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    • 6. 发明授权
    • Dielectric thin film composition showing linear dielectric properties
    • 显示线性介电性能的介电薄膜组合物
    • US08030237B2
    • 2011-10-04
    • US12537198
    • 2009-08-06
    • Ji-Won ChoiWon Kook ChoiSeok-Jin Yoon
    • Ji-Won ChoiWon Kook ChoiSeok-Jin Yoon
    • C04B35/468C04B35/47
    • H01B3/12C04B35/4682C04B35/47C04B2235/3213C04B2235/3215C04B2235/3293
    • The present invention relates to a dielectric thin film composition showing linear dielectric properties, in which tin oxides (SnO2) are introduced into a (Ba,Sr)TiO3 (BSTO) dielectric thin film in a continuous diffusion gradient manner in composition. Since the non-linear dielectric properties of BSTO are converted to linear dielectric properties by the addition of SnO2 according to the present invention, the dielectric thin film composition of the present invention is characterized in that: there is little change in the capacitance according to the applied electric field; it has a high dielectric constant capable of showing a desired capacitance even at a thickness suitable for preventing the occurrence of electron tunneling; and it exhibits paraelectric properties similar to the conventional dielectric substances such as SiO2 while having a very low dielectric loss.
    • 本发明涉及一种电介质薄膜组合物,其表现出线性介电性质,其中在组成中以连续扩散梯度方式将锡氧化物(SnO 2)引入到(Ba,Sr)TiO 3(BSTO)电介质薄膜中。 由于根据本发明通过添加SnO 2将BSTO的非线性介电性能转化为线性介电特性,所以本发明的电介质薄膜组合物的特征在于:根据 应用电场; 即使在适合于防止电子隧道发生的厚度的情况下,也具有能够显示所需电容的高介电常数; 并且具有类似于常规电介质物质如SiO 2的同电性能,同时具有非常低的介电损耗。
    • 7. 发明申请
    • Dielectric Thin Film Composition Showing Linear Dielectric Properties
    • 显示线性介电性能的介电薄膜组成
    • US20100035749A1
    • 2010-02-11
    • US12537198
    • 2009-08-06
    • Ji-Won ChoiWon Kook ChoiSeok-Jin Yoon
    • Ji-Won ChoiWon Kook ChoiSeok-Jin Yoon
    • C04B35/457
    • H01B3/12C04B35/4682C04B35/47C04B2235/3213C04B2235/3215C04B2235/3293
    • The present invention relates to a dielectric thin film composition showing linear dielectric properties, in which tin oxides (SnO2) are introduced into a (Ba,Sr)TiO3 (BSTO) dielectric thin film in a continuous diffusion gradient manner in composition. Since the non-linear dielectric properties of BSTO are converted to linear dielectric properties by the addition of SnO2 according to the present invention, the dielectric thin film composition of the present invention is characterized in that: there is little change in the capacitance according to the applied electric field; it has a high dielectric constant capable of showing a desired capacitance even at a thickness suitable for preventing the occurrence of electron tunneling; and it exhibits paraelectric properties similar to the conventional dielectric substances such as SiO2 while having a very low dielectric loss.
    • 本发明涉及一种电介质薄膜组合物,其表现出线性介电性质,其中在组成中以连续扩散梯度方式将锡氧化物(SnO 2)引入到(Ba,Sr)TiO 3(BSTO)电介质薄膜中。 由于根据本发明通过添加SnO 2将BSTO的非线性介电性能转化为线性介电特性,所以本发明的电介质薄膜组合物的特征在于:根据 应用电场; 即使在适合于防止电子隧道发生的厚度的情况下,也具有能够显示所需电容的高介电常数; 并且具有类似于常规电介质物质如SiO 2的同电性能,同时具有非常低的介电损耗。