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1. 发明授权

US07270533B2 System for creating a turbulent flow of fluid between a mold and a substrate 有权
标题翻译：用于在模具和基底之间产生紊流流体的系统
公开(公告)号：US07270533B2
公开(公告)日：2007-09-18
申请号：US10898037
申请日：2004-07-23
申请人： Ian M. McMackin , Nicholas A. Stacey , Daniel A. Babbs , Duane J. Voth , Mathew P. C. Watts , Van N. Truskett , Frank Y. Xu , Ronald D. Voisin , Pankaj B. Lad
发明人： Ian M. McMackin , Nicholas A. Stacey , Daniel A. Babbs , Duane J. Voth , Mathew P. C. Watts , Van N. Truskett , Frank Y. Xu , Ronald D. Voisin , Pankaj B. Lad
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： The present invention is directed toward a system for introducing a flow of a fluid between a mold, disposed on a template, and a substrate, the system including, a fluid supply system; and a chuck body having a baffle and first and second apertures, the first and second apertures disposed between the baffle and the template, with the first and second apertures in fluid communication with the fluid supply system to produce a turbulent flow of the fluid between the mold and said substrate.
摘要翻译：本发明涉及一种用于在设置在模板上的模具和基板之间引入流体流的系统，该系统包括：流体供应系统; 以及具有挡板和第一和第二孔的卡盘体，所述第一和第二孔设置在挡板和模板之间，其中第一和第二孔与流体供应系统流体连通，以在流体供应系统之间产生紊流模具和所述基板。

2. 发明授权

US07531025B2 Method of creating a turbulent flow of fluid between a mold and a substrate 失效
标题翻译：在模具和基材之间产生流体紊流的方法
公开(公告)号：US07531025B2
公开(公告)日：2009-05-12
申请号：US10898034
申请日：2004-07-23
申请人： Ian M. McMackin , Nicholas A. Stacey , Daniel A. Babbs , Duane J. Voth , Mathew P. C. Watts , Van N. Truskett , Frank Y. Xu , Ronald D. Voisin , Pankaj B. Lad
发明人： Ian M. McMackin , Nicholas A. Stacey , Daniel A. Babbs , Duane J. Voth , Mathew P. C. Watts , Van N. Truskett , Frank Y. Xu , Ronald D. Voisin , Pankaj B. Lad
IPC分类号： B01D19/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： The present invention is directed toward a method of controlling a turbulent flow of a fluid between a substrate and a template, and more specifically, controlling a turbulent flow of a fluid between droplets disposed on a substrate and a template. To that end, the method further comprises the ingression and egression of the fluid through a first and second aperture, and in a further embodiment, a plurality of apertures, to create such a turbulent flow of the fluid.
摘要翻译：本发明涉及一种控制衬底和模板之间的流体的紊流的方法，更具体地说，控制流体在设置在衬底和模板上的液滴之间的紊流。为此，该方法还包括流体通过第一和第二孔的进入和流出，并且在另一实施例中，多个孔，以产生流体的这种湍流。

3. 发明授权

US07090716B2 Single phase fluid imprint lithography method 有权
标题翻译：单相流体压印光刻法
公开(公告)号：US07090716B2
公开(公告)日：2006-08-15
申请号：US10677639
申请日：2003-10-02
申请人： Ian M. McMackin , Nicholas A. Stacey , Daniel A. Babbs , Duane J. Voth , Michael P. C. Watts , Van N. Truskett , Frank Y. Xu , Ronald D. Voisin , Pankaj B. Lad
发明人： Ian M. McMackin , Nicholas A. Stacey , Daniel A. Babbs , Duane J. Voth , Michael P. C. Watts , Van N. Truskett , Frank Y. Xu , Ronald D. Voisin , Pankaj B. Lad
IPC分类号： B01D19/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.
摘要翻译：本发明涉及通过减少存在于沉积在基底上的粘性液体层中的气穴来减少压印层中的图案失真的方法。为此，该方法包括改变靠近粘性液体设置的气体的输送。具体地，其中待记录图案的基板附近的气氛相对于被沉积的粘性液体是高度可溶的，高度扩散的或者两者都被饱和。另外，或者代替饱和气氛，可以降低气氛的压力。

4. 发明授权

US07939131B2 Method to provide a layer with uniform etch characteristics 有权
标题翻译：提供具有均匀蚀刻特性的层的方法
公开(公告)号：US07939131B2
公开(公告)日：2011-05-10
申请号：US10919224
申请日：2004-08-16
申请人： Frank Y. Xu , Christopher J. Mackay , Pankaj B. Lad , Ian M. McMackin , Van N. Truskett , Wesley D. Martin , Edward B. Fletcher , David C. Wang , Nicholas A. Stacey , Michael P. C. Watts
发明人： Frank Y. Xu , Christopher J. Mackay , Pankaj B. Lad , Ian M. McMackin , Van N. Truskett , Wesley D. Martin , Edward B. Fletcher , David C. Wang , Nicholas A. Stacey , Michael P. C. Watts
IPC分类号： B05D3/12
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/1386
摘要： The present invention includes a method and a composition to form a layer on a substrate having uniform etch characteristics. To that end, the method includes controlling variations in the characteristics of a solid layer, such etch characteristics over the area of the solid layer as a function of the relative rates of evaporation of the liquid components that comprise the composition from which the solid layer is formed.
摘要翻译：本发明包括在具有均匀蚀刻特性的基底上形成层的方法和组合物。为此，该方法包括控制固体层的特性的变化，这种固体层面积上的这种蚀刻特性是构成组合物的液体组分的相对蒸发速率的函数的函数，其中固体层是固体层形成。

5. 发明申请

US20110031651A1 DESIRABLE WETTING AND RELEASE BETWEEN AN IMPRINT LITHOGRAPHY MOLD AND A POLYMERIZABLE COMPOSITION 有权
标题翻译：印刷图形模具和可聚合组合物之间的可靠润湿和释放
公开(公告)号：US20110031651A1
公开(公告)日：2011-02-10
申请号：US12905192
申请日：2010-10-15
申请人： Frank Y. Xu , Pankaj B. Lad , Ian M. McMackin , Van N. Truskett , Edward B. Fletcher
发明人： Frank Y. Xu , Pankaj B. Lad , Ian M. McMackin , Van N. Truskett , Edward B. Fletcher
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B41C1/10 , B41M7/0072 , B41M7/0081 , B82Y10/00 , B82Y30/00 , B82Y40/00 , Y10S977/887
摘要： Improved wetting characteristics together with improved release characteristics with respect to a substrate and an imprint lithography mold having imprinting material disposed therebetween.
摘要翻译：改进的润湿特性以及相对于基底的改进的剥离特性和其间设置有压印材料的压印光刻模具。

6. 发明授权

US07837921B2 Method of providing desirable wetting and release characteristics between a mold and a polymerizable composition 有权
标题翻译：在模具和可聚合组合物之间提供所需的润湿和释放特性的方法
公开(公告)号：US07837921B2
公开(公告)日：2010-11-23
申请号：US11244428
申请日：2005-10-05
申请人： Frank Y. Xu , Pankaj B. Lad , Ian M. McMackin , Van N. Truskett , Edward B. Fletcher
发明人： Frank Y. Xu , Pankaj B. Lad , Ian M. McMackin , Van N. Truskett , Edward B. Fletcher
IPC分类号： B28B7/36 , B28B11/10 , G03C1/00
CPC分类号： G03F7/0002 , B41C1/10 , B41M7/0072 , B41M7/0081 , B82Y10/00 , B82Y30/00 , B82Y40/00 , Y10S977/887
摘要： The present invention provides a method that features improved wetting characteristics while allowing preferential adhesion and release characteristics with respect to a substrate and a mold having imprinting material disposed therebetween. The method includes coating a surface of the mold with a volume of surfactant containing solution. The surfactant in the solution includes a hydrophobic component consisting essentially of a plurality of fluorine-containing molecules. The distribution of the plurality of the fluorine atoms in the fluorine-containing molecules, as well as the fluorine-containing molecules throughout the volume provides a desired contact angle with respect to a polymerizable composition disposed on the substrate. The contact angle is in a range of 50° or less.
摘要翻译：本发明提供了一种具有改进的润湿特性的方法，同时允许相对于基材和在其之间设置有压印材料的模具的优先粘合和释放特性。该方法包括用一定体积的含表面活性剂的溶液涂覆模具的表面。溶液中的表面活性剂包括基本上由多个含氟分子组成的疏水组分。含氟分子中的多个氟原子的分布以及整个体积中的含氟分子相对于设置在基材上的可聚合组合物提供期望的接触角。接触角在50°以下的范围内。

7. 发明授权

US07811505B2 Method for fast filling of templates for imprint lithography using on template dispense 有权
标题翻译：使用模板分配快速填充压印光刻模板的方法
公开(公告)号：US07811505B2
公开(公告)日：2010-10-12
申请号：US11101140
申请日：2005-04-07
申请人： Ian M. McMackin , Pankaj B. Lad , Van N. Truskett
发明人： Ian M. McMackin , Pankaj B. Lad , Van N. Truskett
IPC分类号： B28B3/00 , B28B17/00 , H01L25/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： A method of depositing material upon a substrate features filling recesses of a substrate with liquid and removing material present on the substrate, outside of the recesses using fluid, i.e., apply a vacuum of a jet of fluid. To that end, one method of the present invention includes depositing a measure of liquid upon a surface of a substrate having a recess formed therein to ingress into a volume of the recess with a portion of the liquid. A quantity of the liquid is disposed upon regions of the surface proximate to the recess. Thereafter, the quantity of liquid is removed while maintaining the portion within the volume. In this manner, the portion may be transferred onto an additional substrate. More specifically, the portion may be placed in contact with a layer of flowable material and cross-linking therewith by exposing the liquid and the flowable material to actinic radiation.
摘要翻译：在衬底上沉积材料的方法特征在于，用液体填充衬底的凹槽，并且使用流体在凹槽外部除去存在于衬底上的材料，即施加流体射流的真空。为此，本发明的一种方法包括在其中形成有凹部的基材的表面上沉积液体的量，以一部分液体进入凹部的体积。液体的数量被设置在靠近凹部的表面的区域上。此后，在将该部分保持在体积内的同时除去液体的量。以这种方式，该部分可以被转移到另外的基底上。更具体地说，该部分可以与一层可流动的材料接触并与之交联，通过将液体和可流动材料暴露于光化辐射。

8. 发明授权

US07281919B2 System for controlling a volume of material on a mold 有权
标题翻译：用于控制模具上的材料体积的系统
公开(公告)号：US07281919B2
公开(公告)日：2007-10-16
申请号：US11101139
申请日：2005-04-07
申请人： Steven C. Shackleton , Ian M. McMackin , Pankaj B. Lad , Van N. Truskett
发明人： Steven C. Shackleton , Ian M. McMackin , Pankaj B. Lad , Van N. Truskett
IPC分类号： B29C31/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： A system for controlling a volume of liquid on a mold that features a body defining a volume with an aperture formed into the body and positioned proximate to the mold. A pump system is in fluid communication with the body, and the aperture and the pump system are established to create a stream of fluid moving between the mold and the volume. In this manner a quantity of fluid is removed while retained upon the mold is a desired portion of the fluid to undertake imprint lithographic processes.
摘要翻译：一种用于控制模具上的液体体积的系统，其特征在于，具有限定体积的主体，所述体积具有形成在所述主体中并且定位成靠近所述模具的孔。泵系统与主体流体连通，并且孔和泵系统被建立以产生在模具和体积之间移动的流体流。以这种方式，除去一定量的流体，同时保留在模具上是流体的期望部分以进行压印光刻工艺。

9. 发明授权

US07473090B2 Imprint lithography template to facilitate control of liquid movement 有权
标题翻译：压印光刻模板，方便控制液体运动
公开(公告)号：US07473090B2
公开(公告)日：2009-01-06
申请号：US11762378
申请日：2007-06-13
申请人： Ian M. McMackin , Pankaj B. Lad , Van N. Truskett
发明人： Ian M. McMackin , Pankaj B. Lad , Van N. Truskett
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed to a template that features a control surface extending from a periphery of a mold toward a recessed surface of the template forming an oblique angle between a portion of the control surface disposed proximate to the periphery.
摘要翻译：本发明涉及一种模板，其特征在于，具有从模具的周边向模板的凹入表面延伸的控制表面，所述控制表面在靠近周边设置的控制表面的一部分之间形成倾斜的角度。

10. 发明申请

US20090256289A1 Preserving Filled Features When Vacuum Wiping 有权
标题翻译：真空擦拭时保存填充特性
公开(公告)号：US20090256289A1
公开(公告)日：2009-10-15
申请号：US12488642
申请日：2009-06-22
申请人： Steven C. Shackleton , Pankaj B. Lad , Ian M. McMackin , Frank Y. Xu , Sidlgata V. Sreenivasan
发明人： Steven C. Shackleton , Pankaj B. Lad , Ian M. McMackin , Frank Y. Xu , Sidlgata V. Sreenivasan
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B29C43/003 , B29C43/021 , B29C43/34 , B29C2043/025 , B29C2043/142 , B29C2043/3438 , B29K2105/0002 , B82Y10/00 , B82Y40/00
摘要： A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so that the imprint is cured past the gel point, but still retains a thin liquid layer of uncured monomer at the surface that will bond with the wafer. Further, this partially cured layer enables the alignment adjustments between the template and the substrate to be performed after contact between the two without pulling any monomer out of the features.
摘要翻译：在与基底接触之前在模板上固化印模的方法/方法。使用固化过程将印记粘附到晶片或基板上。将单体沉积在模板上，然后使用UV曝光部分固化。控制曝光使得印迹经过凝胶点固化，但仍然保留在将与晶片结合的表面上的未固化单体的薄液体层。此外，这种部分固化的层使得能够在两者之间接触之后进行模板和基板之间的对准调整，而不将任何单体拉出特征。

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