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    • 5. 发明授权
    • Optical waveguide transition and method of fabricating it
    • 光波导过渡及其制造方法
    • US5659646A
    • 1997-08-19
    • US378278
    • 1995-01-26
    • Jean-Fran.cedilla.ois VinchantPierre Doussiere
    • Jean-Fran.cedilla.ois VinchantPierre Doussiere
    • G02B6/122G02B6/13G02B6/30G02B6/42G02B6/10
    • G02B6/1228G02B6/305
    • The invention concerns an optical waveguide transition and its fabrication method, enabling coupling between a buried optical waveguide and a ridged optical waveguide. The transition structure is formed during etching of a layer containing the buried optical waveguide, the transition area being formed by adiabatically increasing the lateral dimensions of the buried waveguide. Top layers are deposited on the buried waveguide and its widened structure in the transition area, and the ridged optical waveguide is fabricated with one part on top of the transition area. Coupling of the respective propagation modes in the buried and ridged waveguides is effected by mode adaptation in the region between the two waveguide structures in the transition area. The transition of the invention is made in two conventional epitaxy steps.
    • 本发明涉及一种光波导过渡及其制造方法,能够实现掩埋光波导与脊状光波导之间的耦合。 在对包含掩埋光波导的层的蚀刻期间形成过渡结构,过渡区域通过绝热地增加掩埋波导的横向尺寸而形成。 顶层沉积在掩埋波导上,并且其在过渡区域中的加宽结构,并且脊状光波导由一部分制造在过渡区域的顶部。 通过在过渡区域中的两个波导结构之间的区域中的模式适应来实现掩埋和脊状波导中各个传播模式的耦合。 本发明的转变在两个常规的外延步骤中进行。