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    • 4. 发明申请
    • Method for patterning organic materials or combinations of organic and inorganic materials
    • 有机材料或有机和无机材料组合的图案化方法
    • US20050048414A1
    • 2005-03-03
    • US10925082
    • 2004-08-24
    • Oliver HarnackIsabelle RaibleAkio YasudaTobias Vossmeyer
    • Oliver HarnackIsabelle RaibleAkio YasudaTobias Vossmeyer
    • H05B33/10G03F7/00H01L21/28H01L21/306H01L21/3205H01L29/06H01L51/50H05K3/02H05K3/04
    • B82Y30/00G03F7/0035H05K3/048
    • The present application refers to a method of patterning organic materials or organic/inorganic materials onto a substrate, comprising the following steps: (1) patterning of a water-soluble material “A” onto a surface of the substrate, thereby forming a substrate/material “A” surface; (2) depositing organic or organic/inorganic material “B” onto the substrate/material “A” surface; (3) lifting-off material “A” in aqueous solution; wherein, step (1) comprises the following steps: (1a) patterning of a photoresist material onto the substrate surface, thereby forming a substrate/photoresist material surface; (1b) depositing the water soluble material “A” onto the substrate/photoresist material surface; (1c) lifting-off the photoresist material in an organic solvent; or, alternatively, step (1) comprises the following steps: (1a′) depositing the water-soluble material “A” onto the substrate surface, thereby forming a substrate/material “A” surface; (1b′) patterning the photoresist material onto the substrate/material “A” surface; (1c′) etching the unmasked material “A” in aqueous solution; (1d′) lifting-off the photoresist material in an organic solvent. The present application also refers to the use of said method, to a pattern of organic materials or organic/inorganic materials prepared by said method, and to a substrate carrying such patterns. The application also refers to the use of a patterned nanoparticle film.
    • 本申请是指将有机材料或有机/无机材料图案化到基材上的方法,包括以下步骤:(1)将水溶性材料“A”图案化到基材的表面上,由此形成基材/ 材料“A”表面; (2)将有机或有机/无机材料“B”沉积在基材/材料“A”表面上; (3)脱水材料“A”在水溶液中; 其中,步骤(1)包括以下步骤:(1a)将光致抗蚀剂材料图案化到衬底表面上,从而形成衬底/光致抗蚀剂材料表面; (1b)将水溶性材料“A”沉积到基材/光致抗蚀剂材料表面上; (1c)在有机溶剂中剥离光致抗蚀剂材料; 或者可选地,步骤(1)包括以下步骤:(1a')将水溶性材料“A”沉积到基材表面上,从而形成基材/材料“A”表面; (1b')将光致抗蚀剂材料图案化到衬底/材料“A”表面上; (1c')在水溶液中蚀刻未掩蔽材料“A” (1d')在有机溶剂中剥离光致抗蚀剂材料。 本申请还涉及使用所述方法,通过所述方法制备的有机材料或有机/无机材料的图案以及携带这种图案的基材。 该应用还涉及使用图案化的纳米颗粒膜。