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    • 1. 发明授权
    • Semiconductor device having decoupling capacitor and method of fabricating the same
    • 具有去耦电容器的半导体器件及其制造方法
    • US07883970B2
    • 2011-02-08
    • US12343035
    • 2008-12-23
    • Hyun-Ki KimJung-Hwa LeeJi-Young Kim
    • Hyun-Ki KimJung-Hwa LeeJi-Young Kim
    • H01L21/336
    • H01L29/945H01L27/0207H01L27/0805H01L27/10861H01L27/10876H01L27/10894H01L29/66181H01L29/66621H01L29/78
    • A semiconductor device having a decoupling capacitor and a method of fabricating the same are provided. The semiconductor device includes a semiconductor substrate having a cell region, a first peripheral circuit region, and a second peripheral circuit region. At least one channel trench is disposed in the cell region of the semiconductor substrate. At least one first capacitor trench is disposed in the first peripheral circuit region of the semiconductor substrate, and at least one second capacitor trench is disposed in the second peripheral circuit region of the semiconductor substrate. A gate electrode is disposed in the cell region of the semiconductor substrate and fills the channel trench. A first upper electrode is disposed in the first peripheral circuit region of the semiconductor substrate and fills at least the first capacitor trench. A second upper electrode is disposed in the second peripheral circuit region of the semiconductor substrate and fills at least the second capacitor trench. A gate dielectric layer is interposed between the channel trench and the gate electrode. A first dielectric layer is interposed between the semiconductor substrate of the first peripheral circuit region having the first capacitor trench and the first upper electrode and has the same thickness as the gate dielectric layer. A second dielectric layer is interposed between the semiconductor substrate of the second peripheral circuit region having the second capacitor trench and the second upper electrode and has a different thickness from the first dielectric layer.
    • 提供具有去耦电容器的半导体器件及其制造方法。 半导体器件包括具有单元区域,第一外围电路区域和第二外围电路区域的半导体衬底。 至少一个通道沟槽设置在半导体衬底的单元区域中。 至少一个第一电容器沟槽设置在半导体衬底的第一外围电路区域中,并且至少一个第二电容器沟槽设置在半导体衬底的第二外围电路区域中。 栅电极设置在半导体衬底的单元区域中并填充沟槽。 第一上电极设置在半导体衬底的第一外围电路区域中,并且填充至少第一电容器沟槽。 第二上电极设置在半导体衬底的第二外围电路区域中,并且填充至少第二电容器沟槽。 栅极电介质层介于通道沟槽和栅电极之间。 在具有第一电容器沟槽的第一外围电路区域的半导体衬底和第一上电极之间插入第一电介质层,并且具有与栅极电介质层相同的厚度。 在具有第二电容器沟槽的第二外围电路区域的半导体衬底和第二上部电极之间插入第二电介质层,并且具有与第一电介质层不同的厚度。
    • 2. 发明申请
    • Semiconductor device having decoupling capacitor and method of fabricating the same
    • 具有去耦电容器的半导体器件及其制造方法
    • US20070052013A1
    • 2007-03-08
    • US11449959
    • 2006-06-09
    • Hyun-Ki KimJung-Hwa LeeJi-Young Kim
    • Hyun-Ki KimJung-Hwa LeeJi-Young Kim
    • H01L29/94
    • H01L29/945H01L27/0207H01L27/0805H01L27/10861H01L27/10876H01L27/10894H01L29/66181H01L29/66621H01L29/78
    • A semiconductor device having a decoupling capacitor and a method of fabricating the same are provided. The semiconductor device includes a semiconductor substrate having a cell region, a first peripheral circuit region, and a second peripheral circuit region. At least one channel trench is disposed in the cell region of the semiconductor substrate. At least one first capacitor trench is disposed in the first peripheral circuit region of the semiconductor substrate, and at least one second capacitor trench is disposed in the second peripheral circuit region of the semiconductor substrate. A gate electrode is disposed in the cell region of the semiconductor substrate and fills the channel trench. A first upper electrode is disposed in the first peripheral circuit region of the semiconductor substrate and fills at least the first capacitor trench. A second upper electrode is disposed in the second peripheral circuit region of the semiconductor substrate and fills at least the second capacitor trench. A gate dielectric layer is interposed between the channel trench and the gate electrode. A first dielectric layer is interposed between the semiconductor substrate of the first peripheral circuit region having the first capacitor trench and the first upper electrode and has the same thickness as the gate dielectric layer. A second dielectric layer is interposed between the semiconductor substrate of the second peripheral circuit region having the second capacitor trench and the second upper electrode and has a different thickness from the first dielectric layer.
    • 提供具有去耦电容器的半导体器件及其制造方法。 半导体器件包括具有单元区域,第一外围电路区域和第二外围电路区域的半导体衬底。 至少一个通道沟槽设置在半导体衬底的单元区域中。 至少一个第一电容器沟槽设置在半导体衬底的第一外围电路区域中,并且至少一个第二电容器沟槽设置在半导体衬底的第二外围电路区域中。 栅电极设置在半导体衬底的单元区域中并填充沟槽。 第一上电极设置在半导体衬底的第一外围电路区域中,并且填充至少第一电容器沟槽。 第二上电极设置在半导体衬底的第二外围电路区域中,并且填充至少第二电容器沟槽。 栅极电介质层介于通道沟槽和栅电极之间。 在具有第一电容器沟槽的第一外围电路区域的半导体衬底和第一上电极之间插入第一电介质层,并且具有与栅极电介质层相同的厚度。 在具有第二电容器沟槽的第二外围电路区域的半导体衬底和第二上部电极之间插入第二电介质层,并且具有与第一电介质层不同的厚度。
    • 3. 发明申请
    • SEMICONDUCTOR DEVICE HAVING DECOUPLING CAPACITOR AND METHOD OF FABRICATING THE SAME
    • 具有解除电容器的半导体器件及其制造方法
    • US20090111232A1
    • 2009-04-30
    • US12343035
    • 2008-12-23
    • Hyun-Ki KimJung-Hwa LeeJi-Young Kim
    • Hyun-Ki KimJung-Hwa LeeJi-Young Kim
    • H01L21/762
    • H01L29/945H01L27/0207H01L27/0805H01L27/10861H01L27/10876H01L27/10894H01L29/66181H01L29/66621H01L29/78
    • A semiconductor device having a decoupling capacitor and a method of fabricating the same are provided. The semiconductor device includes a semiconductor substrate having a cell region, a first peripheral circuit region, and a second peripheral circuit region. At least one channel trench is disposed in the cell region of the semiconductor substrate. At least one first capacitor trench is disposed in the first peripheral circuit region of the semiconductor substrate, and at least one second capacitor trench is disposed in the second peripheral circuit region of the semiconductor substrate. A gate electrode is disposed in the cell region of the semiconductor substrate and fills the channel trench. A first upper electrode is disposed in the first peripheral circuit region of the semiconductor substrate and fills at least the first capacitor trench. A second upper electrode is disposed in the second peripheral circuit region of the semiconductor substrate and fills at least the second capacitor trench. A gate dielectric layer is interposed between the channel trench and the gate electrode. A first dielectric layer is interposed between the semiconductor substrate of the first peripheral circuit region having the first capacitor trench and the first upper electrode and has the same thickness as the gate dielectric layer. A second dielectric layer is interposed between the semiconductor substrate of the second peripheral circuit region having the second capacitor trench and the second upper electrode and has a different thickness from the first dielectric layer.
    • 提供具有去耦电容器的半导体器件及其制造方法。 半导体器件包括具有单元区域,第一外围电路区域和第二外围电路区域的半导体衬底。 至少一个通道沟槽设置在半导体衬底的单元区域中。 至少一个第一电容器沟槽设置在半导体衬底的第一外围电路区域中,并且至少一个第二电容器沟槽设置在半导体衬底的第二外围电路区域中。 栅电极设置在半导体衬底的单元区域中并填充沟槽。 第一上电极设置在半导体衬底的第一外围电路区域中,并且填充至少第一电容器沟槽。 第二上电极设置在半导体衬底的第二外围电路区域中,并且填充至少第二电容器沟槽。 栅极电介质层介于通道沟槽和栅电极之间。 在具有第一电容器沟槽的第一外围电路区域的半导体衬底和第一上电极之间插入第一电介质层,并且具有与栅极电介质层相同的厚度。 在具有第二电容器沟槽的第二外围电路区域的半导体衬底和第二上部电极之间插入第二电介质层,并且具有与第一电介质层不同的厚度。
    • 4. 发明授权
    • Semiconductor device having decoupling capacitor and method of fabricating the same
    • 具有去耦电容器的半导体器件及其制造方法
    • US07485911B2
    • 2009-02-03
    • US11449959
    • 2006-06-09
    • Hyun-Ki KimJung-Hwa LeeJi-Young Kim
    • Hyun-Ki KimJung-Hwa LeeJi-Young Kim
    • H01L27/108H01L29/76
    • H01L29/945H01L27/0207H01L27/0805H01L27/10861H01L27/10876H01L27/10894H01L29/66181H01L29/66621H01L29/78
    • A semiconductor device having a decoupling capacitor and a method of fabricating the same are provided. The semiconductor device includes a semiconductor substrate having a cell region, a first peripheral circuit region, and a second peripheral circuit region. At least one channel trench is disposed in the cell region of the semiconductor substrate. At least one first capacitor trench is disposed in the first peripheral circuit region of the semiconductor substrate, and at least one second capacitor trench is disposed in the second peripheral circuit region of the semiconductor substrate. A gate electrode is disposed in the cell region of the semiconductor substrate and fills the channel trench. A first upper electrode is disposed in the first peripheral circuit region of the semiconductor substrate and fills at least the first capacitor trench. A second upper electrode is disposed in the second peripheral circuit region of the semiconductor substrate and fills at least the second capacitor trench. A gate dielectric layer is interposed between the channel trench and the gate electrode. A first dielectric layer is interposed between the semiconductor substrate of the first peripheral circuit region having the first capacitor trench and the first upper electrode and has the same thickness as the gate dielectric layer. A second dielectric layer is interposed between the semiconductor substrate of the second peripheral circuit region having the second capacitor trench and the second upper electrode and has a different thickness from the first dielectric layer.
    • 提供具有去耦电容器的半导体器件及其制造方法。 半导体器件包括具有单元区域,第一外围电路区域和第二外围电路区域的半导体衬底。 至少一个通道沟槽设置在半导体衬底的单元区域中。 至少一个第一电容器沟槽设置在半导体衬底的第一外围电路区域中,并且至少一个第二电容器沟槽设置在半导体衬底的第二外围电路区域中。 栅电极设置在半导体衬底的单元区域中并填充沟槽。 第一上电极设置在半导体衬底的第一外围电路区域中,并且填充至少第一电容器沟槽。 第二上电极设置在半导体衬底的第二外围电路区域中,并填充至少第二电容器沟槽。 栅极电介质层介于通道沟槽和栅电极之间。 在具有第一电容器沟槽的第一外围电路区域的半导体衬底和第一上电极之间插入第一电介质层,并且具有与栅极电介质层相同的厚度。 在具有第二电容器沟槽的第二外围电路区域的半导体衬底和第二上部电极之间插入第二电介质层,并且具有与第一电介质层不同的厚度。
    • 5. 发明授权
    • Apparatus and method for a query express
    • 用于查询的装置和方法表达
    • US08805868B2
    • 2014-08-12
    • US12671909
    • 2007-12-27
    • Mi-Ran ChoiHee-Cheol SeoHyun-Ki KimMyung-Gil JangJeong HeoSoo-Jong LimYeo-Chan YoonKyoung-Ro Yoon
    • Mi-Ran ChoiHee-Cheol SeoHyun-Ki KimMyung-Gil JangJeong HeoSoo-Jong LimYeo-Chan YoonKyoung-Ro Yoon
    • G06F17/30
    • G06F17/30023G06F17/30926
    • Disclosed is an apparatus and method for expressing a query for searching multimedia data. The apparatus and method of the present invention expresses diverse query types in MPEG-7 query formats and uses field types to re use a designated region. The apparatus for expressing a query inputted from a user for multimedia data search includes: an input means for receiving a query for multimedia data search from a user; and a query expression means for expressing the input query in a field type, wherein the field type includes at least one among identifier information indicating identification (ID) information of a field presenting a search condition included in the input query; type information indicating data type information of the field; and reference information indicating identifier information of another field for reference. The present invention is applied to MPEG-7 query formats.
    • 公开了一种用于表达用于搜索多媒体数据的查询的装置和方法。 本发明的装置和方法以MPEG-7查询格式表示不同的查询类型,并且使用字段类型来重新使用指定的区域。 用于表示从用户输入的用于多媒体数据搜索的查询的装置包括:输入装置,用于从用户接收用于多媒体数据搜索的查询; 以及用于以场类型表达输入查询的查询表达装置,其中,所述字段类型包括表示所述输入查询中包括的搜索条件的字段的标识(ID)信息的标识符信息中的至少一个; 指示该字段的数据类型信息的类型信息; 以及指示用于参考的另一场的标识符信息的参考信息。 本发明应用于MPEG-7查询格式。
    • 9. 发明申请
    • Disposal and Decontamination of Radioactive Polyvinyl Alcohol Products
    • 放射性聚乙烯醇产品的处置和去污
    • US20120220809A1
    • 2012-08-30
    • US13508895
    • 2010-11-12
    • Jin-Kil KimUi-Dong LeeHyun-Ki KimSeong-Jun Hong
    • Jin-Kil KimUi-Dong LeeHyun-Ki KimSeong-Jun Hong
    • G21F9/34B01J19/00
    • G21F9/34G21F9/14
    • Methods and apparatus for decontaminating disposable protective products prepared from polyvinyl alcohol (PVA), used in a nuclear power plant, to less than minimum detectable activity (MDA) are disclosed. In the disclosed methods and apparatus, solid protective products made of PVA, generated from a nuclear power plant, are dissolved into a liquid, and then are decontaminated to less than MDA. The PVA solution decontaminated in this way is concentrated to an appropriate concentration or dried, and finally is subjected to self-disposal. This can fundamentally block the generation amount of combustible waste amounting to 50% or more of low and intermediate level waste of nuclear power plants, thereby considerably contributing to a reduction of the operating expenses of the nuclear power plants. The present invention further relates to methods and apparatus for self-disposing disposable protective products manufactured by conventional polyvinyl alcohol (PVA) through pyrolysis/catalytic oxidation of a PVA solution generated by concentration, and treating the decontaminated PVA solution within a plant. The PVA protective products are dissolved/concentrated/oxidized in water to remove firstly organic matter, and then PVA materials in the PVA solution are completely oxidized into CO2 and H2O by using a small-sized pyrolysis/catalytic oxidation reactor.
    • 公开了将用于核动力装置的聚乙烯醇(PVA)制备的一次性防护产品去污化至少于最小可检测活性(MDA)的方法和装置。 在所公开的方法和装置中,由核电厂生产的由PVA制成的固体保护产品溶解在液体中,然后净化成小于MDA。 以这种方式去除的PVA溶液被浓缩至适当的浓度或干燥,最后进行自我处理。 这可以从根本上阻止核电厂中低档废物达到50%以上的可燃废物的发电量,从而大大有助于降低核电厂的运行费用。 本发明还涉及通过常规聚乙烯醇(PVA)通过热分解/催化氧化浓缩产生的PVA溶液和处理植物中去污的PVA溶液来自行布置一次性防护产品的方法和装置。 PVA保护产物在水中溶解/浓缩/氧化,首先除去有机物质,然后使用小型热解/催化氧化反应器将PVA溶液中的PVA材料完全氧化成CO 2和H 2 O.