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    • 1. 发明授权
    • Fast recovery diode
    • 快速恢复二极管
    • US08395244B2
    • 2013-03-12
    • US12942410
    • 2010-11-09
    • Jan VobeckyKati HemmannHamit DuranMunaf Rahimo
    • Jan VobeckyKati HemmannHamit DuranMunaf Rahimo
    • H01L21/02
    • H01L29/8611H01L29/0661H01L29/32H01L29/36H01L29/66128
    • A fast recovery diode includes an n-doped base layer having a cathode side and an anode side opposite the cathode side. A p-doped anode layer is arranged on the anode side. The anode layer has a doping profile and includes at least two sublayers. A first one of the sublayers has a first maximum doping concentration, which is between 2*1016 cm−3 and 2*1017 cm−3 and which is higher than the maximum doping concentration of any other sublayer. A last one of the sublayers has a last sublayer depth, which is larger than any other sublayer depth. The last sublayer depth is between 90 to 120 μm. The doping profile of the anode layer declines such that a doping concentration in a range of 5*1014 cm−3 and 1*1015 cm−3 is reached between a first depth, which is at least 20 μm, and a second depth, which is at maximum 50 μm. Such a profile of the doping concentration is achieved by using aluminum diffused layers as the at least two sublayers.
    • 快速恢复二极管包括具有阴极侧和与阴极侧相对的阳极侧的n掺杂基极层。 p型掺杂阳极层设置在阳极侧。 阳极层具有掺杂分布并且包括至少两个子层。 第一个子层具有第一最大掺杂浓度,其在2×1016cm-3和2×1017cm-3之间,并且高于任何其它子层的最大掺杂浓度。 最后一个子层具有比任何其他子层深度大的最后一个子层深度。 最后的子层深度为90〜120μm。 阳极层的掺杂分布下降,使得在第一深度(至少20μm)和第二深度之间达到在5×10 14 cm -3和1×10 15 cm -3范围内的掺杂浓度,其中 最大为50μm。 通过使用铝扩散层作为至少两个子层来实现掺杂浓度的这种分布。
    • 2. 发明申请
    • FAST RECOVERY DIODE
    • 快速恢复二极管
    • US20110108953A1
    • 2011-05-12
    • US12942410
    • 2010-11-09
    • Jan VOBECKYKati HemmannHamit DuranMunaf Rahimo
    • Jan VOBECKYKati HemmannHamit DuranMunaf Rahimo
    • H01L29/00H01L21/22
    • H01L29/8611H01L29/0661H01L29/32H01L29/36H01L29/66128
    • A fast recovery diode includes an n-doped base layer having a cathode side and an anode side opposite the cathode side. A p-doped anode layer is arranged on the anode side. The anode layer has a doping profile and includes at least two sublayers. A first one of the sublayers has a first maximum doping concentration, which is between 2*1016 cm−3 and 2*1017 cm−3 and which is higher than the maximum doping concentration of any other sublayer. A last one of the sublayers has a last sublayer depth, which is larger than any other sublayer depth. The last sublayer depth is between 90 to 120 μm. The doping profile of the anode layer declines such that a doping concentration in a range of 5*1014 cm−3 and 1*1015 cm−3 is reached between a first depth, which is at least 20 μm, and a second depth, which is at maximum 50 μm. Such a profile of the doping concentration is achieved by using aluminium diffused layers as the at least two sublayers.
    • 快速恢复二极管包括具有阴极侧和与阴极侧相对的阳极侧的n掺杂基极层。 p型掺杂阳极层设置在阳极侧。 阳极层具有掺杂分布并且包括至少两个子层。 第一个子层具有第一最大掺杂浓度,其在2×1016cm-3和2×1017cm-3之间,并且高于任何其它子层的最大掺杂浓度。 最后一个子层具有比任何其他子层深度大的最后一个子层深度。 最后的子层深度为90〜120μm。 阳极层的掺杂分布下降,使得在第一深度(至少20μm)和第二深度之间达到在5×10 14 cm -3和1×10 15 cm -3范围内的掺杂浓度,其中 最大为50μm。 通过使用铝扩散层作为至少两个子层来实现掺杂浓度的这种分布。