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    • 3. 发明授权
    • Thermoluminescent dosimeter for radiation monitoring, comprising LiF doped with Mg, Cu, and Si, and fabrication method thereof
    • 用于辐射监测的热发射剂量计,包括掺杂有Mg,Cu和Si的LiF及其制造方法
    • US07592609B2
    • 2009-09-22
    • US11789916
    • 2007-04-26
    • Jang-Lyul KimJung-Il LeeJeong-Sun YangBong-Hwan KimJong-Soo Kim
    • Jang-Lyul KimJung-Il LeeJeong-Sun YangBong-Hwan KimJong-Soo Kim
    • H05B33/00G01T1/10
    • G01T1/11
    • Disclosed herein are a thermoluminescent dosimeter for radiation monitoring, comprising LiF doped with Mg, Cu and Si, and a fabrication method thereof. The LiF:Mg,Cu,Si thermoluminescent dosimeter is fabricated by heating a LiF-based thermoluminescent powder material having a composition of LiF mother material, 0.1-0.5 mol % of a Mg compound, 0.001-0.05 mol % of a Cu compound and 0.5-1.3 mol % of a Si compound to a temperature of 900-1200° C. to melt the LiF-based material, cooling the melted material, compression-molding the cooled material, sintering the molded material, cooling the sintered material, and then annealing the cooled material. The thermoluminescent dosimeter has high thermal stability and thus maintains constant thermoluminescence sensitivity even when it is annealed at a high temperature of more than 240° C. Moreover, it has a remarkably low residual signal, and shows excellent dosimetric characteristics, because it can maintain the same sensitivity as its initial readout value, even when it is reused.
    • 本文公开了一种用于辐射监测的热发光剂量计,其包括掺杂有Mg,Cu和Si的LiF及其制造方法。 LiF:Mg,Cu,Si热发光剂量计是通过加热LiF母体材料,0.1-0.5mol%的Mg化合物,0.001-0.05mol%的Cu化合物和0.5wt%的Cu化合物的LiF基热发光粉末材料 -1.3摩尔%的Si化合物至900-1200℃的温度以熔化LiF基材料,冷却熔融的材料,压缩模制冷却的材料,烧结模制材料,冷却烧结材料,然后 退火冷却材料。 热发光剂量计具有高的热稳定性,因此即使在高于240℃的高温下退火也能保持恒定的热发光灵敏度。此外,它具有非常低的残留信号,并且显示出优异的剂量特性,因为它可以保持 与其初始读数值相同的灵敏度,即使在重复使用时也是如此。
    • 4. 发明申请
    • Thermoluminescent dosimeter for radiation monitoring, comprising LiF doped with Mg, Cu, and Si, and fabrication method thereof
    • 用于辐射监测的热发射剂量计,包括掺杂有Mg,Cu和Si的LiF及其制造方法
    • US20080142731A1
    • 2008-06-19
    • US11789916
    • 2007-04-26
    • Jang-Lyul KimJung-Il LeeJeong-Sun YangBong-Hwan KimJong-Soo Kim
    • Jang-Lyul KimJung-Il LeeJeong-Sun YangBong-Hwan KimJong-Soo Kim
    • G01T1/11
    • G01T1/11
    • Disclosed herein are a thermoluminescent dosimeter for radiation monitoring, comprising LiF doped with Mg, Cu and Si, and a fabrication method thereof. The LiF:Mg,Cu,Si thermoluminescent dosimeter is fabricated by heating a LiF-based thermoluminescent powder material having a composition of LiF mother material, 0.1-0.5 mol % of a Mg compound, 0.001-0.05 mol % of a Cu compound and 0.5-1.3 mol % of a Si compound to a temperature of 900-1200° C. to melt the LiF-based material, cooling the melted material, compression-molding the cooled material, sintering the molded material, cooling the sintered material, and then annealing the cooled material. The thermoluminescent dosimeter has high thermal stability and thus maintains constant thermoluminescence sensitivity even when it is annealed at a high temperature of more than 240° C. Moreover, it has a remarkably low residual signal, and shows excellent dosimetric characteristics, because it can maintain the same sensitivity as its initial readout value, even when it is reused.
    • 本文公开了一种用于辐射监测的热发光剂量计,其包括掺杂有Mg,Cu和Si的LiF及其制造方法。 LiF:Mg,Cu,Si热发光剂量计是通过加热LiF母体材料,0.1-0.5mol%的Mg化合物,0.001-0.05mol%的Cu化合物和0.5wt%的Cu化合物的LiF基热发光粉末材料 -1.3摩尔%的Si化合物至900-1200℃的温度以熔化LiF基材料,冷却熔融的材料,压缩模制冷却的材料,烧结模制材料,冷却烧结材料,然后 退火冷却材料。 热发光剂量计具有高的热稳定性,因此即使在高于240℃的高温下退火也能保持恒定的热发光灵敏度。此外,它具有非常低的残留信号,并且显示出优异的剂量特性,因为它可以保持 与其初始读数值相同的灵敏度,即使在重复使用时也是如此。
    • 7. 发明授权
    • Method for forming SOI substrate
    • SOI衬底的形成方法
    • US06881650B2
    • 2005-04-19
    • US10307351
    • 2002-12-02
    • Jung-Il LeeKazuyuki FujiharaNae-In LeeGeum-Jong BaeHwa-Sung RheeSang-su Kim
    • Jung-Il LeeKazuyuki FujiharaNae-In LeeGeum-Jong BaeHwa-Sung RheeSang-su Kim
    • H01L21/205H01L21/02H01L21/20H01L21/30H01L21/46H01L21/762H01L27/12
    • H01L21/76254
    • A method for forming SOI substrates including a SOI layer containing germanium and a strained silicon layer disposed on the SOI layer, comprises forming a relaxed silicon-germanium layer on a first silicon substrate using an epitaxial growth method, and forming a porous silicon-germanium layer thereon. A silicon-germanium epitaxial layer is formed on the porous silicon-germanium layer, an oxide layer is formed on a second silicon substrate, the second silicon substrate is bonded where the oxide layer is formed to the first silicon substrate where the silicon-germanium epitaxial layer is formed. Layers are removed to expose the silicon-germanium epitaxial layer and a strained silicon epitaxial layer is formed thereon. The porous silicon-germanium layer prevents lattice defects of the relaxed silicon-germanium layer from transferring to the silicon-germanium epitaxial layer. Therefore, it is possible to form the silicon-germanium layer and the strained silicon layer of the SOI layer without defects.
    • 一种用于形成包括含有锗的SOI层和设置在SOI层上的应变硅层的SOI衬底的方法包括:使用外延生长方法在第一硅衬底上形成松弛的硅 - 锗层,并且形成多孔硅 - 锗层 上。 在多孔硅锗层上形成硅 - 锗外延层,在第二硅衬底上形成氧化物层,将形成氧化物层的第二硅衬底接合到第一硅衬底上,其中硅 - 锗外延 形成层。 去除层以暴露硅 - 锗外延层,并在其上形成应变硅外延层。 多孔硅 - 锗层防止松散的硅 - 锗层的晶格缺陷转移到硅 - 锗外延层。 因此,可以形成SOI层的硅 - 锗层和应变硅层,而没有缺陷。
    • 9. 发明授权
    • Array substrate for wide viewing angle liquid crystal display device and mehod of manufacturing the same
    • 用于宽视角液晶显示装置的阵列基板及其制造方法
    • US08451410B2
    • 2013-05-28
    • US13167523
    • 2011-06-23
    • Jeong-Oh KimJong-Won MoonJung-Il Lee
    • Jeong-Oh KimJong-Won MoonJung-Il Lee
    • G02F1/1343
    • G02F1/134363G02F2001/134318
    • An array substrate for a wide viewing angle liquid crystal display device includes a gate line on a substrate, a data line crossing the gate line to define a pixel region, a thin film transistor electrically connected to the gate and data lines, a pixel electrode in the pixel region and connected to a drain electrode of the thin film transistor, the pixel electrode including two parts and an opening portion therebetween, a first common electrode in the opening portion, the first common electrode disposed on a same layer as the pixel electrode, a passivation layer on the pixel electrode and the first common electrode, the passivation layer having a common contact hole exposing the first common electrode, and a second common electrode on the passivation layer and connected to the first common electrode through the common contact hole, the second common electrode including first openings corresponding to the pixel electrode and a second opening corresponding to the opening portion.
    • 广视角液晶显示装置的阵列基板包括基板上的栅极线,与栅极线交叉以限定像素区域的数据线,与栅极和数据线电连接的薄膜晶体管,像素电极 所述像素区域并连接到所述薄膜晶体管的漏电极,所述像素电极包括两部分和其间的开口部分,所述开口部分中的第一公共电极,设置在与所述像素电极相同的层上的所述第一公共电极, 在所述像素电极和所述第一公共电极上的钝化层,所述钝化层具有暴露所述第一公共电极的公共接触孔,以及在所述钝化层上的第二公共电极,并且通过所述公共接触孔连接到所述第一公共电极, 第二公共电极包括对应于像素电极的第一开口和对应于开口部分的第二开口。
    • 10. 发明申请
    • FILM SHEET FOR AREA FOCUSING OF SUN LIGHT AND GREENHOUSE PROVIDED WITH THE SAME
    • 适用于太阳光和温室的区域聚焦薄膜
    • US20110138688A1
    • 2011-06-16
    • US12962724
    • 2010-12-08
    • Seong-Il KIMWon-Jun ChoiIl-Ki HanJung-Il Lee
    • Seong-Il KIMWon-Jun ChoiIl-Ki HanJung-Il Lee
    • A01G9/14G02B27/12
    • A01G9/243A01G9/1438F24S23/31G02B5/045Y02A40/252Y02A40/266Y02E10/43Y02P60/124
    • A film sheet for area-focusing of sunlight and a greenhouse provided with the same are provided. A film sheet includes i) a film having a rectangular shape, and ii) a plurality of prism assemblies formed on one surface of the film to extend in one direction. At least one prism assembly of the plurality of prism assemblies includes i) at least one first prism unit including a plurality of first prisms with slanted angles that are substantially the same as each other, and ii) at least one second prism unit neighboring the first prism unit and including a plurality of second prisms with slanted angles that are substantially the same as each other. The width of the first prism unit is substantially the same as the width of the second prism unit and a slanted angle of one first prism among the plurality of first prisms is different from a slanted angle of one second prism among the plurality of second prisms, and light entering the prism assembly is configured to be area-focused.
    • 提供了一种用于阳光区域聚焦的薄膜片和设有该阳光的温室。 膜片包括i)具有矩形形状的膜,以及ii)形成在膜的一个表面上以在一个方向上延伸的多个棱镜组件。 所述多个棱镜组件中的至少一个棱镜组件包括:i)至少一个第一棱镜单元,其包括具有彼此基本相同的倾斜角度的多个第一棱镜,以及ii)与第一棱镜单元相邻的至少一个第二棱镜单元 棱镜单元,并且包括具有彼此基本相同的倾斜角度的多个第二棱镜。 第一棱镜单元的宽度与第二棱镜单元的宽度基本相同,并且多个第一棱镜中的一个第一棱镜的倾斜角度与多个第二棱镜中的一个第二棱镜的倾斜角度不同, 并且进入棱镜组件的光被配置为区域聚焦。