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1. 发明授权

US08056032B2 Methods for measuring mean-to-target (MTT) based on pattern area measurements and methods of correcting photomasks using the same 有权
标题翻译：基于图案区域测量的平均对目标（MTT）的测量方法和使用其的光掩膜校正方法
公开(公告)号：US08056032B2
公开(公告)日：2011-11-08
申请号：US12276526
申请日：2008-11-24
申请人： Hyung-joo Lee , So-yoon Bae , Yo-han Choi , Jong-won Kim , Dong-hoon Chung
发明人： Hyung-joo Lee , So-yoon Bae , Yo-han Choi , Jong-won Kim , Dong-hoon Chung
IPC分类号： G06F17/50
CPC分类号： G06F17/5068
摘要： Methods of measuring a mean-to-target (MTT) based on pattern area measurements are provided including providing a design pattern. A plurality of design pattern measurements are measured for calculating an area of the design pattern based on a shape of the design pattern. A series of calculation measurements are calculated by continuously substituting a same variation into the design pattern measurements, and calculating a series of calculation areas corresponding respectively to the calculation measurements to generate a database including the calculation measurements and the calculation areas. An actual pattern is formed using the design pattern and an area of the actual pattern is measured. A calculation area corresponding to the area of the actual pattern is selected from the database and calculation measurements corresponding to the calculation area are selected. A difference between the design pattern measurements and the calculation measurements is calculated and the difference is set as an MTT. Related methods of correcting a photomask are also provided herein.
摘要翻译：提供了基于图案面积测量来测量平均对目标（MTT）的方法，包括提供设计模式。测量多个设计图案测量，以基于设计图案的形状来计算设计图案的面积。通过连续地将相同的变化替换为设计模式测量并计算分别对应于计算测量的一系列计算区域来生成包括计算测量值和计算区域的数据库来计算一系列计算测量。使用设计图案形成实际图案，并测量实际图案的面积。从数据库中选择与实际图案的区域对应的计算区域，并且选择与计算区域相对应的计算测量。计算设计模式测量和计算测量之间的差异，并将差设置为MTT。本文还提供了校正光掩模的相关方法。

2. 发明申请

US20090150849A1 Methods for Measuring Mean-to-Target (MTT) Based on Pattern Area Measurements and Methods of Correcting Photomasks Using the Same 有权
标题翻译：基于图案区域测量的平均目标（MTT）测量方法和使用该方法校正光掩模的方法
公开(公告)号：US20090150849A1
公开(公告)日：2009-06-11
申请号：US12276526
申请日：2008-11-24
申请人： Hyung-joo Lee , So-yoon Bae , Yo-han Choi , Jong-won Kim , Dong-hoon Chung
发明人： Hyung-joo Lee , So-yoon Bae , Yo-han Choi , Jong-won Kim , Dong-hoon Chung
IPC分类号： G06F17/50
CPC分类号： G06F17/5068
摘要： Methods of measuring a mean-to-target (MTT) based on pattern area measurements are provided including providing a design pattern. A plurality of design pattern measurements are measured for calculating an area of the design pattern based on a shape of the design pattern. A series of calculation measurements are calculated by continuously substituting a same variation into the design pattern measurements, and calculating a series of calculation areas corresponding respectively to the calculation measurements to generate a database including the calculation measurements and the calculation areas. An actual pattern is formed using the design pattern and an area of the actual pattern is measured. A calculation area corresponding to the area of the actual pattern is selected from the database and calculation measurements corresponding to the calculation area are selected. A difference between the design pattern measurements and the calculation measurements is calculated and the difference is set as an MTT. Related methods of correcting a photomask are also provided herein.
摘要翻译：提供了基于图案面积测量来测量平均对目标（MTT）的方法，包括提供设计模式。测量多个设计图案测量，以基于设计图案的形状来计算设计图案的面积。通过连续地将相同的变化替换为设计模式测量并计算分别对应于计算测量的一系列计算区域来生成包括计算测量值和计算区域的数据库来计算一系列计算测量。使用设计图案形成实际图案，并测量实际图案的面积。从数据库中选择与实际图案的区域对应的计算区域，并且选择与计算区域相对应的计算测量。计算设计模式测量和计算测量之间的差异，并将差设置为MTT。本文还提供了校正光掩模的相关方法。

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