. This method comprises the following steps: a first partial and selective etching of the sacrificial layer leaving at least one spacer paving (140) to survive between the substrate and the useful layer, a second selective etching of the useful layer (120) and/or the substrate (100) using the spacer (140) as a mask so as to form at least one abutment (150, 151) in said useful layer and/or the substrate, removal of said spacer.
摘要翻译：一种制造具有有用层（120）的结构的方法，所述有用层（120）通过邻接（150,151）与衬底（100）保持一定距离并分离所述层。该方法包括以下步骤：牺牲层的第一部分和选择性蚀刻，留下至少一个间隔物铺路（140）以在基底和有用层之间存活，第二选择性蚀刻有用层（120）和/或所述衬底（100）使用所述间隔件（140）作为掩模，以在所述有用层和/或所述衬底中形成至少一个邻接（150,151），去除所述间隔物。

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