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    • 1. 发明授权
    • Non-volatile memory device and erase method
    • 非易失性存储器件和擦除方法
    • US08054688B2
    • 2011-11-08
    • US12539829
    • 2009-08-12
    • Jae-hun JeongSoon-moon JungHan-soo KimJae-hoon Jang
    • Jae-hun JeongSoon-moon JungHan-soo KimJae-hoon Jang
    • G11C16/04
    • G11C16/16G11C16/0483
    • Provided is a non-volatile memory device including first and second, vertically stacked semiconductor substrates, a plurality of non-volatile memory cell transistors formed in a row on the first and second semiconductor substrates, and a plurality of word lines connected to gates of the plurality of non-volatile memory cell transistors. The plurality of non-volatile memory cell transistors are grouped into two or more memory cell blocks, such that a first voltage is applied to the first semiconductor substrate including a first memory cell block to be erased, and either (1) a second voltage less than the first voltage and greater than 0V is applied to the second semiconductor substrate not including the first memory cell block, or (2) the second semiconductor substrate not including the first memory cell block is allowed to electrically float.
    • 提供了一种非易失性存储器件,包括第一和第二垂直堆叠的半导体衬底,在第一和第二半导体衬底上形成为一行的多个非易失性存储单元晶体管,以及连接到第一和第二半导体衬底的栅极的多条字线 多个非易失性存储单元晶体管。 多个非易失性存储单元晶体管被分组成两个或更多个存储单元块,使得第一电压被施加到第一半导体衬底,该第一半导体衬底包括要擦除的第一存储单元块,以及(1)第二电压较小 比不包括第一存储单元块的第二半导体衬底施加大于0V的第一电压,或者(2)不包括第一存储单元块的第二半导体衬底被电浮动。