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1. 发明授权

US08871152B2 Exhaust gas processing device 有权
标题翻译：废气处理装置
公开(公告)号：US08871152B2
公开(公告)日：2014-10-28
申请号：US14151221
申请日：2014-01-09
申请人： Ibiden Co., Ltd.
发明人： Fumiyuki Mutsuda , Yoshitaka Fujita
IPC分类号： B01D50/00
CPC分类号： F01N3/2853 , F01N3/2026 , F01N3/2864 , F01N3/2871 , Y02T10/26
摘要： An exhaust gas processing device includes a first cylindrical metallic member, an inorganic mat member, a second cylindrical metallic member, and an insulating layer. The inorganic mat member is wound around an outer periphery of the first cylindrical metallic member. The second cylindrical metallic member accommodates the first cylindrical metallic member around which the inorganic mat member is wound. The insulating layer have a thickness of about 20 μm to about 400 μm and is provided at at least one of a first part which is an inner surface of the first cylindrical metallic member, a second part between an outer surface of the first cylindrical metallic member and the inorganic mat member, and a third part between an inner surface of the second cylindrical metallic member and the inorganic mat member.
摘要翻译：排气处理装置包括第一圆柱形金属构件，无机垫构件，第二圆柱形金属构件和绝缘层。无机垫材缠绕在第一圆柱形金属构件的外周。第二圆柱形金属构件容纳卷绕无机垫构件的第一圆柱形金属构件。绝缘层的厚度为约20μm至约400μm，并且设置在作为第一圆筒形金属构件的内表面的第一部分和第一圆柱形金属构件的外表面之间的第二部分中的至少一个上无机垫材，第二筒状金属构件的内表面和无机垫材之间的第三部分。

2. 发明授权

US09562166B2 Structure and paint for forming surface coat layer 有权
标题翻译：用于形成表面涂层的结构和涂料
公开(公告)号：US09562166B2
公开(公告)日：2017-02-07
申请号：US14511182
申请日：2014-10-10
申请人： IBIDEN CO., LTD.
发明人： Fumiyuki Mutsuda , Yoshitaka Fujita
IPC分类号： C09D101/28 , C03C8/14 , C03C8/20 , F01N13/10 , F01N13/08 , F01N13/14 , F01N13/16 , C08K3/22 , C08K3/38 , C23D5/00
CPC分类号： C09D101/28 , C03C8/14 , C03C8/20 , C03C2207/04 , C03C2207/06 , C08K3/22 , C08K3/38 , C08K2003/2227 , C23D5/00 , C23D5/005 , F01N13/08 , F01N13/102 , F01N13/14 , F01N13/16 , F01N2510/02 , Y10T428/24372 , Y10T428/24612
摘要： A structure includes a surface coat layer of which the thickness on a bump such as a weld bead and a weld spatter or an edge portion, possibly formed on the surface of a base, is not greatly different from the thickness on a flat portion. The structure therefore has excellent properties including heat insulation properties and electrical insulation properties. The structure includes a base that is made of a metal, and has a flat portion and at least one of a bump and an edge portion on a surface; and a surface coat layer that is formed from an amorphous inorganic material and particles of a crystalline inorganic material, and covers the surface of the base, the surface coat layer including a first coat portion covering the flat portion and a second coat portion covering the at least one of a bump and an edge portion.
摘要翻译：一种结构包括表面涂层，其上可能形成在基体表面上的诸如焊缝的凸起上的厚度和焊接飞溅物或边缘部分的厚度与平坦部分上的厚度没有很大差异。因此，该结构具有优异的性能，包括绝热性能和电绝缘性能。该结构包括由金属制成的基部，并且具有平坦部分和表面上的凸起和边缘部分中的至少一个; 以及由无定形无机材料形成的表面涂层和结晶无机材料的颗粒，并且覆盖基材的表面，所述表面涂层包括覆盖所述平坦部分的第一涂层部分和覆盖所述平坦部分的第二涂覆部分至少一个凸块和边缘部分。

3. 发明授权

US09180406B2 Exhaust gas processing device 有权
标题翻译：废气处理装置
公开(公告)号：US09180406B2
公开(公告)日：2015-11-10
申请号：US14554060
申请日：2014-11-26
申请人： IBIDEN CO., LTD.
发明人： Fumiyuki Mutsuda , Yoshitaka Fujita
IPC分类号： B01D50/00 , B01D53/56 , F01N3/28 , F01N3/20 , B01D53/62 , B01D53/72 , B01D53/86
CPC分类号： B01D53/565 , B01D53/62 , B01D53/72 , B01D53/8631 , B01D53/864 , F01N3/2026 , F01N3/2871 , F01N2260/10 , F01N2510/00 , Y02T10/26
摘要： An exhaust gas processing device includes a cylindrical metallic member and an insulating layer. The insulating layer has a thickness of about 20 μm to about 400 μm and is densely formed such that no through pores exist in a thickness direction of the insulating layer. The insulating layer is provided on an inner surface of the cylindrical metallic member.
摘要翻译：废气处理装置包括圆柱形金属构件和绝缘层。绝缘层的厚度为约20μm至约400μm，并且致密地形成，使得绝缘层的厚度方向上不存在通孔。绝缘层设置在圆筒形金属构件的内表面上。

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