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    • 2. 发明申请
    • METHOD FOR PRODUCING A WAVEFRONT-CORRECTED OPTICAL ARRANGEMENT COMPRISING AT LEAST TWO OPTICAL ELEMENTS
    • 用于生成包含至少两个光学元件的波前校正光学布置的方法
    • US20150346488A1
    • 2015-12-03
    • US14654076
    • 2013-12-13
    • JENOPTIK OPTICAL SYSTEMS GMBH
    • Jan WERSCHNIKMarkus AUGUSTIN
    • G02B27/00G06F17/10G06F17/50
    • G02B27/0012G02B27/0025G06F17/10G06F17/50
    • The invention relates to a method for producing a wavefront-corrected optical arrangement comprising at least two optical elements. Using the method, a total wavefront error in the optical arrangement is determined and compared to a permissible tolerance range for the total wavefront error. To perform the method, the optical elements are individualized by assigning an individual identifier to each of them, such that individualized optical elements are obtained, individual surface defects are measured with correct coordinates on all the individualized optical elements and the measured individual surface defects are stored with correct coordinates assigned to the appropriate individualized optical element. The optical arrangement comprising the individualized optical elements is produced virtually as a virtual optical arrangement and a total wavefront error is calculated for the virtual optical arrangement.
    • 本发明涉及一种用于产生包括至少两个光学元件的波前校正的光学装置的方法。 使用该方法,确定光学布置中的总波前误差并将其与总波前误差的容许公差范围进行比较。 为了执行该方法,通过为它们中的每一个分配个体标识符来个体化光学元件,使得获得个性化的光学元件,在所有个体化光学元件上以正确的坐标测量各个表面缺陷,并且存储所测量的各个表面缺陷 将正确的坐标分配给适当的个性化光学元件。 包括个性化光学元件的光学装置实际上被制造为虚拟光学装置,并且为虚拟光学装置计算总的波前误差。