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    • 7. 发明授权
    • Process for preparing cephalosporanic acid compounds
    • 制备头孢菌素酸化合物的方法
    • US4358588A
    • 1982-11-09
    • US193801
    • 1980-10-03
    • Peter W. HennigerJohannes K. van der DriftGerard J. van VeenJagdish C. Kapur
    • Peter W. HennigerJohannes K. van der DriftGerard J. van VeenJagdish C. Kapur
    • C07D499/12C07D20060101C07D499/00C07D499/64C07D499/68C07D501/06C07D501/20
    • C07D499/00
    • A process for the preparation of [D-.alpha.-amino-p-hydroxyphenylacetamido]-penicillanic acid or cephalosporanic acid compounds comprising reacting a compound having a formula selected from the group consisting of ##STR1## wherein X is selected from the group consisting of hydrogen, acetoxy and five-membered heterocyclic group containing at least one hetero atom of the group consisting of oxygen, sulfur and nitrogen and optionally substituted with e.g. lower alkyl, this residue being attached to the 3-CH.sub.2 group via sulfur atom and wherein a NH radical if present has optionally been silylated with at least one mole equivalent of a silylating agent producing ##STR2## wherein R.sub.1, R.sub.2 and R.sub.3 are individually selected from the group consisting of lower alkyl, benzyl, cycloalkyl and phenyl in an inert anhydrous, organic solvent, preferably a water-inmiscible organic main-solvent, to form a compound having a formula selected from the group consisting of ##STR3## adjusting the pH to a scale value of 5.5 to 7.5 and reacting the resulting compounds in a pre-cooled solution with an at least equimolar amount of a compound of the formula wherein R.sub.4 is lower alkyl, R.sub.5 is selected from the group consisting of hydrogen and lower alkyl and R.sub.6 and R.sub.7 are lower alkoxy.
    • 一种制备[D-α-氨基 - 对 - 羟基苯基乙酰胺基] - 青霉烷酸或头孢菌酸化合物的方法,包括使具有选自以下的化合物:其中X是 选自氢,乙酰氧基和含有至少一个由氧,硫和氮组成的组的杂原子的五元杂环基团,并且任选被例如 低级烷基,该残基通过硫原子连接到3-CH 2基团,其中如果存在的话,NH基团任选用至少一摩尔当量的甲硅烷基化剂进行甲硅烷基化,产生其中R1,R2和R3被单独选择 由低级烷基,苄基,环烷基和苯基组成的组在惰性无水的有机溶剂,优选与水不混溶的有机主要溶剂中形成具有选自以下的化合物:选自下组: IV将pH调节至5.5至7.5的比例值,并将所得化合物与预冷却的溶液与至少等摩尔量的下式化合物反应,其中R 4 是低级烷基,R 5选自氢和低级烷基,R 6和R 7是低级烷氧基。