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    • 10. 发明授权
    • CMOS imager photodiode with enhanced capacitance
    • 具有增强电容的CMOS成像光电二极管
    • US08440490B2
    • 2013-05-14
    • US13288686
    • 2011-11-03
    • James W. AdkissonJohn J. Ellis-MonaghanMark D. JaffeDale J. PearsonDennis L. Rogers
    • James W. AdkissonJohn J. Ellis-MonaghanMark D. JaffeDale J. PearsonDennis L. Rogers
    • H01L31/18
    • H01L27/14643H01L27/1463H01L27/14689H01L31/035281
    • A method for manufacturing a pixel sensor cell that includes a photosensitive element having a non-laterally disposed charge collection region. The method includes forming a trench recess in a substrate of a first conductivity type material, and filling the trench recess with a material having second conductivity type material. The second conductivity type material is then diffused out of the filled trench material to the substrate region surrounding the trench to form the non-laterally disposed charge collection region. The filled trench material is removed to provide a trench recess, and the trench recess is filled with a material having a first conductivity type material. A surface implant layer is formed at either side of the trench having a first conductivity type material. A collection region of a trench-type photosensitive element is formed of the outdiffused second conductivity type material and is isolated from the substrate surface.
    • 一种制造像素传感器单元的方法,该像素传感器单元包括具有非横向放置的电荷收集区域的感光元件。 该方法包括在第一导电类型材料的衬底中形成沟槽凹槽,并用具有第二导电类型材料的材料填充沟槽凹槽。 然后将第二导电类型材料从填充的沟槽材料扩散到围绕沟槽的衬底区域,以形成非横向布置的电荷收集区域。 去除填充的沟槽材料以提供沟槽凹槽,并且用具有第一导电类型材料的材料填充沟槽凹槽。 表面注入层形成在具有第一导电类型材料的沟槽的任一侧。 沟槽型感光元件的收集区域由向外扩散的第二导电型材料形成,并与衬底表面隔离。