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1. 发明授权

US07859644B2 Lithographic apparatus, immersion projection apparatus and device manufacturing method 有权
标题翻译：平版印刷装置，浸没投影装置及装置的制造方法
公开(公告)号：US07859644B2
公开(公告)日：2010-12-28
申请号：US12000774
申请日：2007-12-17
申请人： Jan-Gerard Cornelis Van Der Toorn , Hans Butler , Henrikus Herman Marie Cox , Evert Hendrik Jan Draaijer , Nicolaas Ten Kate , Frits Van Der Meulen , Mark Johannes Hermanus Frencken , Martijn Houkes , Antonius Henricus Arends , Minne Cuperus
发明人： Jan-Gerard Cornelis Van Der Toorn , Hans Butler , Henrikus Herman Marie Cox , Evert Hendrik Jan Draaijer , Nicolaas Ten Kate , Frits Van Der Meulen , Mark Johannes Hermanus Frencken , Martijn Houkes , Antonius Henricus Arends , Minne Cuperus
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341
摘要： A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.
摘要翻译：控制系统，被配置为控制流体供应系统的位置，所述流体供应系统构造和布置成在基板和投影系统之间提供流体，所述基板定位在基板台上，所述控制系统包括控制器，所述控制器被配置为确定基于要提供给衬底台的位置信号和位置偏移的流体供应系统的期望位置，位置偏移被添加到要提供给衬底台的位置信号。

2. 发明申请

US20080123071A1 Lithographic apparatus, immersion projection apparatus and device manufacturing method 有权
标题翻译：平版印刷装置，浸没投影装置及装置的制造方法
公开(公告)号：US20080123071A1
公开(公告)日：2008-05-29
申请号：US12000774
申请日：2007-12-17
申请人： Jan-Gerard Cornelis Van Der Toorn , Hans Butler , Henrikus Herman Marie Cox , Evert Hendrik Jan Draaijer , Nicolaas Ten Kate , Frits Van Der Meulen , Mark Johannes Hermanus Frencken , Martijn Houkes , Antonius Henricus Arends , Minne Cuperus
发明人： Jan-Gerard Cornelis Van Der Toorn , Hans Butler , Henrikus Herman Marie Cox , Evert Hendrik Jan Draaijer , Nicolaas Ten Kate , Frits Van Der Meulen , Mark Johannes Hermanus Frencken , Martijn Houkes , Antonius Henricus Arends , Minne Cuperus
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.
摘要翻译：控制系统，被配置为控制流体供应系统的位置，所述流体供应系统构造和布置成在基板和投影系统之间提供流体，所述基板定位在基板台上，所述控制系统包括控制器，所述控制器被配置为确定基于要提供给衬底台的位置信号和位置偏移的流体供应系统的期望位置，位置偏移被添加到要提供给衬底台的位置信号。

3. 发明授权

US07330238B2 Lithographic apparatus, immersion projection apparatus and device manufacturing method 有权
标题翻译：平版印刷装置，浸没投影装置及装置的制造方法
公开(公告)号：US07330238B2
公开(公告)日：2008-02-12
申请号：US11090699
申请日：2005-03-28
申请人： Jan-Gerard Cornelis Van Der Toorn , Hans Butler , Henrikus Herman Marie Cox , Evert Hendrik Jan Draaijer , Nicolaas Ten Kate , Frits Van Der Meulen , Mark Johannes Hermanus Frencken , Martijn Houkes , Antonius Henricus Arends , Minne Cuperus
发明人： Jan-Gerard Cornelis Van Der Toorn , Hans Butler , Henrikus Herman Marie Cox , Evert Hendrik Jan Draaijer , Nicolaas Ten Kate , Frits Van Der Meulen , Mark Johannes Hermanus Frencken , Martijn Houkes , Antonius Henricus Arends , Minne Cuperus
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341
摘要： A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.
摘要翻译：光刻设备包括用于保持基板的基板台和将图案化的辐射束投影到基板的目标部分上的投影系统。光刻设备还包括一个流体供应系统，用于在基板和投影系统的最终透镜元件之间提供流体，以及位置控制器，用于控制流体供应系统的位置。位置控制器被配置为具有基板的位置量，通过向基板的位置量添加位置偏移来确定液体供应系统的期望位置，并且根据期望位置定位液体供应系统。位置量可以包括衬底台的位置和/或旋转位置和/或衬底高度的高度函数。

4. 发明授权

US07148950B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07148950B2
公开(公告)日：2006-12-12
申请号：US10880605
申请日：2004-07-01
申请人： Evert Hendrik Jan Draaijer , Martinus Agnes Willem Cuijpers , Menno Fien , Marcus Joseph Elisabeth Godfried Breukers , Martijn Houkes , Edwin Teunis Van Donkelaar
发明人： Evert Hendrik Jan Draaijer , Martinus Agnes Willem Cuijpers , Menno Fien , Marcus Joseph Elisabeth Godfried Breukers , Martijn Houkes , Edwin Teunis Van Donkelaar
IPC分类号： G03B27/42
CPC分类号： G03F7/70733
摘要： A lithographic apparatus that includes an exposure system and a measurement system, is presented. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.
摘要翻译：提出了一种包括曝光系统和测量系统的光刻设备。曝光系统将图案化的光束投影到第一基板的目标部分上，而测量系统将测量光束投射到第二基板的目标部分上。装置的可移动部分的运动在装置的另一可移动部分的位置产生干扰，例如，由于空气的位移。可以通过计算作为一个或两个可移动部件的状态的函数的补偿信号来补偿该误差。

5. 发明授权

US07352436B2 Lithographic apparatus, projection apparatus and device manufacturing method 有权
标题翻译：平版印刷装置，投影装置及装置的制造方法
公开(公告)号：US07352436B2
公开(公告)日：2008-04-01
申请号：US11155883
申请日：2005-06-20
申请人： Hans Butler , Evert Hendrik Jan Draaijer , Marcus Joseph Elisabeth Godfried Breukers
发明人： Hans Butler , Evert Hendrik Jan Draaijer , Marcus Joseph Elisabeth Godfried Breukers
IPC分类号： G03B27/32 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70725
摘要： A control system to control a position of a substrate table for a lithographic apparatus, including: a first detection device to generate a position signal representative of the position of the projection system, a second detection device to generate a projection system feed-forward signal, a comparative unit to generate a servo error signal by subtracting a signal representative of an actual substrate table position from a substrate table position reference signal and adding the projection system position signal, a control unit to generate a first control signal on the basis of the servo error signal, an addition unit to generate a second control signal by adding the feed-forward signal and the first control signal, and an actuator unit to actuate the substrate table to a desired substrate table position on the basis of the second control signal. The control system further includes a projection system position signal filter unit.
摘要翻译：一种用于控制用于光刻设备的衬底台的位置的控制系统，包括：第一检测装置，用于产生表示投影系统的位置的位置信号;第二检测装置，用于产生投影系统前馈信号; 比较单元，用于通过从衬底台位置参考信号中减去表示实际衬底台位置的信号并相加所述投影系统位置信号来产生伺服误差信号;控制单元，基于所述伺服系统产生第一控制信号误差信号，通过增加前馈信号和第一控制信号来产生第二控制信号的加法单元，以及基于第二控制信号将基板台致动到期望的基板台位置的致动器单元。控制系统还包括投影系统位置信号滤波器单元。

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