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    • 1. 发明申请
    • Thermal liquid flow sensor and method of forming same
    • 热液流量传感器及其形成方法
    • US20070186643A1
    • 2007-08-16
    • US11352774
    • 2006-02-10
    • Jamie SpeldrichScott BeckRichard GehmanMartin MurrayUlrich Bonne
    • Jamie SpeldrichScott BeckRichard GehmanMartin MurrayUlrich Bonne
    • G01F1/68
    • G01F1/6845G01F15/006
    • A thermal liquid flow sensor and method of forming same. The sensor has a substrate and one or more sensing elements, disposed on the substrate, for sensing a property of a liquid. The liquid flow sensor, which can be for example a microsensor having a microbrick® structure, has a hydrophilic layer which is disposed on the substrate and covers the sensing element(s). The hydrophilic layer is preferably formed from a spin on glass material, such as for example a silicate or phosphosilicate. A silicon nitride layer can be disposed on the sensing element(s) and interpose the substrate and the hydrophilic layer. The silicon nitride layer can be oxidized, for example, by means of plasma oxidation or oxygen ion implantation so to form the hydrophilic layer thereon. A variety of other hydrophilic compounds can be utilized to form the hydrophilic layer such as, gold, palladium and diamond like carbon.
    • 一种热液体流量传感器及其形成方法。 传感器具有衬底和设置在衬底上的一个或多个感测元件,用于感测液体的性质。 液体流量传感器(例如可以是具有微结构的微传感器)具有设置在基板上并覆盖感测元件的亲水层。 亲水层优选由旋涂在玻璃材料上形成,例如硅酸盐或磷硅酸盐。 氮化硅层可以设置在感测元件上并插入衬底和亲水层。 氮化硅层可以例如通过等离子体氧化或氧离子注入来氧化,从而在其上形成亲水层。 可以使用各种其它亲水性化合物来形成亲水层,例如金,钯和类似于金刚石的碳。
    • 2. 发明授权
    • Flow and pressure sensor for harsh fluids
    • 流量和压力传感器用于苛刻流体
    • US06681623B2
    • 2004-01-27
    • US10011932
    • 2001-10-30
    • Ulrich BonneJamie Speldrich
    • Ulrich BonneJamie Speldrich
    • G01F168
    • G01F1/6842G01F1/40G01F5/00G01F5/005G01F15/12
    • Methods and systems for preventing degradation of a sensor exposed to a harsh fluid, such as one that might corrode or be exposed to radioactive contaminants, live pathogens, freezing temperatures, overheating, particle deposition or condensable vapors is disclosed. An auxiliary purge stream of comparatively clean fluid or purge fluid is utilized, which flows past the sensor in opposition to the harsh fluid, thereby preventing the harsh fluid from contacting and degrading the sensor. The clean fluid itself may comprise a purge gas, such as clean, dry air, or a liquid that is compatible with the composition of the harsh fluid. The flow and pressure of the clean fluid can be adjusted utilizing one or more supply regulator valves.
    • 公开了用于防止暴露于恶劣流体(例如可能腐蚀或暴露于放射性污染物,活体病原体,冷冻温度,过热,颗粒沉积或可冷凝蒸气)的传感器降解的方法和系统。 使用比较清洁的流体或净化流体的辅助净化流,其与传统的流体相反地流过恶劣的流体,从而防止恶劣的流体接触和降解传感器。 清洁流体本身可以包括吹扫气体,例如干净的干燥空气或与粗糙流体的组成相容的液体。 可以利用一个或多个供应调节阀来调节清洁流体的流量和压力。